JPH0726856Y2 - Semiconductor laser device - Google Patents

Semiconductor laser device

Info

Publication number
JPH0726856Y2
JPH0726856Y2 JP1986194770U JP19477086U JPH0726856Y2 JP H0726856 Y2 JPH0726856 Y2 JP H0726856Y2 JP 1986194770 U JP1986194770 U JP 1986194770U JP 19477086 U JP19477086 U JP 19477086U JP H0726856 Y2 JPH0726856 Y2 JP H0726856Y2
Authority
JP
Japan
Prior art keywords
semiconductor laser
reflectance
laser device
coating
return light
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP1986194770U
Other languages
Japanese (ja)
Other versions
JPS6398674U (en
Inventor
健太郎 井上
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sanyo Electric Co Ltd
Original Assignee
Tottori Sanyo Electric Co Ltd
Sanyo Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tottori Sanyo Electric Co Ltd, Sanyo Electric Co Ltd filed Critical Tottori Sanyo Electric Co Ltd
Priority to JP1986194770U priority Critical patent/JPH0726856Y2/en
Publication of JPS6398674U publication Critical patent/JPS6398674U/ja
Application granted granted Critical
Publication of JPH0726856Y2 publication Critical patent/JPH0726856Y2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Description

【考案の詳細な説明】 イ)産業上の利用分野 本考案は特に光学読取装置に好適な半導体レーザ素子に
関する。
DETAILED DESCRIPTION OF THE INVENTION (a) Field of Industrial Application The present invention relates to a semiconductor laser device particularly suitable for an optical reading device.

ロ)従来の技術 従来よりデイスク盤に記録された情報を読取る光学読取
装置には半導体レーザ素子が用いられ、そのレーザ光を
デイスク盤に反射させて用いている。この場合、反射さ
れたレーザ光が受光素子ではなく半導体レーザ素子に至
ると、干渉もしくはレーザ発振阻害といったいわゆる戻
り光ノイズを生じ不都合である。このため初期の光学読
取装置においては光学系にλ/4板を用いる等の工夫をし
ていたが、近年は小型化や簡素化に伴い光学系による戻
り光対策はなされなくなった。
(B) Conventional technology Conventionally, a semiconductor laser element is used in an optical reading device for reading information recorded on a disk, and the laser light is reflected on the disk and used. In this case, when the reflected laser light reaches the semiconductor laser element instead of the light receiving element, so-called return light noise such as interference or laser oscillation inhibition occurs, which is inconvenient. For this reason, in early optical reading devices, a λ / 4 plate was used for the optical system, but in recent years, due to downsizing and simplification, measures against returning light by the optical system are no longer taken.

一方半導体レーザ素子には、米国特許第4,178,564号に
示されるように、光放出面である対向した劈開面に誘導
体からなる被膜を設けている。これは、劈開面によって
フエブリペロー共振器(Febry−Perot resonator)を形
成する際、端面反射率を上げると閾値が低くなりレーザ
発振がしやすく、制御が容易になる事に着目してなされ
たもので、両劈開面に反射率30%以上の特性の等しい被
膜を設けるのが一般的であった。
On the other hand, in the semiconductor laser device, as shown in U.S. Pat. No. 4,178,564, a coating made of a derivative is provided on the opposing cleavage faces which are the light emitting faces. This was done by paying attention to the fact that when forming a Fabry-Perot resonator with a cleavage plane, increasing the edge reflectivity lowers the threshold value, which facilitates laser oscillation and facilitates control. , It was common to provide a coating with equal characteristics with a reflectance of 30% or more on both cleaved surfaces.

ハ)考案が解決しようとする問題点 本考案は上述の点を考慮してなされたもので、前記被膜
に着目し前述の戻り光ノイズを低減させた半導体レーザ
素子を提供するものである。
C) Problems to be Solved by the Invention The present invention has been made in consideration of the above points, and provides a semiconductor laser device in which the return light noise is reduced by focusing on the film.

ニ)問題点を解決するための手段 本考案は前記被膜の反射率を対向する劈開面で互いに異
ならしめ、一方は25乃至32%、他方は15乃至25%とする
ものである。
D) Means for solving the problems In the present invention, the reflectances of the coatings are made different from each other on the opposing cleavage planes, one of which is 25 to 32% and the other of which is 15 to 25%.

ホ)作用 これによりコヒーレンシー等の特性を劣化させる事なく
戻り光ノイズの影響を低減できる。
(E) Action As a result, the influence of return light noise can be reduced without degrading characteristics such as coherency.

ヘ)実施例 第1図は本考案実施例の半導体レーザ素子の斜視図で、
GaAs基台(1)上にクラツド層で狭まれた活性層(2)
がエピタキシヤル成長され表裏面には電極(3)(3)
が設けてある。活性層(2)はレーザ光が絞れるよう狭
窄された形に形成され、素子の前後から光放出されるよ
うになっているが、その光放出面は劈開面(4)(4)
となってフエブリペロー共振器を構成する。(5)
(5)′はこの劈開面(4)(4)に設けられた誘電体
からなる被膜で、各々の反射率はn1、n2で示す。第2図
は戻り光ノイズの特性を示した図であるが、破線(イ)
は従来のレーザ素子によるもので、両被膜ともn1=n2=
32%の時のものである。一点鎖線(ロ)で示した特性は
本考案研究にあたって一方の被膜の反射率を低くしたも
ので、n1=13%、n2=30%のものを例示している。
F) Embodiment FIG. 1 is a perspective view of a semiconductor laser device according to an embodiment of the present invention.
Active layer (2) sandwiched by cladding layers on a GaAs base (1)
Are epitaxially grown and electrodes (3) (3) are formed on the front and back surfaces.
Is provided. The active layer (2) is formed in a narrowed shape so that the laser light can be narrowed down, and light is emitted from the front and back of the device. The light emitting surface is the cleavage planes (4) (4).
And constitutes a Fabry-Perot resonator. (5)
(5) 'is a film made of a dielectric material provided on the cleavage planes (4) and (4), and the respective reflectances are shown by n1 and n2. FIG. 2 is a diagram showing the characteristics of the return light noise, which is indicated by the broken line (a).
Is due to the conventional laser element, and both coatings have n1 = n2 =
It is at 32%. The characteristic indicated by the alternate long and short dash line (b) is one in which the reflectance of one coating is lowered in the present invention research, and exemplifies the one in which n1 = 13% and n2 = 30%.

いずれも実際に半導体レーザ素子を利用する1.2<Iop/I
th<1.45の電流範囲で戻り光ノイズが大きい。それに対
して実線(ハ)で示した特性は本考案実施例のもので、
代表例としてn1=20%、n2=30%のものを示してあり、
戻り光ノイズは前記電流範囲で−70dB以下、ロツトのば
らつきを含めても−65dB以下にそろえることができた。
Both of which actually use the semiconductor laser device 1.2 <Iop / I
Return light noise is large in the current range of th <1.45. On the other hand, the characteristics shown by the solid line (C) are those of the embodiment of the present invention,
As a typical example, n1 = 20% and n2 = 30% are shown.
The return light noise could be adjusted to -70 dB or less in the above current range, and -65 dB or less even if the variation of the lot was included.

上述の例についてより詳しく説明するが、横軸に示した
のは駆動電流Iopを閾値電流Ithで標準化したもので、一
般に動作電流と呼んでいる。さて、反射率は実際に反射
率そのものを各素子毎に測定したものではなく、Apfel
の円図形法により導出しサンプル素子で確認したもので
ある。この方法によると被膜の形成条件と対応がつくの
で生産性もよい。具体的にはレーザ光の波長λ=800nm
とし被膜としてAl2O3を用いるとすると、被膜の厚さが2
400Åの時反射率32%であり、被膜の厚さが1200Åもし
くは3600Åの時反射率3%となり、その間は正弦波的に
特性が変化する。そしてここで興味深い事は反射率に応
じて被膜に呈色があらわれることで、反射率が32%から
3%にかわるに従って桃色→金色→黄色→緑色→淡青色
→淡色と変化する。
Although the above example will be described in more detail, what is shown on the horizontal axis is the drive current Iop standardized by the threshold current Ith, which is generally called an operating current. Now, the reflectivity is not actually measured by each element, but Apfel
It was derived by the circular figure method of and confirmed by the sample device. According to this method, the productivity can be improved because the conditions for forming the coating can be met. Specifically, the wavelength of laser light λ = 800 nm
When Al 2 O 3 is used as the coating, the thickness of the coating is 2
The reflectivity is 32% at 400Å, and the reflectivity is 3% when the film thickness is 1200Å or 3600Å, and the characteristic changes sinusoidally during that time. And what is interesting here is that the coloration appears in the coating film according to the reflectance, and as the reflectance changes from 32% to 3%, it changes from pink → gold → yellow → green → light blue → light color.

これらの事から上述の戻り光ノイズの低減の条件を示す
と、一方の被膜(5)の反射率n1が15%以上25%以下で
あって、他方の被膜(5)′の反射率n2が25%以上32%
以下の時に−60dB以下になるように特性曲線は横軸に略
平行になる。この時の被膜(5)(5)′の呈色は反射
率の低い方の被膜(5)が黄緑〜黄色〜金色であり、黄
色味を帯びているのが良く、反射率の高い方の被膜5′
が金色〜淡桃色〜桃紫色と桃色味を帯びるのが良い。
From the above, the conditions for reducing the above-mentioned return light noise are shown. One film (5) has a reflectance n1 of 15% or more and 25% or less, and the other film (5) 'has a reflectance n2 of 25% or more 32%
In the following cases, the characteristic curve becomes almost parallel to the horizontal axis so that it becomes -60 dB or less. At this time, the color of the coatings (5) and (5) 'is yellow green to yellow to gold in the coating (5) having a lower reflectance, which is preferably yellowish and has a higher reflectance. Coating 5 '
It should have a golden to pale pink to pink purple and pink taste.

この様な結果について概ね次の様に考えられる。被膜
(5)(5)′において反射率が等しい時および両方が
高反射率の時にはコヒーレンシ(可干渉性)が極めて高
いレーザ光となるので放出光と戻り光とが相互干渉しあ
い、その結果いわゆる戻り光ノイズとなるものと思われ
る。従ってレーザ光の出力が高ければ高い程戻り光ノイ
ズは大きくなる。一方被膜(5)(5)′のいずれかが
低すぎる反射率の時にはフエブリペロー共振器の光閉じ
込めが弱まり発振が弱まると共に、戻り光が共振器内に
も入りやすくなるものと思われる。従って閾値を超えて
しばらくしても戻り光ノイズは減少しない。この様に干
渉性や発振条件が原因と考えられる理由の1つに、反射
率の変化と戻り光ノイズの特性曲線のパターンとの関係
があげられる。即ち反射率の上昇に伴い、第2図の曲線
のロ→ハ→イと徐々に変化するのではない。ロのパター
ンの山型部分が徐々に小さくなるものの被膜(5)が緑
色から黄緑色になる(反射率14%のものと15%のものの
比較)と急にハのパターンとなる。また被膜(5)が金
色から淡桃色になる(反射率25%と27%のものの比較)
においても高動作電流域の戻り光ノイズが急に大きくな
る。尚、両被膜(5)(5)′の反射率が25%より低下
するとレーザ発振は不安定となる。
These results can be considered as follows. When the coatings (5) and (5) 'have the same reflectance and when both have high reflectance, the laser light has extremely high coherency (coherence), so that the emitted light and the returned light interfere with each other, and as a result, so-called It is considered to be a return light noise. Therefore, the higher the output of the laser light, the greater the return light noise. On the other hand, if either of the coatings (5) and (5) 'has a reflectance that is too low, it is considered that the optical confinement of the Fabry-Perot resonator is weakened and the oscillation is weakened, and the return light easily enters the resonator. Therefore, the return light noise does not decrease even after the threshold value is exceeded for a while. One of the reasons that the coherence and the oscillation conditions are considered to be the causes is the relationship between the change in the reflectance and the pattern of the characteristic curve of the return light noise. That is, as the reflectance increases, the curve in FIG. Although the mountain portion of the pattern B is gradually reduced, the coating film (5) changes from green to yellow-green (comparison of reflectance of 14% and 15%), and suddenly becomes a pattern of C. Also, the coating (5) changes from gold to pale pink (comparison of reflectance of 25% and 27%)
Also, the return light noise in the high operating current region suddenly increases. If the reflectance of both coatings (5) and (5) 'falls below 25%, laser oscillation becomes unstable.

ト)考案の効果 以上の如く、劈開面に設ける被膜の反射率をフエブリペ
ロー共振器の前後で異ならしめ、一方を15乃至25%他方
を25乃至32%にする事で、レンズ等の光学系による戻り
光対策がなくとも戻り光ノイズを大巾に減少させること
ができた。
G) Effect of the invention As described above, the reflectance of the coating provided on the cleaved surface is made different between before and after the Fabry-Perot resonator, and one is set to 15 to 25% and the other is set to 25 to 32%. It was possible to greatly reduce the return light noise without any measures against the return light.

【図面の簡単な説明】[Brief description of drawings]

第1図は本考案実施例の半導体レーザ素子の斜視図、第
2図は半導体レーザ素子の特性図である。 (2)…活性層、(4)(4)…劈開面、(5)
(5)′…被膜
FIG. 1 is a perspective view of a semiconductor laser device according to an embodiment of the present invention, and FIG. 2 is a characteristic diagram of the semiconductor laser device. (2) ... Active layer, (4) (4) ... Cleaved surface, (5)
(5) '... coating

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] 【請求項1】活性層とフェブリペロー共振器を形成する
対向した劈開面を有した半導体レーザ素子において、各
々の劈開面を反射率n1、n2が各々15%≦n1≦25%;25%
≦n2≦32%であってn1≠n2なる被膜で覆った事を特徴と
する半導体レーザ素子。
1. A semiconductor laser device having a cleaved surface facing each other forming an active layer and a Fabry-Perot resonator, wherein the cleaved surfaces have reflectances n 1 and n 2 of 15% ≦ n 1 ≦ 25%; 25, respectively. %
A semiconductor laser device characterized by being covered with a film satisfying ≤n 2 ≤32% and n 1 ≠ n 2 .
JP1986194770U 1986-12-18 1986-12-18 Semiconductor laser device Expired - Lifetime JPH0726856Y2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1986194770U JPH0726856Y2 (en) 1986-12-18 1986-12-18 Semiconductor laser device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1986194770U JPH0726856Y2 (en) 1986-12-18 1986-12-18 Semiconductor laser device

Publications (2)

Publication Number Publication Date
JPS6398674U JPS6398674U (en) 1988-06-25
JPH0726856Y2 true JPH0726856Y2 (en) 1995-06-14

Family

ID=31152049

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1986194770U Expired - Lifetime JPH0726856Y2 (en) 1986-12-18 1986-12-18 Semiconductor laser device

Country Status (1)

Country Link
JP (1) JPH0726856Y2 (en)

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6010686A (en) * 1983-06-29 1985-01-19 Matsushita Electric Ind Co Ltd Semiconductor laser device

Also Published As

Publication number Publication date
JPS6398674U (en) 1988-06-25

Similar Documents

Publication Publication Date Title
US4731792A (en) Semiconductor laser device with decreased light intensity noise
US4852112A (en) Semiconductor laser with facet protection film of selected reflectivity
US5438583A (en) Semiconductor laser with optimum resonator
JPH0726856Y2 (en) Semiconductor laser device
JPH02137287A (en) Semiconductor laser device
JP3080312B2 (en) Manufacturing method of semiconductor laser
KR100754956B1 (en) Semiconductor laser device and laser system
JP2572868B2 (en) Semiconductor laser
JPH0750814B2 (en) Multi-point emission type semiconductor laser device
JPS60132380A (en) Distributed feedback type semiconductor laser device
JPS62219684A (en) Distributed feedback type semiconductor laser
JP4613374B2 (en) Semiconductor laser
JP3642711B2 (en) Semiconductor laser element
JPS61156894A (en) Distributed feedback type semiconductor laser
JPH02241075A (en) Semiconductor laser
JP2664388B2 (en) Semiconductor laser device
JPS61174685A (en) Semiconductor laser device and manufacture thereof
JPH0732290B2 (en) Semiconductor laser device
JP3385833B2 (en) Semiconductor laser
JPH1022565A (en) Semiconductor laser element and its manufacture
JPH05304313A (en) Optical semiconductor device
JPH0734494B2 (en) Semiconductor laser device
JPH0732287B2 (en) Semiconductor laser device
JPH01134984A (en) Semiconductor laser device
KR900002001B1 (en) Semiconductor of laser head