JPH07202259A - Gaalas light emitting diode - Google Patents

Gaalas light emitting diode

Info

Publication number
JPH07202259A
JPH07202259A JP33698793A JP33698793A JPH07202259A JP H07202259 A JPH07202259 A JP H07202259A JP 33698793 A JP33698793 A JP 33698793A JP 33698793 A JP33698793 A JP 33698793A JP H07202259 A JPH07202259 A JP H07202259A
Authority
JP
Japan
Prior art keywords
electrode
emitting diode
light emitting
light
extraction region
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP33698793A
Other languages
Japanese (ja)
Inventor
Genta Koizumi
玄太 小泉
Katsuhiko Sakai
勝彦 酒井
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Cable Ltd
Original Assignee
Hitachi Cable Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Cable Ltd filed Critical Hitachi Cable Ltd
Priority to JP33698793A priority Critical patent/JPH07202259A/en
Publication of JPH07202259A publication Critical patent/JPH07202259A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:To make an output uniform with high output by employing advantages of both a peripheral electrode type and a central electrode type. CONSTITUTION:An n-type side metal electrode 2 is outputted from one side of a light emitting region 1, and connected to a wiring 4. In order to take preferably ohmic connection to the electrode 2, a contact layer 3 for the electrode is formed on the electrode. The layer 3 has a low resistance, is formed of an n-type GaAlAs layer having low Al mixed crystal ratio, and further extended along a center of a light emitting region 5mum from the contact with the electrode 2 of a peripheral electrode.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明はGaAlAs系発光ダイ
オードに係り、特に微細構造に好適な発光ダイオードに
関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a GaAlAs light emitting diode, and more particularly to a light emitting diode suitable for a fine structure.

【0002】[0002]

【従来の技術】従来、発光ダイオードアレイのような微
細構造の発光ダイオードは、平面図で示すと、図5に示
すように光取出し領域1の周辺部に電極2を設けた周辺
電極型と、図6に示すように光取出し領域1の中心部に
電極2を設けた中心電極型の2通りに分類される。いず
れも光取出し領域1上に電極用コンタクト層3を介して
電極2が取り出され、電極2は配線4に接続されてい
る。
2. Description of the Related Art Conventionally, a light emitting diode having a fine structure such as a light emitting diode array has a peripheral electrode type in which an electrode 2 is provided in the peripheral portion of a light extraction region 1 as shown in FIG. As shown in FIG. 6, there are two types of center electrode type in which an electrode 2 is provided at the center of the light extraction region 1. In each case, the electrode 2 is extracted on the light extraction region 1 through the electrode contact layer 3, and the electrode 2 is connected to the wiring 4.

【0003】[0003]

【発明が解決しようとする課題】しかしながら、図5に
示す周辺電極型発光ダイオードは、電極2が光取出し領
域1の周辺部にあるため、注入した電流を光取出し領域
の全域に均等に拡げることは非常に困難となる。その結
果、取り出す光も電極2から離れた領域程、出力の低下
が生じるため、光取出し領域1内での光出力に不均一が
生じるとともに、高い出力を出すことができない。
However, in the peripheral electrode type light emitting diode shown in FIG. 5, since the electrode 2 is in the peripheral portion of the light extraction region 1, the injected current can be spread evenly over the entire light extraction region. Will be very difficult. As a result, the output of the extracted light decreases in a region farther from the electrode 2, so that the light output in the light extraction region 1 becomes non-uniform and a high output cannot be output.

【0004】それに対し、図6に示す中心電極型発光ダ
イオードは、電極2が光取出し領域1の中央部にあるた
め、周辺電極型発光ダイオードの欠点をカバーできる。
しかしながら、微細構造となった場合には、光取出し領
域中の電極の被覆率が増大することにより、高出力発光
ダイオードを得ることが難しくなり、また発光スポット
の形状にも問題が生じる。
On the other hand, in the center electrode type light emitting diode shown in FIG. 6, since the electrode 2 is located at the center of the light extraction region 1, the drawbacks of the peripheral electrode type light emitting diode can be covered.
However, in the case of a fine structure, it becomes difficult to obtain a high-power light emitting diode due to an increase in the coverage of the electrode in the light extraction region, and a problem also occurs in the shape of the light emission spot.

【0005】本発明の目的は、電極用コンタクト層を利
用して周辺電極型と中心電極型の双方の利点を取り込む
ことによって、前記した従来技術の欠点を解消し、高出
力でかつ出力の均一なGaAlAs系発光ダイオードを
提供することにある。
The object of the present invention is to solve the above-mentioned drawbacks of the prior art by utilizing the advantages of both the peripheral electrode type and the center electrode type by utilizing the electrode contact layer, and to achieve high output and uniform output. Another object is to provide a GaAlAs-based light emitting diode.

【0006】[0006]

【課題を解決するための手段】本発明は、光取出し領域
の周辺にコンタクト層を介して電極を設けた周辺電極型
のGaAlAs系発光ダイオードにおいて、電極を設け
た光取出し領域の周辺に位置するコンタクト層が光取出
し領域の周辺から光取出し領域の略中央に引き出されて
いるものである。
According to the present invention, in a peripheral electrode type GaAlAs light emitting diode in which an electrode is provided around a light extraction region via a contact layer, the present invention is located around the light extraction region provided with an electrode. The contact layer is drawn out from the periphery of the light extraction region to approximately the center of the light extraction region.

【0007】また、本発明は、光取出し領域の対向辺に
コンタクト層を介して電極を設けた周辺電極型のGaA
lAs系発光ダイオードにおいて、電極を設けた光取出
し領域の対向辺に位置するコンタクト層が光取出し領域
の略中央を横切って連結されているものである。
Further, the present invention is a peripheral electrode type GaA in which electrodes are provided on opposite sides of the light extraction region via a contact layer.
In the 1As-based light emitting diode, a contact layer located on the opposite side of a light extraction region provided with an electrode is connected across substantially the center of the light extraction region.

【0008】なお、上記コンタクト層は、AlGaA
s、GaAs等の化合物半導体結晶で形成されている。
The contact layer is made of AlGaA.
It is formed of a compound semiconductor crystal such as s or GaAs.

【0009】[0009]

【作用】低抵抗で低混晶比のGaAlAs層からなる電
極用コンタクト層を光取出し領域の周辺から略中央に引
き出したり、光取出し領域の略中央を横切らしたりする
と、周辺に設けた電極とともに、このGaAlAsコン
タクト層が発光領域内における注入電流の拡がりに大き
く寄与するので、光取出し領域内の光出力の均一化が図
れ、光出力を大幅に向上させることができる。
When an electrode contact layer made of a GaAlAs layer having a low resistance and a low mixed crystal ratio is drawn out from the periphery of the light extraction region to approximately the center or across the center of the light extraction region, the electrode provided around Since the GaAlAs contact layer greatly contributes to the spread of the injection current in the light emitting region, the light output in the light extraction region can be made uniform and the light output can be greatly improved.

【0010】[0010]

【実施例】図1〜3に本発明の一実施例を説明するため
の周辺電極型の発光ダイオードを示す。この発光ダイオ
ードの構造は、メサ分離型シングルヘテロ構造をもつ微
細寸法のGaAlAs系発光ダイオードである。
1 to 3 show a peripheral electrode type light emitting diode for explaining an embodiment of the present invention. The structure of this light-emitting diode is a GaAlAs-based light-emitting diode having a fine size and having a single hetero structure with separated mesas.

【0011】図1は平面図である。光取出し領域1の横
幅Xは25μm 、縦幅Yは25μmと非常に微細な発光
ダイオードに設計されている。n側金属電極2は、光取
出し領域1内の一辺(図示例で下辺)に設けられ、Al
などの金属配線4と接続されている。
FIG. 1 is a plan view. The light extraction region 1 is designed as a very fine light emitting diode with a horizontal width X of 25 μm and a vertical width Y of 25 μm. The n-side metal electrode 2 is provided on one side (lower side in the illustrated example) in the light extraction region 1 and is made of Al.
Is connected to the metal wiring 4.

【0012】電極2と良好なオーミック接合をとるため
に、電極下に電極用コンタクト層3が形成されている。
この電極用コンタクト層3は、低抵抗で、かつ低Al混
晶比をもつn型GaAlAs層で構成され、周辺電極で
あるn側電極2とのコンタクト部から、更に幅5μm で
光取出し領域1の中央に沿って引き延ばされている。な
お、コンタクト層は光透過性であることが好ましいが、
光透過性でなくてもよい。また、コンタクト層として低
抵抗GaAsを用いてもよい。
In order to obtain a good ohmic contact with the electrode 2, an electrode contact layer 3 is formed under the electrode.
The electrode contact layer 3 is composed of an n-type GaAlAs layer having a low resistance and a low Al mixed crystal ratio, and has a width of 5 μm from the contact portion with the n-side electrode 2 which is a peripheral electrode. Stretched along the center of. The contact layer is preferably light transmissive,
It need not be light transmissive. Further, low resistance GaAs may be used as the contact layer.

【0013】図示例では、引き延ばされた電極用コンタ
クト層3は直線状で1本であるが、複数本引き延ばすよ
うにしても良く、直線状に限らない。
In the illustrated example, the extended electrode contact layer 3 is linear, but one may be extended, and the electrode contact layer 3 is not limited to linear.

【0014】図2は図1中に記入したA−A線に沿って
発光ダイオードチップをへき開した断面図、同様に図3
はB−B線に沿って発光ダイオードチップをへき開した
断面図である。
FIG. 2 is a sectional view in which the light emitting diode chip is cleaved along the line AA shown in FIG. 1, and FIG.
FIG. 4 is a sectional view of the light emitting diode chip cleaved along the line BB.

【0015】p型GaAs基板8上に活性層となるp型
GaAlAs層7、クラッド層となる高混晶比のn型G
aAlAs層6が形成されている。このpn層は前述し
たようにシングルヘテロ構造で、メサ分離型構造となっ
ている。n型GaAlAs層6上に電極用コンタクト層
となる高濃度にドープされて低抵抗とし、かつ低Al混
晶比のGaAlAs層からなるコンタクト層3、そして
さらに表面はに保護用のガラス膜5、電極4と接続した
配線4が、裏面にはp側電極9がそれぞれ取り付けられ
ている。
On the p-type GaAs substrate 8, a p-type GaAlAs layer 7 which becomes an active layer and an n-type G having a high mixed crystal ratio which becomes a clad layer are formed.
The aAlAs layer 6 is formed. As described above, the pn layer has a single hetero structure and a mesa separation type structure. On the n-type GaAlAs layer 6, a contact layer 3 made of a GaAlAs layer having a low resistance by being highly doped to form an electrode contact layer and having a low Al mixed crystal ratio, and further, a protective glass film 5 on the surface, The wiring 4 connected to the electrode 4 and the p-side electrode 9 are attached to the back surface.

【0016】この図1〜3に示した発光ダイオードに通
電すると、周辺電極構造にもかかわらず、光取出し領域
1の中央に沿って引き延ばされたコンタクト層3である
n型AlGaAs層が存在しているため、このn型Ga
AlAs層を通して注入電流がpn界面近傍に形成され
る発光領域内に拡がる。従って、光取出し領域1内での
光出力の均一化が図れる同時に、高出力化が達成でき
る。
When the light emitting diode shown in FIGS. 1 to 3 is energized, there is an n-type AlGaAs layer which is a contact layer 3 extended along the center of the light extraction region 1 in spite of the peripheral electrode structure. Therefore, this n-type Ga
The injection current spreads through the AlAs layer into the light emitting region formed near the pn interface. Therefore, the light output can be made uniform in the light extraction region 1, and at the same time, high output can be achieved.

【0017】実際に、図5に示した従来の周辺電極型発
光ダイオードを、本実施例の周辺電極型発光ダイオード
と同じ大きさで試作して光出力を比較すると、本実施例
の発光ダイオードは、図5の発光ダイオードの約1.4
倍の光出力が得られた。同様に図6に示した中心電極型
発光ダイオードと比較しても約15%高い光出力が得ら
れた。
Actually, when the conventional peripheral electrode type light emitting diode shown in FIG. 5 was trial-produced in the same size as the peripheral electrode type light emitting diode of this embodiment and the light outputs were compared, the light emitting diode of this embodiment was , About 1.4 of the light emitting diode of FIG.
Double light output was obtained. Similarly, a light output about 15% higher than that of the center electrode type light emitting diode shown in FIG. 6 was obtained.

【0018】このように本実施例によれば、金属電極は
従来通り光取出し領域の周辺に設け、中心に金属電極の
代りに低抵抗の半導体電極を設けるようにしたので、微
細化しても、中心電極型のように、光取出し領域中の電
極被覆率が増大することがなく、したがって高出力化が
容易であり、また発光スポットの形状にも不都合は生じ
ない。また、中央に引き出したGaAlAsコンタクト
層を光透過性とすると、中心部の光を遮蔽する中心電極
型発光ダイオードよりも更に高い光出力が得られる。そ
の結果、より高密度な光源が要求される発光ダイオード
アレイ等に適用できる。
As described above, according to this embodiment, the metal electrode is provided around the light extraction region as in the conventional case, and the low resistance semiconductor electrode is provided at the center instead of the metal electrode. Unlike the center electrode type, the electrode coverage in the light extraction region does not increase, so that high output can be easily achieved and the shape of the light emission spot does not cause any inconvenience. Further, if the GaAlAs contact layer led out in the center is made light-transmissive, a higher light output can be obtained than that of the center electrode type light emitting diode that shields the light in the central portion. As a result, it can be applied to a light emitting diode array or the like that requires a higher density light source.

【0019】図4は、本発明の変形例を示したものであ
る。発光領域内の上下の対向辺に、配線4で共通接続さ
れるn側電極2、2をそれぞれ設け、対向電極2の下の
電極用コンタクト層3間を、光取出し領域1の中央を横
切った低抵抗、低混晶比のGaAlAs層からなるコン
タクト層3で結んだブリッジ型の発光ダイオードであ
る。なお、この場合も、横切っている電極用コンタクト
層は直線状で1本であるが、複数本引き延ばすようにし
ても良く、また直線状に限らない。また、対向電極は上
下辺に限らず、左右辺にあっても、隣接辺にあってもよ
い。
FIG. 4 shows a modification of the present invention. The n-side electrodes 2 which are commonly connected to the wiring 4 are provided on the upper and lower opposing sides in the light emitting region, and the center of the light extraction region 1 is crossed between the electrode contact layers 3 below the opposing electrode 2. It is a bridge type light emitting diode connected by a contact layer 3 made of a GaAlAs layer having a low resistance and a low mixed crystal ratio. In this case as well, the number of the electrode contact layers that traverse is linear, but a plurality of electrode contact layers may be extended, and the number of electrode contact layers is not limited to linear. The counter electrodes are not limited to the upper and lower sides, but may be on the left and right sides or on the adjacent sides.

【0020】この発光ダイオードは図1に示した発光ダ
イオードと比較すると、微細構造にした場合、発光領域
中の電極の被覆率が増大するという欠点が生じる。しか
し、発光領域の幅が数十μm を超えるような比較的大き
な発光ダイオードの場合には、図1の発光ダイオードよ
りも高出力化及び光取り出し領域内の光出力の均一化の
効果は大きい。
This light emitting diode, when compared with the light emitting diode shown in FIG. 1, has a drawback that the coverage of the electrodes in the light emitting region increases when the light emitting diode has a fine structure. However, in the case of a comparatively large light emitting diode whose width of the light emitting region exceeds several tens of μm, the effect of increasing the output and making the light output in the light extraction region uniform is greater than that of the light emitting diode of FIG.

【0021】[0021]

【発明の効果】【The invention's effect】

(1) 請求項1に記載のGaAlAs系発光ダイオードに
よれば、コンタクト層を発光領域の略中央に引き出して
注入電流の拡散を図るようにしたので、従来の周辺電極
型発光ダイオードよりも高出力化及び光取出し領域内の
光出力の均一化が図れる。
(1) According to the GaAlAs-based light emitting diode of claim 1, since the contact layer is drawn out substantially in the center of the light emitting region to diffuse the injected current, the output is higher than that of the conventional peripheral electrode type light emitting diode. It is possible to make the light output and the light output in the light extraction region uniform.

【0022】(2) 請求項2に記載のGaAlAs系発光
ダイオードによれば、コンタクト層が光取出し領域の略
中央を横切って対向する電極下のコンタクト層と連結さ
れているので、さらに高出力化及び光取出し領域内の光
出力の均一化が図れる。
(2) According to the GaAlAs-based light-emitting diode of the second aspect, the contact layer is connected to the contact layer under the electrode facing across the substantially center of the light extraction region, so that the output is further increased. Also, the light output in the light extraction region can be made uniform.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明のGaAlAs系発光ダイオードの実施
例を説明するための周辺電極型発光ダイオードの平面
図。
FIG. 1 is a plan view of a peripheral electrode type light emitting diode for explaining an embodiment of a GaAlAs-based light emitting diode of the present invention.

【図2】図1のA−A線断面図。FIG. 2 is a sectional view taken along line AA of FIG.

【図3】図1のB−B線断面図。FIG. 3 is a sectional view taken along line BB of FIG.

【図4】本発明の変形例を説明するための周辺電極型発
光ダイオードの平面図。
FIG. 4 is a plan view of a peripheral electrode type light emitting diode for explaining a modification of the present invention.

【図5】従来例の周辺電極型発光ダイオードの平面図。FIG. 5 is a plan view of a conventional peripheral electrode type light emitting diode.

【図6】従来例の中心電極型発光ダイオードの平面図。FIG. 6 is a plan view of a conventional center electrode type light emitting diode.

【符号の説明】[Explanation of symbols]

1 光取出し領域 2 n側電極 3 電極用コンタクト層(低抵抗、低Al混晶比GaA
lAs層) 4 配線 5 ガラス膜 6 n型GaAlAs層(クラッド層) 7 p型GaAlAs層(活性層) 8 p型GaAs基板 9 p側電極
1 Light extraction region 2 n-side electrode 3 Contact layer for electrode (low resistance, low Al mixed crystal ratio GaA
1As layer) 4 Wiring 5 Glass film 6 n-type GaAlAs layer (cladding layer) 7 p-type GaAlAs layer (active layer) 8 p-type GaAs substrate 9 p-side electrode

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】光取出し領域の周辺にコンタクト層を介し
て電極を設けた周辺電極型のGaAlAs系発光ダイオ
ードにおいて、上記電極を設けた光取出し領域の周辺に
位置するコンタクト層が、上記光取出し領域の周辺から
光取出し領域の略中央に引き出されていることを特徴と
するGaAlAs系発光ダイオード。
1. A peripheral electrode type GaAlAs-based light-emitting diode in which an electrode is provided around a light extraction region via a contact layer, wherein a contact layer located around the light extraction region in which the electrode is provided is the light extraction region. A GaAlAs-based light-emitting diode, characterized in that the light is extracted from the periphery of the region to approximately the center of the light extraction region.
【請求項2】光取出し領域の対向辺にコンタクト層を介
して電極を設けた周辺電極型のGaAlAs系発光ダイ
オードにおいて、上記電極を設けた光取出し領域の対向
辺に位置するコンタクト層が光取出し領域の略中央を横
切って連結されていることを特徴とするGaAlAs系
発光ダイオード。
2. In a peripheral electrode type GaAlAs light emitting diode having electrodes provided on the opposite sides of the light extraction region via a contact layer, the contact layers located on the opposite sides of the light extraction region provided with the electrodes are the light extraction regions. A GaAlAs-based light-emitting diode, which is connected across substantially the center of the region.
JP33698793A 1993-12-28 1993-12-28 Gaalas light emitting diode Pending JPH07202259A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP33698793A JPH07202259A (en) 1993-12-28 1993-12-28 Gaalas light emitting diode

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP33698793A JPH07202259A (en) 1993-12-28 1993-12-28 Gaalas light emitting diode

Publications (1)

Publication Number Publication Date
JPH07202259A true JPH07202259A (en) 1995-08-04

Family

ID=18304435

Family Applications (1)

Application Number Title Priority Date Filing Date
JP33698793A Pending JPH07202259A (en) 1993-12-28 1993-12-28 Gaalas light emitting diode

Country Status (1)

Country Link
JP (1) JPH07202259A (en)

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* Cited by examiner, † Cited by third party
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DE19860325B4 (en) * 1997-12-25 2010-09-30 Fuji Xerox Co., Ltd. Light emitting diode matrix
CN102244174A (en) * 2010-05-14 2011-11-16 三垦电气株式会社 Light-emitting element
JP2013175635A (en) * 2012-02-27 2013-09-05 Stanley Electric Co Ltd Semiconductor light-emitting element, and method of manufacturing the same

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
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