JPH07199166A - Production of reflection electrode plate - Google Patents

Abstract

PURPOSE:To obtain a process for producing a reflection electrode plate capable of freely forming an average degree of inclination of the shape of ruggedness by a simple method consisting of a small number of stages by bringing an original plate having the ruggedness into contact with the surface of an org. insulating film, thereby forming the rugged surface shape of the org. insulating film. CONSTITUTION:This rugged surface shape of the org. insulating film 2 is formed by bringing the original plate 3 having the ruggedness into contact with the surface of the org. insulating film 2 in the process for producing the reflection electrode plate by forming the org. insulating film 2 having the rugged surface shape on a flat substrate 1 and forming reflection electrodes having the ruggedness on the surface on the org. insulating film 2. The formation is made possible only by the stage of pressing the original plate 3 to the film and the rugged shape is formed in about 30 minutes to 1 hour according to such process for production. Then, one sheet of the reflection electrode plate is formable in about 2 to 3 hours even if all the stages are included. Further, the control of the average degree of inclination of the reflection electrode plate is made possible by using the original plate 3 which is controlled in the average degree of inclination of the section shape of the ruggedness.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION The present invention relates to a transparent insulating substrate on one side,
The present invention relates to a method of manufacturing a reflective electrode plate used for a liquid crystal display panel having a structure in which a liquid crystal layer is sandwiched between insulating substrates having a reflective electrode inside.

[0002]

2. Description of the Related Art Liquid crystal displays have been attracting attention as flat panel displays for portable computers and portable information devices. Among them, the reflection type liquid crystal display that does not require a backlight does not require the power consumed by the backlight, so it can be considered to be applied as a low power consumption type display as a display of a battery-powered portable information device, Each organization is actively developing.

Among the reflection type displays, a GH (Guest-Host) liquid crystal display in which a dichroic dye is mixed in the liquid crystal does not require a polarizing plate and is therefore bright because the polarizing plate does not absorb light. You can make a display.
In addition, since the polarizing plate is not required, the reflective electrode plate can be formed inside the panel, which has an advantage that the displayed character image does not float from the reflective electrode plate. This reflective electrode plate needs to have irregularities on the surface in order to obtain bright reflection characteristics without reflection, and an insulating film of an appropriate material is formed on a flat glass substrate, and the irregularities are formed by ordinary photolithography and etching processes. Is formed, and a metal film is formed thereon to form irregularities. The manufacturing technique of such a reflective electrode plate is described in, for example, Naofumi Kimura, Seiichi Mitsui, Yasunori Shimada, Kunihiko Yamamoto, Shuichi Kanzaki, Hiroshi Morimoto, Masataka Matsuura, “Development of reflective color LCD”, Sharp Technical Report. No. 56, June 1993.

FIG. 4 shows a conventional method of manufacturing a reflective electrode plate. FIG. 4 shows a step of forming an uneven film after the insulating film is formed on the substrate. The process includes a photolithography process and an etching process, which are similar to those of a normal semiconductor process. There are 5 steps even if the steps are roughly separated in FIG. 4, and if the steps of baking after resist application and baking after development are included in addition to this, it takes about 2 hours from the step of resist application to the step of resist stripping in FIG. Need 3 hours. Therefore, the whole process takes about 4 to 5 hours. Furthermore, the cross-sectional shape of the unevenness can be slightly changed by adjusting the amount of side etching under the etching conditions, but it is impossible to freely control the average inclination angle of the cross-sectional shape.

[0005]

The field of the invention is:
A reflective electrode plate used for a liquid crystal display panel having a structure in which a liquid crystal layer is sandwiched between a transparent insulating substrate on one side and an insulating substrate having a reflective electrode inside, and a thin film is formed on a flat insulating substrate and the thin film is formed by photolithography. Although the unevenness is formed by the etching process and the metal electrode is formed on the unevenness, the photolithography and the etching have a number of processes, and have a drawback that it takes time and cost. In addition, it is difficult to freely form the shape of the unevenness, and there is a problem in that a reflective electrode plate having a reflection characteristic as designed cannot be produced.

It is an object of the present invention to provide a method of manufacturing a reflective electrode plate which has a simple method with a small number of steps and which is capable of freely forming the average inclination angle of the uneven shape.

[0007]

According to a first aspect of the present invention, an organic insulating film having an uneven surface shape is formed on a flat substrate, and a reflective electrode having an uneven surface is formed on the organic insulating film. In the method for manufacturing a reflective electrode plate, the uneven surface shape of the organic insulating film is formed by bringing an original plate having unevenness into contact with the surface of the organic insulating film.

A second aspect of the present invention is a method of manufacturing a reflective electrode plate in which an organic insulating film having an uneven surface shape is formed on a flat substrate, and a reflective electrode having an uneven surface is formed on the organic insulating film. In, the uneven surface shape of the organic insulating film, the organic insulating film is coated on the original plate having unevenness,
The flat substrate is laminated on the organic insulating film, the original plate is peeled off, and the uneven shape of the original plate is transferred to form the substrate.

[0009]

According to the manufacturing method of the first invention, as shown in FIG. 1, if an original plate having an irregular shape designed in advance is prepared, the original plate can be pressed just on the organic insulating film and the same as the original plate. The uneven shape of can be created. Further, although the plate-shaped original plate is used in FIG. 1, a roller-shaped original plate as shown in FIG. 2 can be rolled by pressing it against the organic insulating film to form an uneven shape similar to that of the original plate. Further, according to the manufacturing method of the second invention,
As described above, the organic insulating film is formed on the original plate side and transferred onto a flat substrate to form the unevenness.

As described above, according to the production method of the present invention, the production can be performed only by the step of pressing the original plate, and even if the time such as firing or irradiation of ultraviolet rays is included, it is 30 minutes to 1 minute per sheet.
The uneven shape can be created in about time. Therefore, the reflective electrode plate can be produced in about 2 to 3 hours including all steps. Further, the average tilt angle of the reflective electrode plate can also be controlled by using an original plate in which the average tilt angle of the uneven cross-sectional shape is controlled by etching roughened glass with hydrofluoric acid.

[0011]

Embodiments of the present invention will be described in detail below with reference to the drawings.

Embodiment 1 FIG. 1 is an explanatory view of a concavo-convex forming portion in a manufacturing method according to Embodiment 1 of the first invention.

First, an organic insulating film 2 made of polyimide or the like is applied on an insulating substrate 1 such as a glass substrate by a spin coater to a thickness of about 1 to 4 μm. After that, pre-baking is performed in an oven at about 80 to 120 degrees for about 30 minutes. Next, for example, the original plate 3, which has been prepared by etching a roughened glass in advance for a suitable time with a glass substrate having an average inclination angle of the desired uneven cross section, is pressed onto the organic insulating film, and the main firing is performed. It is performed at about 150 to 200 degrees for about 30 minutes. After that, the original plate 3 is peeled off from the organic insulating film 2, whereby the uneven shape of the original plate 3 can be transferred to the organic insulating film 2. Further, by depositing aluminum or the like on the surface having the uneven shape by a sputtering method to a thickness of about 300 nm to 500 nm, a reflective electrode plate having a desired uneven shape can be prepared. In this way, all the steps can be performed in 2 to 3 hours with a simple process. In addition, the uneven shape can be obtained almost the same as the original plate.

In this embodiment, the main calcination was carried out while the original plate 3 was pressed. However, depending on the temperature settings of the calcination and the main calcination, the original plate 3 may be peeled off more easily and the shape may be transferred more easily. In some cases.

Example 2 A UV curable resin Photo Po as the organic insulating film 2
The method is the same as that of Example 1 except that a lymer (2P resin) is used and the original plate 3 is pressed and then irradiated with ultraviolet rays. In addition, in some cases, it is better to perform baking at about 150 degrees in addition to ultraviolet irradiation for curing the 2P resin.

Embodiment 3 FIG. 2 is an explanatory diagram of a concavo-convex forming portion in a manufacturing method according to Embodiment 3 of the first invention.

First, an organic insulating film 2 made of polyimide or the like is applied to an insulating substrate 1 such as a glass substrate by a spin coater to a thickness of about 1 to 4 μm. After that, pre-baking is performed in an oven at about 80 to 120 degrees for about 30 minutes. Next, for example, a roughened glass is etched in advance for an appropriate time to create a mold from a glass substrate having a desired average cross-sectional inclination angle, and the mold is wound around a cylindrical cylinder. The original plate roller 4 is rotated while being pressed against the organic insulating film 2, and the uneven shape of the original plate roller 4 is transferred to the organic insulating film 2. After that, the main baking is performed for about 30 minutes at about 150 to 200 degrees to determine the shape of the unevenness. Furthermore, a film of aluminum or the like having a thickness of about 300 nm to 500 nm is formed on a surface having an uneven shape by a sputtering method, whereby a reflective electrode plate having a desired uneven shape can be formed. In this way, all the steps can be performed in 2 to 3 hours with a simple process. In addition, the uneven shape can be obtained almost the same as the original plate.

Example 4 UV curable resin Photo Pol as an organic insulating film
The method is the same as that in Example 3 except that ymer (2P resin) is used, and while the original plate roller 4 is being pressed, it is rolled on the 2P resin and then irradiated with ultraviolet rays. In addition,
For curing the 2P resin, it may be better to perform baking at about 150 degrees in addition to ultraviolet irradiation.

Embodiment 5 FIG. 3 is an explanatory view of a concavo-convex forming portion in a manufacturing method according to Embodiment 5 of the second invention.

First, for example, an organic insulating film 2 made of polyimide or the like is formed on an original plate 3 which is prepared by etching a roughened glass in advance for a proper time with a glass substrate having an average inclination angle of a desired uneven cross section. Is applied by a spin coater to about 1 to 4 μm. Then, about 30 minutes 80
Temporary baking is performed in an oven at a temperature of about 120 to 120 degrees. Next, an insulative substrate 1 such as a glass substrate is pressed onto the organic insulating film 2 and main firing is performed at about 150 to 200 degrees for about 30 minutes. After that, the original plate 3 is peeled off from the organic insulating film 2, so that the uneven shape of the original plate 3 transferred to the organic insulating film 2 can be copied onto the substrate 1. Furthermore, a film of aluminum or the like having a thickness of about 300 nm to 500 nm is formed on a surface having an uneven shape by a sputtering method, whereby a reflective electrode plate having a desired uneven shape can be formed. In this way, the whole process takes 2 hours to 3
Can be done in time. In addition, the uneven shape can be obtained in a shape substantially similar to that of the original plate 3.

In this embodiment, when the original plate 3 and the substrate 1 are bonded together, nothing is coated on the substrate 1 side, but the organic insulating film 2 is coated so that copying can be easily performed. You can

Example 6 As the organic insulating film 2, a UV curable resin Photo Po
The method is the same as in Example 5 except that the polymer (2P resin) is used and the substrate 1 is pressed and then ultraviolet irradiation is performed. In addition, in some cases, it is better to perform baking at about 150 degrees in addition to ultraviolet irradiation for curing the 2P resin.

[0023]

If the present invention is applied, it is possible to freely manufacture a reflective electrode plate having a concavo-convex shape with an average inclination angle as designed by only simple steps.

[Brief description of drawings]

FIG. 1 is a diagram showing a manufacturing process according to Examples 1 and 2 of a manufacturing method of a first invention.

FIG. 2 is a diagram showing a manufacturing process according to Examples 3 and 4 of the manufacturing method of the first invention.

FIG. 3 is a diagram showing a manufacturing process according to Examples 5 and 6 of the manufacturing method of the second invention.

FIG. 4 is a diagram showing a manufacturing process according to a conventional manufacturing method.

[Explanation of symbols]

 1 substrate 2 organic insulating film 3 original plate 4 original plate roller 5 insulating film 6 resist 7 mask

Claims (2)

[Claims] 1. A method of manufacturing a reflective electrode plate, comprising forming an organic insulating film having an uneven surface shape on a flat substrate and forming a reflective electrode having an uneven surface on the organic insulating film. A method of manufacturing a reflective electrode plate, comprising forming the uneven surface shape of a system insulating film by bringing an original plate having unevenness into contact with the surface of the organic insulating film. 2. A method of manufacturing a reflective electrode plate, comprising forming an organic insulating film having an uneven surface shape on a flat substrate and forming a reflective electrode having an uneven surface on the organic insulating film. The uneven surface shape of the system insulating film, the organic insulating film is applied on the original plate having unevenness, the flat substrate is bonded onto the organic insulating film, the original plate is peeled off, and the uneven shape of the original plate is formed. A method of manufacturing a reflective electrode plate, which is characterized by being formed by transferring.