JP2000111906A - Production of electro-optic device - Google Patents

Abstract

PROBLEM TO BE SOLVED: To make display easily visible and to widen a visual angle by forming a metallic film on the ruggedness of a reflection layer and specifying the deposition rate of this metallic film in a stage for forming the metallic film. SOLUTION: A liquid crystal cell 1 is constituted by holding the liquid crystal layer 4 between a pair of the upper and lower substrates 2 and 3. The surface on the liquid crystal layer 4 side of the upper substrate 2 is provided with transparent electrodes 5 of ITO, etc., and the inside surface of the other substrate 3 is provided with the thin metallic film 6 as the reflection layer. The surface on the liquid crystal cell 4 side of the lower substrate 3 is provided with the fine ruggedness and the surface thereof is provided with the thin metallic layer 6, by which the constitution to extend the ruggedness to the surface of the metallic film 6 as well is obtained. In such a case, the ruggedness is formed under the reflection layer on the liquid crystal layer 4 side of the one substrate 3 and the metallic film 6 is formed on the ruggedness in such a manner that the ruggedness is formed on the surface of the reflection layer as well. At the time of formation of the metallic film 6, the deposition rate of the metallic film 6 is specified to about 80 to 250 angstrom/min.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

The present invention relates to an electro-optical device such as a liquid crystal display device and a method for manufacturing the same.

[0002]

2. Description of the Related Art A conventional liquid crystal display device, for example, disclosed in
In the reflective liquid crystal display device disclosed in Japanese Patent No. 188828, a reflective layer or the like is provided on a liquid crystal layer side surface of one substrate of a liquid crystal cell in which a liquid crystal layer is sandwiched between a pair of opposed substrates. It has been proposed to obtain a bright display.

However, in the above-mentioned conventional device, the reflection layer is not always clear. If a metal film or the like is formed on the surface of the substrate on the liquid crystal layer side as a reflection layer, the reflection layer becomes a mirror surface and becomes the face of the user. And the background is reflected and the display is very difficult to see.

[0004] Therefore, a method has been proposed in which a reflective layer is formed on the surface of the substrate on the liquid crystal layer side and then heat-treated to make the surface uneven, or a honing or etching treatment is performed after the reflective layer is formed to form a light scattering surface. ing.

[0005]

However, when the surface is roughened by the heat treatment as described above, 400 to
Heat treatment in a high temperature process of 600 ° C. is required, and heat resistance of the substrate is required, and there are restrictions on the material of the substrate. In addition, since the unevenness is due to the control of the crystallinity, there is a problem that the light scattering effect is not sufficiently obtained.

As described above, when the reflective layer is honed, a pinhole or the like may be formed in the reflective layer. When the reflective layer is used in combination with the electrode, an adverse effect on image quality due to disconnection or change in resistance value is ignored. Can not. Further, when the reflective layer is etched, there is a problem that the light scattering effect is small because the surface of the reflective layer is isotropically etched.

[0007] It is an object of the present invention to provide an electro-optical device and a method for manufacturing the same, which can solve the above problems.

[0008]

To achieve the above object, an electro-optical device and a method of manufacturing the same according to the present invention are configured as follows.

That is, an electro-optical device according to the present invention is an electro-optical device having a reflective layer on a liquid crystal layer side surface of one substrate of a liquid crystal cell having a liquid crystal layer sandwiched between a pair of opposed substrates. The substrate having the reflective layer has fine irregularities on the liquid crystal layer side, and the surface of the irregularities has a metal film as the reflective layer.

Further, according to a method of manufacturing an electro-optical device according to the present invention, a reflective layer is formed on a liquid crystal layer side surface of one substrate of a liquid crystal cell having a liquid crystal layer sandwiched between a pair of opposed substrates. In manufacturing the device, fine irregularities are formed on the surface of the substrate on which the reflective layer is formed on the liquid crystal layer side, and the irregular surface is repaired if necessary, and then the metal as the reflective layer is formed on the irregular surface. The method is characterized in that a film is formed.

[Effect] As described above, the electro-optical device according to the present invention has a structure in which the substrate having the reflective layer has fine irregularities on the liquid crystal layer side, and the metallic film as the reflective layer is formed on the surface of the irregularities. The unevenness on the substrate side also spreads to the surface of the metal film, and a reflective layer having fine unevenness is formed on the surface on the liquid crystal layer side. The light is scattered well by the reflective layer, so that the display is easy to see and the viewing angle. It is possible to provide an electro-optical device having a wide range.

In the method of manufacturing an electro-optical device according to the present invention, fine irregularities are formed on the surface of the substrate on which the reflective layer is formed on the liquid crystal layer side, and then the metal film as the reflective layer is formed on the irregular surface. With this configuration, it is possible to easily manufacture an electro-optical device having an excellent light scattering effect without generating a pinhole or the like in the reflective layer.

[0013]

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Hereinafter, an electro-optical device and a method of manufacturing the same according to the present invention will be specifically described with reference to a liquid crystal display device.

FIG. 1 is a longitudinal sectional view showing an example of a liquid crystal display device as an electro-optical device according to the present invention.

In FIG. 1, reference numeral 1 denotes a liquid crystal cell, which has a liquid crystal layer 4 sandwiched between a pair of upper and lower substrates 2 and 3. A transparent electrode 5 such as ITO is provided on the surface of the upper substrate 2 on the side of the liquid crystal layer 4, and a thin metal film 6 as a reflection layer is provided on the inner surface of the other substrate 3. Reference numeral 7 denotes a spacer, and 8 denotes a polarizing plate.

In this embodiment, fine irregularities are provided on the surface of the lower substrate 3 on the liquid crystal layer 4 side, and the thin metal film 6 is provided on the surface. Is to spread.

An inorganic or organic film such as SiO ₂ may be applied on the surface of the metal film 6 so that the thickness of the liquid crystal layer becomes uniform. In some cases, a rubbing treatment is performed on a polymer organic thin film such as polyimide or polyvinyl alcohol so that liquid crystal molecules are uniformly aligned.

As the substrate 3, for example, a glass substrate is used, or polyethylene terephthalate (PE) is used.
T), a synthetic resin substrate such as polyethersulfone (PES), polycarbonate (PC), or the like, or an acrylic resin, an epoxy resin, a polyimide resin, a polyimide amide resin, a Milanol resin, or the like on a glass substrate surface The one having an organic film can also be used. Note that the substrate 3 does not necessarily need to be transparent. The substrate may have anisotropic conductivity on both surfaces.

When a glass substrate having an organic film is used as described above, the above-mentioned irregularities may be formed on the glass substrate, or may be formed on the organic film. In particular, when forming an organic film after forming irregularities on a glass substrate, the thickness of the organic film is preferably set to 2 μm or less, more preferably 0.5 μm or less.

The material of the metal film constituting the reflection layer is aluminum or any other material, and is not particularly limited. The thickness of the metal film is preferably 1 μm or less, more preferably 300 Å or less.

The above-mentioned metal film can be used also as a display electrode. Further, a substrate having a transparent electrode such as ITO or an opaque electrode on the liquid crystal layer side can be used as the substrate having the metal film. In that case, the above-mentioned unevenness is provided on at least the surface of the substrate and the electrode on the liquid crystal layer side of the electrode.

As described above, the unevenness is provided on the surface of the substrate on the liquid crystal layer side, and a thin metal film is provided as a reflective layer on the surface. As a scattering surface, light incident from the observation surface side (upper side in the figure) can be scattered and reflected well.

In this case, as shown in FIG. 3B, it is desirable to control so that the reflected light is increased on the observer side. For example, when the pitch of the unevenness is formed uniformly, directivity is generated in the reflected light. Since the effect does not occur uniformly in all directions, it is desirable that the pitch of the unevenness is irregularly and randomly formed as shown in FIG. In addition, the average pitch p of the irregularities in that case
Is preferably not more than 80 μm, more preferably not more than 10 μm, and the height h of the unevenness is 2 μm.
m or less, and preferably 0.6 μm or less, more preferably 0.3 μm or less in consideration of the alignment stability of the sandwiched liquid crystal and the concentration of reflected light on the observer side.

Next, a method for manufacturing an electro-optical device such as a liquid crystal display device as described above will be specifically described.

That is, the manufacturing method according to the present invention manufactures a liquid crystal display device or the like having a reflective layer on the liquid crystal layer side surface of one substrate of a liquid crystal cell having a liquid crystal layer sandwiched between a pair of opposed substrates. In this case, fine irregularities are formed on the surface of the substrate on which the reflective layer is formed on the liquid crystal layer side, and if necessary, the irregular surface is repaired, and then a metal film as the reflective layer is formed on the irregular surface. Things.

The means for forming the irregularities on the substrate is optional, but may be formed, for example, by honing.
In this case, the substrate may be a glass substrate or the above-mentioned synthetic resin substrate or a substrate having the above-mentioned organic film on a glass substrate. For those with an organic film on the glass substrate, the organic film may be formed on the glass substrate and then the organic film may be honed to form the unevenness, or the glass substrate may be honed to form the unevenness. After that, an organic film may be formed.

The material of the organic film is an acrylic resin or any other suitable material, and there is no particular restriction on the film thickness. Means for forming the organic film on the glass substrate is coating or other appropriate means, and the formation position of the organic film should be selectively formed only at the position where the above-mentioned unevenness should be formed, avoiding the signal input terminal portion. Effective and desirable from the viewpoint of reliability. For example, an organic film can be formed by coating a photosensitive acrylic resin over the entire surface with a thickness of 2 μm by a spin coating method, irradiating only a desired pattern with a photomask with ultraviolet rays and performing photopolymerization, and developing the remainder.

As the abrasive particles for forming the irregularities on the substrate by honing, it is preferable to use cerium oxide or the like in the case of a glass substrate, or polyvinyl alcohol or the like in the case of the synthetic resin substrate or the organic film. It is preferable to use particles such as a polyurethane resin. It is desirable to use those having a particle size of 10 μm or less, more preferably 5 μm or less.

Further, if the honing process is performed in a vertical (vertical) direction with respect to the substrate, the height of the formed unevenness becomes large and it is difficult to control the unevenness. This is desirable in order to form uniform and shallow irregularities, and the above-mentioned inclination angle is preferably inclined at 45 ° or more with respect to the vertical direction.

As a method other than the honing treatment,
An effective method is to form irregularities by etching a glass substrate with hydrofluoric acid. Also, as the above-mentioned repairing process, for example, a method of lightly etching the uneven surface formed on the substrate using hydrofluoric acid, or a method of adjusting the height of the unevenness by polishing the convex portion of the unevenness can be adopted.

When the uneven surface formed on the substrate is lightly etched by using the above-described hydrofluoric acid, the honed glass substrate is placed on the honed surface side by hydrofluoric acid or a mixture of hydrofluoric acid and ammonium fluoride. 20 to 4 using a mixed liquid (mixing ratio of 4: 1 to 1: 4, adjusted depending on the degree)
The height and shape of the irregularities are adjusted by immersion at 0 ° C. and etching.

In the case where the convex portion is polished as described above,
The abrasive is appropriately selected according to the material of the substrate to be polished. For example, the same abrasive particles as those used in the above-mentioned honing treatment are used.

Next, a metal film as a reflection layer is formed on the substrate having the irregularities formed as described above, and is formed by a vacuum film forming method such as sputtering or vapor deposition.
In this case, the higher the film forming rate, the easier the unevenness is formed on the film, and for example, desirably about 80 to 250 Å / min. The film forming temperature is desirably about 100 to 300 ° C.

Specifically, for example, in the case of the sputtering method,
A film formation rate of about 200 angstroms / min,
A film forming temperature of about 180 ° C. and a film thickness of about 5000 Å may be formed. In the case of vapor deposition, the film forming rate is about 100 Å / min, and the film forming temperature is about 20 Å.
A film thickness of about 5000 Å may be formed at about 0 ° C.

The metal film formed as described above can be made into fine pitch unevenness by controlling the unevenness by heat treatment as needed. For example, when a glass substrate is used, heat treatment may be performed at 200 to 450 ° C. in air. The above heat treatment can be applied to any synthetic resin substrate or glass substrate having an organic film as long as it has high heat resistance. For example, in the case of a polyimide resin, heat treatment can be performed at 220 to 240 ° C.

The metal film formed on the substrate as described above is patterned into a display electrode. In this case, the electrode may be formed before or after patterning, but it is preferable to heat after patterning because the etching rate of the surface where the crystallinity is changed by heat treatment changes. The above heat treatment may be performed in the air, but depending on the metal,
For example, since there is a material such as chromium that oxidizes and lowers the reflectance, it is preferable to perform the treatment in an inert gas atmosphere.

It should be noted that I is provided between the substrate and the metal film.
It is also possible to provide a transparent or opaque electrode such as TO. In this case, a metal film is formed after an electrode having a desired pattern such as ITO is formed on the substrate having the irregularities formed as described above. Alternatively, after forming an electrode on a flat substrate and forming irregularities on the electrode surface in the same manner as described above, a metal film can be formed. In this case, the metal film may be formed by plating nickel or the like.

Specifically, it is formed, for example, in the following manner. That is, the substrate on which the electrodes were formed was replaced with 20% KOH.
It is immersed in a solution at room temperature for 10 minutes for degreasing, and then immersed in a 5% HCl solution at room temperature for 5 minutes to neutralize. Next, electroless plating is started on the surface of the substrate to deposit palladium. For example, a sensitizer (trade name: HS-101, manufactured by Hitachi Chemical Co., Ltd.) is added to a 15% HCl solution.
B) is mixed by 7% and immersed at room temperature for 10 minutes. Next, the glass substrate may be immersed in a nickel plating solution, nickel plating having an average film thickness of about 7000 angstroms may be performed on the transparent electrode, and the surface may be honed to form irregularities. In this case, the abrasive has a particle diameter of, for example, about 20 μm, and is formed to have an average pitch of unevenness of 2 μm and a height of about 0.4 μm.

A metal film may be formed by electrolytic plating of aluminum. The effect of the present invention does not depend on the plating method. Electroless plating or electrolytic plating can be selected depending on the metal to be formed. .

By manufacturing as described above, fine irregularities can be formed on the surface of the metal film on the substrate, and the average pitch is actually 1 to 2 μm and the depth is about 0.1 to 0.2 μm unevenness was successfully formed. In addition, using the substrate, a liquid crystal is sandwiched between a substrate facing the substrate via a seal portion, and a polarizing plate is provided on the outside of the substrate facing the substrate, and a liquid crystal using a nematic liquid crystal layer twist-aligned by 180 ° to 270 ° is used. When the display device was made, the background and the like were not reflected because the reflective layer was in a scattering state, and it was brighter and less shadowy than the conventional one in which a reflective plate was added to the outside of the substrate. A reflective liquid crystal display device having a viewing angle was obtained. In addition, since the electrode is made of metal, the electrode becomes a low-resistance electrode, the input voltage waveform is hardly rounded, and defects such as crosstalk that make the image non-uniform are greatly reduced.

As a result, for example, in a reflection type liquid crystal display device which is frequently used in a so-called notebook type personal computer or the like, a display which is easy to see, and which is thin, lightweight and consumes low power can be obtained.

The present invention is also applicable to a so-called black and white display type or color type liquid crystal display device having an optical compensator. A guest-host type using a dichroic dye that requires at most one polarizing plate, a DSM using light scattering, or a PSM in which a liquid crystal is dispersed in a polymer holder.
It is applicable to types such as DLC. Further, the present invention can be applied not only to the liquid crystal display device but also to various electro-optical devices.

[0043]

As described above, the electro-optical device according to the present invention has a reflection layer on the liquid crystal layer side of one of the substrates of a liquid crystal cell having a liquid crystal layer sandwiched between a pair of opposed substrates. In those, the liquid crystal layer side on the substrate having the reflective layer has fine irregularities, and the surface of the irregularities has a metal film as the reflective layer. As a result, a reflection layer having fine irregularities is formed on the surface on the liquid crystal layer side, and light is scattered well by the reflection layer, so that it is possible to obtain an electro-optical device that is easy to view and has a wide viewing angle.

In the method of manufacturing an electro-optical device according to the present invention, fine irregularities are formed on the surface of the substrate on which the reflective layer is formed on the liquid crystal layer side, and then the metal film as the reflective layer is formed on the irregular surface. As a result, an electro-optical device having an excellent light scattering effect can be easily manufactured without producing pinholes or the like in the reflective layer as in the related art.

[Brief description of the drawings]

FIG. 1 is a sectional view showing an embodiment of an electro-optical device according to the present invention.

FIG. 2 is a perspective view of a substrate.

FIGS. 3A and 3B are explanatory diagrams of a reflected light distribution.

[Explanation of symbols]

 DESCRIPTION OF SYMBOLS 1 ... Liquid crystal cell 2, 3 ... Substrate 4 ... Liquid crystal layer 5 ... Electrode 6 ... Reflection layer (metal film) 7 ... Spacer 8 ... Polarizing plate

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[Procedure amendment]

[Submission date] December 15, 1999 (1999.12.
15)

[Procedure amendment 1]

[Document name to be amended] Statement

[Correction target item name] Name of invention

[Correction method] Change

[Correction contents]

Patent application title: Manufacturing method of electro-optical device

[Procedure amendment 2]

[Document name to be amended] Statement

[Correction target item name] Claims

[Correction method] Change

[Correction contents]

[Claims]

[Procedure amendment 3]

[Document name to be amended] Statement

[Correction target item name] 0001

[Correction method] Change

[Correction contents]

[0001]

The present invention relates to a method for manufacturing an electro-optical device such as a liquid crystal display device.

[Procedure amendment 4]

[Document name to be amended] Statement

[Correction target item name] 0007

[Correction method] Change

[Correction contents]

An object of the present invention is to provide a method for manufacturing an electro-optical device which can solve the above-mentioned problems.

[Procedure amendment 5]

[Document name to be amended] Statement

[Correction target item name] 0009

[Correction method] Change

[Correction contents]

According to a method of manufacturing an electro-optical device of the present invention, a liquid crystal layer is sandwiched between a pair of substrates, and a reflective layer having irregularities is formed on one of the substrates on the liquid crystal layer side. In the manufacturing method, unevenness is formed under the reflective layer on the liquid crystal layer side of the one substrate, and the reflective layer is formed such that unevenness is also formed on the surface of the reflective layer on the unevenness. And forming a metal film at a rate of about 80 to 250 angstroms / min in the step of forming the metal film.

[Procedure amendment 6]

[Document name to be amended] Statement

[Correction target item name] 0010

[Correction method] Change

[Correction contents]

Further, the metal film is formed by a vacuum film forming method of sputtering or vapor deposition. Further, the film forming temperature of the metal film is set to about 100 to 300 ° C. Further, the metal film is subjected to a heat treatment after the formation.

[Procedure amendment 7]

[Document name to be amended] Statement

[Correction target item name] 0011

[Correction method] Change

[Correction contents]

[Effect] As described above, the electro-optical device manufactured by the manufacturing method of the present invention has fine irregularities on the liquid crystal layer side of the substrate having the reflective layer, and has the reflective layer on the irregularities. The unevenness on the substrate side also spreads to the surface of the metal film, forming a reflective layer with fine unevenness on the surface on the liquid crystal layer side, and the light is scattered well by the reflective layer so that the display is easy to see, and It is possible to provide an electro-optical device having a wide viewing angle.

[Procedure amendment 8]

[Document name to be amended] Statement

[Correction target item name] 0012

[Correction method] Change

[Correction contents]

In the method of manufacturing an electro-optical device according to the present invention, fine irregularities are formed on the surface of the substrate on which the reflective layer is formed on the liquid crystal layer side, and then the reflective layer is formed on the irregularities. Without pinholes in the reflective layer,
An electro-optical device having an excellent light scattering effect can be easily manufactured.

[Procedure amendment 9]

[Document name to be amended] Statement

[Correction target item name] 0038

[Correction method] Change

[Correction contents]

Specifically, it is formed, for example, in the following manner. That is, the substrate on which the electrodes were formed was replaced with 20% KOH.
It is immersed in a solution at room temperature for 10 minutes for degreasing, and then immersed in a 5% HCl solution at room temperature for 5 minutes to neutralize. Next, electroless plating is started on the surface of the substrate to deposit palladium. For example, a sensitizer (trade name: HS-101, manufactured by Hitachi Chemical Co., Ltd.) is added to a 15% HCl solution.
B) is mixed by 7% and immersed at room temperature for 10 minutes. Next, the glass substrate is immersed in a nickel plating solution, and nickel plating with an average film thickness of about 7000 Å is performed on the transparent electrode.

[Procedure amendment 10]

[Document name to be amended] Statement

[Correction target item name] 0043

[Correction method] Change

[Correction contents]

[0043]

As described above, in the method of manufacturing an electro-optical device according to the present invention, a liquid crystal layer is sandwiched between a pair of substrates, and a reflection layer having irregularities is formed on the liquid crystal layer side of one of the substrates. In the method for manufacturing an electro-optical device, irregularities are formed on the liquid crystal layer side of one of the substrates and under the reflective layer,
A metal film serving as a reflective layer is formed on the unevenness so that the unevenness is also formed on the surface of the reflective layer. In the metal film forming step, the metal film is formed at a deposition rate of 80 to 250 angstroms / m. min, the unevenness on the substrate side spreads to the surface of the metal film, and a reflective layer having fine unevenness is formed on the surface on the liquid crystal layer side. Light is scattered well by the reflective layer. It is possible to obtain an electro-optical device in which the display is easy to see and the viewing angle is wide.

[Procedure amendment 11]

[Document name to be amended] Statement

[Correction target item name] 0044

[Correction method] Change

[Correction contents]

In the method of manufacturing an electro-optical device according to the present invention, fine irregularities are formed on the surface of the substrate on which the reflective layer is formed on the liquid crystal layer side, and then the reflective layer is formed on the irregular surface. Thus, an electro-optical device having an excellent light scattering effect can be easily manufactured without generating pinholes or the like in the reflection layer as in the conventional case. Further, in the step of forming the metal film, the film formation rate is increased by setting the film formation rate of the metal film to about 80 to 250 angstroms / min.

Continued on the front page (72) Inventor Hitoshi Nishizawa 3-5-5 Yamato, Suwa City, Nagano Prefecture Seiko Epson Corporation (72) Inventor Shuichi Imai 3-5-3 Yamato Suwa City, Nagano Prefecture Seiko Epson Corporation

Claims (22)

[Claims] An electro-optical device having a reflective layer on a liquid crystal layer side surface of one substrate of a liquid crystal cell having a liquid crystal layer sandwiched between a pair of opposed substrates, wherein the liquid crystal of the substrate having the reflective layer is provided. An electro-optical device having fine irregularities on a layer side and a metal film as the reflective layer on the surface of the irregularities. 2. The electro-optical device according to claim 1, wherein at least one of the pair of substrates having a reflective layer is a glass substrate or a synthetic resin substrate. 3. A substrate having at least a reflective layer of the pair of substrates has an organic film on a glass substrate, and at least a surface of the glass substrate and the organic film on the liquid crystal layer side of the organic film. The electro-optical device according to claim 1, wherein the electro-optical device has the irregularities. 4. The substrate on the side having the reflective layer has an electrode on the surface on the liquid crystal layer side, and the substrate has the irregularities on at least the surface of the electrode on the liquid crystal layer side. Item 4. The electro-optical device according to item 1, 2 or 3. 5. The electro-optical device according to claim 1, wherein the pitch of the unevenness is not uniform, the average pitch is 80 μm or less, and the height of the unevenness is 2 μm or less. 6. The electro-optical device according to claim 1, wherein the thickness of the metal film is 5 μm or less. 7. The electro-optical device according to claim 1, wherein said metal film also serves as an electrode. 8. The electro-optical device according to claim 1, wherein the liquid crystal layer is a nematic liquid crystal, a twisted nematic liquid crystal, or a cholesteric liquid crystal. 9. An electro-optical device according to claim 8, wherein a dichroic dye is added to said liquid crystal layer. 10. The electro-optical device according to claim 8, wherein the liquid crystal layer is formed by dispersing liquid crystal in a polymer holder. 11. The electro-optical device according to claim 1, wherein the liquid crystal layer causes light scattering by electric field control. 12. A method for manufacturing an electro-optical device having a reflective layer formed on a liquid crystal layer side surface of one substrate of a liquid crystal cell having a liquid crystal layer sandwiched between a pair of opposed substrates. Forming fine irregularities on the surface of the substrate to be formed on the liquid crystal layer side, repairing the irregularities if necessary, and then forming a metal film as the reflective layer on the irregularities. A method for manufacturing an optical device. 13. A substrate having at least a reflective layer of the pair of substrates is a glass substrate or a synthetic resin substrate, and the surface of the glass substrate or the synthetic resin substrate on the liquid crystal layer side is subjected to honing treatment. The method for manufacturing an electro-optical device according to claim 12, wherein: 14. A substrate having at least a reflective layer of the pair of substrates has an organic film on a glass substrate, and after forming an organic film on the liquid crystal layer side of the glass substrate, 2. The method according to claim 1, wherein the unevenness is formed on a surface of the organic film on a liquid crystal layer side by a honing process.
3. The method for manufacturing an electro-optical device according to item 2. 15. A substrate having at least a reflective layer of the pair of substrates has an organic film on a glass substrate, and the surface of the glass substrate on the liquid crystal layer side is subjected to honing treatment to form the irregularities. 13. The method according to claim 12, wherein an organic film is formed on the surface of the glass substrate on the liquid crystal layer side after the formation. 16. The electro-optical device according to claim 12, wherein the repairing treatment is performed by lightly etching the irregular surface using an etchant that corrodes the glass substrate or the synthetic resin substrate itself. Production method. 17. The method for manufacturing an electro-optical device according to claim 12, wherein the height of the unevenness is adjusted by polishing the convex portion of the unevenness as the repairing process. 18. The method according to claim 1, wherein said metal film is formed by a vacuum film forming method such as sputtering or vapor deposition.
3. The method for manufacturing an electro-optical device according to item 2. 19. The method according to claim 19, wherein the metal film is formed after being formed.
The heat treatment is performed at a temperature of 450 to 450 ° C.
The manufacturing method of the electro-optical device according to the above. 20. The substrate on which the metal film is formed has electrodes of a predetermined pattern, and it is preferable that the metal film is formed after the electrodes are formed on the substrate on which the fine irregularities are formed. The method for manufacturing an electro-optical device according to claim 12, wherein: 21. The substrate on which the metal film is formed has electrodes of a predetermined pattern, and after forming the fine irregularities on the surface of the electrode formed on a flat substrate, the metal film is formed. 13. The method of manufacturing an electro-optical device according to claim 12, wherein: 22. The method according to claim 20, wherein the metal film is formed by a plating method.