JPH0714928A - Monolithic integrated circuit - Google Patents

Monolithic integrated circuit

Info

Publication number
JPH0714928A
JPH0714928A JP14921293A JP14921293A JPH0714928A JP H0714928 A JPH0714928 A JP H0714928A JP 14921293 A JP14921293 A JP 14921293A JP 14921293 A JP14921293 A JP 14921293A JP H0714928 A JPH0714928 A JP H0714928A
Authority
JP
Japan
Prior art keywords
signal transmission
integrated circuit
insulating film
transmission lines
pair
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP14921293A
Other languages
Japanese (ja)
Inventor
Yutaka Matsumura
豊 松村
Kazuo Murata
和夫 村田
Toru Kawagishi
亨 川岸
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Electric Industries Ltd
Original Assignee
Sumitomo Electric Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Electric Industries Ltd filed Critical Sumitomo Electric Industries Ltd
Priority to JP14921293A priority Critical patent/JPH0714928A/en
Publication of JPH0714928A publication Critical patent/JPH0714928A/en
Pending legal-status Critical Current

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  • Semiconductor Integrated Circuits (AREA)
  • Design And Manufacture Of Integrated Circuits (AREA)

Abstract

PURPOSE:To provide a monolithic integrated circuit that allows improved noise radiation characteristics by suppressing magnetic field occurring when differential signal is transmitted. CONSTITUTION:On an integrated circuit board 8 consisting of a semiconductor substrate, an insulation film is formed, and on top of that, a pair of signal transmission lines 1 and 2 for conveying differential signal is formed, being wired between bonding pads 3 and 4 and resistor electrodes 5 and 6. In the middle of the transmission line 2, a silicon oxide film 7 is formed, and over it, the other signal transmission line 1 is formed, so that the middle parts of lines 1 and 2 overlap each other with the silicon oxide film 7 in-between.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、半導体基板上に全ての
素子を形成して回路を構成するモノリシック集積回路に
関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a monolithic integrated circuit in which all elements are formed on a semiconductor substrate to form a circuit.

【0002】[0002]

【従来の技術】従来、モノリシック集積回路において、
外部との電気信号の入出力をおこなうためのボンディン
グパッドと、抵抗やトランジスタ等の回路素子との間を
接続する信号伝送線路は、配線長が最短になるように配
設されている。図5にその一例を示す。同図において、
信号伝送線路1、2はそれぞれ、ボンティングパッド
3、4と、抵抗の電極5、6との間を最短に接続するた
め、互いに並行に配線されている。
2. Description of the Related Art Conventionally, in a monolithic integrated circuit,
A signal transmission line connecting between a bonding pad for inputting / outputting an electric signal to / from the outside and a circuit element such as a resistor or a transistor is arranged so as to have a shortest wiring length. FIG. 5 shows an example thereof. In the figure,
The signal transmission lines 1 and 2 are wired in parallel with each other in order to connect the bonding pads 3 and 4 and the resistance electrodes 5 and 6 to the shortest distance.

【0003】[0003]

【発明が解決しようとする課題】差動信号を外部から入
出力するための2つのボンディングパッドは、一般に互
いに近接して配置するために、2本の信号伝送線路も近
接して配線されていた。また、差動信号はその性質上、
一方と他方が互いに逆向きの電流となっている。そのた
め、信号伝送線路1、2に差動信号を伝送した場合に、
図5に示すように電流I1 が生成する磁界M1 と電流I
2 が生成する磁界M2 は、互いに磁界を強め合う方向に
生じ、合成磁界Mが下方向に生成する。このために、モ
ノリシック集積回路から外部へ磁界が発生し、電磁雑音
の原因となっていた。
Since the two bonding pads for inputting / outputting the differential signal from the outside are generally arranged close to each other, the two signal transmission lines are also arranged close to each other. . Also, due to the nature of differential signals,
One and the other have opposite currents. Therefore, when a differential signal is transmitted to the signal transmission lines 1 and 2,
Magnetic field M 1 and the current I current I 1 is generated as shown in FIG. 5
The magnetic field M 2 generated by 2 is generated in the direction in which the magnetic fields are mutually strengthened, and the synthetic magnetic field M is generated in the downward direction. For this reason, a magnetic field is generated from the monolithic integrated circuit to the outside, causing electromagnetic noise.

【0004】そこで、本発明は以上の問題点を解決する
ためになされたものであり、差動信号を伝送する場合に
おいて、集積回路外部に発生する磁界を抑えることがで
きるモノリシック集積回路を提供することを目的とす
る。
Therefore, the present invention has been made to solve the above problems, and provides a monolithic integrated circuit capable of suppressing the magnetic field generated outside the integrated circuit when transmitting a differential signal. The purpose is to

【0005】[0005]

【課題を解決するための手段】本発明のモノリシック集
積回路は、回路を構成する素子が形成された半導体基板
上に絶縁膜が形成され、絶縁膜上に、差動信号を伝送す
る少なくとも一対の信号伝送線路が形成されており、対
の信号伝送線路が少なくとも1回以上、絶縁手段を介し
て交差または重なり合っていることを特徴とする。
In a monolithic integrated circuit of the present invention, an insulating film is formed on a semiconductor substrate on which elements constituting the circuit are formed, and at least one pair of differential signals transmitting differential signals is formed on the insulating film. A signal transmission line is formed, and a pair of signal transmission lines are crossed or overlapped at least once with an insulating means.

【0006】ここで、対の信号伝送線路の一方が半導体
基板上の第1の絶縁膜上に形成され、一方の信号伝送線
路上に第2の絶縁膜を形成することにより絶縁手段が構
成され、対の信号伝送線路の他方が第2の絶縁膜上に形
成されていることにより対の信号伝送線路が交差または
重なり合って構成されてもよい。または、対の信号伝送
線路の一方が半導体基板上に重ねて堆積された第1およ
び第2の絶縁膜上に形成されると共に、この一方の信号
伝送線路を挟むように第2の絶縁膜にコンタクト孔が形
成され、対の信号伝送線路の他方はコンタクト孔と第1
および第2の絶縁膜の間に介在して形成された配線とに
より接続された第2の絶縁膜上の配線により構成されて
いてもよい。
Here, one of the pair of signal transmission lines is formed on the first insulating film on the semiconductor substrate, and the second insulating film is formed on one of the signal transmission lines to form the insulating means. , The other of the pair of signal transmission lines may be formed on the second insulating film so that the pair of signal transmission lines intersect or overlap each other. Alternatively, one of the pair of signal transmission lines is formed on the first and second insulating films which are stacked and deposited on the semiconductor substrate, and the second insulating film is formed so as to sandwich the one signal transmission line. A contact hole is formed, and the other of the pair of signal transmission lines is the contact hole and the first
And a wiring formed on the second insulating film and connected to the wiring formed between the second insulating film.

【0007】[0007]

【作用】本発明のモノリシック集積回路は、差動信号を
伝送する対の信号伝送線路が、少なくとも1回以上絶縁
手段を介して交差または重なり合っているため、対の信
号伝送線路が交差または重なり合う部分の一方の側で
は、信号伝送線路を流れる差動電流が生じる磁界は互い
に強め合う方向に生じ、合成磁界がある方向に生成す
る。そして、交差または重なり合う部分の他方の側で
は、差動電流が生じる磁界の合成磁界は、上記の一方の
側で生成した合成磁界とは反対の方向に生じる。言い換
えれば、対の信号伝送線路が交差または重なり合う部分
を挟む両側では、磁界は互いに打ち消し合う方向に生成
する。従って、全体として磁界は打ち消されて、集積回
路外部へ発生する磁界を抑えることができる。また、対
の信号伝送線路は絶縁手段を介して交差または重なり合
うので、電気的に絶縁されている。
In the monolithic integrated circuit of the present invention, since the pair of signal transmission lines for transmitting differential signals intersect or overlap each other at least once through the insulating means, the pair of signal transmission lines intersect or overlap each other. On one side, the magnetic fields generated by the differential currents flowing through the signal transmission line are generated in mutually reinforcing directions, and the combined magnetic field is generated in a certain direction. Then, on the other side of the intersecting or overlapping portions, the combined magnetic field of the magnetic fields generated by the differential current is generated in the direction opposite to the combined magnetic field generated on the one side. In other words, the magnetic fields are generated in directions canceling each other on both sides of the portion where the pair of signal transmission lines cross or overlap each other. Therefore, the magnetic field is canceled out as a whole, and the magnetic field generated outside the integrated circuit can be suppressed. Further, the pair of signal transmission lines are electrically insulated because they intersect or overlap each other through the insulating means.

【0008】[0008]

【実施例】以下、添付図面を参照して本発明の実施例を
説明する。なお、図面の説明において同一の要素には同
一符号を付し、重複する説明を省略する。
Embodiments of the present invention will be described below with reference to the accompanying drawings. In the description of the drawings, the same elements will be denoted by the same reference symbols, without redundant description.

【0009】図1は、第1の実施例のモノリシック集積
回路の構成を示す斜視図である。トランジスタ等の回路
素子が内部および表面に形成され、かつ図示しない絶縁
膜、パッシベーション膜等が表面上に形成された半導体
基板からなる集積回路基板8上に、一対の信号伝送線路
1、2がそれぞれ形成され、ボンディングパッド3、4
と抵抗の電極5、6との間を接続している。一方の信号
伝送線路1の中間部分上に絶縁膜であるシリコン酸化膜
7が形成され、この上に他方の信号伝送線路2が形成さ
れて、これら信号伝送線路1、2が互いにシリコン酸化
膜7をはさんで重なり合うように配線されている。
FIG. 1 is a perspective view showing the structure of the monolithic integrated circuit of the first embodiment. A pair of signal transmission lines 1 and 2 are provided on an integrated circuit board 8 made of a semiconductor substrate on which circuit elements such as transistors are formed inside and on the surface, and an insulating film, a passivation film and the like (not shown) are formed on the surface. Formed and the bonding pads 3, 4
And the resistance electrodes 5 and 6 are connected. A silicon oxide film 7 serving as an insulating film is formed on an intermediate portion of one signal transmission line 1, and the other signal transmission line 2 is formed on the intermediate film, so that the signal transmission lines 1 and 2 are mutually formed. They are wired so that they overlap with each other.

【0010】この実施例の作用を図2を参照して説明す
る。同図に示すように、シリコン酸化膜7を介して重な
り合っている信号伝送線路1、2に、差動信号の電流I
1 、I2 がそれぞれ反対方向に流れている。信号伝送線
路1、2が重なり合う部分の一方側(図中の左側)にお
いて、電流I1 が生じる磁界M1aと電流I2 が生じる磁
界M1bとは互いに強め合う方向であり、合成磁界M1
下方向に生成する。そして、信号伝送線路1、2が重な
る部分の他方側(図中の右側)においては、電流I1
生じる磁界M2aと電流I2 が生じる磁界M2bは互いに強
め合い、合成磁界M2 は上記の合成磁界M1 とは逆の上
方向に生成する。すなわち、磁界M1 と磁界M2 は互い
に打ち消し合う方向に生じている。従って、集積回路を
全体としてみれば磁界が打ち消され、集積回路外部へ発
生する磁界を抑えることができるので、電磁雑音放射特
性の改善ができる。
The operation of this embodiment will be described with reference to FIG. As shown in the figure, the current I of the differential signal is applied to the signal transmission lines 1 and 2 which are overlapped with each other through the silicon oxide film 7.
1 and I 2 are flowing in opposite directions. On one side of the portion where the signal transmission line 1 and 2 overlap (the left side in the figure), a direction in which mutually reinforce the magnetic field M 1b of the magnetic field M 1a and current I 2 current I 1 is generated occurs, the synthesized magnetic field M 1 Is generated downward. At the other side of the portion where the signal transmission line 1 and 2 overlap (right side in the figure), the magnetic field M 2b the field M 2a and the current I 2 which the current I 1 is generated occurs mutually reinforce each other, the combined magnetic field M 2 is It is generated in the upward direction opposite to the above-mentioned synthetic magnetic field M 1 . That is, the magnetic field M 1 and the magnetic field M 2 are generated in directions canceling each other. Therefore, when the integrated circuit is viewed as a whole, the magnetic field is canceled and the magnetic field generated outside the integrated circuit can be suppressed, so that the electromagnetic noise emission characteristic can be improved.

【0011】次に図3を参照して、第2の実施例を説明
する。図3は、第2の実施例のモノリシック集積回路の
構成を示す斜視図である。半導体基板上に図示しない第
1層および第2層の絶縁膜が形成された集積回路基板8
上には、2本の信号伝送線路1、2が形成されている。
一方の信号伝送線路2については、全長にわたって集積
回路基板8上に配線されているが、他方の信号伝送線路
1については、重なり合う部分に至るまでの途中部分に
おいて集積回路基板8上に形成され、この重なり合う部
分では第2層目の絶縁膜12に形成されたコンタクト孔
9、10中の導伝材および第1層の絶縁膜上に配線され
た信号伝送線路11によって接続されている。
Next, a second embodiment will be described with reference to FIG. FIG. 3 is a perspective view showing the configuration of the monolithic integrated circuit of the second embodiment. Integrated circuit board 8 in which first layer and second layer insulating films (not shown) are formed on a semiconductor substrate
Two signal transmission lines 1 and 2 are formed on the top.
One of the signal transmission lines 2 is wired on the integrated circuit board 8 over the entire length, while the other signal transmission line 1 is formed on the integrated circuit board 8 in the middle of reaching the overlapping portion. In this overlapping portion, the conductive material in the contact holes 9 and 10 formed in the second-layer insulating film 12 and the signal transmission line 11 wired on the first-layer insulating film are connected.

【0012】この実施例においても、差動信号の電流I
1 、I2 は図3に示すように互いに反対方向に流れる。
このため、重なり合う部分の一方側と他方側で生じる合
成磁界は互いに反対方向になるので、全体として磁界は
打ち消し合う。従って、集積回路外部へ発生する磁界を
抑えることができるので、電磁雑音放射特性の改善がで
きる。
Also in this embodiment, the current I of the differential signal is
1 and I 2 flow in mutually opposite directions as shown in FIG.
Therefore, the combined magnetic fields generated on the one side and the other side of the overlapping portions are in opposite directions, so that the magnetic fields cancel each other out as a whole. Therefore, since the magnetic field generated outside the integrated circuit can be suppressed, the electromagnetic noise radiation characteristic can be improved.

【0013】本発明は上記実施例に限定されることはな
く、様々な変形が可能である。
The present invention is not limited to the above embodiment, but various modifications can be made.

【0014】例えば、第1の実施例中で絶縁膜としてシ
リコン酸化膜を用いたが、シリコン窒化膜のような他の
絶縁膜を用いてもよい。また、実施例中では2本の信号
伝送線路を1回重ね合わせたが、磁界を生成する方向が
それぞれに打ち消し合う方向であればよいので、2回以
上重ね合わせてもよい。また、実施例中では、2本の信
号伝送線路を重ね合わせたが、絶縁手段を介して交差さ
せてもよい。図4にその一例を示す。集積回路基板8上
に形成された対の信号線路1、2において、一方の信号
伝送線路1の中間部分にシリコン酸化膜7が形成され、
その上に他方の信号伝送線路2が形成され、信号伝送線
路1、2が互いにシリコン酸化膜7を介して交差してい
る。他の実施例と同様に、差動信号を伝送する場合、信
号伝送線路1、2が交差する部分を挟む両側では磁界が
打ち消し合う方向に生じるので、全体として磁界は打ち
消されて、集積回路外部へ発生する磁界を抑えることが
でき、雑音放射特性の改善を実現できる。
For example, although the silicon oxide film is used as the insulating film in the first embodiment, another insulating film such as a silicon nitride film may be used. Further, in the embodiment, the two signal transmission lines are superposed once, but the directions in which the magnetic fields are generated may be directions that cancel each other, and thus may be superposed two or more times. Further, in the embodiment, the two signal transmission lines are superposed, but they may be crossed via the insulating means. FIG. 4 shows an example thereof. In the pair of signal lines 1 and 2 formed on the integrated circuit substrate 8, the silicon oxide film 7 is formed in the intermediate portion of one signal transmission line 1.
The other signal transmission line 2 is formed thereon, and the signal transmission lines 1 and 2 intersect each other with the silicon oxide film 7 interposed therebetween. Similar to the other embodiments, when transmitting a differential signal, the magnetic fields are generated in the directions canceling each other on both sides of the intersection of the signal transmission lines 1 and 2, so that the magnetic fields are canceled as a whole, and the integrated circuit external It is possible to suppress the magnetic field generated in the field and improve the noise emission characteristics.

【0015】[0015]

【発明の効果】以上詳細に説明した通り、本発明のモノ
リシック集積回路によれば、差動信号を伝送する対の信
号伝送線路を絶縁手段を介して交差または重ね合わせる
ので、差動電流が生じる磁界は、交差または重なり合う
部分を挟む両側では互いに打ち消し合う方向に生成する
ことができる。従って、全体として磁界は打ち消され
て、モノリシック集積回路の外部へ生成する磁界を抑え
ることができ、電磁雑音放射特性の改善を行うことがで
きる。
As described in detail above, according to the monolithic integrated circuit of the present invention, a pair of signal transmission lines for transmitting a differential signal are crossed or overlapped with each other through insulating means, so that a differential current is generated. The magnetic fields can be generated so as to cancel each other on both sides sandwiching the intersecting or overlapping portions. Therefore, the magnetic field is canceled out as a whole, the magnetic field generated outside the monolithic integrated circuit can be suppressed, and the electromagnetic noise radiation characteristic can be improved.

【図面の簡単な説明】[Brief description of drawings]

【図1】第1の実施例のモノリシック集積回路の構成を
示す斜視図である。
FIG. 1 is a perspective view showing a configuration of a monolithic integrated circuit according to a first embodiment.

【図2】第1の実施例の信号伝送線路と磁界方向を示す
図である。
FIG. 2 is a diagram showing a signal transmission line and a magnetic field direction of the first embodiment.

【図3】第2の実施例のモノリシック集積回路の構成を
示す斜視図である。
FIG. 3 is a perspective view showing a configuration of a monolithic integrated circuit according to a second embodiment.

【図4】実施例の変形例のモノリシック集積回路の構成
を示す斜視図である。
FIG. 4 is a perspective view showing a configuration of a monolithic integrated circuit of a modified example of the embodiment.

【図5】従来の信号伝送線路と磁界方向を示す図であ
る。
FIG. 5 is a diagram showing a conventional signal transmission line and a magnetic field direction.

【符号の説明】[Explanation of symbols]

1,2,11…信号伝送線路、3,4…ボンディングパ
ッド、5,6…電極、7…シリコン酸化膜、8…集積回
路基板、9,10…コンタクト孔、12…絶縁膜
1, 2, 11 ... Signal transmission line, 3, 4 ... Bonding pad, 5, 6 ... Electrode, 7 ... Silicon oxide film, 8 ... Integrated circuit substrate, 9, 10 ... Contact hole, 12 ... Insulating film

Claims (3)

【特許請求の範囲】[Claims] 【請求項1】 回路を構成する素子が形成された半導体
基板上に絶縁膜が形成され、当該絶縁膜上に差動信号を
伝送する少なくとも一対の信号伝送線路が形成されたモ
ノリシック集積回路において、 前記対の信号伝送線路が少なくとも1回以上、絶縁手段
を介して交差または重なり合っていることを特徴とする
モノリシック集積回路。
1. A monolithic integrated circuit in which an insulating film is formed on a semiconductor substrate on which elements constituting a circuit are formed, and at least a pair of signal transmission lines for transmitting differential signals are formed on the insulating film, A monolithic integrated circuit, wherein the pair of signal transmission lines cross or overlap each other at least once via an insulating means.
【請求項2】 前記対の信号伝送線路の一方が前記半導
体基板上の第1の絶縁膜上に形成され、前記一方の信号
伝送線路上に第2の絶縁膜を形成することにより前記絶
縁手段が構成され、前記対の信号伝送線路の他方が前記
第2の絶縁膜上に形成されていることにより前記対の信
号伝送線路が交差または重なり合っていることを特徴と
する請求項1記載のモノリシック集積回路。
2. One of the pair of signal transmission lines is formed on a first insulating film on the semiconductor substrate, and a second insulating film is formed on the one signal transmission line to provide the insulating means. 2. The monolithic structure according to claim 1, wherein the signal transmission lines of the pair are formed on the second insulating film, and the signal transmission lines of the pair intersect or overlap each other. Integrated circuit.
【請求項3】 前記対の信号伝送線路の一方が前記半導
体基板上に重ねて堆積された第1および第2の絶縁膜上
に形成されると共に、この一方の信号伝送線路を挟むよ
うに前記第2の絶縁膜にコンタクト孔が形成され、前記
対の信号伝送線路の他方は前記コンタクト孔と前記第1
および第2の絶縁膜の間に介在して形成された配線とに
より接続された前記第2の絶縁膜上の配線により構成さ
れていることを特徴とする請求項1記載のモノリシック
集積回路。
3. One of the pair of signal transmission lines is formed on first and second insulating films that are stacked and deposited on the semiconductor substrate, and the one signal transmission line is sandwiched so as to sandwich the one signal transmission line. A contact hole is formed in the second insulating film, and the other of the pair of signal transmission lines has the contact hole and the first hole.
2. The monolithic integrated circuit according to claim 1, wherein the monolithic integrated circuit is composed of a wiring on the second insulating film connected to the wiring formed by being interposed between the second insulating film and the second insulating film.
JP14921293A 1993-06-21 1993-06-21 Monolithic integrated circuit Pending JPH0714928A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14921293A JPH0714928A (en) 1993-06-21 1993-06-21 Monolithic integrated circuit

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14921293A JPH0714928A (en) 1993-06-21 1993-06-21 Monolithic integrated circuit

Publications (1)

Publication Number Publication Date
JPH0714928A true JPH0714928A (en) 1995-01-17

Family

ID=15470294

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14921293A Pending JPH0714928A (en) 1993-06-21 1993-06-21 Monolithic integrated circuit

Country Status (1)

Country Link
JP (1) JPH0714928A (en)

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