JPH0714363Y2 - プラズマ処理装置 - Google Patents
プラズマ処理装置Info
- Publication number
- JPH0714363Y2 JPH0714363Y2 JP1987115664U JP11566487U JPH0714363Y2 JP H0714363 Y2 JPH0714363 Y2 JP H0714363Y2 JP 1987115664 U JP1987115664 U JP 1987115664U JP 11566487 U JP11566487 U JP 11566487U JP H0714363 Y2 JPH0714363 Y2 JP H0714363Y2
- Authority
- JP
- Japan
- Prior art keywords
- sample table
- substrate
- plasma
- notch
- plasma processing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000000758 substrate Substances 0.000 claims description 22
- 239000000463 material Substances 0.000 claims description 9
- 230000000149 penetrating effect Effects 0.000 claims description 3
- 238000009832 plasma treatment Methods 0.000 claims 2
- 238000005530 etching Methods 0.000 description 13
- 238000000034 method Methods 0.000 description 3
- 230000008569 process Effects 0.000 description 3
- 239000000428 dust Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 239000012212 insulator Substances 0.000 description 2
- 230000007246 mechanism Effects 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 241000283973 Oryctolagus cuniculus Species 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 230000006835 compression Effects 0.000 description 1
- 238000007906 compression Methods 0.000 description 1
- 239000012141 concentrate Substances 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
Landscapes
- Chemical Vapour Deposition (AREA)
- ing And Chemical Polishing (AREA)
- Drying Of Semiconductors (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1987115664U JPH0714363Y2 (ja) | 1987-07-28 | 1987-07-28 | プラズマ処理装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1987115664U JPH0714363Y2 (ja) | 1987-07-28 | 1987-07-28 | プラズマ処理装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6422772U JPS6422772U (enrdf_load_stackoverflow) | 1989-02-06 |
| JPH0714363Y2 true JPH0714363Y2 (ja) | 1995-04-05 |
Family
ID=31357525
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1987115664U Expired - Lifetime JPH0714363Y2 (ja) | 1987-07-28 | 1987-07-28 | プラズマ処理装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0714363Y2 (enrdf_load_stackoverflow) |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61123128A (ja) * | 1984-11-07 | 1986-06-11 | Fujitsu Ltd | プラズマ反応装置 |
-
1987
- 1987-07-28 JP JP1987115664U patent/JPH0714363Y2/ja not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6422772U (enrdf_load_stackoverflow) | 1989-02-06 |
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