JPH069489Y2 - Wafer support mounting table - Google Patents

Description

DETAILED DESCRIPTION OF THE INVENTION <Industrial Application Field> The present invention relates to a wafer support mounting table accommodated in a vertical heat treatment furnace used for manufacturing a semiconductor device.

<Prior Art> In a vertical heat treatment furnace used for manufacturing a semiconductor device, a wafer support (hereinafter referred to as a boat) is used that simultaneously heat-treats a plurality of wafers to improve productivity.

2. Description of the Related Art Conventionally, as shown in FIG. 2, a boat mounting table for supporting this boat has a cylindrical shape in which a plurality of vertically-arranged columnar columns 2 are fixed by a plurality of discs 3, as shown in FIG. The protrusion 4 for supporting the boat is located inside the position of the extension line of the support column 2 of the boat mounting table, and is fixed by a disc 3 ′ that is smaller than the lower disc 3. Then, as shown in FIG. 3, the boat 1 was placed on the boat mounting table, and in this state, the boat 1 was housed in a heat treatment furnace for heat treatment.

<Problems to be solved by the invention> However, when such a boat mounting table is used and heat treatment is performed at a high temperature of 1100 ° C. in particular, as shown by a dotted line in FIG. When it is deformed and is terrible, the concavo-convex state of the disk 3 shown by L in Fig. 4 is several mm.
As a result, the mounted boat becomes unstable, causing a problem that the boat accommodating the wafer falls during the heat treatment of the wafer.

The present invention has been made to solve the above problems, and an object of the present invention is to provide a boat mounting table that is stable even at high temperatures.

<Means for Solving the Problem> The present invention has a structure in which a plurality of columns are fixed to each other by a plurality of discs to form a cylindrical shape, and a plurality of protrusions are provided on the disc on the upper side. A mounting table for a wafer support, in which a wafer support for storing and holding a wafer is mounted in a vertical heat treatment furnace for semiconductor manufacturing, the number of which is the same as the number of columns of the plurality of protrusions. The projection table is located on the extension line of the support column.

<Operation> According to the present invention, the position of the protrusions on the upper disk of the boat mounting table is not the position different from the position of the extension line of the support columns of the boat mounting table, but is the same as the number of the support columns. Since it is located on the extension line of the column, it is possible to stabilize the boat without being deformed even when heat-treated at high temperature.

<Embodiment> An embodiment of the present invention will be described below with reference to FIG.

As shown in FIG. 1, as many protrusions 4 as the number of the support columns 2 of the boat mounting table are arranged on the extension lines of the support columns 2. The number of the protrusions 4 may be equal to or more than the number of the support columns 2 and is not particularly limited. Further, the height and diameter of the protrusion 4 are not particularly limited.

Using the boat mounting table configured in this way, a deformation experiment was performed in high temperature heat treatment. The number of columns of the boat mounting table used in this experiment was three, while the number of protrusions on the boat mounting table was four, and the height was 10 mm and the diameter was 10 mm. The heat treatment temperature during the experiment was 1100 ° C and the heat treatment time was 25 hours.

As a result of the experiment, the deformation amount (L in FIG. 4) in the conventional example was 2 mm, whereas no deformation was observed in the present invention.

<Effect of the Invention> According to this invention, the boat and the boat mounting table can be stably used for a long time only by structural improvement, and the heat treatment quality and productivity of the wafer can be stabilized.

[Brief description of drawings]

FIG. 1 is a side view showing an embodiment of the present invention, (b) a plan view, FIG. 2 is a side view showing a conventional example of a boat mounting table, and FIG. 3 is a conventional boat mounting table. FIG. 4A is a side view showing a state in which the boat is mounted on the mounting table, FIG. 4B is a sectional view taken along the line AA of FIG. 4, and FIG. 4 is a side view showing a problem of the conventional example. 1 ... Boat (wafer support), 2 ... Boat mounting table column, 3, 3 '... Disk, 4 ... Projection.

Claims (1)

[Scope of utility model registration request] 1. A wafer support for accommodating and holding a wafer, wherein a plurality of pillars are fixed to each other by a plurality of discs to form a cylindrical shape, a plurality of protrusions are provided on an upper disc, and wafers are stored and held thereon. A mounting base of a wafer support tool on which tools are mounted and accommodated in a vertical heat treatment furnace for semiconductor manufacturing, wherein the same number of projections as the number of the support pillars among the plurality of projections is extended. A wafer support mounting table characterized by being positioned on a line.