JPH0687935B2 - Pressure swing adsorption device - Google Patents
Pressure swing adsorption deviceInfo
- Publication number
- JPH0687935B2 JPH0687935B2 JP61208136A JP20813686A JPH0687935B2 JP H0687935 B2 JPH0687935 B2 JP H0687935B2 JP 61208136 A JP61208136 A JP 61208136A JP 20813686 A JP20813686 A JP 20813686A JP H0687935 B2 JPH0687935 B2 JP H0687935B2
- Authority
- JP
- Japan
- Prior art keywords
- gas
- adsorption tower
- adsorption
- pipe
- cleaning
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Landscapes
- Separation Of Gases By Adsorption (AREA)
Description
【発明の詳細な説明】 ［産業上の利用分野］ 本発明は高純度ガスの製造に利用される圧力スイング吸
着装置（以下単にPSA装置という）に関し、特に脱着回
収すべき製品ガスの廃棄量を極力少なくし、製品ガスを
高回収率で回収するためのPSA装置に関するものであ
る。以下にはその代表例として原料空気からN2ガスを高
純度回収するPSA装置について説明するが、本発明装置
の適用対象はこれによって限定解釈されてはならない。DETAILED DESCRIPTION OF THE INVENTION [Industrial application] The present invention relates to a pressure swing adsorption apparatus (hereinafter simply referred to as a PSA apparatus) used for producing high-purity gas, and particularly to a product gas amount to be desorbed and recovered. The present invention relates to a PSA device for reducing product gas as much as possible and recovering product gas at high recovery rate. As a typical example thereof, a PSA apparatus for recovering N 2 gas from material air with high purity will be described below, but the application target of the apparatus of the present invention should not be limitedly interpreted by this.
［従来の技術］ 加圧空気をPSA装置に導入しN2ガスを濃縮回収する方法
を大別すると、O2ガスを吸着剤に吸着除去する方法とN2
ガスを吸着剤に吸着させ更に脱着させる方法の２つに分
類される。このうち後者はゼオライト系の吸着剤を使用
し、N2ガス吸着後の吸着塔を真空ポンプ等によって減圧
することにより高純度N2ガスとして脱着回収する方法で
あり、以下この方法に利用されるPSA装置について説明
する。[Prior Art] A method of introducing pressurized air into a PSA device and concentrating and recovering N 2 gas is roughly divided into a method of adsorbing and removing O 2 gas and an N 2 gas.
It is classified into two methods of adsorbing a gas on an adsorbent and further desorbing it. Of these, the latter is a method of using a zeolite-based adsorbent and desorbing and recovering it as high-purity N 2 gas by depressurizing the adsorption tower after N 2 gas adsorption with a vacuum pump or the like, and is used in this method below. The PSA device will be described.
第２図は前処理塔2a,2bにおいてH2OとCO2を除去した後
のO2/N2混合ガスを３塔式PSA装置に供給してN2ガスを選
択的に回収する装置の概略説明図である。Fig. 2 shows an apparatus for selectively recovering N 2 gas by supplying an O 2 / N 2 mixed gas after removing H 2 O and CO 2 in the pretreatment towers 2a and 2b to a 3-tower PSA apparatus. It is a schematic explanatory drawing.
圧縮機９によって加圧された空気は前処理塔2a,2bのい
ずれかに送給され、吸着剤にH2O及びCO2成分を吸着さ
せ、ここを通過したO2/N2混合ガスを３塔式PSA装置の原
料ガス供給管1aへ送り込む。原料ガス供給管1aは自動開
閉弁（以下単に弁という）V1〜V3を介して吸着塔3a,3b,
3cに接続され、各塔の底部に弁V4〜V6を介して排ガス廃
棄管4aが連結される。該排ガス廃棄管4aは前処理塔2a,2
bに連結され、吸着塔3a,3b,3cを通過して出てきたO2リ
ッチの排ガスは前処理塔内に吸着されたH2O,CO2の脱着
に利用される。また排ガス廃棄管4aの途中（弁V4〜V6介
設点より上流側）からは回収ガス抜出し管5a,5b,5cが分
岐され、夫々弁V7〜V9を介してそれより下流側で合流さ
れる。合流された回収ガス抜出し管５には真空ポンプ６
が設けられて製品ガスホルダ20に連結され、脱着回収さ
れた高純度N2ガスを貯留する。製品ガスホルダ20には、
製品ガスの一部を洗浄用として抜き出す洗浄用管８が配
設され、該洗浄用管８は分岐された後弁V13〜V15を介し
て吸着塔3a,3b,3cの各頂部に連結される。尚各吸着塔3
a,3b.3cは均圧配管10a,10b,10cによって直列的に連結さ
れ、夫々には弁V10〜V12が設けられる。The air pressurized by the compressor 9 is sent to either of the pretreatment towers 2a and 2b, the adsorbent adsorbs H 2 O and CO 2 components, and the O 2 / N 2 mixed gas passing therethrough is mixed. Feed into the raw material gas supply pipe 1a of the three-tower PSA device. The raw material gas supply pipe 1a is connected to the adsorption towers 3a, 3b, through automatic opening / closing valves (hereinafter simply referred to as valves) V 1 to V 3 .
Connected to 3c, the exhaust gas waste pipe 4a is connected through a valve V 4 ~V 6 at the bottom of each tower. The exhaust gas waste pipe 4a is connected to the pretreatment towers 2a, 2
The O 2 -rich exhaust gas that is connected to b and passes through the adsorption towers 3a, 3b, 3c and comes out is used for desorption of H 2 O, CO 2 adsorbed in the pretreatment tower. The middle of the exhaust gas disposal tube 4a from (valve V 4 ~V 6 through the upstream setting point) the recovery gas extraction pipe 5a, 5b, 5c is branched, via a respective valve V 7 ~V 9 it downstream side Joined in. A vacuum pump 6 is installed in the combined recovered gas extraction pipe 5.
Is provided and connected to the product gas holder 20, and stores the desorbed and recovered high-purity N 2 gas. The product gas holder 20 has
Cleaning pipe 8 for extracting a portion of the product gas for the cleaning is disposed, connected to the top of the adsorption tower 3a, 3b, 3c the cleaning tube 8 via the Koben V 13 ~V 15 which is branched To be done. Each adsorption tower 3
a, 3b.3c the equalizing pressure pipe 10a, 10b, serially connected by 10c, the valve V 10 ~V 12 is provided respectively.
［発明が解決しようとする問題点］ 第３図は、吸着塔3a,3b,3cのうちある１塔の作動工程を
示すタイムスケジュール（時間は左から右方向に進む）
であり、吸着工程開始時から脱着工程終了時までの作動
工程を１工程サイクルとしている。この１工程サイクル
は図示の如く吸着工程、回収工程、洗浄工程及び脱着工
程より構成される。まず吸着工程では脱着された吸着塔
内を加圧すると共に、O2/N2混合ガスを供給管1aから加
圧供給し、回収目的成分のN2ガスを吸着剤に吸着させ不
純成分ガス（主にO2ガス）を排ガス廃棄管4aを介して放
出させる。又脱着工程では吸着塔を真空ポンプ６によっ
て減圧し、吸着塔内の吸着剤に吸着されたN2を脱着し回
収ガス抜き出し管５を通して製品ガスホルダ20に回収貯
留する。[Problems to be Solved by the Invention] FIG. 3 is a time schedule showing the operation process of one of the adsorption towers 3a, 3b, 3c (time progresses from left to right).
The operation process from the start of the adsorption process to the end of the desorption process is one process cycle. This one-step cycle is composed of an adsorption step, a recovery step, a washing step and a desorption step as shown in the figure. First, in the adsorption process, the pressure inside the desorbed adsorption tower is increased, and the O 2 / N 2 mixed gas is pressure-supplied from the supply pipe 1a to adsorb the N 2 gas, which is the target component to be recovered, to the adsorbent, and the impure component gas (mainly O 2 gas) is discharged through the exhaust gas waste pipe 4a. Further, in the desorption process, the pressure of the adsorption tower is reduced by the vacuum pump 6, and the N 2 adsorbed by the adsorbent in the adsorption tower is desorbed and collected and stored in the product gas holder 20 through the collected gas extraction pipe 5.
次に回収工程及び洗浄工程を、吸着塔3aの場合を例に挙
げて説明すると第４図（ａ）及び（ｂ）によって示され
る。即ち第４図（ａ）の状態においては、製品ガスホル
ダ側から供給される高純度N2ガスは洗浄用管８を通って
吸着塔3c内の残留O2を追放し、吸着工程の終了した吸着
塔3aへの均圧配管10cを介して送り込まれる。これらの
ガス流れによって吸着塔3aでは回収工程が行なわれ、吸
着塔3cでは洗浄工程が行なわれる。次いで第４図（ｂ）
の状態では、吸着塔3aは洗浄工程を行ない、吸着塔3bは
回収工程を行なう。Next, the recovery process and the cleaning process will be described with reference to the adsorption tower 3a as an example, as shown in FIGS. 4 (a) and 4 (b). That is, in the state of FIG. 4 (a), the high-purity N 2 gas supplied from the product gas holder side passes through the cleaning pipe 8 to expel the residual O 2 in the adsorption tower 3c, and the adsorption after the adsorption step is completed. It is sent to the tower 3a via a pressure equalizing pipe 10c. With these gas flows, a recovery process is performed in the adsorption tower 3a, and a cleaning process is performed in the adsorption tower 3c. Then, FIG. 4 (b)
In this state, the adsorption tower 3a performs the washing step, and the adsorption tower 3b performs the recovery step.
こうして第４図（ｂ）に示す洗浄工程の終了した吸着塔
3aでは、次に真空ポンプ６によって減圧して脱着工程が
行なわれることになるが、上記洗浄工程に使用されるガ
スは高純度N2ガスであり、直列接続された２つの吸着塔
を通過させたガス中には未だ多くのN2成分が含まれてお
り、このまま装置外に排出してしまうことは不能率且つ
不経済である。Thus, the adsorption tower after the washing step shown in FIG.
In 3a, the desorption process is performed by reducing the pressure with the vacuum pump 6 next, but the gas used in the cleaning process is high-purity N 2 gas, and is passed through two adsorption columns connected in series. The gas still contains a large amount of N 2 component, and it is uneconomical and uneconomical to discharge it as it is outside the device.
そこで本発明者は吸着塔の洗浄に利用された洗浄ガスを
そのまま無作為に放出してしまうのではなく効率良く再
回収することを目的として種々検討を積み重ねた結果、
本発明PSA装置を完成させるに至った。Therefore, the present inventor has carried out various studies for the purpose of efficiently recovering the cleaning gas used for cleaning the adsorption tower as it is, rather than randomly discharging the cleaning gas as it is,
The present invention PSA device has been completed.
［問題点を解決するための手段］ 上記目的を達成し得た本発明PSA装置は、吸着塔洗浄ガ
スの排出ラインの任意位置にガスホルダーを設け、該ガ
スホルダーの出口を原料ガス供給管に接続してなる点を
要旨とするものである。[Means for Solving the Problems] The PSA device of the present invention that has achieved the above object is provided with a gas holder at an arbitrary position in the discharge line of the adsorption tower cleaning gas, and the outlet of the gas holder is connected to the raw material gas supply pipe. The point is that the points are connected.
［作用］ 本発明では、洗浄ガスを吸着塔外へ導く排出ラインに予
めガスホルダーを接続しておき、洗浄工程において吸着
塔を通過したガス（以下、中純度ガスと言うことがあ
る）を前記ガスホルダー内に貯留できる様に構成した。[Operation] In the present invention, a gas holder is connected in advance to the discharge line for introducing the cleaning gas to the outside of the adsorption tower, and the gas that has passed through the adsorption tower in the cleaning step (hereinafter, may be referred to as medium purity gas) is described above. It is configured so that it can be stored in the gas holder.
また吸着塔への原料ガス供給管と上記ガスホルダー出口
を連結しておき、ガスホルダー内に貯留された中純度ガ
スを吸着塔の吸着工程において原料ガスと一緒に又は別
々に供給して中純度ガス中の回収成分、例えばN2の再回
収を図るのである。従って吸着工程で消費させる原料ガ
ス量を低減させることができる様になると共に、製品ガ
スの回収率は高い値を維持することができる。In addition, the raw material gas supply pipe to the adsorption tower and the gas holder outlet are connected, and the medium purity gas stored in the gas holder is supplied together with the raw material gas or separately in the adsorption step of the adsorption tower to obtain the medium purity. The recovery component in the gas, for example N 2 , is to be recovered again. Therefore, the amount of raw material gas consumed in the adsorption step can be reduced, and the product gas recovery rate can be maintained at a high value.
［実施例］ 第１図は本発明の代表的な実施例を示す概略説明図であ
る。第２図に示した従来例と構造的に相違する部分は、
排ガス廃棄管4aと原料ガス供給管1aの間に連結管12a,12
bを介してガスホルダー11を配設し、該連結管12a,12b及
び原料ガス供給管1a、排ガス廃棄管4aに夫々弁A4,A3,
A1,A2を設けた点にある。Embodiments FIG. 1 is a schematic explanatory view showing a typical embodiment of the present invention. The part that is structurally different from the conventional example shown in FIG.
Between the exhaust gas waste pipe 4a and the source gas supply pipe 1a, connecting pipes 12a, 12
The gas holder 11 is disposed via b, and the connecting pipes 12a and 12b, the raw material gas supply pipe 1a, and the exhaust gas waste pipe 4a are provided with valves A 4 , A 3 , respectively.
The point is that A 1 and A 2 are provided.
ガスホルダー11内へのガス貯留は次の様に行なわれる。
例えば吸着塔3bの洗浄工程を行なう場合、高純度N2ガス
（洗浄ガス）は第１図の実線矢印に示す様に洗浄用管８
→吸着塔3b→均圧配管10b→吸着塔3c→排ガス廃棄管4a
の経路に沿って流される。この洗浄工程の終期において
排ガス廃棄管4aを通るガス中のN2成分濃度が高くなった
ところで、弁A2を全閉もしくは小開とし、弁A4を開とし
て該洗浄後のガスを加圧状態のままガスホルダー11中へ
導入する。このとき連結管12aにブロワーを設けておけ
ば、上記洗浄後のガスはより一層加圧（2.0Kg/cm2程
度）することが可能となるので、ガスホルダー11の容積
は小さくすることができる。The gas is stored in the gas holder 11 as follows.
For example, when performing the cleaning process of the adsorption tower 3b, the high purity N 2 gas (cleaning gas) is supplied to the cleaning pipe 8 as shown by the solid line arrow in FIG.
→ Adsorption tower 3b → Pressure equalizing pipe 10b → Adsorption tower 3c → Exhaust gas waste pipe 4a
Shed along the path of. At the end of this cleaning process, when the concentration of N 2 component in the gas passing through the exhaust gas disposal pipe 4a becomes high, the valve A 2 is fully closed or small opened, and the valve A 4 is opened to pressurize the gas after the cleaning. It is introduced into the gas holder 11 as it is. At this time, if a blower is provided in the connecting pipe 12a, the gas after the cleaning can be further pressurized (about 2.0 Kg / cm 2 ) and the volume of the gas holder 11 can be reduced. .
次にガスホルダー11内に貯留した中純度ガスを吸着工程
に供給して目的成分の回収を図る場合について説明す
る。例えば吸着塔3aの吸着工程終期段階に至ると、前記
中純度ガスを破線矢印に示す様なルートに沿って吸着塔
側へ流す。即ち弁A1,A4を閉、弁A2,A3を開とし、ガスホ
ルダー11→弁A3→弁V1→吸着塔3a→弁V4→弁A2の経路に
よって吸着塔3aの吸着剤に中純度ガス中のN2成分を吸着
させ、排ガスは排ガス廃棄管4aを介して前処理塔2a,2b
側へ送り返す。Next, a case where the medium purity gas stored in the gas holder 11 is supplied to the adsorption step to collect the target component will be described. For example, when the final stage of the adsorption process of the adsorption tower 3a is reached, the medium-purity gas is flowed to the adsorption tower side along the route shown by the broken line arrow. That is, the valves A 1 and A 4 are closed and the valves A 2 and A 3 are opened, and the gas holder 11 → valve A 3 → valve V 1 → adsorption tower 3a → valve V 4 → valve A 2 of the adsorption tower 3a The N 2 component in the medium purity gas is adsorbed by the adsorbent, and the exhaust gas is passed through the exhaust gas disposal pipe 4a to the pretreatment towers 2a, 2b.
Send back to.
実験例 第１図に示す構造のPSA装置を試作し、N2ガス（79％）O
2ガス（21％）からなる混合ガスよりN2ガスを選択回収
する実験を行なった。吸着塔は内径350mm、高さ1500mm
のものを使用し、吸着剤としては合成ゼオライトを使用
した。原料ガスの吸着圧力は0.5Kg/cm2Gとして48Nm3/h
で供給し、脱着圧力は50TORRに設定して吸着塔の１工程
サイクルを３分で遂行した。Experimental example A PSA device with the structure shown in Fig. 1 was prototyped and N 2 gas (79%) O
An experiment was conducted to selectively recover N 2 gas from a mixed gas composed of 2 gases (21%). The adsorption tower has an inner diameter of 350 mm and a height of 1,500 mm.
The one used as the adsorbent was a synthetic zeolite. Adsorption pressure of source gas is 48 Nm 3 / h with 0.5 Kg / cm 2 G
The desorption pressure was set at 50 TORR and the one-step cycle of the adsorption tower was performed in 3 minutes.
この結果純度99.99％のN2ガスが回収率63％で得られ従
来装置を利用した場合に比べて約1.5倍の回収率を達成
することができる様になった。As a result, N 2 gas with a purity of 99.99% was obtained with a recovery rate of 63%, and it became possible to achieve a recovery rate of about 1.5 times compared with the case of using a conventional device.
本発明に係るガスホルダーの配置位置は第１図の実施例
位置に限定されず、洗浄目的の吸着塔より下流側であれ
ばいずれの位置に設けても良い。The position of the gas holder according to the present invention is not limited to the position of the embodiment shown in FIG. 1, and it may be provided at any position on the downstream side of the adsorption tower for cleaning purposes.
上記した例ではN2ガスの濃縮回収の例を示して説明して
きたが、本発明はN2ガス回収の他H2ガス回収やCOガス回
収等にも適用される。In the above example, the example of concentrating and recovering N 2 gas has been shown and described, but the present invention is also applied to H 2 gas recovery, CO gas recovery and the like in addition to N 2 gas recovery.
［発明の効果］ 本発明のPSA装置を使用することによって洗浄ガスを無
駄に放出してしまうことがなくなり回収目的成分を高回
収率で得ることができる様になった。[Advantages of the Invention] By using the PSA device of the present invention, the cleaning gas is not wastefully discharged, and the recovery target component can be obtained at a high recovery rate.
第１図は本発明の代表的な実施例を示す概略説明図、第
２図は従来のPSA装置を示す概略説明図、第３図は従来
のPSA装置を使った場合の工程を示す模式説明図、第４
図（ａ），（ｂ）は吸着塔3aの回収工程及び洗浄工程を
示す説明図である。 １……原料ガス供給管 2a,2b……前処理塔 3a,3b,3c……吸着塔 ４……排ガス廃棄管、５……回収ガス抜出し管 ６……真空ポンプ、８……洗浄用管 ９……圧縮機 10a,10b,10c……均圧配管 11……ガスホルダー 12a 12b……連結管 V1〜V15,A1〜A4……自動開閉弁FIG. 1 is a schematic explanatory diagram showing a typical embodiment of the present invention, FIG. 2 is a schematic explanatory diagram showing a conventional PSA device, and FIG. 3 is a schematic explanatory diagram showing steps when a conventional PSA device is used. Figure, 4th
(A), (b) is explanatory drawing which shows the collection process and washing | cleaning process of the adsorption tower 3a. 1 ... Raw material gas supply pipe 2a, 2b ... Pretreatment tower 3a, 3b, 3c ... Adsorption tower 4 ... Exhaust gas waste pipe, 5 ... Recovered gas extraction pipe 6 ... Vacuum pump, 8 ... Washing pipe 9 …… Compressor 10a, 10b, 10c …… Equalizing pipe 11 …… Gas holder 12a 12b …… Connecting pipe V 1 〜V 15 , A 1 〜A 4 …… Automatic open / close valve
Claims (1)
び洗浄用ガス配管を配設した圧力スイング吸着装置にお
いて、吸着塔洗浄ガスの排出ラインの任意位置にガスホ
ルダーを設け、該ガスホルダーの出口を原料ガス供給管
に接続してなることを特徴とする圧力スイング吸着装
置。1. A pressure swing adsorption apparatus in which a raw material gas supply pipe, an exhaust gas disposal pipe, and a cleaning gas pipe are arranged in an adsorption tower, and a gas holder is provided at an arbitrary position of an adsorption tower cleaning gas discharge line. The pressure swing adsorption device is characterized in that the outlet of is connected to a raw material gas supply pipe.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61208136A JPH0687935B2 (en) | 1986-09-04 | 1986-09-04 | Pressure swing adsorption device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61208136A JPH0687935B2 (en) | 1986-09-04 | 1986-09-04 | Pressure swing adsorption device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6365929A JPS6365929A (en) | 1988-03-24 |
| JPH0687935B2 true JPH0687935B2 (en) | 1994-11-09 |
Family
ID=16551228
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP61208136A Expired - Lifetime JPH0687935B2 (en) | 1986-09-04 | 1986-09-04 | Pressure swing adsorption device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0687935B2 (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| RU2443763C2 (en) * | 2006-10-31 | 2012-02-27 | Осака Гэс Ко., Лтд. | Inflammable gas concentration system |
| PL227951B1 (en) | 2010-01-26 | 2018-02-28 | Osaka Gas Co Ltd | Device for enriching fuel gas |
-
1986
- 1986-09-04 JP JP61208136A patent/JPH0687935B2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6365929A (en) | 1988-03-24 |
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