JPH0677076A - Manufacture of coil part - Google Patents

Manufacture of coil part

Info

Publication number
JPH0677076A
JPH0677076A JP25077792A JP25077792A JPH0677076A JP H0677076 A JPH0677076 A JP H0677076A JP 25077792 A JP25077792 A JP 25077792A JP 25077792 A JP25077792 A JP 25077792A JP H0677076 A JPH0677076 A JP H0677076A
Authority
JP
Japan
Prior art keywords
coil
photoresist
insulator
coil conductor
pattern
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP25077792A
Other languages
Japanese (ja)
Inventor
Hisashi Kobuke
恆 小更
Minoru Takatani
稔 高谷
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
TDK Corp
Original Assignee
TDK Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by TDK Corp filed Critical TDK Corp
Priority to JP25077792A priority Critical patent/JPH0677076A/en
Publication of JPH0677076A publication Critical patent/JPH0677076A/en
Withdrawn legal-status Critical Current

Links

Landscapes

  • Magnetic Heads (AREA)
  • Manufacturing Cores, Coils, And Magnets (AREA)
  • Coils Or Transformers For Communication (AREA)

Abstract

PURPOSE:To provide a method of manufacturing a coil part applicable to a magnetic head, an inductor, or a transformer, where the coil part can be formed into a fine pattern, lessened in size, enhanced in characteristics, and efficiently manufactured. CONSTITUTION:By the use of a photolithography technique comprising application of photoresist, exposure, and development, a coil conductor 6 or an insulator forming photoresist removing pattern is formed. The coil conductor 6 or an insulator is printed on all the surface, and then a photoresist 8g and the coil conductor 6 or the insulator 5 located on the photoresist 8g are removed at a time so as to form the coil conductor 6 or the insulator of deposited pattern.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、磁気ヘッド、インダク
タ、あるいはトランス等に用いられるコイル部品の製造
方法に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for manufacturing a coil component used in a magnetic head, an inductor, a transformer or the like.

【0002】[0002]

【従来の技術】磁気ヘッド、インダクタ、あるいはトラ
ンス等に用いられる積層型チップ部品等のコイル部品の
製造方法には、印刷法やシ−ト法による厚膜形成技術に
より磁性体の中に導電コイルを一体に積層してコイルを
形成する方法、また、スパッタリングのような薄膜形成
技術により磁性薄膜および薄膜の銅製コイルを多段に形
成する方法等がある。
2. Description of the Related Art A method of manufacturing a coil component such as a magnetic chip, an inductor, or a laminated chip component used in a transformer or the like is known as a conductive coil in a magnetic material by a thick film forming technique by a printing method or a sheet method. There is a method of forming a coil by integrally laminating a coil and a method of forming a magnetic thin film and thin-film copper coils in multiple stages by a thin film forming technique such as sputtering.

【0003】図5は従来の厚膜形成技術によるコイル部
品の製造工程図である。図5(a)〜(i)に示すよう
に、この方法は、磁性フェライト等の磁性体層5f〜5
jと、銀、銅、金、アルミニウム等のコイル導体層6g
〜6jとを印刷法あるいはシ−ト法により交互に積層す
ることにより、引き出し電極部を含む導電コイルを磁性
体の中に一体に形成したコイル部品を作製するものであ
る。
FIG. 5 is a manufacturing process drawing of a coil component by a conventional thick film forming technique. As shown in FIGS. 5 (a) to 5 (i), this method is applied to magnetic layers 5f to 5 such as magnetic ferrite.
j and a coil conductor layer 6g of silver, copper, gold, aluminum, etc.
By alternately laminating 6 to 6j by a printing method or a sheet method, a coil component in which a conductive coil including a lead electrode portion is integrally formed in a magnetic body is manufactured.

【0004】[0004]

【発明が解決しようとする課題】しかし、厚膜形成技術
による製造方法では、各層のパタ−ン形成において、幅
が100μm以下のファインラインパタ−ンを形成する
ことは困難であり、また、厚さが10μm程度の膜厚が
あり、にじみのないシャ−プなエッヂのパタ−ンを形成
することは困難であった。このためパタ−ンの細密化が
できず、コイル部品の小型化には限界があった。さらに
印刷法では、メッシュ材のマスクを使用するため、この
マスクの伸びによるパタ−ンずれが発生し、コイル導体
層がショ−ト等を起こし、電気的特性や信頼性等が低下
するという問題点があった。
However, in the manufacturing method by the thick film forming technique, it is difficult to form a fine line pattern having a width of 100 μm or less in the pattern formation of each layer, and It was difficult to form a sharp edge pattern with no bleeding and a film thickness of about 10 μm. Therefore, the pattern cannot be made finer, and there is a limit to the miniaturization of the coil component. Further, in the printing method, since a mask made of a mesh material is used, a pattern shift occurs due to the expansion of the mask, a short circuit occurs in the coil conductor layer, and electrical characteristics and reliability are deteriorated. There was a point.

【0005】また、薄膜形成技術による製造方法では、
一度に成膜できる枚数が制限され、時間を必要とするの
で、作業能率が悪いという問題点があった。
Further, in the manufacturing method by the thin film forming technique,
Since the number of films that can be formed at one time is limited and it takes time, there is a problem that work efficiency is poor.

【0006】本発明は、上記した実情に鑑み、磁気ヘッ
ド、インダクタ、あるいはトランスに用いられるコイル
部品において、細密なパターンの形成が可能で小型化で
きると共に、特性の向上が図れ、かつ能率よく製造でき
るコイル部品の製造方法を提供することを目的とする。
In view of the above-mentioned circumstances, the present invention is capable of forming a fine pattern in a coil component used in a magnetic head, an inductor, or a transformer, which can be miniaturized, improved in characteristics, and efficiently manufactured. An object of the present invention is to provide a method of manufacturing a coil component that can be manufactured.

【0007】[0007]

【課題を解決するための手段】本発明は、上記目的を達
成するため、コイル導体と絶縁体とを層状に積層してな
るコイル部品を製造するにあたり、フォトレジスト塗
布、露光、現像によるフォトリソグラフィ手法を用い
て、フォトレジストを全面に塗布し、コイル導体又は絶
縁体形成用のフォトレジストを介して露光、現像後、ほ
ぼ全面にわたってコイル導体又は絶縁体を印刷し、その
後フォトレジスト並びにフォトレジスト上のコイル導体
又は絶縁体を同時に除去して、コイル導体又は絶縁体の
積層パタ−ンを形成することを特徴とする。また、本発
明により得られるコイル部品としては、前記絶縁体全体
が磁性体又は非磁性体でなるもののみならず、コイル芯
部が磁性体、コイル外部が非磁性体でなるものの場合等
がある。
In order to achieve the above-mentioned object, the present invention provides a photolithography method by applying a photoresist, exposing and developing in producing a coil component in which a coil conductor and an insulator are laminated in layers. Using the technique, apply photoresist to the entire surface, through the photoresist for forming the coil conductor or insulator, after exposure and development, print the coil conductor or insulator on almost the entire surface, and then on the photoresist and the photoresist The coil conductor or insulator is removed at the same time to form a laminated pattern of the coil conductor or insulator. Further, the coil component obtained by the present invention is not limited to one in which the entire insulator is made of a magnetic material or a non-magnetic material, but may be one in which the coil core is made of a magnetic material and the outside of the coil is made of a non-magnetic material. .

【0008】[0008]

【作用】上述のように、コイル導体または絶縁体のパタ
−ンはフォトリソグラフィにより微細パタ−ンとして形
成でき、成膜は印刷法により能率良く形成できる。
As described above, the pattern of the coil conductor or the insulator can be formed as a fine pattern by photolithography, and the film can be formed efficiently by the printing method.

【0009】[0009]

【実施例】図4(A)は本発明の方法により作られるコ
イル部品の斜視図、同(B)は(A)のE−E断面図で
ある。図4(A)、(B)に示すように、このコイル部
品は、磁性フェライトのような磁性体5と、銀、銅、
金、アルミニウム等の金属でなるコイル導体6とを、交
互に積層し、コイル外周部は非磁性体7を積層して形成
している。
EXAMPLE FIG. 4A is a perspective view of a coil component manufactured by the method of the present invention, and FIG. 4B is a sectional view taken along line EE of FIG. As shown in FIGS. 4A and 4B, this coil component includes a magnetic body 5 such as magnetic ferrite, silver, copper,
The coil conductors 6 made of metal such as gold or aluminum are alternately laminated, and the outer peripheral portion of the coil is formed by laminating the non-magnetic material 7.

【0010】図1〜図3は本発明によるコイル部品の一
実施例の製造工程を示す図である(各工程の上側は平面
図、下側は側面図を示す)。まず、図1において、一方
の端面の磁性体層5gとその外周に非磁性体層7gをペ
ーストの印刷、乾燥により形成(以下これらを「印刷」
と略す)し(a)、その上にフォトレジスト8gを全面
に塗布し(b)、そのフォトレジスト8gを一方の引き
出し電極となるコイル導体層のパタ−ン1Wで露光し
(c)、パタ−ン1Wで感光した感光液を除去する
(d)。
1 to 3 are views showing manufacturing steps of an embodiment of a coil component according to the present invention (upper side of each step is a plan view and lower side is a side view). First, in FIG. 1, a magnetic material layer 5g on one end face and a non-magnetic material layer 7g are formed on the outer periphery of the magnetic material layer 5g by paste printing and drying (hereinafter, these are referred to as "printing").
(A), a photoresist 8g is applied on the entire surface (b), and the photoresist 8g is exposed with a pattern 1W of a coil conductor layer that serves as one of the extraction electrodes (c). The photosensitive solution exposed with 1 W is removed (d).

【0011】続いて前記フォトレジスト8gの除去部か
らその内側にかけてコイル導体層6を印刷し(e)、そ
の後エッチングによりフォトレジスト8gとフォトレジ
スト8g上のコイル導体層6とを同時に除去すると、コ
イル導体6が前記パタ−ン1Wの形状で前記磁性体層5
gの上に残り、一方の引き出し電極となるコイル導体層
6gが形成される(f)。
Then, the coil conductor layer 6 is printed from the removed portion of the photoresist 8g to the inside thereof (e), and then the photoresist 8g and the coil conductor layer 6 on the photoresist 8g are removed at the same time by etching. The conductor 6 has the shape of the pattern 1W and the magnetic layer 5
A coil conductor layer 6g which remains on g and serves as one of the lead electrodes is formed (f).

【0012】続いてその上にフォトレジスト8hを全面
に塗布し(g)、外周の非磁性体層パタ−ン1Xでフォ
トレジスト8hを露光する(h)。
Subsequently, a photoresist 8h is applied over the entire surface (g), and the photoresist 8h is exposed by the nonmagnetic layer pattern 1X on the outer periphery (h).

【0013】次に図2において、前記パタ−ン1Xで感
光した感光液を除去し(a)、フォトレジスト8hの除
去部を中心に非磁性体7を印刷し(b)、その後エッチ
ングによりフォトレジスト8hとフォトレジスト8h上
の非磁性体7とを同時に除去すると、非磁性体7がパタ
−ン1Xの形状で残り、外周部に非磁性体層7hが形成
される(c)。
Next, referring to FIG. 2, the photosensitive solution exposed by the pattern 1X is removed (a), the non-magnetic material 7 is printed around the removed portion of the photoresist 8h (b), and then the photolithography is performed by etching. When the resist 8h and the nonmagnetic material 7 on the photoresist 8h are removed at the same time, the nonmagnetic material 7 remains in the shape of the pattern 1X, and the nonmagnetic material layer 7h is formed on the outer peripheral portion (c).

【0014】続いてその上にフォトレジスト8iを全面
に塗布し(d)、磁性体層パタ−ン1Yでフォトレジス
ト8iを露光し(e)、パタ−ン1Yで感光した感光液
を除去し(f)、フォトレジスト8iの除去部を中心に
磁性体5を印刷し(g)、その後エッチングによりフォ
トレジスト8iとフォトレジスト8i上の磁性体5とを
除去すると、磁性体5がパタ−ン1Yの形状で残り、前
記コイル導体層6gの半分を覆って磁性体層5hが形成
される(h)。
Subsequently, a photoresist 8i is coated on the entire surface (d), the photoresist 8i is exposed by the magnetic layer pattern 1Y (e), and the photosensitive liquid exposed by the pattern 1Y is removed. (F), the magnetic body 5 is printed around the removed portion of the photoresist 8i (g), and then the photoresist 8i and the magnetic body 5 on the photoresist 8i are removed by etching, the magnetic body 5 is patterned. The magnetic layer 5h is formed so as to remain in the shape of 1Y and cover half of the coil conductor layer 6g (h).

【0015】次に図3において、フォトレジスト8jを
全面に塗布し(a)、コイル導体層のパタ−ン1Zで露
光し(b)、パタ−ンで1Zで感光した感光液を除去す
る(c)。
Next, in FIG. 3, a photoresist 8j is applied to the entire surface (a) and exposed by the pattern 1Z of the coil conductor layer (b), and the photosensitive solution exposed by the pattern 1Z is removed ( c).

【0016】続いて前記フォトレジスト8jの除去部な
いしはその内側にコイル導体6を印刷し(d)、その後
エッチングによりフォトレジスト8jとフォトレジスト
8j上のコイル導体6とを同時に除去すると、コイル導
体6がパタ−ン1Zの形状で残り、コイル導体層6hが
形成される(e)。
Subsequently, the coil conductor 6 is printed on the removed portion or the inside of the photoresist 8j (d), and then the photoresist 8j and the coil conductor 6 on the photoresist 8j are simultaneously removed by etching. Remains in the shape of the pattern 1Z, and the coil conductor layer 6h is formed (e).

【0017】この後、図2(e)〜(h)に準ずる工程
で前記磁性層5hとは反対側に磁性層を形成し、コイル
導体層6hの半分を覆い、その上に、図1(b)〜
(f)に準ずる工程で前記パタ−ン1Wから先端引き出
し部をなくしたパタ−ンでコイル導体層を形成する。
After that, in a process similar to that shown in FIGS. 2E to 2H, a magnetic layer is formed on the side opposite to the magnetic layer 5h to cover half of the coil conductor layer 6h, and the magnetic layer shown in FIG. b) ~
In a step similar to (f), the coil conductor layer is formed by a pattern in which the leading end portion is removed from the pattern 1W.

【0018】さらに図1(g)から上述までの工程を必
要タ−ン数繰り返した後、図3(f)に示すように、他
方の引き出し電極となるコイル導体層6iを形成し、さ
らに図3(g)に示すように非磁性体層7iを形成した
後、図3(h)に示すように他方の端面の磁性体層5i
を形成する。
Further, after repeating the steps from FIG. 1 (g) to the above for the required number of turns, as shown in FIG. 3 (f), a coil conductor layer 6i serving as the other lead electrode is formed, and After forming the non-magnetic layer 7i as shown in FIG. 3 (g), the magnetic layer 5i on the other end face is formed as shown in FIG. 3 (h).
To form.

【0019】このように、フォトレジストの塗布、マス
キング、露光、および現像による感光部の除去工程から
なるフォトリソグラフィ手法を用いて細密なフォトレジ
スト除去部のパタ−ンを形成し、その除去部のみに印刷
した各層が残るようにしたので、各層を幅が100μm
以下の細密パタ−ンで形成することができ、積層型チッ
プ部品等のコイル部品の小型化を図ることができる。
As described above, a fine pattern of the photoresist removing portion is formed by using the photolithography method including the steps of applying the photoresist, masking, exposing and developing to remove the photosensitive portion, and only the removed portion is formed. The width of each layer is 100 μm because each layer printed on
It can be formed by the following fine patterns, and the coil components such as laminated chip components can be downsized.

【0020】また、パタ−ン形成に印刷法製版用のメッ
シュ材のマスクを使用しないので、厚さが10μm程度
の膜厚でも、にじみのないシャ−プなエッヂのパタ−ン
を形成することができ、かつメッシュ材のマスクの伸び
による各層のパタ−ンずれが発生せず、コイル導体層の
ショ−ト等を防止できるので、電気的特性、信頼性が向
上する。 さらに、印刷用製版のパタ−ン形成に用いる
メッシュ材のマスクは次第に伸張するため寿命が限られ
ていたが、フォトリソグラフィ手法で用いるマスクはフ
ィルムのため半永久的に使用ができるため経済的であ
る。
Further, since a mesh mask for printing plate making is not used for pattern formation, a sharp edge pattern without bleeding can be formed even when the film thickness is about 10 μm. In addition, the pattern shift of each layer does not occur due to the elongation of the mask of the mesh material, and the short of the coil conductor layer can be prevented, so that the electrical characteristics and reliability are improved. Further, the mask of the mesh material used for forming the pattern of the printing plate has a limited life because it gradually expands, but the mask used in the photolithography method is economical because it can be used semipermanently because it is a film. .

【0021】[0021]

【発明の効果】請求項1によれば、印刷法に加えて、フ
ォトリソグラフィ手法を併せて用いることにより、各層
のパタ−ンを形成するので、細密なパタ−ンの形成が可
能になりコイル部品を小型化できる。また、単に薄膜形
成技術のみを用いる場合に比べて製造の能率を向上させ
ることができる。さらに、にじみのないシャ−プなエッ
ヂのパタ−ンを形成することが可能になるので、コイル
導体層のショ−ト等を防止し、電気的特性、信頼性等が
向上したコイル部品を得ることができる。
According to the first aspect of the present invention, since the pattern of each layer is formed by using the photolithography method in addition to the printing method, it is possible to form a fine pattern, and the coil can be formed. Parts can be miniaturized. Further, the manufacturing efficiency can be improved as compared with the case where only the thin film forming technique is used. Further, since it is possible to form a sharp edge pattern without bleeding, it is possible to prevent the coil conductor layer from being shorted and obtain a coil component with improved electrical characteristics and reliability. be able to.

【0022】請求項2によれば、磁束の漏れを防止でき
るので、効率のよいコイル部品を得ることができる。
According to the second aspect, since leakage of magnetic flux can be prevented, an efficient coil component can be obtained.

【0023】請求項3によれば、前記方法で積層型チッ
プ部品を製造することにより、電気的特性、信頼性等が
向上した積層型チップ部品を得ることができる。
According to the third aspect, by manufacturing the laminated chip component by the above method, it is possible to obtain the laminated chip component having improved electrical characteristics, reliability and the like.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明によるコイル部品の製造方法の一実施例
の製造工程の一部を示す図である。
FIG. 1 is a diagram showing a part of a manufacturing process of an embodiment of a method for manufacturing a coil component according to the present invention.

【図2】該実施例の製造工程の図1に続く工程を示す図
である。
FIG. 2 is a diagram showing a step that follows the manufacturing step of FIG. 1 in the example.

【図3】該実施例の製造工程の残りの工程を示す図であ
る。
FIG. 3 is a diagram showing the remaining steps of the manufacturing process of the example.

【図4】(A)は本発明の製造方法により作られるコイ
ル部品の一実施例の斜視図、同(B)は(A)のE−E
断面図である。
FIG. 4 (A) is a perspective view of an embodiment of a coil component manufactured by the manufacturing method of the present invention, and FIG. 4 (B) is EE of (A).
FIG.

【図5】従来の厚膜形成技術によるコイル部品の製造工
程図である。
FIG. 5 is a manufacturing process diagram of a coil component by a conventional thick film forming technique.

【符号の説明】[Explanation of symbols]

1W〜1Z 露光部分 5 磁性体 5g〜5i 磁性体層 6 コイル導体 6g〜6i コイル導体層 7 非磁性体 7g〜7i 非磁性体層 8、8g〜8j フォトレジスト 1W-1Z Exposed part 5 Magnetic substance 5g-5i Magnetic substance layer 6 Coil conductor 6g-6i Coil conductor layer 7 Non-magnetic substance 7g-7i Non-magnetic substance layer 8, 8g-8j Photoresist

Claims (3)

【特許請求の範囲】[Claims] 【請求項1】コイル導体と絶縁体とを層状に積層してな
るコイル部品を製造するにあたり、フォトレジスト塗
布、露光、現像によるフォトリソグラフィ手法を用い
て、フォトレジストを全面に塗布し、コイル導体又は絶
縁体形成用のフォトレジストを介して露光、現像後、ほ
ぼ全面にわたってコイル導体又は絶縁体を印刷し、その
後フォトレジスト並びにフォトレジスト上のコイル導体
又は絶縁体を同時に除去して、コイル導体又は絶縁体の
積層パタ−ンを形成することを特徴とするコイル部品の
製造方法。
1. When manufacturing a coil component in which a coil conductor and an insulator are laminated in layers, a photoresist is applied to the entire surface by a photolithography technique such as photoresist application, exposure, and development, and the coil conductor is applied. Alternatively, after exposure and development through a photoresist for forming an insulator, a coil conductor or an insulator is printed on almost the entire surface, and then the photoresist and the coil conductor or the insulator on the photoresist are removed at the same time to obtain a coil conductor or an insulator. A method of manufacturing a coil component, which comprises forming a laminated pattern of an insulator.
【請求項2】請求項1おいて、前記絶縁体として、コイ
ル芯部に磁性体を形成し、コイル外部に非磁性体を形成
することを特徴とするコイル部品の製造方法。
2. The method for manufacturing a coil component according to claim 1, wherein a magnetic material is formed on a coil core portion and a non-magnetic material is formed outside the coil as the insulator.
【請求項3】請求項1または2において、前記コイル部
品が積層型チップ部品であることを特徴とするコイル部
品の製造方法。
3. The method for manufacturing a coil component according to claim 1, wherein the coil component is a laminated chip component.
JP25077792A 1992-08-26 1992-08-26 Manufacture of coil part Withdrawn JPH0677076A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP25077792A JPH0677076A (en) 1992-08-26 1992-08-26 Manufacture of coil part

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP25077792A JPH0677076A (en) 1992-08-26 1992-08-26 Manufacture of coil part

Publications (1)

Publication Number Publication Date
JPH0677076A true JPH0677076A (en) 1994-03-18

Family

ID=17212893

Family Applications (1)

Application Number Title Priority Date Filing Date
JP25077792A Withdrawn JPH0677076A (en) 1992-08-26 1992-08-26 Manufacture of coil part

Country Status (1)

Country Link
JP (1) JPH0677076A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1997000526A1 (en) * 1995-06-17 1997-01-03 Robert Bosch Gmbh Inductive component

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1997000526A1 (en) * 1995-06-17 1997-01-03 Robert Bosch Gmbh Inductive component

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