JPH0674173B2 - Method for producing lead zirconate titanate - Google Patents

Method for producing lead zirconate titanate

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Publication number
JPH0674173B2
JPH0674173B2 JP2255376A JP25537690A JPH0674173B2 JP H0674173 B2 JPH0674173 B2 JP H0674173B2 JP 2255376 A JP2255376 A JP 2255376A JP 25537690 A JP25537690 A JP 25537690A JP H0674173 B2 JPH0674173 B2 JP H0674173B2
Authority
JP
Japan
Prior art keywords
lead
sol solution
film
titanium
zirconium
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2255376A
Other languages
Japanese (ja)
Other versions
JPH04139064A (en
Inventor
秀樹 酒井
敏雄 土谷
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Iwatsu Electric Co Ltd
Original Assignee
Iwatsu Electric Co Ltd
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Publication date
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Priority to JP2255376A priority Critical patent/JPH0674173B2/en
Publication of JPH04139064A publication Critical patent/JPH04139064A/en
Publication of JPH0674173B2 publication Critical patent/JPH0674173B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は圧電磁器材料であるチタ酸ジルコン酸鉛(PZ
T)の製造方法、より詳しくゾル−ゲル法を用いたチタ
ン酸ジルコン酸鉛の製造方法に係る。
DETAILED DESCRIPTION OF THE INVENTION [Industrial Field of Application] The present invention relates to piezoelectric zirconate titanate (PZ) which is a piezoelectric ceramic material.
T), more specifically, a method for producing lead zirconate titanate using a sol-gel method.

〔従来の技術〕[Conventional technology]

従来のPZTの製造方法としては酸化物混合法と、PVD法、
CVD法とがある。
As a conventional PZT manufacturing method, an oxide mixing method, a PVD method,
There is a CVD method.

酸化物混合法は、PdO,ZrO2,TiO2を湿式で混合させ、乾
燥後に乾式でペレット成形したり、バインダ・溶剤を加
えシート成形し、これらを1150℃以上の高温で焼成する
方法である。
The oxide mixing method is a method in which PdO, ZrO 2 and TiO 2 are mixed in a wet manner, dried and then pellet-formed, or a binder / solvent is added to form a sheet, and these are fired at a high temperature of 1150 ° C. or higher. .

また、PVD法としてはスパッタ法、EB蒸着法、イオンプ
レーティング法など、CVD法としては例えばプラズマCVD
法、MOCVD法などを用いる方法などが知られている。
Further, as the PVD method, a sputtering method, an EB vapor deposition method, an ion plating method, etc., and as the CVD method, for example, plasma CVD
Methods using MOCVD, MOCVD, etc. are known.

〔発明が解決しようとする課題〕[Problems to be Solved by the Invention]

酸化物混合法では、PbOの揮散が生じ組成変動が起こる
ため、あらかじめ過剰のPbOを添加したり、PbO雰囲気で
の焼成が不可欠となるが、PbO蒸気圧の制御が困難であ
る。また、粉末混合時のコンタミネーションや凝集粒子
の存在、さらにバインダ除去により空孔がセラミックス
内部に残留し、緻密化が妨げられ圧電特性の劣化が生じ
てしまう問題がある。
In the oxide mixing method, volatilization of PbO occurs and composition change occurs, so it is essential to add excess PbO in advance or to perform firing in a PbO atmosphere, but it is difficult to control the PbO vapor pressure. In addition, there is a problem in that, when powder is mixed, contamination or the presence of agglomerated particles and the removal of the binder leave voids inside the ceramics, which prevents the densification and deteriorates the piezoelectric characteristics.

また、PVD法、CVD法は、緻密な膜は作製できるが、堆積
させる基板を選択しなくてはならない。また、装置の関
係上高価なものとなり、大量生産も不可能である。さら
に気相などを経ているため、組成制御がかなり困難とな
ってしまうなどの問題がある。
Further, although the PVD method and the CVD method can produce a dense film, it is necessary to select a substrate to be deposited. Further, it is expensive due to the device, and mass production is impossible. Further, since it has gone through the gas phase, there is a problem that composition control becomes considerably difficult.

〔課題を解決するための手段〕[Means for Solving the Problems]

本発明は、上気の如き従来技術の欠点を解決するため
に、塩化物及びアルコキシド以外の鉛化合物及びジルコ
ニウム化合物とチタンアルコキシドを原料とし、酢酸及
び水を溶媒としてゾル溶液を作製し、これをゲル化した
後、800℃以下の温度で焼成することを特徴とするチタ
ン酸ジルコン酸鉛の製造方法を提供する。
The present invention, in order to solve the drawbacks of the prior art such as the above-mentioned, using lead compounds other than chlorides and alkoxides and zirconium compounds and titanium alkoxides as raw materials, making a sol solution using acetic acid and water as solvents, Provided is a method for producing lead zirconate titanate, which comprises firing at a temperature of 800 ° C. or lower after gelling.

チタン酸ジルコン酸鉛(PZT)はPb(ZrxTi1-x)O3〔た
だし、0≦x≦1〕で表わされる組成を有する。
Lead zirconate titanate (PZT) has a composition represented by Pb (ZrxTi 1- x) O 3 [where 0 ≦ x ≦ 1].

先ず、PZT原料のゾル溶液を作製する。鉛原料とジルコ
ニウム原料としては塩化物及びアルコキシド以外であれ
ば有機、無機のいずれの化合物でもよい。例えば、鉛原
料として酢酸鉛、硝酸鉛、炭酸鉛、水酸化鉛、酸化鉛、
ステアリン酸鉛、ジルコニウム原料として硝酸ジルコニ
ム、水酸化ジルコニル、ジルコニウムアセチルアセトネ
ートが好ましく使用される。
First, a sol solution of PZT raw material is prepared. The lead raw material and the zirconium raw material may be organic or inorganic compounds other than chlorides and alkoxides. For example, as lead materials, lead acetate, lead nitrate, lead carbonate, lead hydroxide, lead oxide,
Lead stearate and zirconium nitrate, zirconyl hydroxide, and zirconium acetylacetonate are preferably used as zirconium raw materials.

原料に塩化物を用いると、白色沈殿が生じ均一なゾル溶
液が作製できない。ゾル溶液中のPZTモル濃度を低くす
ることでほぼ透明なドライゲルの作製を行うことは可能
であるが、焼成によりPbCl2あるいはPbCl4の針状結晶が
析出し、PZTの熱膨張係数との差が原因と思われるクラ
ックが発生するため均一な膜やパルクが得られない。ま
た、熱処理によっても塩素は完全に飛ばす鉛と反応して
しまうため、塩化物を原料に用いることは避ける。ま
た、鉛やジルコニウムのアルコキシドは、高価であるの
みならず、空気中の水分と容易に反応して白濁し(沈殿
の生成)、均一なゾル溶液(透明溶液)を得ることが容
易でないので本発明では使用しない。
When chloride is used as a raw material, white precipitation occurs and a uniform sol solution cannot be prepared. It is possible to prepare an almost transparent dry gel by lowering the PZT molar concentration in the sol solution, but needle-like crystals of PbCl 2 or PbCl 4 are precipitated by firing, and the difference from the thermal expansion coefficient of PZT A uniform film or parc cannot be obtained because cracks that are thought to be caused are generated. Also, use of chloride as a raw material is avoided because chlorine reacts completely with lead, which is also removed by heat treatment. In addition, lead and zirconium alkoxides are not only expensive, but also easily react with water in the air to become cloudy (precipitation), and it is not easy to obtain a uniform sol solution (clear solution). Not used in the invention.

チタン原料としてはチタソアルコキシドを使用する。こ
のアルコキシドが後に重縮合してゲル化を可能にする。
チタンアルコキシドとしてはチタンブトキシド、チタン
イソプロポキシドが好ましく使用できる。
Titaso alkoxide is used as the titanium raw material. This alkoxide is subsequently polycondensed and allows gelation.
As the titanium alkoxide, titanium butoxide and titanium isopropoxide can be preferably used.

これらの原料は酢酸と水を溶媒とすることによりゾル溶
液を作製することができる。鉛原料、ジルコニウム原料
及びチタン原料は所望のPZT組成に応じて配合し、これ
に酢酸および水を添加して透明なゾル溶液が得られるま
で攪拌する。アルコキシドは加水分解しやすいので最後
に添加するのがよい。酢酸の濃度はPb1モルに対して600
〜1600ml、また原料組成物の濃度は溶液1500〜3000mlに
対し1モルがよい。これらの濃度から外れると、濃い場
合には焼成時に膜やバルク体にクラックが入り、均一な
PZTが作製できない。逆に、薄い場合は膜が薄すぎて成
膜できなくなったり、バルク体では塊りにならず、膜状
になってしまう。
A sol solution can be prepared from these raw materials by using acetic acid and water as solvents. Lead raw material, zirconium raw material and titanium raw material are blended according to a desired PZT composition, and acetic acid and water are added thereto and stirred until a transparent sol solution is obtained. The alkoxide is easily hydrolyzed, so it is better to add it last. The concentration of acetic acid is 600 per mol of Pb
~ 1600 ml, and the concentration of the raw material composition is preferably 1 mol per 1500-3000 ml of the solution. If the concentration is deviated from these concentrations, if the concentration is high, cracks will occur in the film or bulk body during firing, resulting in a uniform
I cannot make PZT. On the other hand, if the film is thin, the film is too thin to form a film, or the bulk body does not lump and becomes a film.

ゾル溶液には溶液の粘度調整及び高安定化のためにエチ
レングリコール類を鉛1.0モルに対し0.5〜2.0モル添
加、攪拌することが望ましい。
In order to adjust the viscosity of the sol solution and to make it highly stable, it is desirable to add 0.5 to 2.0 mol of ethylene glycol to 1.0 mol of lead and stir it.

このゾル溶液をゲル化する第1の方法は、ディップコー
ティング法、スピンコーティング法、超音波コーティン
グ法などの方法で基板上に膜を形成するもので、成膜さ
れるときにゲル化する。また、ゾル溶液は乾燥すること
によってもゲル化する。
The first method of gelling this sol solution is to form a film on a substrate by a method such as a dip coating method, a spin coating method, an ultrasonic coating method, etc., and gels when the film is formed. The sol solution also gels when dried.

そこで、本発明により、ゾル溶液からPZTを製造する第
1の方法は、上記の如く基板上に各種コーティング法で
ゲル膜を製膜した後、800℃以下、好ましくは600〜800
℃の温度で焼成する方法である。
Therefore, according to the present invention, the first method for producing PZT from a sol solution is to form a gel film on a substrate by various coating methods as described above, and then 800 ° C. or lower, preferably 600 to 800.
This is a method of firing at a temperature of ℃.

第2の方法は、ゾル溶液をゆっくり乾燥して(例えば室
温に1週間放置後、35℃で2週間保持)ゲル化させ、得
られたゲル成形体を800℃以下の温度で焼成する方法で
ある。
The second method is a method in which the sol solution is slowly dried (eg, left at room temperature for 1 week and kept at 35 ° C for 2 weeks) to gel, and the obtained gel compact is fired at a temperature of 800 ° C or lower. is there.

〔作用〕[Action]

ゾル−ゲル法を用いたことにより、均一な組成のPZTを
低温で焼成できる。
By using the sol-gel method, PZT having a uniform composition can be fired at a low temperature.

〔実施例〕〔Example〕

第1図にゾル溶液の製作工程のフローチャートを示す。
この図のように、鉛原料とジルコニウム原料を所定量秤
量し、これに酢酸と純水を添加後、溶液が完全に透明に
なるまで攪拌する。次に所定量のチタン原料をビュレッ
ト等を用いて滴下する。この混合溶液に溶液の粘度調整
並びに溶液の高安定性化のためエチレングリコール類を
鉛1.0molに対し0.5〜2.0mol添加し、攪拌することでゾ
ル溶液とする。
FIG. 1 shows a flowchart of the manufacturing process of the sol solution.
As shown in this figure, a lead material and a zirconium material are weighed in predetermined amounts, acetic acid and pure water are added thereto, and the mixture is stirred until the solution becomes completely transparent. Next, a predetermined amount of titanium raw material is dropped using a buret or the like. To adjust the viscosity of the solution and make the solution highly stable, add 0.5 to 2.0 mol of ethylene glycol to 1.0 mol of lead and stir to form a sol solution.

これに石英、ITO、ソーダガラス、Pt等の基板を浸漬さ
せ、5〜15cm/minのスピードで引上げ基板上にゲル膜を
形成させる。この引上げ回数により所望の膜厚を有する
PZT膜を形成させる。ここで引上げ1回当り約0.15μm
の膜厚となり、引上げの操作回数により膜厚が容易に制
御できた。このようにして得た膜試料を試料Aとする。
なお、ここで試料Aはスピンコーティング法や超音波コ
ーティング法による膜でもよく、スピン速度やスプレー
時間により、膜厚の制御が可能である。
Substrates such as quartz, ITO, soda glass, and Pt are immersed in this, and a gel film is formed on the pulled-up substrate at a speed of 5 to 15 cm / min. A desired film thickness is obtained by this number of pulling
A PZT film is formed. About 0.15 μm per pull
And the film thickness could be easily controlled by the number of pulling operations. The film sample thus obtained is referred to as sample A.
Here, the sample A may be a film formed by a spin coating method or an ultrasonic coating method, and the film thickness can be controlled by the spin speed and the spray time.

また、上記作製したゾル溶液を乾燥後500〜800℃で焼成
した粉末試料を試料Bとする。
A powder sample obtained by drying the sol solution prepared above and baking it at 500 to 800 ° C. is referred to as Sample B.

薄膜および粉末X線回折の結果より、試料A・B共に50
0℃からペロブスカイト相が折出しはじめ、600℃の熱処
理によりペロブスカイト単相となった。これにより600
℃以上の熱処理によりPZT単相が得られることが分かっ
た。
From the results of thin film and powder X-ray diffraction, both sample A and B are 50
The perovskite phase began to break out at 0 ° C and became a single perovskite phase by heat treatment at 600 ° C. This gives 600
It was found that the PZT single phase was obtained by heat treatment above ℃.

次に、試料Aについて300〜800nmにおける透過率を測定
した結果、膜厚を約3μmとした場合においても600nm
付近で50%以上の透過率を示した。
Next, as a result of measuring the transmittance of Sample A at 300 to 800 nm, 600 nm is obtained even when the film thickness is about 3 μm.
In the vicinity, it showed a transmittance of 50% or more.

上記の工程で得られたPZTの各組成での誘電率を表1に
示す。
Table 1 shows the dielectric constant of each composition of PZT obtained in the above process.

実施例A−1はPb/Zr/Ti=1/0.52/0.48(mol比)となる
よう酢酸鉛3水和物、硝酸ジルコニル2水和物、チタン
ブトキシドを第1図に示すフローチャートに従いゾル溶
液を作製し、ディップコーティング法でITOを膜付けし
た石英基板に成膜したゲル膜を700℃で焼成した。
Example A-1 is a sol solution of lead acetate trihydrate, zirconyl nitrate dihydrate and titanium butoxide so that Pb / Zr / Ti = 1 / 0.52 / 0.48 (mol ratio) according to the flow chart shown in FIG. Was prepared, and a gel film formed on a quartz substrate coated with ITO by the dip coating method was fired at 700 ° C.

実施例A−2〜A−4はA−1とPb/Zr/Tiの組成比を変
えただけで他は同じ条件で作製した。
Examples A-2 to A-4 were produced under the same conditions except that the composition ratio of A-1 and Pb / Zr / Ti was changed.

実施例A−5〜A−8はA−1〜A−4と成膜まで同一
条件で、750℃にて焼成した試料で、実施例A−9〜A
−12は800℃にて焼成した試料で、比較例A−13〜A−1
6は850℃にて焼成した試料である。
Examples A-5 to A-8 are samples fired at 750 ° C. under the same conditions as A-1 to A-4 until film formation. Examples A-9 to A-8
-12 is a sample baked at 800 ° C., which is Comparative Examples A-13 to A-1.
6 is a sample baked at 850 ° C.

上記表に見られるように、焼成温度が800℃を越える
と、鉛成分が試料中から放出され組成変動が起こり特性
が劣化した。また、この理由のため、800℃までは多少
黄色味を帯びた透光性を有していた試料が800℃以上の
焼成により白色不透明となった。尚、800℃以下の焼成
においては雰囲気の制御を行わない大気中での焼成にも
かかわらず、従来法と同等の特性を示した。ここで、デ
ィップコーティング法、スピンコーティング法、超音波
スプレー法を用いた試料は、いずれも同等の特性を示し
た。
As shown in the above table, when the firing temperature exceeded 800 ° C., the lead component was released from the sample, compositional variation occurred, and the characteristics deteriorated. For this reason, the sample which had a yellowish translucency up to 800 ° C became white and opaque when fired at 800 ° C or higher. It should be noted that in the case of firing at 800 ° C or lower, the same characteristics as those of the conventional method were exhibited despite the firing in the atmosphere without controlling the atmosphere. Here, the samples using the dip coating method, the spin coating method, and the ultrasonic spray method all showed the same characteristics.

尚、本発明によるPZTのMPBは53/47付近の組成であるこ
とが分った。
It was found that the MPB of PZT according to the present invention had a composition near 53/47.

次に各原料を変えた場合の実施例を表2に示す。Next, Table 2 shows an example in which each raw material is changed.

実施例B−1はチタン原料にチタンイソプロポキシドを
用いた例、実施例B−2はジルコニウム原料にジルコニ
ウムアセチルアセトネートを用いた例、実施例B−3〜
B−5は鉛原料にそれぞれ硝酸鉛、炭酸鉛、酸化鉛を用
いた例である。
Example B-1 is an example using titanium isopropoxide as a titanium raw material, Example B-2 is an example using zirconium acetylacetonate as a zirconium raw material, and Examples B-3 to
B-5 is an example in which lead nitrate, lead carbonate, and lead oxide are used as lead raw materials, respectively.

比較例B−6〜B−8は各原料に塩化物を用いた例であ
る。
Comparative Examples B-6 to B-8 are examples in which chloride was used for each raw material.

このように原料に塩化物を用いた場合は、白色沈殿の生
成により透明なゾル溶液を作製できなかった。
Thus, when chloride was used as the raw material, a transparent sol solution could not be prepared due to the formation of white precipitate.

実施例A−6及びB−1〜B−5では透明で均一なPZT
膜を作製することができ、誘電率も1000以上と高い値が
得られた。
In Examples A-6 and B-1 to B-5, transparent and uniform PZT
A film could be prepared and a high dielectric constant of 1000 or more was obtained.

〔発明の効果〕〔The invention's effect〕

以上説明したように、本発明によりゾル−ゲル法を用い
ることによって800℃以下という低温で、雰囲気制御を
せずに従来法と同等の特性を有し、しかも安価で形状の
自由度が大きく、大量生産も可能なPZTが製造できると
いう効果がある。
As described above, by using the sol-gel method according to the present invention, at a low temperature of 800 ° C. or less, it has the same characteristics as the conventional method without controlling the atmosphere, and is inexpensive and has a large degree of freedom in shape. The effect is that PZT that can be mass-produced can be manufactured.

【図面の簡単な説明】[Brief description of drawings]

第1図は本発明によるゾル溶液の作製工程を示すフロー
チャートである。
FIG. 1 is a flow chart showing the steps for producing a sol solution according to the present invention.

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】塩化物及びアルコキシド以外の鉛化合物及
びジルコニウム化合物とチタンアルコキシドを原料と
し、酢酸及び水を溶媒としてゾル溶液を作製し、これを
ゲル化した後、800℃以下の温度で焼成することを特徴
とするチタン酸ジルコン酸鉛の製造方法。
1. A lead compound other than chloride and alkoxide, a zirconium compound, and a titanium alkoxide are used as raw materials to prepare a sol solution using acetic acid and water as a solvent. The sol solution is gelled and then fired at a temperature of 800 ° C. or lower. A method for producing lead zirconate titanate, which comprises:
【請求項2】鉛化合物として酢酸鉛、硝酸鉛、炭酸鉛、
水酸化鉛、酸化鉛、ステアリン酸鉛のいずれか、ジルコ
ニウム化合物として硝酸ジルコニル、水酸化ジルコニ
ル、ジルコニウムアセチルアセトネートのいずれか、チ
タンアルコキシドとしてチタンブトキシド、チタンイソ
プロポキシドのいずれかを用いる請求項1記載の方法。
2. A lead compound as lead acetate, lead nitrate, lead carbonate,
Use of any one of lead hydroxide, lead oxide and lead stearate, any one of zirconyl nitrate, zirconyl hydroxide and zirconium acetylacetonate as a zirconium compound, and any one of titanium butoxide and titanium isopropoxide as a titanium alkoxide. The method described.
JP2255376A 1990-09-27 1990-09-27 Method for producing lead zirconate titanate Expired - Fee Related JPH0674173B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2255376A JPH0674173B2 (en) 1990-09-27 1990-09-27 Method for producing lead zirconate titanate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2255376A JPH0674173B2 (en) 1990-09-27 1990-09-27 Method for producing lead zirconate titanate

Publications (2)

Publication Number Publication Date
JPH04139064A JPH04139064A (en) 1992-05-13
JPH0674173B2 true JPH0674173B2 (en) 1994-09-21

Family

ID=17277909

Family Applications (1)

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JPH06305713A (en) * 1993-04-16 1994-11-01 Texas Instr Japan Ltd Formation of ferroelectric film by sol-gel method and production of capacitor, and raw material solution therefor
EP0913359A4 (en) * 1996-07-17 1999-10-20 Citizen Watch Co Ltd Ferroelectric element and process for producing the same
KR100416760B1 (en) * 2001-03-12 2004-01-31 삼성전자주식회사 Method for preparing a thick coating of PZT using sol-gel process
SG115500A1 (en) * 2002-10-09 2005-10-28 Inst Materials Research & Eng Method to produce a reliable piezoelectric thick film on a substrate

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JPS62162670A (en) * 1986-01-09 1987-07-18 住友金属鉱山株式会社 Manufacture of lead zirconate titanate sintered body

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