JPH0669086A - Semiconductor device - Google Patents

Semiconductor device

Info

Publication number
JPH0669086A
JPH0669086A JP21757392A JP21757392A JPH0669086A JP H0669086 A JPH0669086 A JP H0669086A JP 21757392 A JP21757392 A JP 21757392A JP 21757392 A JP21757392 A JP 21757392A JP H0669086 A JPH0669086 A JP H0669086A
Authority
JP
Japan
Prior art keywords
wafer
fuse
fuse element
output
test
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP21757392A
Other languages
Japanese (ja)
Other versions
JP2792356B2 (en
Inventor
Akihito Tanaka
章仁 田中
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp filed Critical NEC Corp
Priority to JP21757392A priority Critical patent/JP2792356B2/en
Publication of JPH0669086A publication Critical patent/JPH0669086A/en
Application granted granted Critical
Publication of JP2792356B2 publication Critical patent/JP2792356B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Design And Manufacture Of Integrated Circuits (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)

Abstract

PURPOSE:To determine the position of a chip inside a wafer by detecting the state of a fuse element which can be cut being matched to the position of the chip and outputting it externally. CONSTITUTION:By cutting a fuse element 1 according to the position of a chip inside a wafer, the output of a 2-input NAND gate 7 changes according to the state of the fuse element 1 when a TEST signal is set to a high level and the output signal is output externally, thus determining the position inside the wafer.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は半導体装置に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a semiconductor device.

【0002】[0002]

【従来の技術】半導体装置において、1枚のウェーハか
ら多くの良品を得ることが、すなわちコスト低減につな
がっている。そこでチップの大きさをできるだけ小さく
設計する努力がなされている。しかし、小さくするとい
っても必要最小限の回路は入れなければならない。また
ダイナミックラムのように3年で容量が4倍になるよう
なものでは限界がある。そこでウェーハのサイズを大き
くすることで、1枚当たりに作れるチップの数を増やす
ことも行なわれている。しかし、ウェーハのサイズを大
きくすることは技術的に難かしく、現在8インチのウェ
ーハが量産に使用されはじめたところである。
2. Description of the Related Art In a semiconductor device, obtaining many non-defective products from one wafer leads to cost reduction. Therefore, efforts are being made to design the size of the chip as small as possible. However, even if it is made small, the minimum necessary circuit must be included. In addition, there is a limit in the case where the capacity is quadrupled in three years like Dynamic Ram. Therefore, by increasing the size of the wafer, the number of chips that can be produced per wafer is also increased. However, it is technically difficult to increase the size of the wafer, and 8-inch wafers are currently being used for mass production.

【0003】さらに単純にウェーハを大きくするだけで
は良品数は増えない。それはウェーハが大きくなればな
る程、均一な面を作り出すのが難かしくなるからであ
る。また製造中での温度変化等により、ウェーハが反る
などして面が不均一になってしまう。そのため、ウェー
ハ面内でトランジスタ特性などにバラツキが生じてしま
う。図4に示すようにウェーハ100内に多数の半導体
チップ領域101があるが、半導体チップに図示しない
識別マークを設けてウェーハ内の位置をある程度知り、
不良分布をとるなどの生産管理に役立てることができる
ようになっている。
Further, simply increasing the size of the wafer does not increase the number of non-defective products. The larger the wafer, the more difficult it is to create a uniform surface. In addition, due to temperature changes during manufacturing, the surface of the wafer becomes non-uniform due to warping of the wafer. Therefore, variations occur in transistor characteristics and the like within the wafer surface. As shown in FIG. 4, there are a large number of semiconductor chip regions 101 in the wafer 100, but the semiconductor chip is provided with an identification mark (not shown) so that the position within the wafer can be known to some extent.
It can be used for production control such as defect distribution.

【0004】[0004]

【発明が解決しようとする課題】この従来の半導体装置
では、識別マークが半導体チップに設けられているが、
組立後では再度チップを露出させないかぎりウェーハ内
での位置を知ることができず不便であった。
In this conventional semiconductor device, the identification mark is provided on the semiconductor chip.
After assembly, it was inconvenient because the position in the wafer could not be known unless the chip was exposed again.

【0005】[0005]

【課題を解決するための手段】本発明の半導体装置は、
一端を固定電位供給端に接続されたヒューズ素子および
テスト信号を受けて前記ヒューズ素子の他端の電位レベ
ルに応じた検出信号を発生するヒューズ・テスト回路か
らなる識別信号発生手段が半導体チップに設けられてい
るというものである。
The semiconductor device of the present invention comprises:
A semiconductor chip is provided with an identification signal generating means including a fuse element having one end connected to a fixed potential supply terminal and a fuse test circuit that receives a test signal and generates a detection signal according to the potential level of the other end of the fuse element. It is said that it is being done.

【0006】[0006]

【実施例】図1を参照すると本発明の第1の実施例はヒ
ューズ素子1とヒューズ・テスト回路2とが各半導体チ
ップにひとつづつ設けられている。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Referring to FIG. 1, in a first embodiment of the present invention, a fuse element 1 and a fuse test circuit 2 are provided for each semiconductor chip.

【0007】ヒューズ素子はポリシリコン膜などのヒュ
ーズ本体の両端にアルミニウム膜などの電極を設けたも
ので、冗長回路などに用いられるものと同様のものでよ
い。必要に応じてポリシリコン膜にレーザ光などを照射
して切断する。ヒューズ素子の一端は電源端子Vccに
接続され、他端はヒューズ・テスト回路2に接続され
る。ヒューズ・テスト回路2の入力端(ヒューズ素子の
他端)はエンハンスメント型のMOST3を介して接地
端に接続される。入力端の電位はインバータ4を介して
MOST3のゲートに供給されるとともに、インバータ
5,6を経て2入力NANDゲート7に供給される。2
入力NANDゲート7にはテスト信号TESTが供給さ
れる。
The fuse element is one in which electrodes such as an aluminum film are provided on both ends of a fuse body such as a polysilicon film and may be the same as that used for a redundant circuit or the like. If necessary, the polysilicon film is irradiated with laser light or the like to be cut. One end of the fuse element is connected to the power supply terminal Vcc, and the other end is connected to the fuse test circuit 2. The input end (the other end of the fuse element) of the fuse test circuit 2 is connected to the ground end via the enhancement-type MOST 3. The potential at the input end is supplied to the gate of the MOST 3 via the inverter 4 and is also supplied to the 2-input NAND gate 7 via the inverters 5 and 6. Two
The test signal TEST is supplied to the input NAND gate 7.

【0008】たとえばウェーハ内の領域を2つに分けて
区別するため、第1の領域にある半導体チップのヒュー
ズ素子1を溶断せず、第2の領域では溶断するようにし
ておいたとすると、第1の領域のチップでは接点Aの電
位は常にハイレベルに固定されている。ここでヒューズ
素子の状態を知りたい時、図2に示すようにテスト信号
TESTをロウレベルからハイレベルに変化させると、
インバータ4の出力は常にロウレベルになっているの
で、2入力NANDゲート7により出力信号WADDは
ロウレベルからハイレベルに変化する。第2の領域のチ
ップの場合には、接点Aの電位はロウレベルに固定され
るので、テスト信号がロウレベルからハイレベルに変化
すると、インバータ4の出力は常にハイレベルなので2
入力NANDゲート7の出力WADDはロウレベルであ
る。このWADD信号を出力ピン(外部端子)より出力
することにより、半導体チップがウェーハのどの領域に
あったかがわかる。
For example, if the fuse element 1 of the semiconductor chip in the first region is not blown but is blown in the second region in order to divide the region in the wafer into two regions, In the chip in the first region, the potential of the contact A is always fixed at high level. When it is desired to know the state of the fuse element, if the test signal TEST is changed from low level to high level as shown in FIG.
Since the output of the inverter 4 is always at the low level, the output signal WADD changes from the low level to the high level by the 2-input NAND gate 7. In the case of the chip in the second region, the potential of the contact A is fixed to the low level, so that when the test signal changes from the low level to the high level, the output of the inverter 4 is always at the high level.
The output WADD of the input NAND gate 7 is at a low level. By outputting this WADD signal from the output pin (external terminal), it is possible to know which region of the wafer the semiconductor chip was on.

【0009】一般に、図1の回路を半導体チップにn個
設け、n個の出力ピンに出力させるようにすればヒュー
ズ素子を切る、切らないの組合わせで、2n 通りの識別
信号をうることができ、半導体チップが存在していたウ
ェーハ内の領域を細分して知ることができる。
In general, if n circuits of FIG. 1 are provided on a semiconductor chip and are output to n output pins, 2 n kinds of identification signals can be obtained by a combination of cutting and non-cutting fuse elements. Therefore, it is possible to subdivide and know the region in the wafer where the semiconductor chip was present.

【0010】なお、テスト信号は入力ピンから半導体チ
ップのボンディングパッドを経てヒューズ・テスト回路
に供給されるようにしてもよいし、テスト回路を内蔵し
ている半導体装置ではテスト回路から供給されるように
してもよい。
The test signal may be supplied from the input pin to the fuse test circuit via the bonding pad of the semiconductor chip, or may be supplied from the test circuit in a semiconductor device having a built-in test circuit. You may

【0011】図3を参照すると、本発明の第2の実施例
は2つのヒューズ素子1a,1bと2つのヒューズ・テ
スト回路2a,2bとを有している。ヒューズ・テスト
回路2aでは、テスト信号TESTは、カウンタ回路8
aを介して2入力NANDゲート7aに加えられる。ま
た、カウンタ回路8aの出力信号は、ヒューズ・テスト
回路2bのテスト信号となり、カウンタ回路8bを介し
て2入力NANDゲート7bに加えられる。2入力NA
NDゲート7a,7bの出力端は共通接続されている信
号WADDを供給する。
Referring to FIG. 3, the second embodiment of the present invention has two fuse elements 1a and 1b and two fuse test circuits 2a and 2b. In the fuse test circuit 2a, the test signal TEST outputs the counter circuit 8
It is applied to the 2-input NAND gate 7a via a. The output signal of the counter circuit 8a becomes the test signal of the fuse test circuit 2b and is applied to the 2-input NAND gate 7b via the counter circuit 8b. 2 input NA
The output terminals of the ND gates 7a and 7b supply the commonly connected signal WADD.

【0012】ウェーハ内の領域を4つに分けて識別する
場合、例えば第1の領域ではヒューズ素子1a,1bを
ともに溶断せず、第2の領域ではヒューズ素子1aは切
るが、ヒューズ1bは切らない、第3の領域では1aは
切らないが、1bは切る、第4の領域では1a,1b共
切るようにしてあったとする。第2の領域の半導体チッ
プでは接点Bはハイレベル、接点Cはロウレベルに固定
される。ここでヒューズ素子の状態を知るためにテスト
信号TESTをロウレベルからハイレベルに変化させる
と、カウンタ回路8aの出力接点Dがハイレベルになる
ようにしておけば、インバータ6の出力はロウレベルで
あるから、2入力NANDゲート7aの出力信号はロウ
レベルからハイレベルに変化する。また接点Dがハイレ
ベルに変化することにより、カウンタ回路8bが動作し
て出力接点Eがハイレベルになり、インバータ6bの出
力がハイレベルになっているので、2入力NANDゲー
ト7bの出力信号はロウレベルに変化する。カウンタ回
路8a,8bのビット数に差をつけなるなどの手段によ
り遅延時間に差をつけて出力させるようにしておけば、
1つの出力ピン(WADD)からヒューズ素子1a,1
bの状態を知ることができる利点がある。なお、カウン
タ8aは必ずしも必要ではなくテスト信号TESTを直
接2入力NANDゲート7aに加えてもよい。
When the wafer region is divided into four regions for identification, for example, both the fuse elements 1a and 1b are not blown in the first region, and the fuse element 1a is cut in the second region, but the fuse 1b is not cut. It is assumed that 1a is not cut in the third region, but 1b is cut in the third region, and both 1a and 1b are cut in the fourth region. In the semiconductor chip in the second region, the contact B is fixed at high level and the contact C is fixed at low level. If the test signal TEST is changed from low level to high level in order to know the state of the fuse element, the output of the inverter 6 is low level if the output contact D of the counter circuit 8a is set to high level. The output signal of the 2-input NAND gate 7a changes from low level to high level. Further, when the contact D changes to the high level, the counter circuit 8b operates, the output contact E becomes the high level, and the output of the inverter 6b becomes the high level. Therefore, the output signal of the 2-input NAND gate 7b becomes Change to low level. If the delay times are made different by means such as making the bit numbers of the counter circuits 8a and 8b different,
From one output pin (WADD) to the fuse elements 1a, 1
There is an advantage that the state of b can be known. The counter 8a is not always necessary, and the test signal TEST may be directly applied to the 2-input NAND gate 7a.

【0013】[0013]

【発明の効果】以上説明したように本発明は、レーザ光
等により切断可能なヒューズ素子およびその切断の有無
を電気的に検出して識別信号を発生する手段を半導体チ
ップに設けたので、ウェーハ内での位置に応じて切断し
ておくことにより、テスト信号を入力することで前記ヒ
ューズ素子の切断の有無を検知し、ウェーハ内で半導体
チップの位置を組立後においても知ることができる。
As described above, according to the present invention, the semiconductor chip is provided with the fuse element which can be cut by the laser beam or the like and the means for electrically detecting the presence or absence of the cut and generating the identification signal. By cutting according to the position within the wafer, it is possible to detect whether or not the fuse element is cut by inputting a test signal, and to know the position of the semiconductor chip within the wafer even after assembly.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の第1の実施例を示す回路図である。FIG. 1 is a circuit diagram showing a first embodiment of the present invention.

【図2】図1の回路の動作のタイムチャートである。FIG. 2 is a time chart of the operation of the circuit of FIG.

【図3】本発明の第2の実施例を示す回路図である。FIG. 3 is a circuit diagram showing a second embodiment of the present invention.

【図4】従来例のウェーハの平面図である。FIG. 4 is a plan view of a conventional wafer.

【符号の説明】[Explanation of symbols]

1,1a,1b ヒューズ素子 2,2a,2b ヒューズ・テスト回路 3,3a,3b MOST 4,4a,4b インバータ 5,5a,5b インバータ 6,6a,6b インバータ 7,7a,7b インバータ 8a,8b カウンタ 1, 1a, 1b Fuse element 2, 2a, 2b Fuse test circuit 3, 3a, 3b MOST 4, 4a, 4b Inverter 5, 5a, 5b Inverter 6, 6a, 6b Inverter 7, 7a, 7b Inverter 8a, 8b Counter

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】 一端を固定電位供給端に接続されたヒュ
ーズ素子およびテスト信号を受けて前記ヒューズ素子の
他端の電位レベルに応じた検出信号を発生するヒューズ
・テスト回路からなる識別信号発生手段が半導体チップ
に設けられていることを特徴とする半導体装置。
1. An identification signal generating means comprising a fuse element having one end connected to a fixed potential supply terminal and a fuse test circuit for receiving a test signal and generating a detection signal according to the potential level of the other end of the fuse element. Is provided on a semiconductor chip.
JP21757392A 1992-08-17 1992-08-17 Semiconductor device Expired - Lifetime JP2792356B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP21757392A JP2792356B2 (en) 1992-08-17 1992-08-17 Semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP21757392A JP2792356B2 (en) 1992-08-17 1992-08-17 Semiconductor device

Publications (2)

Publication Number Publication Date
JPH0669086A true JPH0669086A (en) 1994-03-11
JP2792356B2 JP2792356B2 (en) 1998-09-03

Family

ID=16706395

Family Applications (1)

Application Number Title Priority Date Filing Date
JP21757392A Expired - Lifetime JP2792356B2 (en) 1992-08-17 1992-08-17 Semiconductor device

Country Status (1)

Country Link
JP (1) JP2792356B2 (en)

Also Published As

Publication number Publication date
JP2792356B2 (en) 1998-09-03

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