JPH0667465B2 - Processing method of work piece - Google Patents
Processing method of work pieceInfo
- Publication number
- JPH0667465B2 JPH0667465B2 JP1174022A JP17402289A JPH0667465B2 JP H0667465 B2 JPH0667465 B2 JP H0667465B2 JP 1174022 A JP1174022 A JP 1174022A JP 17402289 A JP17402289 A JP 17402289A JP H0667465 B2 JPH0667465 B2 JP H0667465B2
- Authority
- JP
- Japan
- Prior art keywords
- liquid
- temperature
- pipe
- temperature control
- container
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J19/0006—Controlling or regulating processes
- B01J19/002—Avoiding undesirable reactions or side-effects, e.g. avoiding explosions, or improving the yield by suppressing side-reactions
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Coating Apparatus (AREA)
- Feeding, Discharge, Calcimining, Fusing, And Gas-Generation Devices (AREA)
Description
【発明の詳細な説明】 本発明は液体処理装置、特にフォトレジストを一定温度
で注入するシステム、とりわけ固体撮像素子のウェーハ
へのゼラチン塗布に好適なフォトレジスト定温注入シス
テムに関するものである。The present invention relates to a liquid processing apparatus, in particular, a system for injecting a photoresist at a constant temperature, and more particularly to a photoresist constant temperature injection system suitable for coating gelatin on a wafer of a solid-state image pickup device.
一般に固体撮像素子には、色分解フィルタとして一種の
フォトレジストであるゼラチンが使用されており、この
ゼラチンはウェーハ上にに形成された絵素上に回転塗布
法により被着形成される。そして、このゼラチンは、約
25℃程度の常温でゲル状態を呈しているため、約25℃以
上に温め、ゾル状態にしておかなければ塗布できない。
さらにゼラチンは、またウェーハも塗布膜厚が均一で膜
欠点もない良好な塗布を行うためには所定の温度に温調
する必要がある。Generally, a solid-state image pickup device uses gelatin, which is a kind of photoresist, as a color separation filter, and this gelatin is formed on a pixel formed on a wafer by spin coating. And this gelatin is about
Since it is in a gel state at room temperature of about 25 ℃, it cannot be applied unless it is warmed to about 25 ℃ or higher and kept in the sol state.
Further, gelatin has a uniform coating film thickness on the wafer, and it is necessary to control the temperature to a predetermined temperature in order to perform favorable coating without film defects.
これらの条件を踏まれた従来のゼラチン塗布システムを
第１図に示す。同図において、従来のシステムは、恒温
槽1,ヒータ2,温度センサ3,攪拌器４および温度調節器５
により恒温に温調される液体６に、ゼラチン７の収容容
器８が入れられた加圧容器９を浸け、ゼラチン７をゾル
状態にしておくとともに、一定温度に保温させる。また
恒温槽１から塗布室10までの注入系を内部に注入管11が
通された弗素樹脂製チューブ12と、この外部を覆った断
熱材13と、これとチューブ12との間に入れられたヒータ
14および温度センサ15と、温度調節器16とにより温調
し、ゼラチン７を一定温度で吐出させる。さらに図示し
ないファンと、ヒータおよびフィルタとからなるファン
ヒータユニットとにより、温風17をダクト18を通じて塗
布室10へ送り込み、回転するように構成されているチャ
ック19に吸着されたウェーハ20を一定温度に加熱するよ
うになっている。なお、21は廃液回収器、22はウェーハ
20の回転時に発生するゼラチン飛沫吸引用ブロア、23は
ゼラチンを吐出させるための所定の圧力に制御されたN2
ガス、24はフィルタ、25,26は注入管11の開閉，吐出側
ゼラチンのサックバック用ベローズである。FIG. 1 shows a conventional gelatin coating system that has been subjected to these conditions. In the figure, the conventional system includes a constant temperature bath 1, a heater 2, a temperature sensor 3, an agitator 4 and a temperature controller 5.
The pressure vessel 9 in which the container 8 for the gelatin 7 is placed is dipped in the liquid 6 whose temperature is regulated by the constant temperature to keep the gelatin 7 in the sol state and keep it at a constant temperature. Further, the injection system from the constant temperature bath 1 to the coating chamber 10 was inserted between the tube 12 made of a fluororesin, the tube 12 made of a fluororesin having an injection tube 11 passed through it, the heat insulating material 13 covering the outside thereof, and the tube 12. heater
The temperature is controlled by 14 and the temperature sensor 15 and the temperature controller 16, and the gelatin 7 is discharged at a constant temperature. Further, a fan (not shown) and a fan heater unit including a heater and a filter blow hot air 17 into the coating chamber 10 through the duct 18, and the wafer 20 attracted to the chuck 19 configured to rotate is kept at a constant temperature. It is designed to heat up. 21 is a waste liquid recovery device, 22 is a wafer
A blower for sucking gelatin droplets generated when rotating 20. 23 is N 2 controlled to a predetermined pressure for discharging gelatin.
Gas, 24 is a filter, 25 and 26 are bellows for opening and closing the injection pipe 11 and sucking back the gelatin on the discharge side.
このように構成された従来システムは、ゼラチン注入系
の温調方法に問題があった。すなわち、温度調節器５の
設定温度とゼラチン７の吐出温度とが異なるため、吐出
液温調整が不便であった。また塗布室10内のゼラチン温
度を調節できないという欠点もあった。さらにこのた
め、ウェーハ加熱用温風を塗布室10へ送り込まなければ
注入管11の末端からゼラチンが凝固してくる問題もあっ
た。The conventional system configured as described above has a problem in the temperature control method of the gelatin injection system. That is, since the set temperature of the temperature controller 5 and the discharge temperature of the gelatin 7 are different, adjusting the discharge liquid temperature is inconvenient. Further, there is a drawback that the gelatin temperature in the coating chamber 10 cannot be adjusted. For this reason, there is also a problem that gelatin is coagulated from the end of the injection pipe 11 unless hot air for heating the wafer is sent to the coating chamber 10.
したがって本発明は、上述した従来技術の問題点を解消
するためになされたものであり、その目的とするところ
は、注入系の末端まで温調できるフォトレジスト定温注
入システムを提供することにある。Therefore, the present invention has been made in order to solve the above-mentioned problems of the prior art, and an object thereof is to provide a photoresist constant temperature injection system capable of controlling the temperature to the end of the injection system.
このような目的を達成するために本発明は、固定台に設
置された被加工物に対して吐出するための処理液を収す
る収容容器と、該収容容器から上記処理液を上記被加工
物に供給するための第１の管と、該第１の管の上記処理
液の吐出部分先端近傍から所定の部分まで覆う第１の部
分と上記吐出部分先端近傍の位置で該第１の部分と接続
されて上記第１の管を内部に配置しない第２の部分とか
らなる第の管と、上記第２の部分に設けられ、上記第１
の管の外側と上記第２の管の内側に上記処理液の温度を
調節するための温度調節用液体を流動させるためのポン
プと、該温度調節用液体の温度を制御するための温度調
節機とを備えた液体処理装置を用いた被加工物の処理方
法において、上記温度調節機は上記温度調節用液体の温
度に応じて該温度調節用液体を加熱制御し、上記ポンプ
は加熱制御された上記温度調節用液体を上記第１の管の
外側と上記第２の管の内側に流し、上記第１の管の中の
上記処理液の温度を上記吐出部分先端近傍まで調節し、
上記処理液を上記被加工物に対して吐出することを特徴
とする被加工物の処理方法とし、更に、上記ポンプは、
上記吐出部分先端近傍から上記収容容器の方向へ上記温
度調節用液体を流動させるようにしたことを特徴とする
被加工物の処理方法とし、更に、上記液体処理装置は更
に上記温度調節用液体を収容する温度調節容器を有し、
かつ、上記第１の管は、上記温度調節容器の中で上記第
２の管の内側から外側に出る構造を有することを特徴と
する被加工物の処理方法とし、更に、上記液体処理装置
は、更にに上記温度調節用液体を収容する温度調節容器
を有し、かつ、上記処理液を収容する収容容器は、上記
温度調節容器中に設けられる構造を有することを特徴と
する被加工物の処理方法とし、更に、上記被加工物に塗
布される処理液はフォトレジストである被加工物の処理
方法とし、更に、上記被加工物に塗布される処理液はゼ
ラチンである被加工物の処理方法とし、更に、上記被加
工物は、ウェーハである被加工物の処理方法とした。In order to achieve such an object, the present invention provides a storage container for storing a processing liquid to be discharged onto a workpiece placed on a fixed base, and the processing liquid from the storage container to the workpiece. A first tube for supplying to the first tube, a first section for covering a predetermined portion from the vicinity of the discharge portion tip of the processing liquid of the first tube, and the first portion at a position near the discharge section tip. A second pipe that is connected to the second pipe and does not have the first pipe therein; and a second pipe that is provided in the second portion.
Pump for flowing the temperature control liquid for controlling the temperature of the treatment liquid to the outside of the pipe and the inside of the second pipe, and a temperature controller for controlling the temperature of the temperature control liquid. In the method of processing a workpiece using a liquid processing apparatus including: the temperature controller controls heating of the temperature controlling liquid according to the temperature of the temperature controlling liquid, and the pump controls heating. The temperature adjusting liquid is caused to flow to the outside of the first pipe and the inside of the second pipe, and the temperature of the treatment liquid in the first pipe is adjusted to near the tip of the discharge portion,
A method for treating a workpiece, characterized in that the treatment liquid is discharged to the workpiece, and further, the pump is
A method for treating a workpiece, wherein the temperature control liquid is caused to flow from the vicinity of the tip of the discharge portion toward the storage container, and further, the liquid processing apparatus further applies the temperature control liquid. Has a temperature control container to accommodate,
And the said 1st pipe | tube has the structure which goes out from the inner side of the said 2nd pipe | tube in the said temperature control container, It is a processing method of the to-be-processed object, Furthermore, the said liquid processing apparatus is And a temperature control container for further storing the temperature control liquid, and a storage container for storing the processing liquid has a structure provided in the temperature control container. A processing method, wherein the processing liquid applied to the workpiece is a photoresist, and the processing liquid applied to the workpiece is gelatin. In addition, the processing object is a processing method of the processing object which is a wafer.
以下、図面を用いて本発明の実施例を詳細に説明する。Hereinafter, embodiments of the present invention will be described in detail with reference to the drawings.
第２図は本発明によるフォトレジスト定温注入システム
の一例を示す断面構成図であり、第１図と同符号は同一
要素となるのでその説明は省略する。第２図において、
恒温槽１から塗布室10を経由し、再び恒温槽１までポン
プ27を通してチューブ28が配管されている。そして、こ
のチューブ28の内部にはゼラチン７の注入管11が塗布室
10まで通されている。また塗布室10内のゼラチン吐出部
分は第３図に要部断面図で示すような構造を湯してい
る。すなわち、第３図において、29はコネクタであり、
このコネクタ29には前記チューブ28が通常用いられてい
るチューブ継手30により接続されている。また、前記注
入管11の先端はフランジ加工され、コネクタ29の一端に
ねじ込まれるノズル31により、コネクタ29に締付固定さ
れている。なお、32はシール材である。FIG. 2 is a cross-sectional configuration diagram showing an example of a photoresist constant temperature injection system according to the present invention, and the same reference numerals as those in FIG. In FIG.
A tube 28 is piped from the constant temperature bath 1 through the coating chamber 10 to the constant temperature bath 1 again through a pump 27. Inside the tube 28, a gelatin 7 injection tube 11 is provided.
It is threaded through 10. Further, the gelatin discharging portion in the coating chamber 10 has a structure as shown in FIG. That is, in FIG. 3, 29 is a connector,
The tube 28 is connected to the connector 29 by a tube joint 30 which is normally used. The tip of the injection pipe 11 is flanged and is fixed to the connector 29 by a nozzle 31 screwed into one end of the connector 29. In addition, 32 is a sealing material.
このように配管された注入系において、ポンプ27を作動
させることにより、恒温槽１内に液体６が注入管11のま
わりを包むようにしてチューブ28とコネクタ29とを循環
する。一方、液体６は前述したように恒温となるように
常時加熱温調されている。したがって、この定温注入シ
ステムによれば、収入容器８内のゼラチン７の温度を一
定に保つと同時に注入管11内のゼラチン温度も一定に保
つことが出来る。また、液体６の温度はそのまま収容容
器８および注入管11内のゼラチン温度となるため、温度
調節器５の設定温度とゼラチン吐出温度とが同一とな
る。In the injection system thus piped, by operating the pump 27, the liquid 6 wraps around the injection pipe 11 in the constant temperature bath 1 and circulates through the tube 28 and the connector 29. On the other hand, the liquid 6 is constantly heated and controlled so as to have a constant temperature as described above. Therefore, according to this constant temperature injection system, it is possible to keep the temperature of the gelatin 7 in the income container 8 constant and at the same time keep the gelatin temperature in the injection pipe 11 constant. Further, since the temperature of the liquid 6 becomes the gelatin temperature in the storage container 8 and the injection pipe 11 as it is, the set temperature of the temperature controller 5 and the gelatin discharge temperature become the same.
このように、温度調節機５の設定温度とゼラチン吐出温
度とが同一になるように温度調節できるのは、上述のい
わば２重の管状にした部分で、一定温度の温度調整用の
液体が、処理液を包むようにながれることにより処理液
の温度変化を極めて少なくすることが出来るからであ
る。すなわち、温度調整用の液体は基本的に温度が変化
しないように制御される。よって、温度調整用の液体は
温度変化による対流等は、期待出来ず、循環用のポンプ
を設けることが必須となる。In this way, the temperature can be adjusted so that the set temperature of the temperature controller 5 and the gelatin discharge temperature are the same, that is, the so-called double tubular portion, where the liquid for temperature adjustment at a constant temperature is This is because the temperature change of the treatment liquid can be extremely reduced by wrapping the treatment liquid. That is, the temperature adjusting liquid is basically controlled so that the temperature does not change. Therefore, the liquid for temperature adjustment cannot be expected to have convection due to temperature change, and it is essential to provide a pump for circulation.
また、処理液の注入管11と容器８とを同じ液体６で温度
調節しているので、或いは、それらを共通の温度制御系
２、３及び５で温度調整しているので、温度制御性が良
い。ポンプ27は注入管が内側に挿入されていないチュー
ブ28の部分に取り付けられているため、取付けが簡単で
ある。Further, since the temperature of the treatment liquid injection pipe 11 and the container 8 is adjusted by the same liquid 6, or the temperature of them is adjusted by the common temperature control systems 2, 3 and 5, the temperature controllability is improved. good. Since the pump 27 is attached to the part of the tube 28 in which the injection tube is not inserted inside, the installation is easy.
また、チューブ28が注入管11を包含する二重管構造から
チューブ28だけの単管にする位置は、第２図、第３図に
示すように、チューブ28の端部でなく、チューブ28の途
中であり、チューブ28をＴ字状に分岐させて二重管から
単管にしているので構造が簡単であり、また、処理液を
被加工物に供給するときの邪魔になることもない。Further, as shown in FIGS. 2 and 3, the position where the tube 28 is changed to a single tube from the double tube structure including the injection tube 11 is not the end of the tube 28 but the tube 28. In the middle of the process, the tube 28 is branched into a T-shape so that the double pipe is changed to a single pipe, so that the structure is simple and there is no hindrance when the processing liquid is supplied to the workpiece.
以上説明したように本発明によれば、温度調節器の設定
温度通りに制御された液体で、収容容器内から吐出部ま
でにわたってゼラチン温調することができるので、吐出
液温度調整が簡単となり、かつ吐出先端からのゼラチン
の凝固が全く起らなくなるなどの極めて優れた効果が得
られる。As described above, according to the present invention, the temperature of the liquid is controlled according to the set temperature of the temperature controller, and the gelatin temperature can be adjusted from the inside of the container to the discharge portion, so that the discharge liquid temperature can be adjusted easily. In addition, extremely excellent effects such as no gelatin coagulation from the discharge tip can be obtained.
第１図は従来のゼラチン塗布システムの一例を説明する
ための要部断面構成図、第２図は本発明に係わるゼラチ
ン塗布システムの一例を説明するための要部断面構成
図、第３図は第２図のゼラチン吐出部分を示す断面構成
図である。 １……恒温槽、２……ヒータ、３……温度センサ、４…
…攪拌器、５……温度調節器、６……液体、７……ゼラ
チン、８……収容容器、９……加圧容器、10……塗布
室、11……注入管、12……チューブ、13……断熱材、14
……ヒータ、15……温度センサ、16……温度調節器、17
……温風、18……ダクト、19……チャック、20……ウェ
ーハ、21……廃液回収容器、22……ブロア、23……N2ガ
ス、24……フィルタ、25,26……ベローズ、27……ポン
プ、28……チューブ、29……コネクタ、30……チューブ
継手、31……ノズル、32……シール材。FIG. 1 is a cross-sectional configuration diagram of an essential part for explaining an example of a conventional gelatin coating system, FIG. 2 is a cross-sectional configuration diagram of an essential part for explaining an example of a gelatin coating system according to the present invention, and FIG. FIG. 3 is a cross-sectional configuration diagram showing a gelatin discharging portion of FIG. 2. 1 ... Constant temperature bath, 2 ... Heater, 3 ... Temperature sensor, 4 ...
... Stirrer, 5 ... Temperature controller, 6 ... Liquid, 7 ... Gelatin, 8 ... Storage container, 9 ... Pressurized container, 10 ... Coating chamber, 11 ... Injection tube, 12 ... Tube , 13 …… Insulation, 14
...... Heater, 15 …… Temperature sensor, 16 …… Temperature controller, 17
...... Warm air, 18 ...... Duct, 19 ...... Chuck, 20 ...... Wafer, 21 ...... Waste liquid collection container, 22 ...... Blower, 23 ...... N 2 gas, 24 ...... Filter, 25, 26 ...... Bellows , 27 …… pump, 28 …… tube, 29 …… connector, 30 …… tube fitting, 31 …… nozzle, 32 …… sealant.
Claims (8)
するための処理液を収容する収容容器と、該収容容器か
ら上記処理液を上記被加工物に供給するための第１の管
と、該第１の管の上記処理液の吐出部分先端近傍から所
定の部分まで覆う第１の部分と上記吐出部分先端近傍の
位置で該第１の部分と接続されて上記第１の管を内部に
配置しない第２の部分とからなる第２の管と、上記第２
の部分に設けられ、上記第１の管の外側と上記第２の管
の内側に上記処理液の温度を調節するための温度調節用
液体を流動させるためのポンプと、該温度調節用液体の
温度を制御するための温度調節機とを備えた液体処理装
置を用いた被加工物の処理方法において、 上記温度調節機は上記温度調節用液体の温度に応じて該
温度調節用液体を加熱制御し、上記ポンプは加熱制御さ
れた上記温度調節用液体を上記第１の管の外側と上記第
２の管の内側に流し、上記第１の管の中の上記処理液の
温度を上記吐出部分先端近傍まで調節し、上記処理液を
上記被加工物に対して吐出することを特徴とする被加工
物の処理方法。1. An accommodating container installed on a fixed base for accommodating a processing liquid to be discharged onto a workpiece, and a first container for supplying the processing liquid to the workpiece from the accommodating container. A pipe, a first portion covering a portion of the first pipe from the vicinity of a discharge portion tip of the processing liquid to a predetermined portion, and the first portion connected to the first portion at a position near the discharge portion tip. A second tube having a second portion not disposed inside, and the second tube
And a pump for flowing a temperature control liquid for controlling the temperature of the treatment liquid to the outside of the first pipe and the inside of the second pipe, and a pump for controlling the temperature of the temperature control liquid. In a method for treating a workpiece using a liquid processing apparatus including a temperature controller for controlling temperature, the temperature controller controls heating of the temperature controlling liquid according to the temperature of the temperature controlling liquid. Then, the pump causes the temperature control liquid whose heating is controlled to flow to the outside of the first pipe and the inside of the second pipe, and the temperature of the processing liquid in the first pipe is changed to the discharge portion. A method for treating a workpiece, wherein the treatment liquid is adjusted to near the tip and the treatment liquid is discharged onto the workpiece.
上記収容容器の方向へ上記温度調節用液体を流動させる
ようにしたことを特徴とする特許請求の範囲第１項記載
の被加工物の処理方法。2. The workpiece according to claim 1, wherein the pump is adapted to flow the temperature control liquid from the vicinity of the tip of the discharge portion toward the storage container. Processing method.
液体を収容する温度調節容器を有し、かつ、上記第１の
管は、上記温度調節容器の中で上記第２の管の内側から
外側に出る構造を有することを特徴とする特許請求の範
囲第１項記載の被加工物の処理方法。3. The liquid processing apparatus further comprises a temperature control container for containing the temperature control liquid, and the first pipe is inside the second pipe in the temperature control container. The method for treating a work piece according to claim 1, wherein the method has a structure that extends from the outside to the outside.
液体を収容する温度調節容器を有し、かつ、上記処理液
を収容する収容容器は、上記温度調節容器中に設けられ
る構造を有することを特徴とする特許請求の範囲第１項
記載の被加工物の処理方法。4. The liquid processing apparatus further has a temperature control container for storing the temperature control liquid, and the storage container for storing the processing liquid has a structure provided in the temperature control container. The method for treating a work piece according to claim 1, wherein
度調節容器中に設けられることを特徴とする特許請求の
範囲第３項記載の被加工物の処理方法。5. The method for treating a workpiece according to claim 3, wherein a container for containing the processing liquid is provided in the temperature control container.
レジストであることを特徴とする特許請求の範囲第１項
乃至第５項の何れかに記載の被加工物の処理方法。6. The method for treating a work piece according to claim 1, wherein the treatment liquid discharged onto the work piece is a photoresist.
ンであることを特徴とする特許請求の範囲第１項乃至第
５項の何れかに記載の被加工物の処理方法。7. The method for treating a work piece according to claim 1, wherein the treatment liquid discharged onto the work piece is gelatin.
徴とする特許請求の範囲第１項乃至第７項の何れかに記
載の被加工物の処理方法。8. The method of treating a work piece according to claim 1, wherein the work piece is a wafer.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1174022A JPH0667465B2 (en) | 1989-07-07 | 1989-07-07 | Processing method of work piece |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1174022A JPH0667465B2 (en) | 1989-07-07 | 1989-07-07 | Processing method of work piece |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP57118586A Division JPS599654A (en) | 1982-07-09 | 1982-07-09 | System for injecting photoresist at constant temperature |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0286826A JPH0286826A (en) | 1990-03-27 |
| JPH0667465B2 true JPH0667465B2 (en) | 1994-08-31 |
Family
ID=15971273
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1174022A Expired - Lifetime JPH0667465B2 (en) | 1989-07-07 | 1989-07-07 | Processing method of work piece |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0667465B2 (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110875223A (en) * | 2018-08-31 | 2020-03-10 | 台湾积体电路制造股份有限公司 | Leak detection system, integration device, and leak detection method |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5081067A (en) * | 1973-11-16 | 1975-07-01 | ||
| JPS5670869A (en) * | 1979-11-14 | 1981-06-13 | Hitachi Ltd | Spinner coating apparatus |
| JPS58128441U (en) * | 1982-02-24 | 1983-08-31 | 富士通株式会社 | developing device |
-
1989
- 1989-07-07 JP JP1174022A patent/JPH0667465B2/en not_active Expired - Lifetime
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110875223A (en) * | 2018-08-31 | 2020-03-10 | 台湾积体电路制造股份有限公司 | Leak detection system, integration device, and leak detection method |
| US11199466B2 (en) | 2018-08-31 | 2021-12-14 | Taiwan Semiconductor Manufacturing Company, Ltd. | System and method for liquid leak detection |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0286826A (en) | 1990-03-27 |
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