JPH0286831A - Liquid treating device - Google Patents
Liquid treating deviceInfo
- Publication number
- JPH0286831A JPH0286831A JP17402889A JP17402889A JPH0286831A JP H0286831 A JPH0286831 A JP H0286831A JP 17402889 A JP17402889 A JP 17402889A JP 17402889 A JP17402889 A JP 17402889A JP H0286831 A JPH0286831 A JP H0286831A
- Authority
- JP
- Japan
- Prior art keywords
- gelatin
- temperature
- temp
- fluid
- liquid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000007788 liquid Substances 0.000 title claims description 29
- 239000012530 fluid Substances 0.000 claims abstract 11
- 108010010803 Gelatin Proteins 0.000 abstract description 32
- 239000008273 gelatin Substances 0.000 abstract description 32
- 229920000159 gelatin Polymers 0.000 abstract description 32
- 235000019322 gelatine Nutrition 0.000 abstract description 32
- 235000011852 gelatine desserts Nutrition 0.000 abstract description 32
- 238000005345 coagulation Methods 0.000 abstract description 2
- 230000015271 coagulation Effects 0.000 abstract description 2
- 239000000463 material Substances 0.000 abstract description 2
- 238000002347 injection Methods 0.000 description 21
- 239000007924 injection Substances 0.000 description 21
- 239000011248 coating agent Substances 0.000 description 14
- 238000000576 coating method Methods 0.000 description 14
- 235000012431 wafers Nutrition 0.000 description 7
- 229920002120 photoresistant polymer Polymers 0.000 description 5
- 238000010586 diagram Methods 0.000 description 4
- 238000007599 discharging Methods 0.000 description 2
- 238000003384 imaging method Methods 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 239000002699 waste material Substances 0.000 description 2
- 230000007547 defect Effects 0.000 description 1
- 239000000499 gel Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- 239000012774 insulation material Substances 0.000 description 1
- 239000003566 sealing material Substances 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J19/0006—Controlling or regulating processes
- B01J19/002—Avoiding undesirable reactions or side-effects, e.g. avoiding explosions, or improving the yield by suppressing side-reactions
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Coating Apparatus (AREA)
- Feeding, Discharge, Calcimining, Fusing, And Gas-Generation Devices (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
Description
【発明の詳細な説明】
本発明は液体処理装置、特にフォトレジストを一定温度
で注入するシステム、とりわけ固体撮像素子のウェーハ
へのゼラチン塗布に好適なフォトレジスト定温注入シス
テムに関するものである。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a liquid processing apparatus, particularly to a system for injecting photoresist at a constant temperature, and particularly to a constant temperature photoresist injection system suitable for coating gelatin on a wafer of a solid-state imaging device.
一般に固体撮像素子には1色分解フィルタとして一種の
フォトレジストであるゼラチンが使用されており、この
ゼラチンはウェーハ上に形成された絵素上に回転塗布法
により被着形成される。そして、このゼラチンは、約2
5℃程度の常温でゲル状態を呈しているため、約25℃
以上に温め、ゾル状態にしておかなければ塗布できない
。さらにゼラチンは、またウェーハも塗布膜厚が均一で
膜欠点もない良好な塗布を行なうためには所定の温度に
温調する必要がある。Generally, gelatin, which is a type of photoresist, is used as a one-color separation filter in solid-state imaging devices, and this gelatin is deposited on picture elements formed on a wafer by a spin coating method. And this gelatin is about 2
Approximately 25°C as it is in a gel state at room temperature of around 5°C.
It cannot be applied unless it is heated above and turned into a sol. Furthermore, gelatin needs to be heated to a predetermined temperature in order to ensure good coating of gelatin and wafers with a uniform coating thickness and no defects.
これらの条件を踏まれた従来のゼラチン塗布システムを
第1図に示す、同図において、従来のシステムは、恒温
槽1.ヒータ2.温度センサ3゜攪拌器4および温度調
節器5により恒温に温調される液体6に、ゼラチン7の
収容容器8が入れられた加圧容器9を浸け、ゼラチン7
をゾル状態にしておくとともに、一定温度に保温させる
。また恒温槽1から塗布室10までの注入系を内部に注
入管11が通された弗素樹脂製チューブ12と、この外
部を覆った断熱材13と、これとチューブ12との間に
入れられたヒータ14および温度センサ15と、温度調
節器16とにより温調し、ゼラチン7を一定温度で吐出
させる。さらに図示しないファンと、ヒータおよびフィ
ルタとからなるファンヒータユニットとにより、温風1
7をダクト18を通じて塗布室10へ送り込み、回転す
るように構成されているチャック19に吸着されたウェ
ーハ20を一定温度に加熱するようになっている。なお
、21は廃液回収容器、22はウェーハ20の回転時に
発生するゼラチン飛沫吸引用ブロア、23はゼラチンを
吐出させるための所定の圧力に制御されたN2ガス、2
4はフィルタ、25.26は注入管11の開閉、吐出側
ゼラチンのサックバック用ベローズである。A conventional gelatin coating system that meets these conditions is shown in FIG. Heater 2. A pressurized container 9 containing a container 8 containing gelatin 7 is immersed in a liquid 6 whose temperature is controlled to a constant temperature by a temperature sensor 3, a stirrer 4, and a temperature regulator 5.
It is kept in a sol state and kept at a constant temperature. In addition, the injection system from the constant temperature chamber 1 to the coating chamber 10 is inserted between a fluororesin tube 12 into which the injection pipe 11 is passed, a heat insulating material 13 covering the outside, and the tube 12. The temperature is controlled by the heater 14, the temperature sensor 15, and the temperature regulator 16, and the gelatin 7 is discharged at a constant temperature. Furthermore, a fan (not shown) and a fan heater unit consisting of a heater and a filter generate hot air 1.
7 is sent into the coating chamber 10 through a duct 18, and the wafer 20 adsorbed by a chuck 19 configured to rotate is heated to a constant temperature. In addition, 21 is a waste liquid collection container, 22 is a blower for sucking gelatin droplets generated when the wafer 20 is rotated, 23 is N2 gas controlled to a predetermined pressure for discharging gelatin, and 2
4 is a filter, and 25 and 26 are bellows for opening and closing the injection pipe 11 and for sucking back gelatin on the discharge side.
このように構成された従来システムは、ゼラチン注入系
の温調方法に問題があった。すなわち。The conventional system configured in this manner has a problem in the temperature control method of the gelatin injection system. Namely.
温度調節器5の設定温度とゼラチン7の吐出温度とが異
なるため、吐出液温調整が不便であった。Since the set temperature of the temperature regulator 5 and the discharge temperature of the gelatin 7 were different, it was inconvenient to adjust the discharge liquid temperature.
また塗布室10内のゼラチン温度を調節できないという
欠点もあった。さらにこのため、ウェーハ加熱用の温風
を塗布室10へ送り込まなければ注入管11の末端から
ゼラチンが凝固してくる問題もあった。Another drawback was that the gelatin temperature within the coating chamber 10 could not be adjusted. Furthermore, for this reason, there was a problem in that gelatin would solidify from the end of the injection tube 11 unless hot air for heating the wafer was sent into the coating chamber 10.
したがって本発明は、上述した従来技術の問題点を解消
するためになされたものであり、その目的とするところ
は、注入系の末端まで温調できるフォトレジスト定温注
入システムを提供することにある。Therefore, the present invention has been made to solve the above-mentioned problems of the prior art, and its purpose is to provide a constant temperature photoresist injection system that can control the temperature up to the end of the injection system.
このような目的を達成するために本発明は、注入系に温
調手段を設けたものである。In order to achieve such an object, the present invention provides a temperature control means in the injection system.
以下、図面を用いて本発明の実施例を詳細に説明する。Embodiments of the present invention will be described in detail below with reference to the drawings.
第2図は本発明によるフォトレジスト定温注入システム
の一例を示す断面構成図であり、第1図と同符号は同一
要素となるのでその説明は省略する。第2図において、
恒温槽1から塗布室10をューブ28が配管されている
。そして、このチューブ28の内部にはゼラチン7の注
入管11が塗布室10まで通されている。また塗布室1
0内のゼラチン吐出部分は第3図に要部断面図で示すよ
うな構造を有している。すなわち、第3図において、2
9はコネクタであり、このコネクタ29には前記チュ、
−ブ28が通常用いられているチューブ継手30により
接続されている。また、前記注入管11の先端はフラン
ジ加工され、コネクタ29の一端にねじ込まれるノズル
31により、コネクタ29に締付固定されている。なお
、32はシール材である。FIG. 2 is a cross-sectional configuration diagram showing an example of a photoresist constant temperature injection system according to the present invention, and since the same reference numerals as in FIG. 1 represent the same elements, a description thereof will be omitted. In Figure 2,
A tube 28 is connected from the constant temperature bath 1 to the coating chamber 10 . An injection tube 11 for gelatin 7 is passed through the tube 28 to the coating chamber 10. Also, coating room 1
The gelatin discharging portion in 0 has a structure as shown in a cross-sectional view of the main part in FIG. That is, in Figure 3, 2
9 is a connector, and this connector 29 has the aforementioned tubes,
- tubes 28 are connected by a commonly used tube fitting 30; The distal end of the injection tube 11 is flanged and is fastened to the connector 29 by a nozzle 31 screwed into one end of the connector 29. Note that 32 is a sealing material.
このように配管された注入系において、ポンプ27を作
動させることにより、恒温槽1内に液体6が注入管11
のまわりを包むようにしてチューブ28とコネクタ29
とを通って循環する。一方、液体6は前述したように恒
温となるように常時加熱温調されている。したがって、
この定温注入システムによれば、収入容器8内のゼラチ
ン7の温度を一定に保つと同時に注入管ll内のゼラチ
ン温度も一定に保つことが出来る。また、液体6の温度
はそのまま収容容器8および注入管11内のゼラチン温
度となるた゛め、温度調節器5の設定温度とゼラチン吐
出温度とが同一となる。In the injection system piped in this way, by operating the pump 27, the liquid 6 flows into the thermostatic chamber 1 through the injection pipe 11.
Wrap the tube 28 and connector 29 around the
It circulates through. On the other hand, the liquid 6 is constantly heated and temperature controlled to maintain a constant temperature as described above. therefore,
According to this constant temperature injection system, the temperature of the gelatin 7 in the collection container 8 can be kept constant, and at the same time, the temperature of the gelatin in the injection tube 11 can also be kept constant. Furthermore, since the temperature of the liquid 6 directly becomes the gelatin temperature in the storage container 8 and the injection tube 11, the set temperature of the temperature regulator 5 and the gelatin discharge temperature become the same.
また、処理液の注入管11と容器8とを、同じ液体6で
温度調節しているので、或は、それらを共通の温度制御
系2,3及び5でm度調整しているので、温度制御性が
良い。ポンプ27は注入管が内側に挿入されていないチ
ューブ28の部分に取り付けられているため、取り付け
が簡単である。In addition, since the temperature of the treatment liquid injection pipe 11 and the container 8 is adjusted with the same liquid 6, or because they are adjusted by m degrees with the common temperature control system 2, 3, and 5, the temperature Good controllability. Since the pump 27 is attached to the portion of the tube 28 into which the injection tube is not inserted, attachment is easy.
また、チューブ28が注入管11を包含する二重管構成
からチューブ28だけの単管にする位置は、第2図、第
3図に示すように、チューブ28の端部でなく、チュー
ブ28の途中であり、チューブ28をT字状に分岐させ
て二重管から単管にしているので構造が簡単であり、ま
た、処理液を被加工物に供給するときの邪魔になること
もない。In addition, the position where the tube 28 changes from a double tube structure including the injection tube 11 to a single tube is not at the end of the tube 28, but at the end of the tube 28, as shown in FIGS. 2 and 3. Since the tube 28 is branched into a T-shape and changed from a double tube to a single tube, the structure is simple and does not get in the way when supplying the processing liquid to the workpiece.
以上説明したように本発明によれば、温度調節器の設定
温崖道りに制御された液体で、収容容器とができるので
、吐出液温度調整が簡単となり、かつ吐出部先端からの
ゼラチンの凝固が全く起らなくなるなどの極めて優れた
効果が得られる。As explained above, according to the present invention, the storage container can be made of liquid that is controlled according to the temperature set by the temperature controller, so the temperature of the discharged liquid can be easily adjusted, and the gelatin from the tip of the discharge part can be Extremely excellent effects such as no coagulation occurring at all can be obtained.
第1図は従来のゼラチン塗布システムの一例を説明する
ための要部断面構成図、第2図は本発明に係わるゼラチ
ン塗布システムの一例を説明するための要部断面構成図
、第3図は第2図のゼラチン吐出部分を示す断面構成図
である。
1・・・恒温槽、2・・・ヒータ、3・・・温度センサ
、4・・・攪拌器、5・・・温度調節器、6・・・液体
、7・・・ゼラチン、8・・・収容容器、9・・・加圧
容器、10・・・塗布室、11・・・注入管、12・・
・チューブ、13・・・断熱材、14・・・ヒータ、1
5・・・温度センサ、16・・・温度調節器、17・・
・温風、18・・・ダクト、19・・・チャック、20
・・・ウェーハ、21・・・廃液回収容器、22・・・
ブロア、23・・・Nzガス、24・・・フィル′ミ望
、25.26・・・ベローズ、27・・・ボン二N゛・
ン
プ、28・・・チューブ、29・・・コネクタ、30・
・・チューブ継手、31・・・ノズル、32・・・シー
ル材。
第3図FIG. 1 is a cross-sectional configuration diagram of essential parts for explaining an example of a conventional gelatin coating system, FIG. 2 is a cross-sectional configuration diagram of essential parts for explaining an example of a gelatin coating system according to the present invention, and FIG. FIG. 3 is a cross-sectional configuration diagram showing the gelatin discharge portion of FIG. 2; 1... Constant temperature bath, 2... Heater, 3... Temperature sensor, 4... Stirrer, 5... Temperature regulator, 6... Liquid, 7... Gelatin, 8... - Storage container, 9... Pressurized container, 10... Coating chamber, 11... Injection pipe, 12...
・Tube, 13...Insulation material, 14...Heater, 1
5...Temperature sensor, 16...Temperature controller, 17...
・Warm air, 18...Duct, 19...Chuck, 20
...Wafer, 21...Waste liquid collection container, 22...
Blower, 23...Nz gas, 24...Film connection, 25.26...Bellows, 27...Bond N゛・amp, 28...Tube, 29...Connector, 30・
...Tube joint, 31...Nozzle, 32...Seal material. Figure 3
Claims (1)
、流体を上記処理液供給管の周りに供給するための流体
供給手段と、上記流体の温度を調整することが可能な温
度調整手段とを具備して成ることを特徴とする液体処理
装置。 2、被加工物に処理液を供給するための処理液供給管と
、該処理液供給管の周りに温度調整された液体を供給す
るためのポンプとを具備して成ることを特徴とする液体
処理装置。 3、被加工物に処理液を供給するための処理液供給管と
、温度調整用の流体を上記処理液供給管の周りに供給し
、かつ、上記流体を循環させることのできる流体供給手
段とを具備して成ることを特徴とする液体処理装置。[Claims] 1. A processing liquid supply pipe for supplying a processing liquid to a workpiece, a fluid supply means for supplying fluid around the processing liquid supply pipe, and adjusting the temperature of the fluid. 1. A liquid treatment device comprising: a temperature adjustment means capable of controlling the temperature of the liquid; 2. A liquid characterized by comprising a processing liquid supply pipe for supplying a processing liquid to a workpiece, and a pump for supplying a temperature-controlled liquid around the processing liquid supply pipe. Processing equipment. 3. A processing liquid supply pipe for supplying a processing liquid to the workpiece, and a fluid supply means capable of supplying a temperature adjustment fluid around the processing liquid supply pipe and circulating the fluid. A liquid processing device comprising:
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP17402889A JPH0286831A (en) | 1989-07-07 | 1989-07-07 | Liquid treating device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP17402889A JPH0286831A (en) | 1989-07-07 | 1989-07-07 | Liquid treating device |
Related Parent Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP57118586A Division JPS599654A (en) | 1982-07-09 | 1982-07-09 | System for injecting photoresist at constant temperature |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH0286831A true JPH0286831A (en) | 1990-03-27 |
Family
ID=15971371
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP17402889A Pending JPH0286831A (en) | 1989-07-07 | 1989-07-07 | Liquid treating device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0286831A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2001314801A (en) * | 2000-05-09 | 2001-11-13 | Seven Tec:Kk | Liquid application system |
JP2008524852A (en) * | 2004-12-17 | 2008-07-10 | アプライド マテリアルズ インコーポレイテッド | Self-cooled gas distributor in high vacuum for high density plasma applications |
-
1989
- 1989-07-07 JP JP17402889A patent/JPH0286831A/en active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2001314801A (en) * | 2000-05-09 | 2001-11-13 | Seven Tec:Kk | Liquid application system |
JP2008524852A (en) * | 2004-12-17 | 2008-07-10 | アプライド マテリアルズ インコーポレイテッド | Self-cooled gas distributor in high vacuum for high density plasma applications |
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