JPH0290934A - Liquid treating apparatus - Google Patents
Liquid treating apparatusInfo
- Publication number
- JPH0290934A JPH0290934A JP17402689A JP17402689A JPH0290934A JP H0290934 A JPH0290934 A JP H0290934A JP 17402689 A JP17402689 A JP 17402689A JP 17402689 A JP17402689 A JP 17402689A JP H0290934 A JPH0290934 A JP H0290934A
- Authority
- JP
- Japan
- Prior art keywords
- temperature
- liquid
- gelatin
- gelatine
- tube
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000007788 liquid Substances 0.000 title claims abstract description 27
- 239000012530 fluid Substances 0.000 claims abstract 3
- 229920000159 gelatin Polymers 0.000 abstract description 33
- 235000019322 gelatine Nutrition 0.000 abstract description 33
- 238000007599 discharging Methods 0.000 abstract description 7
- 239000001828 Gelatine Substances 0.000 abstract 5
- 230000015271 coagulation Effects 0.000 abstract 2
- 238000005345 coagulation Methods 0.000 abstract 2
- 108010010803 Gelatin Proteins 0.000 description 28
- 239000008273 gelatin Substances 0.000 description 28
- 235000011852 gelatine desserts Nutrition 0.000 description 28
- 238000002347 injection Methods 0.000 description 20
- 239000007924 injection Substances 0.000 description 20
- 239000011248 coating agent Substances 0.000 description 14
- 238000000576 coating method Methods 0.000 description 14
- 235000012431 wafers Nutrition 0.000 description 7
- 229920002120 photoresistant polymer Polymers 0.000 description 5
- 238000010586 diagram Methods 0.000 description 4
- 238000003384 imaging method Methods 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 239000003566 sealing material Substances 0.000 description 2
- 239000002699 waste material Substances 0.000 description 2
- 230000007547 defect Effects 0.000 description 1
- 239000000499 gel Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- 239000012774 insulation material Substances 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J19/0006—Controlling or regulating processes
- B01J19/002—Avoiding undesirable reactions or side-effects, e.g. avoiding explosions, or improving the yield by suppressing side-reactions
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Coating Apparatus (AREA)
- Feeding, Discharge, Calcimining, Fusing, And Gas-Generation Devices (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
Description
【発明の詳細な説明】
本発明は液体処理装置、特にフォトレジストを一定温度
で注入するシステム、とりわけ固体撮像素子のウェーハ
へのゼラチン塗布に好適なフォトレジスト定温注入シス
テムに関するものである。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a liquid processing apparatus, particularly to a system for injecting photoresist at a constant temperature, and particularly to a constant temperature photoresist injection system suitable for coating gelatin on a wafer of a solid-state imaging device.
一般に固体撮像索子には、色分解フィルタとして一種の
フォトレジストであるゼラチンが使用されており、この
ゼラチンはウェーハ上に形成された絵素上に回転塗布法
により被着形成される。そして、このゼラチンは、約２
５℃程度の常温でゲル状態を呈しているため、約２５℃
以上に温め、ゾル状態にしておかなければ塗布できない
。さらにゼラチンは、またウェーハも塗布膜厚が均一で
膜欠点もない良好な塗布を行なうためには所定の温度に
温調する必要がある。Generally, gelatin, which is a type of photoresist, is used as a color separation filter in a solid-state imaging element, and this gelatin is deposited on picture elements formed on a wafer by a spin coating method. And this gelatin is about 2
Approximately 25°C as it is in a gel state at room temperature of around 5°C.
It cannot be applied unless it is heated above and turned into a sol. Furthermore, gelatin needs to be heated to a predetermined temperature in order to ensure good coating of gelatin and wafers with a uniform coating thickness and no defects.
これらの条件を踏まれた従来のゼラチン塗布システムを
第１図に示す、同図において、従来のシステムは、恒温
槽１．ヒータ２．温度センサ３゜攪拌器４および温度調
節器５により恒温に温調される液体６に、ゼラチン７の
収容容器８が入れられた加圧容器９を浸け、ゼラチン７
をゾル状態にしておくとともに、一定温度に保温させる
。また恒温槽１から塗布室１０までの注入系を内部に注
入管１１が通された弗素樹脂製チューブ１２と、この外
部を覆った断熱材１３と、これとチューブ１２との間に
入れられたヒータ１４および温度センサ１５と、温度調
節器１６とにより温調し、ゼラチン７を一定温度で吐出
させる。さらに図示しないファンと、ヒータおよびフィ
ルタとからなるファンヒータユニットとにより、温風１
７をダクト１８を通じて塗布室１０へ送り込み、回転す
るように構成されているチャック１９に吸着されたウェ
ーハ２０を一定温度に加熱するようになっている。なお
、２１は廃液回収容器、２２はウェーハ２０の回転時に
発生するゼラチン飛沫吸引用ブロア、２３はゼラチンを
吐出させるための所定の圧力に制御されたＮ２ガス、２
４はフィルタ、２５．２６は注入管１１の開閉、吐出側
ゼラチンのサックバック用ベローズである。A conventional gelatin coating system that meets these conditions is shown in FIG. Heater 2. A pressurized container 9 containing a container 8 containing gelatin 7 is immersed in a liquid 6 whose temperature is controlled to a constant temperature by a temperature sensor 3, a stirrer 4, and a temperature regulator 5.
It is kept in a sol state and kept at a constant temperature. In addition, the injection system from the constant temperature chamber 1 to the coating chamber 10 is inserted between a fluororesin tube 12 into which the injection pipe 11 is passed, a heat insulating material 13 covering the outside, and the tube 12. The temperature is controlled by the heater 14, the temperature sensor 15, and the temperature regulator 16, and the gelatin 7 is discharged at a constant temperature. Furthermore, a fan (not shown) and a fan heater unit consisting of a heater and a filter generate hot air 1.
7 is sent into the coating chamber 10 through a duct 18, and the wafer 20 adsorbed by a chuck 19 configured to rotate is heated to a constant temperature. In addition, 21 is a waste liquid collection container, 22 is a blower for sucking gelatin droplets generated when the wafer 20 is rotated, 23 is N2 gas controlled to a predetermined pressure for discharging gelatin, and 2
4 is a filter, and 25 and 26 are bellows for opening and closing the injection pipe 11 and for sucking back gelatin on the discharge side.
このように構成された従来システムは、ゼラチン注入系
の温調方法に問題があった。すなわち。The conventional system configured in this manner has a problem in the temperature control method of the gelatin injection system. Namely.
温度調節器５の設定温度とゼラチン７の吐出温度とが異
なるため、吐出液湿調整が不便であった。Since the set temperature of the temperature regulator 5 and the discharge temperature of the gelatin 7 were different, it was inconvenient to adjust the humidity of the discharged liquid.
また塗布室１０内のゼラチン温度を調節できないという
欠点もあった。さらにこのため、ウェーハ加熱用の温風
を塗布室１０へ送り込まなければ注入管１１の末端から
ゼラチンが凝固してくる問題もあった。Another drawback was that the gelatin temperature within the coating chamber 10 could not be adjusted. Furthermore, for this reason, there was a problem in that gelatin would solidify from the end of the injection tube 11 unless hot air for heating the wafer was sent into the coating chamber 10.
したがって本発明は、上述した従来技術の問題点を解消
するためになされたものであり、その目的とするところ
は、注入系の末端まで温調できるフォトレジスト定温注
入システムを提供することにある。Therefore, the present invention has been made to solve the above-mentioned problems of the prior art, and its purpose is to provide a constant temperature photoresist injection system that can control the temperature up to the end of the injection system.
このような目的を達成するために本発明は、注入系に温
調手段を設けたものである。In order to achieve such an object, the present invention provides a temperature control means in the injection system.
以下、図面を用いて本発明の実施例を詳細に説明する。Embodiments of the present invention will be described in detail below with reference to the drawings.
第２図は本発明によるフォトレジスト定温注入システム
の一例を示す断面構成図であり、第１図と同符号は同一
要素となるのでその説明は省略する。第２図において、
恒温槽１から塗布室１０を経由し、再び恒温槽１までポ
ンプ２７を通してチューブ２８が配管されている。そし
て、このチューブ２８の内部にはゼラチン７の注入管１
１が塗布室１０まで通されている。また塗布室１０内の
ゼラチン吐出部分は第３図に要部断面図で示すような構
造を有している。すなわち、第３図において、２９はコ
ネクタであり、このコネクタ２９には前記チューブ２８
が通常用いられているチューブ継手３０により接続され
ている。また、前記注入管１１の先端はフランジ加工さ
れ、コネクタ２９の一端にねじ込まれるノズル３１によ
り、コネクタ２９に締付固定されている。なお、３２は
シール材である。FIG. 2 is a cross-sectional configuration diagram showing an example of a photoresist constant temperature injection system according to the present invention, and since the same reference numerals as in FIG. 1 represent the same elements, a description thereof will be omitted. In Figure 2,
A tube 28 is piped from the constant temperature bath 1 via the coating chamber 10 and back to the constant temperature bath 1 through a pump 27. Inside this tube 28, there is an injection tube 1 for gelatin 7.
1 is passed through to the coating chamber 10. Further, the gelatin discharge portion in the coating chamber 10 has a structure as shown in a cross-sectional view of the main part in FIG. That is, in FIG. 3, 29 is a connector, and the tube 28 is attached to this connector 29.
are connected by a commonly used tube joint 30. The distal end of the injection tube 11 is flanged and is fastened to the connector 29 by a nozzle 31 screwed into one end of the connector 29. Note that 32 is a sealing material.
このように配管された注入系において、ポンプ２７を作
動させることにより、恒温槽１内に液体６が注入管１１
のまわりを包むようにしてチューブ２８とコネクタ２９
とを通って循環する。一方。In the injection system piped in this way, by operating the pump 27, the liquid 6 flows into the thermostatic chamber 1 through the injection pipe 11.
Wrap the tube 28 and connector 29 around the
It circulates through. on the other hand.
液体６は前述したように恒温となるように常時加熱温調
されている。したがって、この定温注入システムによれ
ば、収入容器８内のゼラチン７の温ｆ ’？一定しこ保
つと同時に注入管１１内のゼラチン温度も一定に保つこ
とが出来る。また、液体６の温度はそのまま収容容器８
および注入管１１内のゼラチン温度となるため、温度調
節器５の設定温度とゼラチン吐出温度とが同一となる。As described above, the liquid 6 is constantly heated and temperature-controlled to maintain a constant temperature. Therefore, according to this constant temperature injection system, the temperature f' of the gelatin 7 in the receiving container 8? At the same time, the gelatin temperature inside the injection tube 11 can be kept constant. In addition, the temperature of the liquid 6 remains unchanged in the storage container 8.
Since the temperature of the gelatin in the injection tube 11 becomes the same, the set temperature of the temperature regulator 5 and the gelatin discharge temperature become the same.
また、処理液の注入’ｌ？１１と容器８とを同じ液体６
で温度調節しているので、或は、それらを共通４温度制
御系２．３及び５で温度調整している、国
ので、温度制御性が良い、ポンプ２７は注入管が内側に
挿入されていないチューブ２８の部分に取り付けられて
いるため、取り付けが簡単である。Also, is it possible to inject the processing liquid? 11 and container 8 with the same liquid 6
The temperature is controlled by the common 4-temperature control system 2.3 and 5, or the temperature is controlled by the country, so the temperature control is good.The pump 27 has an injection pipe inserted inside. Since it is attached to the portion of the tube 28 that is not present, the attachment is easy.
また、チューブ２８が注入管１１を包含する二重管構成
からチューブ２８だけの単管にする位置は、第２図、第
３図に示すように、チューブ２８の端部でなく、チュー
ブ２８の途中であり、チューブ２８をＴ字状に分岐させ
て二重管から単管にしているので構造が簡単であり、ま
た、処理液を被加工物に供給するときの邪魔になること
もない。In addition, the position where the tube 28 changes from a double tube structure including the injection tube 11 to a single tube is not at the end of the tube 28, but at the end of the tube 28, as shown in FIGS. 2 and 3. Since the tube 28 is branched into a T-shape and changed from a double tube to a single tube, the structure is simple and does not get in the way when supplying the processing liquid to the workpiece.
以上説明したように本発明によれば、温度調節器の設定
温変通りに制御された液５体で、収容容器内から吐出部
までにわたってゼラチン温調することができるので、吐
出液温度調整が簡単となり、かつ吐出部先端からのゼラ
チンの凝固が全く起らなくなるなどの極めて優れた効果
が得られる。As explained above, according to the present invention, it is possible to control the temperature of gelatin from the inside of the storage container to the discharge section using five liquids controlled according to the temperature settings of the temperature controller, so that the temperature of the discharged liquid can be adjusted. It is simple, and extremely excellent effects such as gelatin no longer coagulates from the tip of the ejecting part can be obtained.
第１図は従来のゼラチン塗布システムの一例を説明する
ための要部断面構成図、第２図は本発明に係わるゼラチ
ン塗布システムの一例を説明するだめの要部断面構成図
、第３図は第２図のゼラチン吐出部分を示す断面構成図
である。
１・・・恒温槽、２・・・ヒータ、３・・・温度センサ
、４・・・攪拌器、５・・・温度調節器、６・・・液体
、７・・・ゼラチン、８・・・収容容器、９・・・加圧
容器、１０・・・塗布室、１１・・・注入管、１２・・
・チューブ、１３・・・断熱材、１４・・・ヒータ、１
５・・・温度センサ、１６・・・温度調節器、１７・・
・温風、１８・・・ダクト、１９・・・チャック、２０
・・・ウェーハ、２１・・・廃液回収容器、２２・・・
ブロア、２３・・・Ｎ２ガス、２４・・・フィルタ、２
５．２６・・・ベローズ、２７・・・ポンプ、２８・・
・チューブ、２９・・・コネクタ。
３０・・・チューブ継手、３１・・・ノズル、３２・・
・シール材。FIG. 1 is a cross-sectional configuration diagram of essential parts for explaining an example of a conventional gelatin coating system, FIG. 2 is a cross-sectional configuration diagram of essential parts for explaining an example of a gelatin coating system according to the present invention, and FIG. FIG. 3 is a cross-sectional configuration diagram showing the gelatin discharge portion of FIG. 2; 1... Constant temperature bath, 2... Heater, 3... Temperature sensor, 4... Stirrer, 5... Temperature regulator, 6... Liquid, 7... Gelatin, 8... - Storage container, 9... Pressurized container, 10... Coating chamber, 11... Injection pipe, 12...
・Tube, 13...Insulation material, 14...Heater, 1
5...Temperature sensor, 16...Temperature controller, 17...
・Warm air, 18...Duct, 19...Chuck, 20
...Wafer, 21...Waste liquid collection container, 22...
Blower, 23...N2 gas, 24...filter, 2
5.26... bellows, 27... pump, 28...
・Tube, 29...Connector. 30...Tube joint, 31...Nozzle, 32...
・Sealing material.
Claims (1)
、該処理液を処理するための処理室と、温度調整用の流
体を上記処理液供給管の周りに供給するための手段を具
備して成り、上記処理液供給管を上記処理室の内部に至
るまで設け、かつ、上記処理液供給管の先端部に至るま
で温度制御したことを特徴とする液体処理装置。1. A processing liquid supply pipe for supplying a processing liquid to the workpiece, a processing chamber for processing the processing liquid, and a means for supplying temperature adjustment fluid around the processing liquid supply pipe. A liquid processing apparatus comprising: the processing liquid supply pipe provided up to the inside of the processing chamber, and temperature controlled up to the tip of the processing liquid supply pipe.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1174026A JPH0624622B2 (en) | 1989-07-07 | 1989-07-07 | Liquid processing device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1174026A JPH0624622B2 (en) | 1989-07-07 | 1989-07-07 | Liquid processing device |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP57118586A Division JPS599654A (en) | 1982-07-09 | 1982-07-09 | System for injecting photoresist at constant temperature |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0290934A true JPH0290934A (en) | 1990-03-30 |
| JPH0624622B2 JPH0624622B2 (en) | 1994-04-06 |
Family
ID=15971337
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1174026A Expired - Lifetime JPH0624622B2 (en) | 1989-07-07 | 1989-07-07 | Liquid processing device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0624622B2 (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0498821A (en) * | 1990-08-16 | 1992-03-31 | Nec Yamagata Ltd | Rotational coater for manufacture of semiconductor |
| JP2011165886A (en) * | 2010-02-09 | 2011-08-25 | Shin-Etsu Chemical Co Ltd | Resist application device and resist application method |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS54154369U (en) * | 1978-04-18 | 1979-10-26 |
-
1989
- 1989-07-07 JP JP1174026A patent/JPH0624622B2/en not_active Expired - Lifetime
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS54154369U (en) * | 1978-04-18 | 1979-10-26 |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0498821A (en) * | 1990-08-16 | 1992-03-31 | Nec Yamagata Ltd | Rotational coater for manufacture of semiconductor |
| JP2011165886A (en) * | 2010-02-09 | 2011-08-25 | Shin-Etsu Chemical Co Ltd | Resist application device and resist application method |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0624622B2 (en) | 1994-04-06 |
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