JPH0657436A - Vacuum treatment device - Google Patents
Vacuum treatment deviceInfo
- Publication number
- JPH0657436A JPH0657436A JP23890792A JP23890792A JPH0657436A JP H0657436 A JPH0657436 A JP H0657436A JP 23890792 A JP23890792 A JP 23890792A JP 23890792 A JP23890792 A JP 23890792A JP H0657436 A JPH0657436 A JP H0657436A
- Authority
- JP
- Japan
- Prior art keywords
- earth
- discharge electrode
- shield
- plate
- insulators
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Physical Vapour Deposition (AREA)
- Chemical Vapour Deposition (AREA)
- ing And Chemical Polishing (AREA)
Abstract
Description
【０００１】[0001]
【産業上の利用分野】この発明はアースシールドと放電
電極との短絡を防止する真空処理装置に関するものであ
る。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a vacuum processing apparatus which prevents a short circuit between a ground shield and a discharge electrode.
【０００２】[0002]
【従来の技術】従来の真空処理装置は図４〜図６に示さ
れており、これらの図において、真空槽１内の下部には
Ｔ字型横断面をもつ松茸状の放電電極２が配置され、そ
の放電電極２の内部にはガス拡散スペース２ａが設けら
れている。また、放電電極２の表面の放電プレート２ｂ
にはガス拡散スペース２ａよりガスを真空槽１内に噴出
するガス噴出孔（図示せず）が多数設けられている。真
空槽１内の上部には裏板３により基板ホルダー４に保持
された基板５が放電電極２と対向するように配置され、
裏板３と基板ホルダー４とが放電電極２の対向電極にな
っている。裏板３、基板ホルダー４及び基板５の背後の
真空槽１内には加熱ヒーター６が配設されている。放電
電極２の背後にはアースプレート７が放電電極２と隙間
をもって配設され、また、放電電極２の側部にもアース
プレート７の端部に立設されたアースシールド８が放電
電極２と隙間をもって配設されている。2. Description of the Related Art A conventional vacuum processing apparatus is shown in FIGS. 4 to 6, in which a mushroom-shaped discharge electrode 2 having a T-shaped cross section is arranged in the lower portion of a vacuum chamber 1. A gas diffusion space 2a is provided inside the discharge electrode 2. Also, the discharge plate 2b on the surface of the discharge electrode 2
Is provided with a large number of gas ejection holes (not shown) for ejecting gas from the gas diffusion space 2a into the vacuum chamber 1. The substrate 5 held by the substrate holder 4 by the back plate 3 is arranged in the upper part of the vacuum chamber 1 so as to face the discharge electrode 2,
The back plate 3 and the substrate holder 4 are opposite electrodes of the discharge electrode 2. A heater 6 is arranged in the vacuum chamber 1 behind the back plate 3, the substrate holder 4 and the substrate 5. A ground plate 7 is disposed behind the discharge electrode 2 with a gap between the discharge electrode 2 and a ground shield 8 standing upright at the end of the ground plate 7 on the side of the discharge electrode 2 and the discharge electrode 2. It is arranged with a gap.
【０００３】このような真空処理装置においては、加熱
ヒーター６で基板５を加熱しながら、裏板３および基板
ホルダー４の対向電極と、放電電極２との間の放電によ
り、プラズマが発生し、その作用に基づいて基板５に薄
膜を形成するようになる。In such a vacuum processing apparatus, while the substrate 5 is heated by the heater 6, plasma is generated by the discharge between the counter electrode of the back plate 3 and the substrate holder 4 and the discharge electrode 2. A thin film is formed on the substrate 5 based on the action.
【０００４】[0004]
【発明が解決しようとする課題】従来の真空処理装置
は、上記のように加熱ヒーター６で基板５を加熱するよ
うにしているが、その時の熱が放電電極２にも及ぶよう
になる。そのため、放電電極２が熱膨張し、その側部に
隙間をもって配設されていたアースシールド８と接触
し、短絡する問題があった。In the conventional vacuum processing apparatus, the heater 5 heats the substrate 5 as described above, but the heat at that time also reaches the discharge electrode 2. Therefore, there is a problem that the discharge electrode 2 thermally expands and comes into contact with the earth shield 8 disposed with a gap on the side thereof to cause a short circuit.
【０００５】この発明の目的は、従来の上記問題を解決
して、アースシールドと放電電極との短絡を防止するこ
との可能な真空処理装置を提供することである。An object of the present invention is to solve the above-mentioned problems of the prior art and to provide a vacuum processing apparatus capable of preventing a short circuit between the earth shield and the discharge electrode.
【０００６】[0006]
【課題を解決するための手段】上記目的を達成するため
に、この発明は、真空槽内で基板と対向して配置した放
電電極の背部にこれと隙間をもってアースプレートを配
設するとともに、放電電極の側部にこれと隙間をもって
アースシールドを配設している真空処理装置において、
複数の絶縁物の一端部を上記放電電極の側部の数箇所に
取り付ける一方で、複数の絶縁物の他端部を上記アース
シールドの数箇所に取り付け、上記放電電極の側部とア
ースシールドとの隙間を複数の絶縁物で維持するととも
に、上記アースプレートとアースシールドとをアース接
続板で接続し、上記アースプレートとアースシールドと
をアース電位にしたことを特徴するものである。In order to achieve the above object, the present invention provides a ground plate with a gap between the ground electrode and the back of a discharge electrode which is arranged to face a substrate in a vacuum chamber. In a vacuum processing device in which a ground shield is arranged on the side of the electrode with a gap therebetween,
While attaching one end of a plurality of insulators to several places on the side of the discharge electrode, attach the other end of a plurality of insulators to several places of the earth shield, and to the side of the discharge electrode and the earth shield. The gap is maintained by a plurality of insulators, the earth plate and the earth shield are connected by an earth connection plate, and the earth plate and the earth shield are set to the earth potential.
【０００７】[0007]
【作用】この発明においては、基板を加熱する加熱ヒー
ターの熱により、放電電極が加熱され、熱膨張すると、
熱膨張した長さに応じて、絶縁物が移動するようにな
る。絶縁物の移動により、アースシールドも移動するよ
うになるが、アースシールドの移動はアース接続板が撓
むことによって可能になる。このように放電電極の熱膨
張により、アースシールドが移動し、放電電極の側部と
アースシールドとの隙間が複数の絶縁物で維持されるの
で、放電電極の側部とアースシールドとが短絡すること
がなくなる。また、複数の絶縁物の一端部を放電電極の
側部の数箇所に取り付ける一方で、複数の絶縁物の他端
部をアースシールドの数箇所に取り付けているので、放
電電極の側部とアースシールドとの隙間の全体を絶縁物
で埋める場合に比べて、放電電極の浮遊容量を小さくす
ることができる。In this invention, the discharge electrode is heated by the heat of the heater for heating the substrate and thermally expands,
The insulator moves according to the length of thermal expansion. The movement of the insulator causes the earth shield to move, and the movement of the earth shield is enabled by the bending of the earth connecting plate. In this way, the thermal expansion of the discharge electrode moves the ground shield, and the gap between the side portion of the discharge electrode and the ground shield is maintained by a plurality of insulators, so that the side portion of the discharge electrode and the ground shield are short-circuited. Will disappear. Also, while one end of multiple insulators is attached to several locations on the side of the discharge electrode, the other end of multiple insulators is attached to several locations on the ground shield, so the side of the discharge electrode and the ground are connected. The stray capacitance of the discharge electrode can be reduced as compared with the case where the entire gap between the shield and the shield is filled with an insulator.
【０００９】[0009]
【実施例】以下、この発明の実施例について図面を参照
しながら説明する。この発明の実施例は図１〜図３に示
されており、これらの図において、真空槽１内の下部に
はＴ字型横断面をもつ松茸状の放電電極２が配置され、
その放電電極２の内部にはガス拡散スペース２ａが設け
られている。また、放電電極２の表面の放電プレート２
ｂにはガス拡散スペース２ａよりガスを真空槽１内に噴
出するガス噴出孔（図示せず）が多数設けられている。
真空槽１内の上部には裏板３により基板ホルダー４に保
持された基板５が放電電極２と対向するように配置さ
れ、裏板３と基板ホルダー４とが放電電極２の対向電極
になっている。裏板３、基板ホルダー４及び基板５の背
後の真空槽１内には加熱ヒーター６が配設されている。
放電電極２の背部にはアースプレート７が放電電極２と
隙間をもって配設され、そのアースプレート７にはアー
スシールド８が板厚０．１ｍｍ〜０．３ｍｍ程度の可撓
性のアース接続板９を介して接続され、アースプレート
７とアースシールド８とをアース電位にしている。そし
て、複数の絶縁物１０の一端部を放電電極２の側部の数
箇所に取り付ける一方で、複数の絶縁物１０の他端部を
アースシールド８の数箇所に取り付け、放電電極２の側
部とアースシールド８との隙間を複数の絶縁物１０で維
持している。Embodiments of the present invention will be described below with reference to the drawings. An embodiment of the present invention is shown in FIGS. 1 to 3, in which a pine mushroom-shaped discharge electrode 2 having a T-shaped cross section is arranged in the lower part of a vacuum chamber 1.
Inside the discharge electrode 2, a gas diffusion space 2a is provided. In addition, the discharge plate 2 on the surface of the discharge electrode 2
In b, a large number of gas ejection holes (not shown) for ejecting gas from the gas diffusion space 2a into the vacuum chamber 1 are provided.
A substrate 5 held on a substrate holder 4 by a back plate 3 is arranged in the upper part of the vacuum chamber 1 so as to face the discharge electrode 2, and the back plate 3 and the substrate holder 4 serve as a counter electrode of the discharge electrode 2. ing. A heater 6 is arranged in the vacuum chamber 1 behind the back plate 3, the substrate holder 4 and the substrate 5.
A ground plate 7 is disposed on the back of the discharge electrode 2 with a gap between the discharge electrode 2 and a ground shield 8 on the ground plate 7, which is a flexible ground connection plate 9 having a plate thickness of about 0.1 mm to 0.3 mm. And the earth plate 7 and the earth shield 8 are connected to each other via the. Then, while one end of the plurality of insulators 10 is attached to several places on the side of the discharge electrode 2, the other end of the plurality of insulators 10 is attached to several places of the earth shield 8 to form the side of the discharge electrode 2. The gap between the ground shield 8 and the ground shield 8 is maintained by a plurality of insulators 10.
【００１０】このような実施例において、基板５を加熱
する加熱ヒーター６の熱により、放電電極２が加熱さ
れ、熱膨張すると、熱膨張した長さに応じて、絶縁物１
０が移動するようになる。絶縁物１０の移動により、ア
ースシールド８も移動するようになるが、アースシール
ド８の移動はアース接続板９が撓むことによって可能に
なる。このように放電電極２の熱膨張により、アースシ
ールド８が移動し、放電電極２の側部とアースシールド
８との隙間が複数の絶縁物１０で維持されるので、放電
電極２の側部とアースシールド８とが短絡することがな
くなる。また、複数の絶縁物１０の一端部を放電電極２
の側部の数箇所に取り付ける一方で、複数の絶縁物１０
の他端部をアースシールド８の数箇所に取り付けている
ので、放電電極２の側部とアースシールド８との隙間の
全体を絶縁物１０で埋める場合に比べて、放電電極２の
浮遊容量を小さくすることができる。In such an embodiment, when the discharge electrode 2 is heated by the heat of the heater 6 for heating the substrate 5 and thermally expands, the insulator 1 is expanded according to the length of the thermally expanded material.
0 will move. The movement of the insulator 10 causes the earth shield 8 to move, but the movement of the earth shield 8 can be performed by bending the earth connecting plate 9. As described above, due to the thermal expansion of the discharge electrode 2, the earth shield 8 moves, and the gap between the side portion of the discharge electrode 2 and the earth shield 8 is maintained by the plurality of insulators 10. The earth shield 8 will not be short-circuited. In addition, one end of the plurality of insulators 10 is connected to the discharge electrode 2
While being attached to several places on the side of the
Since the other end of the discharge electrode 2 is attached to several places of the earth shield 8, the stray capacitance of the discharge electrode 2 can be reduced as compared with the case where the entire gap between the side portion of the discharge electrode 2 and the earth shield 8 is filled with the insulator 10. Can be made smaller.
【００１１】ところで、上記実施例は、放電電極２の側
部に３つの絶縁物１０を取り付けているが、絶縁物１０
は如何なる数であってもよく、また、放電電極２の内部
にガス拡散スペース２ａを設ける代わりに、ガスを直接
真空槽１内に導入してもよい。更に、加熱ヒーターをも
った真空処理装置であれば、ＣＶＤ装置に限らず、エッ
チング装置等いかなるものであってもよい。By the way, in the above embodiment, the three insulators 10 are attached to the side portions of the discharge electrode 2.
May be any number, and instead of providing the gas diffusion space 2a inside the discharge electrode 2, the gas may be directly introduced into the vacuum chamber 1. Further, as long as it is a vacuum processing apparatus having a heater, it is not limited to the CVD apparatus, and any apparatus such as an etching apparatus may be used.
【００１２】[0012]
【発明の効果】この発明は、上記のように基板を加熱す
る加熱ヒーターの熱により、放電電極が加熱され、熱膨
張しても、熱膨張した長さに応じて、絶縁物及びアース
シールドが移動し、放電電極の側部とアースシールドと
の隙間が複数の絶縁物で維持されるので、放電電極の側
部とアースシールドとが短絡することがなくなる。ま
た、複数の絶縁物の一端部を放電電極の側部の数箇所に
取り付ける一方で、複数の絶縁物の他端部をアースシー
ルドの数箇所に取り付けているので、放電電極の側部と
アースシールドとの隙間の全体を絶縁物で埋める場合に
比べて、放電電極の浮遊容量を小さくすることができ
る。更に、アースプレートとアースシールドとをアース
接続板で接続しているので、アースシールドがアースプ
レートより力を受けなくなる。As described above, according to the present invention, even if the discharge electrode is heated by the heat of the heater for heating the substrate as described above, and the thermal expansion occurs, the insulator and the ground shield are separated according to the length of the thermal expansion. Since it moves and the gap between the side portion of the discharge electrode and the earth shield is maintained by the plurality of insulators, the side portion of the discharge electrode and the earth shield are not short-circuited. Also, while one end of multiple insulators is attached to several locations on the side of the discharge electrode, the other end of multiple insulators is attached to several locations on the ground shield, so the side of the discharge electrode and the ground are connected. The stray capacitance of the discharge electrode can be reduced as compared with the case where the entire gap between the shield and the shield is filled with an insulator. Further, since the earth plate and the earth shield are connected by the earth connecting plate, the earth shield receives less force than the earth plate.
【図１】この発明の実施例の断面図FIG. 1 is a sectional view of an embodiment of the present invention.
【図２】図１のＡ−Ａ線より見た平面図FIG. 2 is a plan view seen from line AA of FIG.
【図３】図１のＢ部の詳細図FIG. 3 is a detailed view of part B of FIG.
【図４】従来の真空処理装置の断面図FIG. 4 is a sectional view of a conventional vacuum processing apparatus.
【図５】図１のＣ−Ｃ線より見た平面図5 is a plan view seen from the line CC of FIG.
【図６】図１のＤ部の詳細図FIG. 6 is a detailed view of a portion D in FIG.
１・・・・・・・真空槽 ２・・・・・・・放電電極 ２ａ・・・・・・ガス拡散スペース ２ｂ・・・・・・放電プレート ３・・・・・・・裏板 ４・・・・・・・基板ホルダー ５・・・・・・・基板 ６・・・・・・・加熱ヒーター ７・・・・・・・アースプレート ８・・・・・・・アースシールド ９・・・・・・・アース接続板 １０・・・・・・絶縁物 1 ... Vacuum chamber 2 ... Discharge electrode 2a ... Gas diffusion space 2b ... Discharge plate 3 ... Back plate 4 ··· Board holder 5 ··· Board 6 · · · Heater 7 · · · Earth plate 8 · · · Earth shield 9 · ·・ ・ ・ Ground connection plate 10 ・ ・ ・ Insulator
Claims (1)
極の背部にこれと隙間をもってアースプレートを配設す
るとともに、放電電極の側部にこれと隙間をもってアー
スシールドを配設している真空処理装置において、複数
の絶縁物の一端部を上記放電電極の側部の数箇所に取り
付ける一方で、複数の絶縁物の他端部を上記アースシー
ルドの数箇所に取り付け、上記放電電極の側部とアース
シールドとの隙間を複数の絶縁物で維持するとともに、
上記アースプレートとアースシールドとをアース接続板
で接続し、上記アースプレートとアースシールドとをア
ース電位にしたことを特徴する真空処理装置。1. A ground plate is provided in the vacuum chamber at the back of the discharge electrode facing the substrate with a gap therebetween, and a ground plate is provided at the side of the discharge electrode with a gap therebetween. In the vacuum processing apparatus, one end of the plurality of insulators is attached to several places on the side of the discharge electrode, while the other end of the plurality of insulators is attached to several places of the earth shield. While maintaining the gap between the side part and the earth shield with multiple insulators,
A vacuum processing apparatus, wherein the earth plate and the earth shield are connected by an earth connection plate, and the earth plate and the earth shield are set to earth potential.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP04238907A JP3092884B2 (en) | 1992-08-14 | 1992-08-14 | Vacuum processing equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP04238907A JP3092884B2 (en) | 1992-08-14 | 1992-08-14 | Vacuum processing equipment |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0657436A true JPH0657436A (en) | 1994-03-01 |
| JP3092884B2 JP3092884B2 (en) | 2000-09-25 |
Family
ID=17037045
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP04238907A Expired - Fee Related JP3092884B2 (en) | 1992-08-14 | 1992-08-14 | Vacuum processing equipment |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3092884B2 (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2016535410A (en) * | 2013-08-16 | 2016-11-10 | アプライド マテリアルズ インコーポレイテッドＡｐｐｌｉｅｄ Ｍａｔｅｒｉａｌｓ，Ｉｎｃｏｒｐｏｒａｔｅｄ | An elongated capacitively coupled plasma source for high temperature and low pressure environments |
| KR20240018374A (en) | 2022-08-02 | 2024-02-13 | 얀마 홀딩스 주식회사 | Display device and construction machine |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR101594843B1 (en) | 2014-02-11 | 2016-02-17 | 이순호 | Heating apparatus |
-
1992
- 1992-08-14 JP JP04238907A patent/JP3092884B2/en not_active Expired - Fee Related
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2016535410A (en) * | 2013-08-16 | 2016-11-10 | アプライド マテリアルズ インコーポレイテッドＡｐｐｌｉｅｄ Ｍａｔｅｒｉａｌｓ，Ｉｎｃｏｒｐｏｒａｔｅｄ | An elongated capacitively coupled plasma source for high temperature and low pressure environments |
| KR20240018374A (en) | 2022-08-02 | 2024-02-13 | 얀마 홀딩스 주식회사 | Display device and construction machine |
Also Published As
| Publication number | Publication date |
|---|---|
| JP3092884B2 (en) | 2000-09-25 |
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