JP3092884B2 - Vacuum processing equipment - Google Patents

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a vacuum processing apparatus for preventing a short circuit between an earth shield and a discharge electrode.

[0002]

2. Description of the Related Art A conventional vacuum processing apparatus is shown in FIGS. 4 to 6, in which a pine mushroom-shaped discharge electrode 2 having a T-shaped cross section is disposed in a lower portion of a vacuum chamber 1. FIG. A gas diffusion space 2 a is provided inside the discharge electrode 2. Also, the discharge plate 2b on the surface of the discharge electrode 2
Are provided with a number of gas ejection holes (not shown) for ejecting gas from the gas diffusion space 2a into the vacuum chamber 1. A substrate 5 held by a substrate holder 4 by a back plate 3 is disposed at an upper portion in the vacuum chamber 1 so as to face the discharge electrode 2.
The back plate 3 and the substrate holder 4 are opposite electrodes of the discharge electrode 2. A heater 6 is provided in the vacuum chamber 1 behind the back plate 3, the substrate holder 4 and the substrate 5. An earth plate 7 is provided behind the discharge electrode 2 with a gap from the discharge electrode 2, and an earth shield 8 erected at the end of the earth plate 7 is also provided on the side of the discharge electrode 2. It is arranged with a gap.

In such a vacuum processing apparatus, a plasma is generated by a discharge between the counter electrode of the back plate 3 and the substrate holder 4 and the discharge electrode 2 while the substrate 5 is heated by the heater 6. A thin film is formed on the substrate 5 based on the action.

[0004]

In the conventional vacuum processing apparatus, the substrate 5 is heated by the heater 6 as described above. However, the heat at that time reaches the discharge electrode 2 as well. For this reason, there is a problem that the discharge electrode 2 thermally expands and comes into contact with the earth shield 8 provided with a gap on a side portion thereof, thereby causing a short circuit.

An object of the present invention is to solve the above-mentioned conventional problems and to provide a vacuum processing apparatus capable of preventing a short circuit between an earth shield and a discharge electrode.

[0006]

SUMMARY OF THE INVENTION In order to achieve the above object, the present invention provides an electric discharge apparatus, comprising: a ground electrode disposed behind a discharge electrode disposed in a vacuum chamber so as to face a substrate; In a vacuum processing device in which an earth shield is arranged with a gap on the side of the electrode,
While attaching one end of the plurality of insulators to several places on the side of the discharge electrode, attaching the other end of the plurality of insulators to several places of the earth shield, the side of the discharge electrode and the earth shield Are maintained by a plurality of insulators, the earth plate and the earth shield are connected by an earth connection plate, and the earth plate and the earth shield are set to the earth potential.

[0007]

In the present invention, when the discharge electrode is heated by the heat of the heater for heating the substrate and thermally expanded,
The insulator moves according to the length of the thermal expansion. The movement of the insulator also causes the earth shield to move, but the earth shield can be moved by bending the ground connection plate. In this manner, the earth shield moves due to the thermal expansion of the discharge electrode, and the gap between the side of the discharge electrode and the earth shield is maintained by a plurality of insulators, so that the side of the discharge electrode and the earth shield are short-circuited. Disappears. Also, while one end of the plurality of insulators is attached to several places on the side of the discharge electrode, the other end of the plurality of insulators is attached to several places of the earth shield, so that the side of the discharge electrode is The floating capacitance of the discharge electrode can be reduced as compared with the case where the entire gap with the shield is filled with an insulator.

[0009]

Embodiments of the present invention will be described below with reference to the drawings. An embodiment of the present invention is shown in FIGS. 1 to 3, in which a matsutake-shaped discharge electrode 2 having a T-shaped cross section is arranged at a lower portion in a vacuum chamber 1.
A gas diffusion space 2a is provided inside the discharge electrode 2. The discharge plate 2 on the surface of the discharge electrode 2
b has a number of gas ejection holes (not shown) for ejecting gas from the gas diffusion space 2a into the vacuum chamber 1.
A substrate 5 held on a substrate holder 4 by a back plate 3 is disposed at an upper portion in the vacuum chamber 1 so as to face the discharge electrode 2, and the back plate 3 and the substrate holder 4 serve as opposing electrodes of the discharge electrode 2. ing. A heater 6 is provided in the vacuum chamber 1 behind the back plate 3, the substrate holder 4 and the substrate 5.
An earth plate 7 is disposed behind the discharge electrode 2 with a gap from the discharge electrode 2, and an earth shield 8 is provided on the earth plate 7 with a flexible earth connection plate 9 having a thickness of about 0.1 mm to 0.3 mm. And the earth plate 7 and the earth shield 8 are set to the earth potential. One end of the plurality of insulators 10 is attached to several places on the side of the discharge electrode 2, and the other end of the plurality of insulators 10 is attached to several places on the ground shield 8, The gap between the wire and the earth shield 8 is maintained by a plurality of insulators 10.

In such an embodiment, the discharge electrode 2 is heated by the heat of the heater 6 for heating the substrate 5 and thermally expanded.
0 moves. The movement of the insulator 10 also causes the earth shield 8 to move, but the earth shield 8 can be moved by bending the ground connection plate 9. As described above, the earth shield 8 moves due to the thermal expansion of the discharge electrode 2, and the gap between the side of the discharge electrode 2 and the earth shield 8 is maintained by the plurality of insulators 10. Short circuit with the earth shield 8 is eliminated. Further, one end of the plurality of insulators 10 is connected to the discharge electrode 2.
At several places on the side of the
Are attached to several places of the earth shield 8, so that the floating capacity of the discharge electrode 2 is reduced as compared with the case where the entire gap between the side part of the discharge electrode 2 and the earth shield 8 is filled with the insulator 10. Can be smaller.

In the above-described embodiment, three insulators 10 are attached to the side of the discharge electrode 2.
May be any number, and a gas may be directly introduced into the vacuum chamber 1 instead of providing the gas diffusion space 2 a inside the discharge electrode 2. Furthermore, as long as it is a vacuum processing apparatus having a heater, it is not limited to a CVD apparatus, but may be any apparatus such as an etching apparatus.

[0012]

As described above, according to the present invention, even when the discharge electrode is heated by the heat of the heater for heating the substrate and thermally expanded, the insulating material and the earth shield are formed according to the length of the thermal expansion. The gap between the side of the discharge electrode and the earth shield is maintained by the plurality of insulators, so that the side of the discharge electrode and the earth shield are not short-circuited. Also, while one end of the plurality of insulators is attached to several places on the side of the discharge electrode, the other end of the plurality of insulators is attached to several places of the earth shield, so that the side of the discharge electrode is The floating capacitance of the discharge electrode can be reduced as compared with the case where the entire gap with the shield is filled with an insulator. Further, since the earth plate and the earth shield are connected by the earth connection plate, the earth shield is less affected by the earth plate.

[Brief description of the drawings]

FIG. 1 is a sectional view of an embodiment of the present invention.

FIG. 2 is a plan view taken along line AA of FIG. 1;

FIG. 3 is a detailed view of a portion B in FIG. 1;

FIG. 4 is a sectional view of a conventional vacuum processing apparatus.

FIG. 5 is a plan view taken along line CC of FIG. 1;

FIG. 6 is a detailed view of a portion D in FIG. 1;

[Explanation of symbols]

 1 Vacuum chamber 2 Discharge electrode 2a Gas diffusion space 2b Discharge plate 3 Back plate 4 ······ Substrate holder 5 ····· Substrate 6 ····· Heater 7 ······ Earth plate 8 ······ Earth shield 9・ ・ ・ ・ ・ ・ Ground connection plate 10 ・ ・ ・ ・ ・ ・ Insulator

──────────────────────────────────────────────────続 き Continued on the front page (56) References JP-A 4-88028 (JP, U) JP-A 1-163328 (JP, U) (58) Fields surveyed (Int. Cl. ⁷ , DB name) C23C 14/00-14/58 C23C 16/00-16/56 C23F 4/00 H01L 21/205 H01L 21/3065 H01L 21/31 H05H 1/46

Claims (1)

(57) [Claims] An earth plate is provided at the back of a discharge electrode arranged opposite to a substrate in a vacuum chamber with a gap therebetween, and an earth shield is provided at a side of the discharge electrode with a gap therebetween. In one vacuum processing apparatus, one end of the plurality of insulators is attached to several places on the side of the discharge electrode, while the other end of the plurality of insulators is attached to several places of the ground shield, While maintaining the gap between the side and the earth shield with multiple insulators,
A vacuum processing apparatus, wherein the earth plate and the earth shield are connected by an earth connection plate, and the earth plate and the earth shield are set to the earth potential.