JP3155844B2 - High frequency electrode of vacuum processing equipment - Google Patents

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

The present invention relates to a plasma CVD apparatus,
The present invention relates to a high-frequency electrode of a vacuum processing device such as an etching device.

[0002]

2. Description of the Related Art In a vacuum processing apparatus such as a plasma CVD apparatus or an etching apparatus, a high-frequency electrode and a substrate are arranged in a vacuum chamber so as to face each other, and a heater is arranged behind the substrate. The substrate is heated by heat from the substrate. FIGS. 6 and 7 show a conventional example of a high-frequency electrode of such a vacuum processing apparatus. In these figures, a high-frequency introduction shaft 1 having a gas introduction passage 1a therein.
A bottom plate 2 is fixed to the tip of the electrode plate 3, an electrode frame 3 is erected on a peripheral portion of the bottom plate 2, and a shower plate 4 having a large number of gas ejection ports 4 a is provided at one end of the electrode frame 3. Are attached by screws 6 via a shower plate holding plate 5. An earth plate 7 is arranged behind the bottom plate 2 with a gap therefrom, and an earth shield 8 is erected on the periphery of the earth plate 7. The earth plate 7 and the earth shield 8 are at the earth potential. In addition,
In the figure, reference numeral 10 denotes glass.

In the high-frequency electrode of such a vacuum processing apparatus, gas flowing through the gas introduction passage 1a of the high-frequency introduction shaft 1 is ejected from the gas ejection port 4a of the shower plate 4 into the vacuum chamber. When high-frequency power is applied, the shower plate 4 becomes a high voltage, discharge occurs between the substrate and the shower plate 4, plasma is generated, and a film is formed on the substrate or the film on the substrate is etched. Or be done. In that case, the substrate is heated by the heat from the heater, and at the same time, the shower plate 4 is also heated by the radiant heat from the heater, and the shower plate 4 tends to thermally expand.

[0004]

In the high-frequency electrode of the conventional vacuum processing apparatus, the shower plate 4 is heated by the radiant heat from the heater as described above, and tends to thermally expand. However, since the shower plate 4 is attached to one end of the electrode frame 3 by screws 6 via the shower plate holding plate 5, thermal expansion of the shower plate 4 is prevented, and the shower plate 4 itself is thermally deformed. . Therefore, the potential of the shower plate 4 becomes non-uniform, which causes a problem that the film thickness and the film quality distribution of the film formed on the substrate become non-uniform.

When the shower plate 4 is attached to one end of the electrode frame 3 with screws 6 via the shower plate holding plate 5, the shower plate holding plate 5 projects above the shower plate 4. Therefore, the projection of the shower plate holding plate 5 makes the potential of the shower plate 4 non-uniform, which causes a problem that the film thickness and film quality distribution of the film formed on the substrate become non-uniform.

SUMMARY OF THE INVENTION An object of the present invention is to provide a high-frequency electrode of a vacuum processing apparatus which solves the above-mentioned conventional problems and does not form projections on the shower plate and can eliminate thermal deformation of the shower plate. It is.

[0007]

In order to achieve the above object, according to the present invention, a discharge electrode arranged to face a substrate heated by a heater is provided upright on a peripheral portion of a bottom plate. In a high-frequency electrode of a vacuum processing apparatus configured by disposing a shower plate so as to cover an electrode frame, a slide angle is provided on a peripheral portion of the shower plate so as to form a gap with a lower surface of the shower plate. A gap for slidably holding the slide angle is provided at an upper end of the shower plate, and a plurality of leaf springs are provided on the bottom plate so that the bending directions of the leaf springs are from the vicinity of the center of the shower plate to the peripheral direction. And the shower plate is fixed to the shower plate fixture.

[0008]

According to the present invention, the shower plate of the discharge electrode is heated and thermally expanded by the heat of the heater for heating the substrate. However, the shower plate is
A slide angle provided on the periphery is slidably sandwiched between the electrode frames, and the shower plate is fixed to a leaf spring provided on the bottom plate from the vicinity of the center of the shower plate toward the peripheral direction. Since the shower plate is fixed via the fixture, the expansion due to the thermal expansion of the shower plate is allowed only in the surface direction of the shower plate by the sliding of the slide angle with respect to the electrode frame and the movement of the shower plate fixture due to the bending of the leaf spring. You. Therefore, thermal deformation due to thermal expansion of the shower plate is suppressed as much as possible. Also, the fixing of the shower plate fixture to the shower plate can be fastened with flathead screws,
The projection on the surface of the shower plate can be eliminated.

[0009]

Embodiments of the present invention will be described below with reference to the drawings. An embodiment of the present invention is shown in FIGS. 1 to 5, in which a bottom plate 2 is fixed to a distal end of a high-frequency introduction shaft 1 having a gas introduction passage 1a therein. An electrode frame 3 is erected on the peripheral edge of the electrode frame 3, and the electrode frame 3 forms a square shape. Further, a shower plate 4 having a large number of gas outlets 4a is arranged so as to cover the rectangular electrode frame 3. A plurality of brackets 11 are radially attached to the bottom plate 2, and each bracket 1
A leaf spring 12 is fixed to 1. Furthermore, each leaf spring 1
A shower plate fixing device 13 is attached to 2, and a shower plate 4 is fixed to these shower plate fixing devices 13 by flathead screws 14. An earth plate 7 is arranged behind the bottom plate 2 with a gap therebetween, and an earth shield 8 is erected on a peripheral portion of the earth plate 7. The earth shield 8 is separated from the electrode frame 3 by an insulator 9. There is a gap, and the earth plate 7 and the earth shield 8 are at the earth potential. In the figure, reference numeral 10 denotes an insulator. Also, a slide angle 15 is provided on the lower surface of the peripheral portion of the shower plate 4.
Are attached so as to form a gap 16 with the lower surface of the shower plate 4, and an electrode angle 17 is provided around the electrode frame 3 erected on the peripheral edge of the bottom plate 2 between the upper surface of the electrode frame 3. Is formed so as to form a gap 18. The blades 15a and 17a of the slide angle 15 and the electrode angle respectively have a gap 1
It is slidably sandwiched between 8 and 16 so that the airtightness between the shower plate 4 and the electrode frame 3 can be maintained.

In such an embodiment, while the gas flowing through the gas introduction passage 1a of the high-frequency introduction shaft 1 is ejected from the gas ejection port 4a of the shower plate 4 into the vacuum chamber,
When high-frequency power is applied to the high-frequency introducing shaft 1, the shower plate 4 becomes high voltage, discharge occurs between the substrate and the shower plate 4, plasma is generated, and a film is formed on the substrate, or The upper film may be etched. At this time, the shower plate 4 is heated by radiant heat from a heater for heating the substrate, and the shower plate 4 thermally expands.

At this time, with the thermal expansion of the shower plate 4, the bracket 1 attached to the bottom plate 2
1 is bent in the surface direction of the shower plate 4 to move the shower plate fixture 13, and the slide angle 1 sandwiched in the gap 18 formed by the electrode frame 3 and the electrode angle 17. Slides in the gap 18. Therefore, thermal deformation due to thermal expansion of the shower plate 4 is suppressed as much as possible. The fixing of the shower plate fixture 13 to the shower plate 4 is performed by using a flathead screw 1.
4, the projections on the surface of the shower plate 4 can be eliminated, and the flatness of the surface of the shower plate 4 can be maintained.

In the above embodiment, the bracket 1
1, the leaf spring 12 and the shower plate fixture 13 are arranged radially. However, depending on the size of the electrodes, they may be arranged only diagonally. Further, although the shape of the electrode is square, it may be circular.

[0013]

According to the present invention, as described above, in response to the thermal expansion of the shower plate, the shower plate fixture moves in the plane direction of the shower plate due to the bending of the leaf spring,
Since the slide angle slides with respect to the electrode frame while maintaining airtightness, thermal deformation due to thermal expansion of the shower plate is suppressed as much as possible. Further, since the shower plate fixing device is fixed to the shower plate with a flathead screw, projections on the shower plate surface can be eliminated, and the flatness of the shower plate surface can be maintained. Therefore, no protrusion is formed on the shower plate, and the thermal deformation of the shower plate can be eliminated, the potential of the shower plate is made uniform, and the film thickness and film quality distribution of the film formed on the substrate become uniform. become.

[Brief description of the drawings]

FIG. 1 is a plan view of an embodiment of the present invention.

FIG. 2 is a sectional view of an embodiment of the present invention.

FIG. 3 is a detailed elevation view of a portion A in FIG. 2;

FIG. 4 is a detailed plan view of a portion A in FIG. 2;

FIG. 5 is a detailed elevation view of a part B in FIG. 2;

FIG. 6 is a plan view of a high-frequency electrode of a conventional vacuum processing apparatus.

FIG. 7 is a sectional view of a high-frequency electrode of a conventional vacuum processing apparatus.

[Explanation of symbols]

 1 high frequency induction shaft 1a gas introduction passage 2 bottom plate 3 electrode frame 4 shower Plate 4a Gas outlet 7 Earth plate 8 Shield 9 Insulator 10 Insulator 11: bracket 12: leaf spring 13: shower plate fixing device 14: countersunk screw 15: slide angle 17: ... Electrode angles

──────────────────────────────────────────────────続 き Continued on the front page (72) Inventor Yasuo Shimizu 2500 Hagizono, Hagizono, Chigasaki City, Kanagawa Prefecture, Japan (72) Inventor Masahiro Ichiyama 2500, Hagizono, Hagizono, Chigasaki City, Kanagawa Prefecture, Japan (72 Inventor Hidenori Suwa 2500 Hagizono, Hagizono, Chigasaki City, Kanagawa Prefecture (72) Kuniaki Kurokawa 2500 Hagizono, Chigasaki City, Kanagawa Prefecture Inside Nippon Vacuum Engineering Co., Ltd. (72) Inventor Hideyuki Ogata Hagizono, Chigasaki City, Kanagawa Prefecture 2500 Nippon Vacuum Engineering Co., Ltd. (56) References Japanese Utility Model No. 2-102722 (JP, U) (58) Field surveyed (Int. Cl. ⁷ , DB name) C23C 16/00-16/56 B01J 3 / 00 C23F 4/00-4/04 H01L 21/205 H01L 21/3065 H05H 1/46

Claims (1)

(57) [Claims] 1. A vacuum processing system comprising: a discharge electrode disposed so as to face a substrate heated by a heater; and a shower plate disposed so as to cover an electrode frame provided upright on a peripheral portion of a bottom plate. In the high-frequency electrode of the device, a slide angle is provided on the peripheral portion of the shower plate so as to form a gap with the lower surface of the shower plate, and a gap for slidably holding the slide angle at the upper end of the electrode frame. In addition, a plurality of leaf springs are provided on the bottom plate with the bending direction of the leaf springs extending from the vicinity of the center of the shower plate to the peripheral direction, and further, the shower plate is fixed to the shower plate fixture. A high-frequency electrode for a vacuum processing apparatus, characterized in that: