JPH0650131Y2 - Polishing equipment - Google Patents

Polishing equipment

Info

Publication number
JPH0650131Y2
JPH0650131Y2 JP1989003972U JP397289U JPH0650131Y2 JP H0650131 Y2 JPH0650131 Y2 JP H0650131Y2 JP 1989003972 U JP1989003972 U JP 1989003972U JP 397289 U JP397289 U JP 397289U JP H0650131 Y2 JPH0650131 Y2 JP H0650131Y2
Authority
JP
Japan
Prior art keywords
polishing surface
polishing
correction
work
grindstone
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP1989003972U
Other languages
Japanese (ja)
Other versions
JPH0297566U (en
Inventor
喬男 石田
洋 萩原
一三 各務
威雄 中川
整 大森
Original Assignee
新東ブレーター株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 新東ブレーター株式会社 filed Critical 新東ブレーター株式会社
Priority to JP1989003972U priority Critical patent/JPH0650131Y2/en
Publication of JPH0297566U publication Critical patent/JPH0297566U/ja
Application granted granted Critical
Publication of JPH0650131Y2 publication Critical patent/JPH0650131Y2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Description

【考案の詳細な説明】 (産業上の利用分野) 本考案は金属部品やセラミック部品等の平坦面を研摩デ
ィスクにより研摩した際に生ずる研摩ディスクの研摩面
の偏摩耗等を電解方式により修正する機構を備えた研摩
装置に関するものである。
[Detailed Description of the Invention] (Industrial field of application) The present invention corrects uneven wear of the polishing surface of the polishing disk caused by polishing the flat surface of metal parts, ceramic parts, etc. by the electrolytic method. The present invention relates to a polishing device having a mechanism.

(従来の技術) 上面を固定砥粒による研摩面とした水平回転自在な研摩
ディスクと、前記研摩面にワークを押し付けるワーク保
持装置と、前記研摩面に対向する研摩面修正用の修正砥
石を備えた修正砥石保持装置とを同一の機台に組み込ん
だ研摩装置は特開昭63−64859号公報などにより既に知
られており、また、電解研摩による修正装置も実開昭54
−63297号公報などにより既に知られている。
(Prior Art) Equipped with a horizontally rotatable polishing disc whose upper surface is a polishing surface with fixed abrasive grains, a work holding device for pressing a work against the polishing surface, and a correction grindstone for correcting the polishing surface facing the polishing surface. A polishing device in which a modified whetstone holding device is incorporated in the same machine base is already known from JP-A-63-64859, and a correction device by electrolytic polishing is also practically used.
It is already known from, for example, the −63297 publication.

(考案が解決しようとする課題) しかしながら、従来のこの種研摩装置では高速加工、重
加工等の場合に研摩面の偏摩耗、凹凸等が大となるの
で、短時間で偏摩耗等の修正を研摩作業中に行うことが
できない。そこで、前記のような研摩装置に電解研摩に
よる修正装置を組み込むことにより研摩作業中にも短時
間で偏摩耗等の修正を行えるようにすることも考えられ
るが、装置が大掛かりとなって広い設置場所が必要とな
り実用的なものとは言いがたいものとなる。
(Problems to be solved by the invention) However, in this type of conventional polishing apparatus, uneven wear, unevenness, etc. of the polishing surface become large in the case of high-speed processing, heavy processing, etc., so it is necessary to correct uneven wear in a short time. Cannot be done during polishing work. Therefore, it may be possible to correct uneven wear in a short time during polishing work by incorporating a correction device by electrolytic polishing into the polishing device as described above, but the device becomes a large scale and it is widely installed. It requires space and is hardly practical.

(課題を解決するための手段) 本考案は、以上のような問題点を解決したコンパクトな
研摩装置に関するもので、上面をメタルボンド固定砥粒
による研摩面とした水平回転自在な研摩ディスクと、前
記研摩面にワークを押し付けるワーク保持装置と、前記
研摩面に対向する研摩面修正用の修正砥石を備えた修正
砥石保持装置と、昇降動自在な回転軸の下端に電気絶縁
体を介して取付けられて前記研摩面上の偏心位置まで下
降する回転可能な修正電極体と前記研摩ディスクとを電
源装置に接続して導電性液体の供給下に前記研摩面を電
解仕上げする研摩面修正装置とが同一の機台に組み込ま
れており、前記修正砥石は傾角調節可能として研摩面の
上方の前記修正電極体とは異なる偏心位置に昇降動自在
に配置されるとともに、前記ワーク保持装置は研摩面の
外側のワーク供給位置から加工位置である研摩面の上方
の前記修正電極体と修正砥石の各設置位置とは異なる偏
心位置を経てワーク搬出位置へ移動させる揺動アームに
取付けられたものとしたことを特徴とするものである。
(Means for Solving the Problem) The present invention relates to a compact polishing apparatus that solves the above problems, and includes a horizontally rotatable polishing disk whose upper surface is a polishing surface with fixed metal bond abrasive grains, A work holding device for pressing a work against the polishing surface, a correction grindstone holding device equipped with a correction grindstone for correcting the polishing surface facing the polishing surface, and a lower end of a rotary shaft that can be moved up and down mounted via an electric insulator And a polishing surface correcting device for connecting the rotating correction electrode body that is lowered to an eccentric position on the polishing surface and the polishing disk to a power supply device to electrolytically finish the polishing surface under the supply of a conductive liquid. It is incorporated in the same machine base, the correction grindstone is adjustable in tilt angle, and is vertically movable at a different eccentric position from the correction electrode body above the polishing surface. The mount is attached to a swing arm that moves from a work supply position outside the polishing surface to a work unloading position through an eccentric position different from the respective installation positions of the correction electrode body and the correction grindstone above the polishing surface, which is the processing position. It is characterized by having been made.

(作用) このような研摩装置は、研摩ディスクを回転させたの
ち、ワークをワーク保持装置に保持させてワークを研摩
面上へ位置させてワークを回転させ、加圧力を調整しな
がら研摩面へ圧接して研摩加工を行う。そして、この研
摩作業により研摩面に偏摩耗等が生じたら、修正砥石保
持装置のモータを駆動してあらかじめ水平度調整してあ
る修正砥石を回転させ、次いで、修正砥石を回転させな
がら下降して研摩面を荒仕上修正する。次に、研摩面修
正装置を作動させて修正電極体を回転させるとともに、
図示されない昇降機構によりこれを下降させ、研摩面と
の間が所定の間隙となったらこの下降を停止して導電性
液体をノズルより前記間隙部に供給する。次いで、電源
装置より研摩ディスクと修正電極体間に所定電圧をかけ
て研摩面を電解研摩すれば、研摩面は修正砥石と修正電
極体とにより短時間でツルーイング・ドレッシングされ
て所定の研摩面に再生される。
(Operation) In such a polishing device, after rotating the polishing disk, the work is held by the work holding device, the work is positioned on the polishing surface, the work is rotated, and the pressure is adjusted to the polishing surface. Pressing and polishing. Then, if uneven wear or the like occurs on the polishing surface due to this polishing work, the motor of the correction grindstone holding device is driven to rotate the correction grindstone whose levelness has been adjusted in advance, and then descend while rotating the correction grindstone. Correct the rough finish of the polished surface. Next, the polishing surface correction device is operated to rotate the correction electrode body,
This is lowered by an elevating mechanism (not shown), and when a predetermined gap is formed between the polishing surface and the polishing surface, this lowering is stopped and the conductive liquid is supplied from the nozzle to the gap. Then, a predetermined voltage is applied between the polishing disk and the correction electrode body from the power supply device to electropolish the polished surface, and the polishing surface is trued and dressed in a short time by the correction grindstone and the correction electrode body to form a predetermined polishing surface. Is played.

(実施例) 次に、本考案を図示の実施例について詳細に説明する。(Example) Next, this invention is demonstrated in detail about the Example shown in figure.

(1)は箱状の機台であって、該機台(1)内の支持枠
(2)には研摩ディスク(3)が取付けてあり、この研
摩ディスク(3)はモータ(4)によりVベルト、Vプ
ーリ等の伝導機構を経て水平回転される。なお、研摩デ
ィスク(3)の下部側は金属製の基盤(5)により構成
されていてこれにメタルボンド固定砥粒による研摩砥粒
層が形成してあって、その上面は研摩面(6)とされて
いる。また、機台(1)の支持枠(2)にはワークの搬
入出把持加工装置(7)が設けてあり、その支柱(8)
には揺動アーム(9)が揺動自在に保持され、揺動アー
ム(9)の先端下方にはワークの着脱及び研摩面(6)
への押し付けを行うワーク保持装置(10)が取付けてあ
って、これは上部ブラケットに取付けたモータ(11)に
より駆動されるとともに、揺動アーム(9)によりワー
ク供給位置から加工位置である研摩面(6)上の偏心位
置を経てワーク搬出位置へ移動可能となっている。さら
に、機台(1)の側壁(1a)には研摩面修正装置(12)
の回転軸(13)が昇降可能に取付けてあり、該回転軸
(13)の下端には電気絶縁体(14)を介してカップ状の
修正電極体(15)が固定され、その下面は研摩面(6)
上面の偏心位置に対向して臨むように配設されている。
また、回転軸(13)はその上部側を中心に揺動可能とさ
れていて、下端の修正電極体(15)は研摩面(6)に対
し水平度調整可能な構成とされている。更に、機台
(1)に付設した電源装置(16)の陽極側は給電ブラシ
(17)を介して研摩ディスク(3)の基盤(5)へ、ま
た、陰極側は給電ブラシ(18)を介して修正電極体(1
5)へ接続してあり、前記研摩面(6)と修正電極体(1
5)との境界付近には該境界面に導電性液体を供給可能
とするノズル(19)が機台(1)に設けられた配管端部
に取付けて位置されている。さらにまた、機台(1)の
正面後部の側壁(1b)には修正砥石保持装置(20)が研
摩面修正装置(12)と同様に取付けてあり、その修正砥
石(21)は一般のビトリファイド砥石、メタルボンド砥
石等と同じで、ワーク保持装置(10)と研摩面修正装置
(12)との間の研摩面(6)を研摩できるように前記加
工位置や修正電極体(15)とは異なる偏心位置に対向位
置されている。すなわち、修正砥石保持装置(20)は第
2図に示すように、側壁(1b)に取付けた保持装置本体
(22)に軸支された縦形の送りねじ軸(23)を有し、送
りねじ軸(23)の上端は保持装置本体(22)に取付けた
モータ(24)の駆動軸に連結されていて該送りねじ軸
(23)の下部側には、昇降ブラケット(25)に固定した
ナット(26)が螺着させてあり、昇降ブラケット(25)
の一側は側壁(1b)に設けた図示されない摺動案内部に
上下方向に摺動自在に係合させてあって、モータ(24)
の駆動により回転する送りねじ軸(23)とこれに螺着さ
れたナット(26)により、昇降ブラケット(25)は昇降
する構成とされ、更に、昇降ブラケット(25)の筒状部
(27)の上端面には、球面受座(28)が形成してある。
(29)は前記筒状部(27)に若干の隙間を設けて挿入さ
れた保持筒で、該保持筒(29)の上端には上部フランジ
(30)が固定してあり、その外周下部には球面受座(2
8)に対応する球面受座(31)が形成してあり、保持筒
(29)はその球面受座(31)が球面受座(28)に係合さ
れているので、前記係合面部により、保持筒(29)は昇
降ブラケット(25)に揺動自在に吊下げ保持された状態
となっている。また、保持筒(29)の下端には下部フラ
ンジ(32)が固定され、その外側付近には縦形の調節ボ
ルト(33)が適数個螺挿してあって、それぞれの先端部
は昇降ブラケット(25)の下面に当接され、これら調節
ボルト(33)の出入りにより球面受座(28)により吊下
げ保持されている保持筒(29)の縦方向に対する傾きが
調整され、調節ボルト(33)を締め付けることにより保
持筒(29)は所定の傾斜状態で昇降ブラケット(25)に
固定される。そして保持筒(29)内には上下の軸受(3
4)、(34)により軸支された回転軸(35)が挿通され
ており、その上端はモータ(36)の駆動軸に連結されて
いるとともに下端には前記の修正砥石(21)が固定して
あり、(37)はワーク保持装置(10)に設けられた加圧
力調整機、Wはワークを示す。
(1) is a box-shaped machine base, and a polishing disc (3) is attached to a support frame (2) in the machine base (1). The polishing disc (3) is driven by a motor (4). It is horizontally rotated through a transmission mechanism such as a V belt and a V pulley. The lower side of the polishing disk (3) is composed of a metal base (5) on which a polishing abrasive grain layer of metal bond fixed abrasives is formed, the upper surface of which is the polishing surface (6). It is said that. Further, a work loading / unloading and gripping processing device (7) is provided on the support frame (2) of the machine base (1), and its support (8).
A swinging arm (9) is swingably held by the swinging arm (9), and a work piece is attached / detached and a polishing surface (6) is provided below the tip of the swinging arm (9).
A work holding device (10) for pressing the work is attached to the work holding device (10), which is driven by a motor (11) attached to an upper bracket, and which is moved from a work supply position to a polishing position by a swing arm (9). It is possible to move to the work unloading position via the eccentric position on the surface (6). Further, a polishing surface correction device (12) is provided on the side wall (1a) of the machine base (1).
Has a rotary shaft (13) attached to it so that it can be raised and lowered. A cup-shaped correction electrode body (15) is fixed to the lower end of the rotary shaft (13) through an electric insulator (14), and the lower surface thereof is polished. Surface (6)
It is arranged so as to face the eccentric position on the upper surface.
Further, the rotary shaft (13) is swingable around the upper side thereof, and the correction electrode body (15) at the lower end is configured to be able to adjust the levelness with respect to the polishing surface (6). Further, the anode side of the power supply device (16) attached to the machine base (1) is connected to the base (5) of the polishing disk (3) via the power supply brush (17), and the cathode side is connected to the power supply brush (18). Through the correction electrode body (1
5) and is connected to the polishing surface (6) and the correction electrode body (1).
In the vicinity of the boundary with 5), a nozzle (19) capable of supplying a conductive liquid to the boundary surface is attached to the end of the pipe provided on the machine base (1). Furthermore, a correction grindstone holding device (20) is attached to the side wall (1b) at the front rear of the machine base (1) in the same manner as the polishing surface correction device (12), and the correction grindstone (21) is a general vitrified As with a grindstone, a metal bond grindstone, etc., the processing position and the correction electrode body (15) are defined so that the polishing surface (6) between the work holding device (10) and the polishing surface correction device (12) can be polished. It is located at a different eccentric position. That is, as shown in FIG. 2, the correction grindstone holding device (20) has a vertical feed screw shaft (23) axially supported by a holding device main body (22) attached to a side wall (1b), and a feed screw The upper end of the shaft (23) is connected to the drive shaft of the motor (24) attached to the holding device body (22), and the nut fixed to the lifting bracket (25) is attached to the lower side of the feed screw shaft (23). (26) is screwed on and lift bracket (25)
One side of the motor (24) is slidably engaged with a sliding guide portion (not shown) provided on the side wall (1b) in the vertical direction.
The raising / lowering bracket (25) is configured to be raised and lowered by the feed screw shaft (23) which is rotated by driving the nut and the nut (26) screwed to the feed screw shaft (23), and further, the tubular portion (27) of the raising and lowering bracket (25). A spherical seat (28) is formed on the upper end surface of the.
Reference numeral (29) is a holding tube inserted into the tubular portion (27) with a slight gap, and an upper flange (30) is fixed to the upper end of the holding tube (29), and the lower portion of the outer periphery thereof is fixed. Is the spherical seat (2
8) is formed with a spherical seat (31), and since the holding cylinder (29) has its spherical seat (31) engaged with the spherical seat (28), The holding cylinder (29) is swingably held by the lifting bracket (25). Further, a lower flange (32) is fixed to the lower end of the holding cylinder (29), and an appropriate number of vertical adjusting bolts (33) are screwed around the outer periphery of the lower flange (32). 25), the tilting of the holding cylinder (29) suspended by the spherical seat (28) with respect to the vertical direction is adjusted by the adjustment bolt (33) coming in and out, and the adjustment bolt (33) is adjusted. The holding cylinder (29) is fixed to the elevating bracket (25) in a predetermined inclined state by tightening. The upper and lower bearings (3
4), the rotary shaft (35) pivotally supported by (34) is inserted, the upper end of which is connected to the drive shaft of the motor (36) and the lower end is fixed with the above-mentioned correction grindstone (21). (37) is a pressurizing force adjuster provided in the work holding device (10), and W is a work.

このように構成されたものは、第3図に示すように、ワ
ーク保持装置(10)の揺動アーム(9)を揺動させて保
持されたワークWを研摩研摩ディスク(3)の研摩面
(6)上の加工位置へ位置させるとともに、モータ(1
1)を駆動してワークWを回転させる。続いて、ワーク
保持装置(10)の加圧力調整機(37)を作動させ、回転
しているワークWをモータ(4)により回転されている
研摩ディスク(3)の研摩面(6)へ所定の圧力で圧接
し、適当なクーラントを加えてワーク研摩を行う。ワー
クWの研摩加工につれて研摩面(6)に偏摩耗や凹凸部
等が生じて修正を要することとなったら、同じ機台
(1)に前記研摩面(6)上の加工位置とは異なる偏心
位置に修正砥石(21)があるように組み込まれている修
正砥石保持装置(20)のモータ(36)を駆動して回転軸
(35)により下部の修正砥石(21)を回転させる。修正
砥石(21)はあらかじめその水平度調整が施されていて
下面が研摩面(6)の傾斜度に対応して傾動させてあ
る。これは各調節ボルト(33)の出し入れ調整により、
昇降ブラケット(25)の球面受座(28)に球面受座(3
1)により係合保持さている保持筒(29)が前記球面受
座(28)と球面受座(31)との係合面における滑りによ
り揺動し、これにより回転軸(35)も揺動して下端の修
正砥石(21)の下面が傾動し、これが研摩面(6)の傾
斜度に対応したところで調節ボルト(33)を位置決め固
定して行われる。次いで、モータ(24)を駆動して送り
ねじ軸(23)を回転させ、ナット(26)を介して昇降ブ
ラケット(32)を下降させ、修正砥石(21)を研摩面
(6)に対し所定の切込み位置まで下降させてクーラン
トを供給しながら研摩面(6)の修正研摩を行う。この
後述、研摩面(6)上の前記加工位置や修正砥石(21)
の設置位置とは異なる偏心位置に設置された研摩面修正
装置(12)を作動させて、前記同様に研摩面(6)の傾
斜度に沿った状態に水平度調整されている修正電極体
(15)を回転させるとともに下降させ、その下面と研摩
面(6)との対向間隙が所定値となったら、下降停止さ
せて導電性液体を図示されないポンプ装置によりノズル
(19)より前記間隙部へ供給し、その間を導電性液体に
より満たす。次に、電源装置(16)により給電ブラシ
(17)、(18)を介して研摩研摩ディスク(3)と修正
電極体(15)間に所定電圧をかければ、研摩面(6)と
修正電極体(15)間に電解作用が生じ、研摩面(6)が
電解研摩される。この際、修正電極体(15)は昇降動自
在な回転軸(13)の下端に電気絶縁体(14)を介して取
付けられて前記研摩面(6)上の偏心位置まで下降する
回転可能なものとしてあるから、その下面と研摩面
(6)との平行が容易に得られ安定した電解が可能とな
る。
With this construction, as shown in FIG. 3, the work W held by swinging the swing arm (9) of the work holding device (10) is used as the polishing surface of the polishing disk (3). (6) Place the motor in the upper machining position and
1) is driven to rotate the work W. Subsequently, the pressurizing force adjuster (37) of the work holding device (10) is actuated to bring the rotating work W to the polishing surface (6) of the polishing disk (3) rotated by the motor (4) in a predetermined manner. Press at the pressure of, and add a suitable coolant to polish the work. If uneven polishing, unevenness, etc. occur on the polishing surface (6) as the work W is polished, and the correction is required, the eccentricity different from the processing position on the polishing surface (6) on the same machine base (1). The motor (36) of the correction grindstone holding device (20) incorporated so that the correction grindstone (21) is located at the position drives the rotation shaft (35) to rotate the lower correction grindstone (21). The correction grindstone (21) has its levelness adjusted in advance, and the lower surface thereof is tilted according to the inclination of the polishing surface (6). This is done by adjusting the adjustment bolts (33)
The spherical seat (3) is attached to the spherical seat (28) of the lifting bracket (25).
The holding cylinder (29) engaged and held by 1) swings due to the slip on the engagement surface between the spherical seat (28) and the spherical seat (31), which also swings the rotary shaft (35). Then, the lower surface of the correction grindstone (21) at the lower end is tilted, and the adjustment bolt (33) is positioned and fixed where this corresponds to the inclination of the polishing surface (6). Next, the motor (24) is driven to rotate the feed screw shaft (23), the lifting bracket (32) is lowered via the nut (26), and the correction grindstone (21) is moved to the polishing surface (6) in a predetermined manner. The polishing surface (6) is corrected and polished while lowering to the notch position and supplying the coolant. This later, the processing position on the polishing surface (6) and the correction grindstone (21)
The correction electrode body (12), which is installed at an eccentric position different from the installation position of (1), is actuated to adjust the levelness to a state along the inclination of the polishing surface (6) in the same manner as described above ( 15) is rotated and lowered, and when the opposing gap between the lower surface and the polishing surface (6) reaches a predetermined value, the lowering is stopped and the conductive liquid is pumped by a pump device (not shown) from the nozzle (19) to the gap portion. It is supplied and the space between them is filled with a conductive liquid. Next, if a predetermined voltage is applied between the polishing disk (3) and the correction electrode body (15) via the power supply brushes (17) and (18) by the power supply device (16), the polishing surface (6) and the correction electrode (6) Electrolytic action occurs between the bodies (15), and the polishing surface (6) is electrolytically polished. At this time, the correction electrode body (15) is attached to the lower end of a rotating shaft (13) which can be moved up and down via an electric insulator (14), and is rotatable down to an eccentric position on the polishing surface (6). Since it is provided, the lower surface and the polished surface (6) are easily parallel to each other, and stable electrolysis is possible.

以上により研摩面(6)は修正砥石(21)により所定量
の荒研摩がされ、続いて、修正電極体(15)により微細
研摩されるとともに研摩面(6)の砥粒の出張りも均一
に調整され、偏摩耗や凹凸部を除去された所定の研摩面
(6)に再生される。なお、修正砥石(21)は研摩面
(6)の修正状況により適宜停止して修正電極体(15)
により電解微細仕上げを行うが、両者同時に作動させる
こともできる。
As described above, the polishing surface (6) is rough-polished by a predetermined amount by the correction grindstone (21), then finely polished by the correction electrode body (15), and the abrasive grains on the polishing surface (6) are evenly projected. The surface is regenerated to a predetermined polished surface (6) which is adjusted to the above condition and is free from uneven wear and uneven portions. In addition, the correction grindstone (21) is appropriately stopped depending on the correction condition of the polishing surface (6) and the correction electrode body (15) is
Although the electrolytic fine finishing is performed by the above, both can be operated simultaneously.

(考案の効果) 本考案は前記説明より明らかなように、電解研摩方式に
より研摩面のツルーイング・ドレッシングを行う研摩装
置に修正砥石保持装置を加えて修正砥石による研摩面修
正加工も可能としたもので、偏摩耗等が大な場合でも修
正砥石により荒仕上げを行うとともに修正電極体による
電解作業により微細仕上げを行えるので、ツルーイング
・ドレッシングが短時間で行うことができて研摩面の偏
摩耗、凹凸等が大となる高速研摩加工その他の多くの研
摩加工方式に適用でき、しかも、同一機台に全ての機構
を組み込んであるため、研摩作業中においても研摩面の
修正が適時実施できて生産性が向上し、且つ、揺動アー
ムによりワーク保持装置が研摩面の外側のワーク供給位
置から研摩面上の偏心位置にある加工位置に移動可能と
したばかりでなく修正電極体および修正砥石を研摩面上
の前記加工位置とは異なる偏心位置に設けたことにより
極めてコンパクト化されるので安価に提供できるばかり
か、設置面積も小さくできる等の多くの利点を有するも
ので、従来のこの種研摩装置の問題点を解決したものと
して実用的価値極めて大きいものである。
(Effects of the Invention) As is apparent from the above description, the present invention adds a correction grindstone holding device to a polishing device for truing and dressing the polishing surface by the electrolytic polishing method, and enables polishing surface correction processing by the correction grindstone. Therefore, even if uneven wear is large, rough finishing can be performed with a correction grindstone and fine finishing can be performed by electrolytic work with the correction electrode body, so truing and dressing can be performed in a short time, resulting in uneven wear and unevenness on the polished surface. It can be applied to high-speed polishing and many other polishing methods, and because all the mechanisms are built into the same machine base, the polishing surface can be corrected in a timely manner even during polishing work, thus improving productivity. In addition, the swinging arm enables the work holding device to move from the work supply position outside the polishing surface to the processing position at the eccentric position on the polishing surface. Not only can it be made extremely compact by providing the correction electrode body and the correction grindstone at an eccentric position different from the above-mentioned processing position on the polishing surface, so not only can it be provided at a low cost, but it also has many advantages such as a small installation area. It has an extremely high practical value as a solution to the problems of the conventional polishing apparatus of this kind.

【図面の簡単な説明】[Brief description of drawings]

第1図は本考案の実施例を示す正面図、第2図は本考案
における修正砥石保持装置の一部切欠正面図、第3図は
研摩ディスク上におけるワーク、修正砥石、修正電極体
の位置関係の一例を示す概略説明図である。 (1):機台、(3):研摩ディスク、(6):研摩
面、(9):揺動アーム、 (10):ワーク保持装置、(12):研摩面修正装置、
(13):回転軸、(14):電気絶縁体、 (15):修正電極体、(16):電源装置、(20):修正
砥石保持装置、(21):修正砥石。
FIG. 1 is a front view showing an embodiment of the present invention, FIG. 2 is a partially cutaway front view of a correction grindstone holding device in the present invention, and FIG. 3 is a position of a work, a correction grindstone, and a correction electrode body on a polishing disk. It is a schematic explanatory drawing which shows an example of a relationship. (1): Machine stand, (3): Abrasive disc, (6): Abrasive surface, (9): Swing arm, (10): Work holding device, (12): Abrasive surface correction device,
(13): rotating shaft, (14): electrical insulator, (15): repairing electrode assembly, (16): power supply device, (20): repairing grindstone holding device, (21): repairing grindstone.

───────────────────────────────────────────────────── フロントページの続き (72)考案者 中川 威雄 神奈川県川崎市中原区市ノ坪223番地4― 416 武蔵小杉ビューハイツ (72)考案者 大森 整 東京都板橋区前野町6丁目41番16号 西尾 方10号室 ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Takeo Nakagawa, creator 4-2 Nakatsubo, Nakahara-ku, Kawasaki-shi, Kanagawa 4-216 Musashi-Kosugi View Heights (72) Sei Omori 6-41-16 Maeno-cho, Itabashi-ku, Tokyo Nishio Room 10

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] 【請求項1】上面をメタルボンド固定砥粒による研摩面
(6)とした水平回転自在な研摩ディスク(3)と、前
記研摩面(6)にワークを押し付けるワーク保持装置
(10)と、前記研摩面(6)に対向する研摩面修正用の
修正砥石(21)を備えた修正砥石保持装置(20)と、昇
降動自在な回転軸(13)の下端に電気絶縁体(14)を介
して取付けられて前記研摩面(6)上の偏心位置まで下
降する回転可能な修正電極体(15)と前記研摩ディスク
(3)とを電源装置(16)に接続して導電性液体の供給
下に前記研摩面(6)を電解仕上げする研摩面修正装置
(12)とが同一の機台(1)に組み込まれており、前記
修正砥石(21)は傾角調節可能として研摩面(6)の上
方の前記修正電極体(15)とは異なる偏心位置に昇降動
自在に配置されるとともに、前記ワーク保持装置(10)
は研摩面(6)の外側のワーク供給位置から加工位置で
ある研摩面(6)の上方の前記修正電極体(15)と修正
砥石(21)の各設置位置とは異なる偏心位置を経てワー
ク搬出位置へ移動させる揺動アーム(9)に取付けられ
たものとしたことを特徴とする研摩装置。
1. A horizontally rotatable polishing disk (3) having an upper surface as a polishing surface (6) with fixed metal bond abrasive grains, a work holding device (10) for pressing a work against the polishing surface (6), and A correction grindstone holding device (20) provided with a correction grindstone (21) for correcting the polishing surface facing the polishing surface (6), and an electric insulator (14) at the lower end of a rotating shaft (13) which can be moved up and down. Is attached to the polishing surface (6) and is lowered to an eccentric position on the polishing surface (6) and the polishing disk (3) is connected to a power supply device (16) to supply a conductive liquid. And a polishing surface correction device (12) for electrolytically finishing the polishing surface (6) are incorporated in the same machine base (1), and the correction whetstone (21) is provided with an adjustable tilt angle. It is arranged so as to be able to move up and down at an eccentric position different from the upper correction electrode body (15). The workpiece holding device (10)
Indicates a work from a work supply position outside the polishing surface (6) through an eccentric position different from the respective installation positions of the correction electrode body (15) and the correction grindstone (21) above the polishing surface (6) which is a processing position. A polishing device, characterized in that it is attached to a swinging arm (9) which is moved to a carry-out position.
JP1989003972U 1989-01-18 1989-01-18 Polishing equipment Expired - Lifetime JPH0650131Y2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1989003972U JPH0650131Y2 (en) 1989-01-18 1989-01-18 Polishing equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1989003972U JPH0650131Y2 (en) 1989-01-18 1989-01-18 Polishing equipment

Publications (2)

Publication Number Publication Date
JPH0297566U JPH0297566U (en) 1990-08-03
JPH0650131Y2 true JPH0650131Y2 (en) 1994-12-21

Family

ID=31206077

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1989003972U Expired - Lifetime JPH0650131Y2 (en) 1989-01-18 1989-01-18 Polishing equipment

Country Status (1)

Country Link
JP (1) JPH0650131Y2 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5761943B2 (en) * 2010-03-25 2015-08-12 株式会社東京精密 Finish grinding apparatus and finish grinding method

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6384859A (en) * 1986-09-25 1988-04-15 Citizen Watch Co Ltd Polishing device

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5463297U (en) * 1977-10-13 1979-05-04

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6384859A (en) * 1986-09-25 1988-04-15 Citizen Watch Co Ltd Polishing device

Also Published As

Publication number Publication date
JPH0297566U (en) 1990-08-03

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