JPH0644096Y2 - 高周波誘導加熱用サセプタ - Google Patents
高周波誘導加熱用サセプタInfo
- Publication number
- JPH0644096Y2 JPH0644096Y2 JP1988087886U JP8788688U JPH0644096Y2 JP H0644096 Y2 JPH0644096 Y2 JP H0644096Y2 JP 1988087886 U JP1988087886 U JP 1988087886U JP 8788688 U JP8788688 U JP 8788688U JP H0644096 Y2 JPH0644096 Y2 JP H0644096Y2
- Authority
- JP
- Japan
- Prior art keywords
- susceptor
- frequency induction
- induction heating
- heating
- graphite
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Landscapes
- Crystals, And After-Treatments Of Crystals (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1988087886U JPH0644096Y2 (ja) | 1988-07-01 | 1988-07-01 | 高周波誘導加熱用サセプタ |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1988087886U JPH0644096Y2 (ja) | 1988-07-01 | 1988-07-01 | 高周波誘導加熱用サセプタ |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH029425U JPH029425U (lv) | 1990-01-22 |
JPH0644096Y2 true JPH0644096Y2 (ja) | 1994-11-14 |
Family
ID=31312475
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1988087886U Expired - Lifetime JPH0644096Y2 (ja) | 1988-07-01 | 1988-07-01 | 高周波誘導加熱用サセプタ |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0644096Y2 (lv) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH04129434U (ja) * | 1991-01-25 | 1992-11-26 | ハリソン電機株式会社 | 照光式押釦スイツチ |
US20170051407A1 (en) * | 2015-08-17 | 2017-02-23 | Applied Materials, Inc. | Heating Source For Spatial Atomic Layer Deposition |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS62170627U (lv) * | 1986-04-17 | 1987-10-29 |
-
1988
- 1988-07-01 JP JP1988087886U patent/JPH0644096Y2/ja not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
JPH029425U (lv) | 1990-01-22 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
EP0964433B1 (en) | Multiple-layered ceramic heater | |
TW571382B (en) | Electrostatic chuck and substrate processing apparatus | |
US3845738A (en) | Vapor deposition apparatus with pyrolytic graphite heat shield | |
JPH0834187B2 (ja) | サセプタ | |
JPS6169116A (ja) | シリコンウエハ−の連続cvdコ−テイング用サセプター | |
JP2012502478A (ja) | 調整可能な電気抵抗率を有するウェーハ処理装置 | |
CN103911596A (zh) | 一种制备金刚石膜的装置及使用该装置制备金刚石膜的方法 | |
JPH0631185B2 (ja) | 炭化珪素発熱体の製造方法 | |
JPH07297268A (ja) | 静電チャック付セラミックスヒーター | |
JPH0644096Y2 (ja) | 高周波誘導加熱用サセプタ | |
EP1416520A1 (en) | Heating apparatus with electrostatic attraction function and method for producing it | |
JP2004200436A (ja) | サセプタ及びその製造方法 | |
JPH04358074A (ja) | ホットプレート | |
JPS6396912A (ja) | 基板ホルダ− | |
JP2005503009A (ja) | エピタキシャル成長制御装置を備えたサセプターおよびそれを使用したエピタキシャル反応器 | |
JP3788836B2 (ja) | 気相成長用サセプタ及びその製造方法 | |
US7679880B2 (en) | Electrostatic chuck and manufacturing method thereof | |
JP4166345B2 (ja) | 塩素系ガスに対する耐蝕性部材 | |
JP3170248B2 (ja) | 半導体基板保持装置 | |
JP3565469B2 (ja) | 気相成長用のサセプタ | |
JPH0227715A (ja) | 気相成長装置用加熱ステージ | |
JPH0774451B2 (ja) | 成膜装置 | |
JP3844408B2 (ja) | 複層セラミックスヒータ | |
JP2021038129A (ja) | 単結晶製造装置及びSiC単結晶の製造方法 | |
EP3686922A1 (en) | Wafer supporting device |