JPH06341958A - シャドウマスク検査方法及び装置 - Google Patents

シャドウマスク検査方法及び装置

Info

Publication number
JPH06341958A
JPH06341958A JP5154452A JP15445293A JPH06341958A JP H06341958 A JPH06341958 A JP H06341958A JP 5154452 A JP5154452 A JP 5154452A JP 15445293 A JP15445293 A JP 15445293A JP H06341958 A JPH06341958 A JP H06341958A
Authority
JP
Japan
Prior art keywords
shadow mask
illumination light
image
main surface
dark
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP5154452A
Other languages
English (en)
Japanese (ja)
Inventor
Toru Shibahara
亨 芝原
Kichiji Asai
吉治 浅井
Masayoshi Kobayashi
正嘉 小林
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dainippon Screen Manufacturing Co Ltd
Original Assignee
Dainippon Screen Manufacturing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dainippon Screen Manufacturing Co Ltd filed Critical Dainippon Screen Manufacturing Co Ltd
Priority to JP5154452A priority Critical patent/JPH06341958A/ja
Priority to KR19940007207A priority patent/KR940026536A/ko
Publication of JPH06341958A publication Critical patent/JPH06341958A/ja
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/956—Inspecting patterns on the surface of objects
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/82—Auxiliary processes, e.g. cleaning or inspecting
    • G03F1/84—Inspecting
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/956—Inspecting patterns on the surface of objects
    • G01N2021/95676—Masks, reticles, shadow masks

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
JP5154452A 1993-05-31 1993-05-31 シャドウマスク検査方法及び装置 Pending JPH06341958A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP5154452A JPH06341958A (ja) 1993-05-31 1993-05-31 シャドウマスク検査方法及び装置
KR19940007207A KR940026536A (enExample) 1993-05-31 1994-04-06

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5154452A JPH06341958A (ja) 1993-05-31 1993-05-31 シャドウマスク検査方法及び装置

Publications (1)

Publication Number Publication Date
JPH06341958A true JPH06341958A (ja) 1994-12-13

Family

ID=15584535

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5154452A Pending JPH06341958A (ja) 1993-05-31 1993-05-31 シャドウマスク検査方法及び装置

Country Status (2)

Country Link
JP (1) JPH06341958A (enExample)
KR (1) KR940026536A (enExample)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012107937A (ja) * 2010-11-16 2012-06-07 Toyo Kohan Co Ltd 板材検査方法及び板材検査装置
JP2012107936A (ja) * 2010-11-16 2012-06-07 Toyo Kohan Co Ltd 多孔板表面検査方法及び多孔板表面検査装置
US8223326B2 (en) 2008-02-19 2012-07-17 Snu Precision Co., Ltd. Dark-field examination device
CN104115004A (zh) * 2012-02-10 2014-10-22 株式会社岛津制作所 太阳能电池单体的检查装置以及太阳能电池单体的处理装置
JP2015068787A (ja) * 2013-09-30 2015-04-13 大日本印刷株式会社 蒸着マスクの検査方法および蒸着マスクの検査治具

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8223326B2 (en) 2008-02-19 2012-07-17 Snu Precision Co., Ltd. Dark-field examination device
JP2012107937A (ja) * 2010-11-16 2012-06-07 Toyo Kohan Co Ltd 板材検査方法及び板材検査装置
JP2012107936A (ja) * 2010-11-16 2012-06-07 Toyo Kohan Co Ltd 多孔板表面検査方法及び多孔板表面検査装置
CN104115004A (zh) * 2012-02-10 2014-10-22 株式会社岛津制作所 太阳能电池单体的检查装置以及太阳能电池单体的处理装置
JP2015068787A (ja) * 2013-09-30 2015-04-13 大日本印刷株式会社 蒸着マスクの検査方法および蒸着マスクの検査治具

Also Published As

Publication number Publication date
KR940026536A (enExample) 1994-12-09

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