JPH06291027A - Supplying device for treatment liquid of rotary substrate treatment apparatus - Google Patents

Abstract

PURPOSE:To obtain a supply device wherein, while a temperature can be regulated sufficiently by a temperature-regulating pipe, the unexpected drop of a treatment liquid due to the deformation of a treatment liquid supply tube is not caused and a nozzle which has been selected from a plurality of nozzles is moved surely to a prescribed position in a prescribed attitude. CONSTITUTION:A plurality of nozzles 1 and treatment liquid supply tubes are supported by a rigid arm 4 which is used partly as, and constituted of, temperature regulating pipes 3 which come into contact with the tubes and which make the temperature of treatment liquids at their inside defnite. The support arm 4 is supported so as to be rotatable around the rotation center prescribed in a prescribed part at the side of a substrate W in such a way that the nozzles 1 are displaced to their discharge positions and their standby positions away from the upper part of the wafer W. The support arm 4 is engaged and held alternatively by a driving arm 21, and it is turned in such a way that the nozzles 1 are displaced to their discharge positions and their standby positions.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a semiconductor wafer, a glass substrate for a photomask, a glass substrate for a liquid crystal display device,
A plurality of nozzles for supplying a treatment liquid to a rotatably supported substrate for supplying a surface treatment liquid such as a photoresist liquid to a substrate such as an optical disc substrate for performing the surface treatment, and a nozzle and the treatment liquid. A plurality of tubes that connect to the storage part, temperature control pipes that contact the tubes to keep the temperature of the processing liquid in the tubes constant, and of the nozzles, selectively take out the desired nozzle and place it above the substrate. The present invention relates to a processing liquid supply apparatus for a rotary substrate processing apparatus including a nozzle moving unit that moves to a discharge position.

[0002]

2. Description of the Related Art In a rotary substrate processing apparatus as described above, a plurality of processing liquid supply systems are provided for selecting and supplying a plurality of types of processing liquids having different components and viscosities even in the same apparatus. Is desired to be provided. Therefore, conventionally, for example, as disclosed in Japanese Utility Model Publication No. 4-52990, a desired nozzle among a plurality of nozzles provided at a standby position is selectively gripped by a transfer arm, and a desired substrate is ejected. There is known one configured to move to an upper discharge position.

[0003]

However, the above-mentioned conventional example has the following drawbacks. When gripping and moving the nozzle with the transfer arm, the hardness of the tube connected to the nozzle acts as a resistance and the nozzle posture changes, and when the nozzle is moved to the discharge position on the substrate, for example, the nozzle discharges the desired discharge. The ejection posture becomes unstable, such as shifting from the position or tilting without going directly below,
The position where the processing liquid is dropped from the nozzle is displaced on the substrate. Generally, such a treatment liquid dropping position is required to have an accuracy of 0.1 mm unit in order to perform the treatment uniformly.However, if such a dropping position occurs, the treatment quality will deteriorate. was there. When the nozzle is moved between the standby position and the discharge position, the tube connecting the processing liquid supply source and the nozzle is largely displaced, so that the processing liquid supply tube is used to keep the temperature of the processing liquid constant. When a multiple pipe is inserted through the temperature control pipe, the rigidity of the multiple pipe becomes large, which makes it difficult to handle the pipe. Conversely, if the temperature control pipe is made of a thin and flexible material in order to prioritize the handling of the pipe, the amount of the temperature control liquid in the temperature control pipe will be insufficient and the tube for supplying the processing liquid will be evenly distributed from the surroundings. There was a drawback that the temperature control became impossible and the temperature control accuracy decreased. When the tube moves a lot, the tube undergoes large bending deformation and torsional deformation, and this deformation causes a volume change in the pipe, which causes the treatment liquid in the tube to drip from the nozzle onto the substrate. There was a drawback that the phenomenon of falling off, so-called fluffing phenomenon, was likely to occur.

The present invention has been made in view of the above circumstances, and the processing liquid supply apparatus of the rotary substrate processing apparatus according to the first aspect of the present invention sufficiently heats the processing liquid by the temperature control pipe. In addition, the nozzle selected from the plurality of nozzles can be reliably moved to a predetermined position in a predetermined posture without causing unexpected drops of the processing liquid due to deformation of the processing liquid supply tube. In order to achieve the above, the processing liquid supply apparatus of the rotary substrate processing apparatus according to the second and third aspects of the present invention further includes the movement of the selected nozzle,
It is an object of the present invention to make it possible to carry out without bringing dust on the substrate.

[0005]

According to a first aspect of the present invention, there is provided a processing liquid supply apparatus for a rotary substrate processing apparatus, wherein the processing liquid is supplied to a rotatably supported substrate in order to achieve the above object. A plurality of nozzles to be supplied, a plurality of tubes that connect the nozzles to the processing liquid storage unit, and a temperature control pipe that contacts the tubes to keep the temperature of the processing liquid inside the tubes constant,
In a processing liquid supply device of a rotary substrate processing apparatus, which comprises a nozzle moving means for selectively taking out a desired nozzle among the nozzles and moving it to a discharge position above the substrate, Each of them is supported via a rigid support arm, and each of the support arms is located at a position off the nozzle so that the nozzle moving means is displaced to a discharge position and a standby position off the substrate. Arm support means for rotatably supporting a rotation center defined at a predetermined position, and arm rotation means for selectively engaging the support arm and rotating the nozzle so as to displace the nozzle between the discharge position and the standby position. It consists of and.

Further, in order to achieve the above-mentioned object, the processing liquid supply apparatus for the rotary substrate processing apparatus according to the second aspect of the present invention supplies a plurality of processing liquids to the rotatably supported substrates. A nozzle, a plurality of tubes that connect the nozzle to the processing liquid storage unit, a temperature control pipe that contacts the tubes to keep the temperature of the processing liquid inside the nozzle constant, and a desired nozzle is selected from the nozzles. In a processing liquid supply apparatus of a rotary substrate processing apparatus, which is provided with a nozzle moving means that is taken out once and moved to a discharge position above the substrate, each set of a nozzle and the tube is connected via a rigid support arm. And the nozzle moving means for individually supporting the respective supporting arms so as to be rotatable, and an arm for moving a desired one of the arm rotating supports to a predetermined position laterally of the substrate. By engaging the selective moving means and the support arm moved to the predetermined position by the arm selective moving means at the side of the substrate, the support arm is moved to a predetermined position apart from above the nozzle. A centering engagement mechanism that regulates a rotation center position so as to rotate around a defined rotation center, and a support arm that is centered by the centering engagement mechanism engages with the side of the substrate to rotate. Then, the nozzle supported by the support arm is composed of arm rotating means for moving the nozzle to a discharge position and a standby position deviated from above the substrate.

Further, in order to achieve the above-mentioned object, the processing liquid supply apparatus for the rotary substrate processing apparatus according to the third aspect of the present invention supplies a plurality of processing liquids to the rotatably supported substrates. A nozzle, a plurality of tubes that connect the nozzle to the processing liquid storage unit, a temperature control pipe that contacts the tubes to keep the temperature of the processing liquid inside the nozzle constant, and a desired nozzle is selected from the nozzles. In a processing liquid supply apparatus of a rotary substrate processing apparatus, which is provided with a nozzle moving means that is taken out once and moved to a discharge position above the substrate, each set of a nozzle and a tube is passed through a rigid support arm. Support,
The nozzle moving means is moved between an arm rotation supporting member that rotatably supports each of the supporting arms around an individual predetermined position on the side of the substrate and the supporting arms so that the nozzle moving means moves to a desired supporting arm laterally of the substrate. The arm selection mechanism that engages selectively with and the support arm that is engaged on the side of the substrate by the arm selection mechanism are rotated to disengage the nozzle supported by the support arm from the ejection position and above the substrate. Arm rotation means for moving the arm to the standby position.

[0008]

According to the structure of the processing liquid supply apparatus for the rotary substrate processing apparatus of the first aspect of the present invention, a set of a plurality of nozzles and tubes is made to be supported by a support arm, and a desired one of the plurality of support arms is supported. When the arm rotating means is selectively engaged with the supporting arm supporting the nozzle and the tube, and the arm rotating means rotates about the rotation center defined by the arm supporting means, the supporting arm supports the supporting arm. The desired nozzle is moved to a predetermined position.

As described above, the movement of the nozzle moves so that the rotation center is defined at a predetermined position by the arm support means and the distance from the rotation center of the nozzle is defined by the support arm. Is regulated.
Therefore, the desired nozzle can be accurately moved to the predetermined position by the rotational movement whose center and radius are defined.

Further, during the movement, since the tube is also supported by the support arm together with the nozzle, the support arm receives the force generated by the deformation of the tube during the movement and does not give the force to the nozzle. The posture does not become unstable, and the treatment liquid dropping position does not shift.

According to the structure of the processing liquid supply apparatus of the rotary substrate processing apparatus of the second aspect of the present invention, a set of a plurality of nozzles and tubes is supported by a support arm, and a desired one of the plurality of support arms is supported. The support arm for supporting the nozzle and the tube is moved to a predetermined position on the side of the substrate by the selecting means, and the center of rotation is defined by the centering and engaging mechanism, and then the arm rotating means is selected at the side of the substrate. And the support arm is rotated about the center of rotation defined by the centering engagement mechanism by the arm rotating means, and the desired nozzle supported by the support arm is moved to a predetermined position.

As described above, the nozzle is moved in such a manner that the center of rotation defines the center of rotation at a predetermined position on the side of the substrate by the centering engagement mechanism, and the distance from the center of rotation of the nozzle is defined by the support arm. Movement is regulated so that it can be moved. Therefore, the desired nozzle can be accurately moved to the predetermined position by the rotational movement whose center and radius are defined.

Further, during the movement, since the tube is also supported by the support arm together with the nozzle, the support arm receives the force generated by the deformation of the tube during the movement, and does not give the force to the nozzle. The posture does not become unstable, and the treatment liquid dropping position does not shift.

According to the structure of the processing liquid supply device of the rotary substrate processing apparatus of the third aspect of the present invention, each set of a plurality of nozzles and tubes is supported by the support arm, and each of the support arms rotates the arm. Since the support body is rotatably supported around each predetermined position on the side of the substrate as a rotation center, the position on the side of the substrate with respect to the support arm supporting the desired nozzle and tube among the plurality of support arms. The arm selection mechanism engages with the
The arm rotation support rotates about a rotation center defined by the arm rotation support, and the desired nozzle supported by the support arm moves to a predetermined position.

As described above, the movement of the nozzle is such that the rotation center is defined by the arm rotation support at a predetermined position on the side of the substrate, and the distance from the rotation center of the nozzle is defined by the support arm. The movement is regulated so that Therefore, the desired nozzle can be accurately moved to the predetermined position by the rotational movement whose center and radius are defined.

Further, during the movement, since the tube is also supported by the support arm together with the nozzle, the force generated by the deformation of the tube during the movement is received by the support arm and does not give a force to the nozzle. The posture does not become unstable, and the treatment liquid dropping position does not shift.

[0017]

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS FIG. 1 is a partially cutaway side view showing a first embodiment of a processing liquid supply apparatus for a rotary substrate processing apparatus according to the present invention, FIG. 2 is a plan view, and FIG. FIG. 3 is a partially cutaway side view showing a plurality of nozzles 1 for supplying a photoresist liquid, which is an example of a processing liquid, to a semiconductor substrate W rotatably supported.
Each of them and the treatment liquid storage portion T are connected via a tube 2, and each of the tubes 2 ... Is covered with a temperature control pipe 3 for circulating constant temperature water that keeps the temperature of the treatment liquid therein, and Of the nozzles 1, ..., a desired nozzle 1 is selectively taken out and a nozzle moving means that moves between a discharge position set above the vicinity of the rotation center of the substrate W and a standby position deviated from above the substrate W is provided. The processing liquid supply device is provided.

Each of the nozzles 1 ... Is provided at the tip of a highly rigid metal pipe 3a which is also used as a part of the temperature control pipe 3, and the tip side of the tube 2 is inserted and supported inside the metal pipe 3a. . Further, the return tube 5 is inserted through the inside of the metal pipe 3a.
The constant temperature water supplied inside keeps the treatment liquid in the tube 2 at a constant temperature, and then is recovered via the return tube 5. The constant temperature water may be supplied in the opposite direction to the above, that is, may be supplied into the temperature control pipe through the return tube 5.

A support block 6 is integrally attached to the base of the metal pipe 3a, and a metal cylinder shaft 7 is integrally connected to one end of the support block 6 to support the metal pipe 3a and the support. The block 6 and the cylinder shaft 7 constitute a rigid support arm 4 that supports the nozzle 1 and the tube 2. The temperature control pipe 3 is a metal pipe 3
a, a support block 6, a cylinder shaft 7, and a return tube 5. At the lower end of the cylindrical shaft 7, a constant temperature water supply tube 8 that constitutes the temperature control pipe 3 is connected, and the processing liquid supply tube 2 and the return tube 5 are inserted into the constant temperature water supply tube 8. The constant temperature water supply tube 8 is connected to a constant temperature water supply source (not shown).

The cylinder shafts 7 of the support arms 4 ... Respectively support the arm rotation support 9 which constitutes arm support means.
Is rotatably supported around the axis of the cylindrical shaft 7. Further, each arm rotation support 9 ... Is a common movable frame 10
Further, they are supported in parallel in a straight line so as to be vertically movable via the respective guide rails 11.

The movable frame 10 is supported by the apparatus frame 12 (immovable) of the rotary substrate processing apparatus so as to be horizontally movable via the guide rails 13, and the rack 14 provided on the movable frame 10 can be rotated forward and backward. It is engaged with the pinion 16 driven by the electric motor 15,
The arm selection moving means is configured to move the arm rotation support 9 in the parallel direction by the forward and reverse drive of 5.

An elevating frame 18 which is vertically moved by a pair of air cylinders 17a and 17b connected in series is provided on a side portion of the arm rotation support 9, and the elevating frame 18 is connected to the elevating frame 18 by an air cylinder 19. A movable bracket 20 is provided which is movable in the vertical direction. A support shaft 21a that is rotatable around a rotation center P at a predetermined position is provided on the movable bracket 20, and a drive arm 21 is provided below the support shaft 21a so as to be rotatable around the rotation center P.

A support block 6 in each support arm 4 ...
A conical engagement concave portion 22 is formed on the upper surface of the cylinder shaft 7 on the axial center of the cylinder shaft 7, and an engagement pin 23 is provided at a position away from the concavity concave portion 22 on the nozzle 1 side.

On the other hand, on the lower surface of the drive arm 21, a conical engagement projection 24 is provided coaxially with the center of rotation P so as to project from the center of rotation P and corresponds to the engagement pin 23. Engagement holes 25 are formed. Then, one arbitrarily selected support arm 4 is moved by the arm selecting and moving means including the movable frame 10 and the electric motor 15 so that the axis of the cylindrical shaft 7 of the support arm 4 is the drive arm 2.
When it is moved to a predetermined position located directly below the rotation center P of the drive arm 1, the drive arm 21 is moved with respect to the support arm 4.
By lowering the engaging recess 22 of the support arm 4.
The engaging projection 23 and the engaging hole 25 of the drive arm 21 are engaged with the engaging pin 23 to hold the drive arm 21 and the support arm 4 in one body, and the cylindrical axis of the support arm 4 is retained. A centering engagement mechanism that positions the shaft 7 of the drive arm 21 so as not to be displaced in the horizontal direction from the rotation center P of the drive arm 21 is configured.

The support shaft 21a of the drive arm 21 is mounted on the movable bracket 20 and is capable of rotating in the forward and reverse directions.
Are linked to each other via a timing belt 27,
By rotating the drive arm 21 forward and backward, the support arm 4 engaged and held as described above is rotated around the rotation center P defined at a predetermined position, and the nozzle 1 of the support arm 4 is dislocated to the side of the substrate W. The arm rotating means is configured to move over the standby position and the discharge position near the center of the substrate.

The operation for supplying the processing liquid with the above configuration will be described below. (1) In the initial state, as shown by the solid lines in FIGS. 1 and 2, all the nozzles 1 are retracted to the standby position which is laterally displaced from the substrate W, and the arm rotation support 9 is also in the lowered position. Waiting for Each support arm 4 standing by at the lowered position L has a positioning protrusion 2 provided on the lower surface of the support block 6.
8 and the positioning recess 29 provided on the upper surface of the movable frame 10.
It is positioned and held in a fixed posture by engagement with. In this standby state, each nozzle 1 is thrust into the drying prevention cup 30 provided at a fixed position from above and placed in a wet atmosphere. (2) When supplying the processing liquid, first, the desired nozzle 1
The support arm 4 is the center of rotation P, that is, the drive arm 2
The movable frame 10 is driven by the electric motor 15 so as to come to a position directly below 1. (3) Next, as shown in the partially cutaway side view of FIG. 4, the air cylinder 19 is extended and the movable bracket 20 is lowered, and the drive arm 21 is lowered accordingly. Engage with. As a result, when the support arm 4 is rotated so that the nozzle 1 to be used is located at the ejection position on the substrate, the cylindrical shaft 7 that serves as a rotation center.
Are positioned so as to coincide with the rotation center P of the drive arm 21. (4) After that, the air cylinders 17a and 17b are both extended to raise the elevating frame 18. In the initial stage, the abutment portion 31 provided on the elevating frame 18 abuts on the upper end protrusion 32 of the arm rotation support 9 from below, whereby the support arm 4 becomes the drive arm 21 and the abutting portion 31 of the elevating frame 18. It is clamped up and down with. In this clamped state, the elevating frame 18 is further raised to raise the support arm 4 together with the arm rotation support 9 to the upper limit (H) as shown in the partially cutaway side view of FIG. (5) Next, the electric motor 26 is normally rotated to drive the drive arm 21.
2 is rotated clockwise by a predetermined angle, and the nozzle 1 is rotationally moved to a predetermined ejection position above the substrate W. (6) Next, only one of the air cylinders 17a, 17b is shortened to lower the nozzle 1 to a predetermined supply height (F) above the substrate W, and in this state, start pre-rotation or low-speed rotation. A predetermined amount of the treatment liquid is dropped and supplied onto the substrate W, and the substrate is immediately rotated at a high speed so that the substrate is uniformly spin-coated. (7) When the supply of the processing liquid is completed, the shortened one air cylinder is extended again to support arm 4 and nozzle 1.
Is lifted and retracted to a predetermined height (H) above the substrate W, and then the electric motor 26 is reversely rotated to retract and rotate the support arm 4 to the standby position. With the support arm 4 in the standby position, the air cylinder 17a and 17b are both shortened to lower the elevating frame 18 to the lower limit and the air cylinder 19 is shortened, whereby the movable bracket 20 is moved.
And the drive arm 21 is returned to the ascending position, and the drive arm 21
And the support arm 4 are disengaged. After that, when the nozzle 1 to be used is changed, the movable frame 10 is appropriately driven to select the support arm 4 connected to the drive arm 21, and the above operation is performed.

FIG. 6 is a side view showing a second embodiment of the processing liquid supply apparatus of the rotary substrate processing apparatus according to the present invention. The difference from the first embodiment is as follows. That is,
The drive arm 21 is attached to the lower end of the cylinder shaft 7 of the support arm 4.
Is provided with a connecting arm 40 that is centered and engaged with the drive arm 21, and an abutting portion 41 that cooperates with the drive arm 21 to clamp the cylinder shaft 7 is independently moved up and down by an air cylinder 42 provided in the elevating frame 20. Is configured to. The other structure is the same as that of the first embodiment, and the description thereof will be omitted by giving the same drawing numbers.

FIG. 7 is a side view showing a third embodiment of the processing liquid supply apparatus for a rotary substrate processing apparatus according to the present invention, FIG. 8 is a plan view, and FIG. 9 is a sectional view of a main part. The difference from the embodiment is as follows. That is, a plurality of support arms 4 supporting the nozzle 1 and the tube 2 are rotatably provided side by side around rotation centers Q1, Q2, Q3 defined at different predetermined positions, and are connected to the base of the support arm 4. The arm rotation support 9 that rotatably supports the cylindrical shaft 7 is attached to the device frame 50 by the guide rail 51.
A drive arm 21 for selecting the nozzle 1 to be used is rotatably provided around a certain center R on the side of the support arm 4 group.

Support shaft 5 provided at the base of drive arm 21
2 is a pair of air cylinders 17a, 1 connected in series
An arm 53 extending from the support shaft 52 and an electric motor 26 installed on the elevating frame 18 are rotatably supported by the elevating frame 18 that is moved up and down by 7b.
Are linked together via a link mechanism 54, and the motor 26
The drive arm 21 is configured to traverse above the support arm 4 group by the forward and reverse rotations of.

A roller 55 with a V-groove is rotatably attached to the upper portion of each support arm 4 near the base portion so as to be rotatable about the vertical axis, and can be retracted in the longitudinal direction of the arm by an air cylinder 56 at the lower portion of the drive arm 21. A pair of left and right guide rails 57 are provided in the guide rail 57, and the guide rails 57 that are moved forward and are engaged with the rollers 55. The other structure is the same as that of the first embodiment, and the explanation is omitted by giving the same drawing numbers.

According to the third embodiment, it operates as follows. (1) The drive arm 21 rotates on the group of support arms 4 standing by at the lowered position (L), whereby the support arm 4 of the nozzle 1 to be used is selected and the guide rail 57 is advanced to move the target. The roller 55 of the support arm 4 is engaged and supported. (2) Both air cylinders 17a and 17b are extended together to raise the elevating frame 18, and the support arm 4 selected for engagement is moved to the upper limit (H). (3) Next, the drive arm 21 is rotationally driven to move the nozzle 1 of the support arm 4 that is engaged and supported to the ejection position above the substrate W. In this case, the support arm 4 and the drive arm 21
The difference in the center of rotation between and is absorbed by the relative rolling of the guide rail 57 and the roller 55. (4) After that, one of the air cylinders 17a is shortened to lower the support arm 4 by a predetermined amount, and the substrate W is set to a predetermined supply height (F).

In the first to third embodiments, the nozzle 1
And the metal pipe 3a, which is a part of the support arm 4 that supports the tube 2, also serves as the metal pipe 3a.
However, the structure may be such that a dedicated support arm separate from the temperature control pipe 3 is provided.

[0033]

According to the processing liquid supply apparatus of the rotary substrate processing apparatus of the first aspect of the present invention, a set of a plurality of nozzles and tubes is supported by a support arm, and a desired one of the plurality of support arms is supported. The arm rotation means is selectively engaged with the support arm supporting the nozzle and the tube of FIG. 1 and is rotated around the rotation center defined by the arm support means to move the desired nozzle to a predetermined position. Because
Since the movement of the nozzle is a movement whose movement is restricted so as to be a rotational movement having a center and a radius defined, a desired nozzle can be accurately moved to a predetermined position. In addition, since the tube is supported by the support arm together with the nozzle during the movement, the force generated by the deformation of the tube during the movement is received by the support arm and is not applied to the nozzle. With this, it is possible to reliably move to a predetermined ejection position and improve the processing accuracy. Moreover, since the selected support arm is rotated around a predetermined rotation center, there are few restrictions on the handling of the piping, and the thickness and material of the processing liquid supply tube and the temperature control piping that comes into contact with the processing liquid supply tube can be set arbitrarily. It has become possible to perform good temperature control of the processing liquid. Further, since the deformation of the tube caused by the rotation of the support arm is limited to the torsional deformation around the predetermined rotation center, the volumetric deformation in the tube is less than that in the conventional means that undergoes bending deformation and torsional deformation, and the treatment liquid It is possible to avoid accidental dropping of the processing liquid due to the deformation of the supply tube.

Further, according to the processing liquid supply apparatus of the rotary substrate processing apparatus of the invention of claim 2, the nozzle is the same as the processing liquid supply apparatus of the rotary substrate processing apparatus of the invention of claim 1 described above. Can be reliably moved to a predetermined discharge position in a predetermined posture, processing accuracy can be improved, good temperature control of the processing liquid can be performed, and the processing liquid caused by deformation of the processing liquid supply tube It is possible to avoid accidental dripping. Moreover, since the arm rotation means rotates the support arm laterally of the substrate, that is, in a state of engaging at a position disengaged from above the substrate, the support arm is displaced to the discharge position and the standby position,
The nozzle can be moved without bringing dust on the substrate, and the processing quality can be further improved.

Further, according to the processing liquid supply apparatus of the rotary substrate processing apparatus of the invention according to claim 3, the nozzle is the same as the processing liquid supply apparatus of the rotary substrate processing apparatus of the invention according to claim 1 described above. Can be reliably moved to a predetermined discharge position in a predetermined posture, processing accuracy can be improved, good temperature control of the processing liquid can be performed, and the processing liquid caused by deformation of the processing liquid supply tube It is possible to avoid accidental dripping. In addition, the arm selection mechanism causes the support arm to rotate and be displaced to the discharge position and the standby position while being engaged at the side of the substrate, that is, at the position disengaged from above the substrate.
The nozzle can be moved without bringing dust on the substrate, and the processing quality can be further improved.

[Brief description of drawings]

FIG. 1 is a partially cutaway side view of a first embodiment.

FIG. 2 is a plan view of the first embodiment.

FIG. 3 is a partially cutaway side view of a main part of the first embodiment.

FIG. 4 is a partially cutaway side view of the first embodiment with a support arm engaged.

FIG. 5 is a partially cutaway side view of the first embodiment with the support arm raised.

FIG. 6 is a partially cutaway side view of the second embodiment.

FIG. 7 is a partially cutaway side view of the third embodiment.

FIG. 8 is a plan view of the third embodiment.

FIG. 9 is a sectional view of an essential part of the third embodiment.

[Explanation of symbols]

 1 ... Nozzle 2 ... Tube 3 ... Temperature control pipe 4 ... Support arm 9 ... Arm rotation support P ... Rotation center W ... Substrate

─────────────────────────────────────────────────── ─── Continuation of the front page (51) Int.Cl. ⁵ Identification number Reference number within the agency FI Technical indication location G03F 7/30 502 7124-2H (72) Inventor Hiroshi Kato 322 Hazushi Furukawacho, Fushimi-ku, Kyoto City Univ. Nihon Screen Manufacturing Co., Ltd.Rakusai Factory (72) Inventor Masami Otani 322 Hazushishi Furukawacho, Fushimi-ku, Kyoto Dainichi Screen Manufacturing Co., Ltd. Rakusai Factory

Claims (3)

[Claims] 1. A plurality of nozzles for supplying a processing liquid to a rotatably supported substrate, a plurality of tubes connecting the nozzles and a processing liquid storage section, and a processing liquid inside the tubes in contact with the tubes. Of the rotary substrate processing apparatus including: a temperature control pipe for keeping the temperature of the substrate constant; and a nozzle moving unit that selectively takes out a desired nozzle from the nozzles and moves it to a discharge position above the substrate. In the processing liquid supply apparatus, each of the set of the nozzle and the tube is supported via a rigid support arm, and the nozzle moving means is provided at a discharge position where the nozzle is located and a standby position where the nozzle deviates from above the substrate. Arm supporting means for rotatably supporting each of the support arms rotatably around a rotation center defined at a position deviated from above the nozzle and the support arm; Process liquid supply apparatus of the rotary substrate processing apparatus, characterized in that the nozzle engages one coupled to each other is composed of an arm rotation means for rotating so as to be displaced in the standby position and the discharge position. 2. A plurality of nozzles for supplying a treatment liquid to a rotatably supported substrate, a plurality of tubes connecting the nozzles and a treatment liquid storage section, and a treatment liquid inside the tubes in contact with the tubes. Of the rotary substrate processing apparatus including: a temperature control pipe for keeping the temperature of the substrate constant; and a nozzle moving unit that selectively takes out a desired nozzle from the nozzles and moves it to a discharge position above the substrate. In the treatment liquid supply apparatus, each of the set of the nozzle and the tube is supported via a rigid support arm, and the nozzle moving means is an arm rotation support member that individually rotatably supports each of the support arms. An arm selection moving means for moving a desired one of the arm rotation supports to a predetermined position laterally of the substrate, and the arm selection moving means moved to the predetermined position by the arm selection moving means. By engaging the support arm with the side of the substrate, the rotation center position is defined so as to rotate the support arm at a position deviated from above the nozzle and around a rotation center defined at a predetermined position. A centering engagement mechanism for rotating the nozzle supported by the support arm by engaging the support arm centered by the centering engagement mechanism and rotating the support arm laterally of the substrate. A processing liquid supply device for a rotary substrate processing apparatus, comprising: an arm rotating means for moving the substrate to a standby position which is separated from above the substrate. 3. A plurality of nozzles for supplying a treatment liquid to a rotatably supported substrate, a plurality of tubes connecting the nozzles and a treatment liquid storage section, and a treatment liquid inside the tubes in contact with the tubes. Of the rotary substrate processing apparatus including: a temperature control pipe for keeping the temperature of the substrate constant; and a nozzle moving unit that selectively takes out a desired nozzle from the nozzles and moves it to a discharge position above the substrate. In the processing liquid supply apparatus, each of the set of the nozzle and the tube is supported via a rigid support arm, and the nozzle moving means is arranged so that each of the support arms is centered on an individual predetermined position on a side of the substrate. An arm rotation support for rotatably supporting the arm, and an arm selection mechanism that moves between the support arms to selectively engage a desired support arm laterally of the substrate. And an arm rotating means for rotating the support arm engaged on the side of the substrate to move the nozzle supported by the support arm to a discharge position and a standby position deviated from above the substrate. A processing liquid supply device for a rotary substrate processing apparatus.