JP2582407Y2 - Processing liquid supply device for rotary substrate processing equipment - Google Patents

Description

[Detailed description of the invention]

[0001]

The present invention relates to a semiconductor wafer, a glass substrate for a photomask, a glass substrate for a liquid crystal display,
In order to perform a surface treatment by supplying a surface treatment liquid such as a photoresist liquid to a substrate such as a substrate for an optical disk, a plurality of chemical treatment units and a nozzle for supplying a chemical to the chemical treatment units are provided, In addition, the present invention relates to a processing liquid supply device of a rotary substrate processing apparatus provided with a nozzle moving unit that holds a nozzle and selectively moves to a chemical liquid processing unit.

[0002]

2. Description of the Related Art As a processing liquid supply apparatus for a rotary substrate processing apparatus as described above, a processing liquid supply apparatus disclosed in Japanese Patent Application Laid-Open No. 4-118074 is conventionally known. According to this conventional example, a plurality of supports for supporting a substrate are provided, and a single nozzle is moved from the standby position to the support by a moving mechanism for supplying a chemical solution to the supports. doing.

[0003] Even in the same apparatus, it is desired to provide a plurality of processing liquid supply systems in order to select and supply a plurality of types of processing liquids having different components and viscosities.
For this reason, although a plurality of chemical solution processing units are not provided, conventionally, for example, as disclosed in Japanese Utility Model Publication No. 4-52990, a desired nozzle among a plurality of nozzles provided at the standby position is used. 2. Description of the Related Art There is known a configuration in which a transfer arm is selectively held and moved to a discharge position above a substrate.

[0004]

However, in the case of the above-described conventional example, when the resist nozzle is gripped from the standby block and moved to the substrate loaded on the spin chuck, the resist nozzle is moved together with the resist nozzle. The connected pipe is pulled out in a state where it is pulled up, and the pipe is largely displaced, and the displacement causes large bending deformation and torsion deformation of the pipe, which causes volume fluctuation in the pipe due to this deformation. This causes a disadvantage that the processing liquid in the piping is dripped from the resist nozzle onto the substrate, that is, a so-called dropping phenomenon is likely to occur.

In addition, when a plurality of processing liquid supply systems are provided, the pipes are greatly displaced and interfere with the pipes connected to the adjacent nozzles to slidably contact with each other. Had the disadvantage of contaminating it.

The present invention has been made in view of such circumstances, and prevents a large displacement of a chemical solution pipe when a predetermined nozzle is selected and moved to a chemical solution processing section to prevent dripping and chemical solution drop. It is an object of the present invention to prevent generation of particles due to interference between pipes.

[0007]

According to the present invention, in order to achieve the above-mentioned object, a plurality of chemical solution processing sections, a nozzle for supplying a chemical solution to the chemical solution processing sections are provided, and the nozzles are provided. In a processing liquid supply device of a rotary substrate processing apparatus provided with a nozzle moving means for holding and selectively moving to a chemical processing section, a rotary table is provided between the chemical processing sections, and an opening is provided at a rotation center of the rotary table. And a plurality of nozzle holders are provided on the turntable at predetermined intervals in the rotation direction thereof, and a plurality of flexibly deformable chemical liquid pipes having a length or more sufficient to reach the chemical liquid processing unit through the opening are projected upward. And a nozzle which is detachably held by the nozzle holding portion at the tip of each of the chemical liquid pipes.

[0008]

According to the configuration of the processing liquid supply device of the rotary substrate processing apparatus of the present invention, the rotary table is rotated, a desired nozzle is taken out of the nozzle holding unit by the nozzle moving means, and the nozzle is moved to the desired chemical processing unit. To supply the drug solution,
After the supply of the chemical solution, the nozzle is moved to the nozzle holding unit and returned. At this time, the chemical solution pipe bends and deforms at a portion protruding above the opening, and can move following the movement of the nozzle without being pulled out from the opening.

[0009]

FIG. 1 is an overall plan view showing an embodiment of a processing liquid supply device of a rotary substrate processing apparatus according to the present invention. 1, a rotary table 2 is provided between them, and the rotary table 2 is provided with four nozzle holding members 3... At predetermined intervals in the rotation direction, and a desired one of the nozzle holding members 3. The nozzle moving means 4 is provided for selectively holding and moving to a desired chemical solution processing section 1, 1.

As shown in a partially cut-away side view of a main part of FIG.
, And a large-diameter annular gear 7 is attached to the outer peripheral surface of the turntable 2, while a first electric motor 8 is attached to the fixed base 5, and the first electric motor 8 is attached to the fixed base 5. A small-diameter gear 9 driven forward and reverse by the motor 8 is engaged with the gear 7.

An opening 10 is formed at the center of the turntable 2, and four chemical liquid pipes 11 are passed through the opening 10, and further, the chemical liquid pipes 11 regulate the position of adjacent chemical liquid pipes. In this state, it is held by a holder 12 mounted in the opening 10.

The position where the chemical liquid pipes 11 are held by the holder 12 is arranged lower than the position where the substrate W is placed in the chemical liquid processing sections 1 and 1. In addition, around the opening 10 of the turntable 2 at predetermined intervals in the circumferential direction,
Nozzle holding members 3... Nozzle holding portions 14 into which nozzles 13 held in respective nozzle holding members 3 are detachably fitted, and positioning holes 16 through which positioning pins 15 projecting downward from nozzle holding members 3. Are formed. The lower part of the turntable 2 is covered with a cover 40.

As shown in FIG. 2, in each of the chemical liquid pipes 11, as shown in FIG. The length of the protruding portion 11a that reaches the
1 are set to have a length sufficient to sufficiently reach each of them by bending deformation. On the upper part of each of the nozzle holding members 3, a holding rod 17 having a quadrangular cross-sectional shape and having a large diameter portion 17a for retaining at the upper end is integrally connected.

In the nozzle moving means 4, as shown in FIG. 1, a first support arm 18 has a first guide 19, a screw shaft 20, and a belt-type transmission mechanism 21 mounted on the screw shaft 20.
And a second electric motor 22 which can be rotated forward and reverse in an interlocking manner via the first and second motors, so as to be movable in the direction in which the chemical processing units 1 and 1 are arranged side by side. The first support arm 18 includes:
The second support arm 26 can be driven and moved in a direction perpendicular to the direction in which the chemical liquid processing units 1 and 1 are arranged by the belt 24 and the second guide 25 driven by the third electric motor 23 that can be rotated forward and backward. It is provided in. A third support arm 29 is provided on the second support arm 26 so as to be able to move up and down by a first air cylinder 27 and a third guide 28.
The fixed claw 30a and the movable claw 30 are attached to the third support arm 29.
b, and a second air cylinder 31 is interlockedly connected to the movable claw 30b. With these configurations, the nozzle moving unit 4 that holds the desired nozzle 13 and selectively moves to the desired chemical processing unit 1 is configured.

The operation of moving the nozzle 13 by the nozzle moving means 4 is as follows. First, the first electric motor 8
Is driven to rotate the turntable 2 to move a desired nozzle holding member 3 to a position on the nozzle moving means 4 side. On the other hand, the movable claw 30b is fixed to the fixed claw 30 by the second air cylinder 31.
a, and in that state, the second electric motor 2
By operating the second air cylinder 27 and the first air cylinder 27,
a and 30b are positioned corresponding to the holding rods 17. Thereafter, the third electric motor 23 is driven to drive both claws 30a, 3a.
At 0b, the holding rod 17 is fitted to the outside, the second air cylinder 31 is shortened, and the holding rod 17 is gripped by both claws 30a, 30b. Then, the first air cylinder 2
7, the nozzle holding member 3 is raised, and the nozzle 13
From the nozzle holding unit 14, and after the separation, the first and second
In addition, the third electric motors 8, 22, and 23 are driven to move the nozzle 13 onto a desired chemical processing section 1. When returning from the chemical processing section 1 to the nozzle holding section 14, the operation is the reverse of the above-described case.

The first electric motor 8 and the second electric motor 22 hold the nozzle holding member 3 by the fixed claw 30a and the movable claw 30b, and move the nozzle 13 to the nozzle holding portion 14
Are driven in synchronism with each other after the
The nozzle 13 is configured to move while maintaining a state in which the nozzle 13 and the center of rotation P, the holding position of the chemical liquid pipe 11 from which the nozzle 13 has been detached from the nozzle holding unit 14 by the holder 12, and the nozzle 13 are aligned. Thus, when the nozzle 13 is moved from the nozzle holding unit 14 to the chemical processing unit 1, it is possible to prevent a twisting force from being applied to the chemical pipe 11 on the nozzle 13 side from the holding position of the holder 12, and Since the chemical liquid pipes 11 do not come into sliding contact with each other above the position, the dropping phenomenon and the generation of particles can be more favorably prevented.

Since the position where the chemical pipes 11 are held by the holder 12 is lower than the position where the substrate W is placed in the chemical processing sections 1 and 1, the nozzle 13 moves. At this time, even if the chemical liquid pipes 11 come into sliding contact with each other below the position of the holder 12, particles caused by the chemical liquid pipes 11 do not contaminate the substrate W.

In the above embodiment, the two claws 30a and 30b gripping the nozzle 13 are linearly moved in two directions in the horizontal two-dimensional direction, and are moved over the nozzle holding unit 14 and the chemical processing unit 1. However, according to the present invention, the nozzles are arranged by arranging the chemical supply positions for both the chemical processing units 1 and 1 and the position where the nozzle 13 is taken out from the turntable 2 on an imaginary circle having the same radius. 1
The nozzle 13 may be moved over the nozzle holding unit 14 and the chemical processing unit 1 by swinging the nozzle 3 around the vertical axis.

According to the present invention, three or more chemical processing units 1 are used.
Can be applied to the case where

[0020]

According to the processing liquid supply device of the rotary substrate processing apparatus of the present invention, the turntable is rotated, a desired nozzle is taken out of the nozzle holding unit by the nozzle moving means, and the chemical liquid pipe is placed above the opening. Since the nozzle is moved over the desired chemical processing section while flexing and deforming at the protruding portion and moving following the movement of the nozzle, when the nozzle is moved, the chemical pipe is prevented from being pulled upward from the opening. It is possible to prevent large displacement of the chemical pipe, prevent dropping due to volume change and generation of particles due to interference between chemical pipes, and unexpected drop of the processing liquid due to volume change of the chemical pipe, and It has become possible to improve the processing quality by avoiding any carry-in of dust on the substrate.

[Brief description of the drawings]

FIG. 1 is an overall plan view showing an embodiment of a processing liquid supply device of a rotary substrate processing apparatus according to the present invention.

FIG. 2 is a partially cutaway side view of a main part.

[Explanation of symbols]

 DESCRIPTION OF SYMBOLS 1 ... Chemical liquid processing part 2 ... Turntable 4 ... Nozzle moving means 10 ... Opening 11 ... Chemical liquid piping 13 ... Nozzle 14 ... Nozzle holding part

Continuation of front page (56) References JP-A-4-118074 (JP, A) JP-A-4-305270 (JP, A) JP-A-4-30521 (JP, A) JP-A-5-90151 (JP) , A) JP-B 62-55132 (JP, B2) JP-B 4-52990 (JP, Y2) (58) Field surveyed (Int. Cl. ⁶ , DB name) H01L 21/027 G03F 7/30 502

Claims (1)

(57) [Scope of request for utility model registration] 1. A plurality of chemical processing units, a nozzle for supplying a chemical to the chemical processing units, and a nozzle moving means for holding the nozzles and selectively moving to the chemical processing units are provided. In the processing liquid supply device of the rotary substrate processing apparatus, a rotary table is provided between the chemical solution processing units, an opening is provided at a rotation center of the rotary table, and the rotary table is spaced at a predetermined interval in the rotation direction. A plurality of nozzle holding portions are provided, and a plurality of flexibly deformable chemical liquid pipes having a length or more sufficient to reach the chemical liquid processing section through the opening are supported so as to protrude upward, and at the tip of each of the chemical liquid pipes A processing liquid supply device for a rotary substrate processing apparatus, wherein a nozzle for detachably holding the nozzle is provided in the nozzle holding unit.