JPH06289625A - Developing device - Google Patents

Abstract

PURPOSE:To miniaturize the device and to enhance its productivity by providing the device with a planar member which spreads the developer of a substrate, a mechanism for vacuum-sucking the rear surface of the substrate and rotating the substrate, a lifting mechanism and a washing mechanism. CONSTITUTION:The planar member 5 longer than the width of the substrate 1 and shorter than the width of the part of the outside frame of a receiving tray 7 is moved onto the surface of the substrate 1 by using rollers. The planar member 5 is scanned forward and backward in a direction A, by which the developer on the substrate 1 is spread. The vacuum suction to the receiving tray 7 is stopped and a spin chuck 11 is risen by an air cylinder 14 for lifting the spin chuck by which the substrate 1 is lifted and washing is started. Washing water is first dropped from a substrate washing nozzle 3. Simultaneously, the spin chuck 11 rotates to wash the developer 2 while sucking the substrate 1 by vacuum. The developer 2 is washed by ejecting the washing water upward from a rear surface nozzle 10 of the substrate. Further, the substrate 1 is rotated while the substrate is held sucked by the spin chuck 11, by which the washing water is dried.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a developing device used in a photolithography process in the manufacturing process of glass substrates for liquid crystals.

[0002]

2. Description of the Related Art A conventional developing device will be described below.

FIG. 5 shows a conventional developing device.
In FIG. 5, 31 is a substrate and 32 is a vacuum source.
Adsorb. A nozzle 33 supplies the developing solution 34.
Reference numeral 35 is an outer frame. Reference numeral 36 is a saucer for accommodating the substrate 31.
37 is a plate-shaped member.

The operation of the developing device configured as described above will be described below. First, the back surface of the substrate 31 is vacuum-sucked by the vacuum source 32 to accommodate the substrate. Next, regarding the developing method, first, the developing solution 3 is discharged from the external nozzle 33.
Drop 4 The developer 34 is transferred to the substrate 31 by the outer frame 35
The outer frame 35 covers the surface of the substrate 31, the substrate 31 and the saucer 36.
It is stored in the clearance 37 and the surface of the tray 36. The substrate 31 is vacuum-adsorbed on the tray 36. Next, the plate member 3
7 is used to move the surface of the substrate 31 to form a gap G of 0.2 to 0.5 mm from the substrate surface, and then the plate member 37 is reciprocally scanned in the hand direction, The developer on the substrate 31 is spread. After the required time has passed, the vacuum suction is stopped, the atmosphere is returned to the atmosphere, the push-up pins 41 at the bottom of the tray 36 are pushed up to lift the substrate 31, and the substrate is transported by the transport arm 42 to the washing step.

[0005]

However, with such a conventional developing device structure, washing and drying cannot be performed at the same place, so that the device structure becomes large and the productivity is low. Further, when the substrate is vacuum-adsorbed, the developing solution wraps around and remains on the end face of the back surface of the substrate, and the transfer arm is soiled.

Therefore, the present invention aims at downsizing the developing device and provides a liquid-saving phenomenon device having high productivity.

[0007]

In order to achieve this object, a developing device of the present invention develops a substrate by scanning the substrate while maintaining a minute gap between a tray portion for accommodating the substrate and the surface of the substrate. It is composed of a plate-shaped member for spreading the liquid, a mechanism for vacuum-adsorbing and rotating the back surface of the substrate at the center of the tray, a mechanism for moving the rotating mechanism up and down, and a mechanism for cleaning the front and back surfaces of the substrate.

[0008]

With this structure, the reciprocating motion of the plate-like member enables development with a very small amount of liquid, and further washing and drying with the same apparatus.

[0009]

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS An embodiment of the present invention will be described below with reference to FIGS.
Will be described with reference to.

FIG. 1 is an overall configuration diagram. 1 is a substrate. 2 is a developing solution. Reference numeral 3 is a substrate surface cleaning nozzle. Reference numeral 4 is a plate-shaped member cleaning nozzle, and 5 is a plate-shaped member. Reference numeral 6 is a nozzle for drying the substrate 1. Reference numeral 7 is a tray for accommodating the substrate 1, and 8 is a developing solution supply section to which the developing solution 2 is supplied. 9 is a vacuum suction nozzle, 10 is a substrate back surface cleaning nozzle, 11 is a spin chuck, 12 is a motor, 14
Is an air cylinder for raising and lowering the spin chuck, and 16 is a developer tank, and the developer 2 is supplied to the developer supply unit 8 by a metering pump 15.

The operation of the developing device configured as described above will be described with reference to FIGS. First,
The back surface of the substrate 1 is vacuum-sucked by the vacuum source 9 to accommodate the tray 7.

Next, the developing method will be described. The developer 2 is supplied from the developer tank 16 to the developer supply unit 8 by the metering pump 15. The developing solution 2 is stored on the surface of the substrate 1 by the pan 7. The plate-like member 5 which is longer than the inside of the substrate 1 and shorter than the inside of the outer frame portion of the tray 7 is attached to the roller 23.
After moving to the surface of the substrate 1 by using, to form a gap of 0.2 to 0.5 mm from the substrate surface, the plate member 5
Is reciprocated in the direction A to spread the developer 2 on the substrate 1 (see FIG. 2).

Then, after the required time has passed, the vacuum suction on the tray 7 is stopped, and the spin chuck 11 is lifted to lift the substrate 1 as shown in FIG. Then start washing with water. First, cleaning water is dropped from the substrate cleaning nozzle 3. At the same time, the spin chuck 11 rotates while the substrate 1 is vacuum-adsorbed to wash the developing solution 2. In addition, cleaning water is jetted upward from the substrate backside nozzle 10 to clean the developer 2 that has flown around the edge of the backside of the substrate 1.

After the cleaning is completed, the drying process is started. As shown in FIG. 4, the substrate 1 is rotated while the substrate is adsorbed by the spin chuck 11, and the cleaning water is dried. Further, the substrate drying nozzle 6 is moved in the direction D to the central portion of the substrate 1 to blow N ₂ gas to remove water droplets on the substrate 1 and dry the substrate 1.

[0015]

EFFECT OF THE INVENTION Development, washing with water and drying can be performed in the same apparatus. As a result, the device becomes smaller, takes up less space, and productivity is increased. In addition, since the developer that has flowed around the back surface of the substrate is also washed, the contamination of the substrate does not propagate.

[Brief description of drawings]

FIG. 1 is a diagram showing an overall configuration of a developing device of the present invention.

FIG. 2 is a diagram for explaining an operation of a developing process in the embodiment.

FIG. 3 is a diagram for explaining an operation of a cleaning process in the example.

FIG. 4 is a diagram for explaining an operation of a drying process in a conventional example.

FIG. 5 is a diagram showing a configuration of a conventional developing device.

[Explanation of symbols]

 1 substrate 2 developing solution 5 plate-like member 13 outer frame

 ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Inventor Masaki Suzuki 1006 Kadoma, Kadoma City, Osaka Prefecture Matsushita Electric Industrial Co., Ltd.

Claims (3)

[Claims] 1. A saucer part having an outer frame for supporting the surface of the substrate on which the conductor pattern is not formed and accommodating the substrate and storing a developing solution on the substrate, and maintaining a minute gap from the surface of the substrate. A plate-like member that allows the developer to flow on the substrate while still scanning, and an opening provided in the center of the tray so that the opening can be raised and lowered and the substrate is rotated while being horizontally supported. A pedestal, a substrate backside cleaning liquid supply means for supplying a cleaning liquid from below to the opening in the center of the saucer, and a substrate surface cleaning liquid supply from above the saucer part to the surface of the substrate. And a developing device. 2. The developing device according to claim 1, wherein the substrate surface cleaning liquid supply means is fixed to a plate-like member which allows the developing liquid to flow. 3. The developing device according to claim 1, further comprising a developing solution supply means for storing a developing solution in an amount required for one development and allowing the developing solution to flow out to a tray portion.