JPH06286148A - Bonding method for ink jet printing head - Google Patents

Bonding method for ink jet printing head

Info

Publication number
JPH06286148A
JPH06286148A JP7691793A JP7691793A JPH06286148A JP H06286148 A JPH06286148 A JP H06286148A JP 7691793 A JP7691793 A JP 7691793A JP 7691793 A JP7691793 A JP 7691793A JP H06286148 A JPH06286148 A JP H06286148A
Authority
JP
Japan
Prior art keywords
layer
alloy member
alloy
metallized
joining
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP7691793A
Other languages
Japanese (ja)
Other versions
JP3293224B2 (en
Inventor
Masaya Horino
正也 堀野
Akiomi Kono
顕臣 河野
Keiji Watanabe
啓司 渡辺
Kunihiro Tamahashi
邦裕 玉橋
Yuji Furuya
佑治 古家
Kenichi Hisagai
健一 久貝
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Koki Holdings Co Ltd
Original Assignee
Hitachi Koki Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Koki Co Ltd filed Critical Hitachi Koki Co Ltd
Priority to JP7691793A priority Critical patent/JP3293224B2/en
Publication of JPH06286148A publication Critical patent/JPH06286148A/en
Application granted granted Critical
Publication of JP3293224B2 publication Critical patent/JP3293224B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Particle Formation And Scattering Control In Inkjet Printers (AREA)

Abstract

PURPOSE:To obtain a bonding part superior in corrosion resistance without giving a large thermal damage to an object to be bonded by a method wherein three-ply metallized layers of Au, Sn, and Au are disposed on the surfaces of two alloy members forming a head, both the alloy members are made to adhere to each other with the metallized layers in between, and the metallized layers are melted. CONSTITUTION:A plurality of alloy members 101, 111 form an ink jet printing head. When the first surface of the first alloy member 101 is bonded to the second surface of the second alloy member 111, three-ply metallized layers of Au as first metallized plies 103, 107, Sn as second metallized plies 104, 108, and Au as third metallized plies 105, 109 are provided in this order from the matrixes on at least one of the first and second surfaces. The first surface is disposed opposedly to the second surface. After the relative position of the first surface and the second surface is adjusted, the both are made to adhere to each other. The three-ply metallized layers are heated to a temperature of 553 deg.K or higher to be melted without melting both the members 101, 111 to bond both the alloy members.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明はインクジェットプリント
ヘッドを構成する合金部材同志を接合するインクジェッ
トプリントヘッドの接合方法に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for joining ink jet print heads, which joins alloy members constituting an ink jet print head.

【0002】[0002]

【従来の技術】インクジェットプリントヘッドでは、微
細な3次元のインク流路を形成するために、エッチング
や電鋳などの技法を用いて微細な2次元パターンを形成
した金属板を積層して接合する必要があり、はんだ接合
やろう付けが多く用いられている。なお、特開平2−1
07451号及び特開平3−142248号公報にはA
u−Ni系合金及びPb−Sn系合金を用いてろう付け
及びはんだ付けを行う方法が開示されている。従来この
種のはんだ接合及びろう付けでは、はんだあるいはろう
材層を単一の層としてめっきあるいは蒸着によって形成
していた。
2. Description of the Related Art In an ink jet print head, in order to form a fine three-dimensional ink flow path, metal plates on which a fine two-dimensional pattern is formed are laminated and joined by using a technique such as etching or electroforming. It is necessary, and soldering and brazing are often used. Incidentally, Japanese Patent Laid-Open No. 2-1
07451 and Japanese Unexamined Patent Publication (Kokai) No. 3-142248 A
A method of brazing and soldering using a u-Ni-based alloy and a Pb-Sn-based alloy is disclosed. Conventionally, in this type of solder joining and brazing, the solder or brazing material layer is formed as a single layer by plating or vapor deposition.

【0003】[0003]

【発明が解決しようとする課題】インクジェットプリン
タに用いられるインクは腐食性を有することが多く、構
成部品及び接合部にはインクに対する耐食性が要求され
る。上記従来技術において、Ni−Au系合金を用いた
ろう付けの場合には、接合部の耐食性は高いが接合温度
が高く被接合物に与える熱的ダメージが大きいという問
題があった。またPb−Sn系合金を用いたはんだ付け
の場合には、接合温度は低いが耐食性が低いという問題
があった。
The inks used in ink jet printers are often corrosive, and the components and joints are required to have corrosion resistance to the inks. In the above-mentioned conventional technique, in the case of brazing using a Ni-Au alloy, there is a problem that the corrosion resistance of the joint is high but the joint temperature is high and the thermal damage to the objects to be joined is large. Further, in the case of soldering using a Pb-Sn alloy, there is a problem that the joining temperature is low but the corrosion resistance is low.

【0004】本発明の目的は、被接合物に大きな熱的ダ
メージを与えることなく耐食性に優れた接合部を得るイ
ンクジェットプリントヘッドの接合方法及び接合装置を
提供することにある。
An object of the present invention is to provide a joining method and joining apparatus for an ink jet print head which can obtain a joined portion having excellent corrosion resistance without causing a large thermal damage to the article to be joined.

【0005】[0005]

【課題を解決するための手段】本発明は上記目的を達成
するため、SnをAuでサンドイッチした三層構造のメ
タライズ層を接合層として用いる。Au−Sn合金の接
合層を単一の合金層として接合面上に形成する技術は確
立されておらず、接合層の組成を精度よくコントロール
するのは極めて困難であり、実用的でない。Au−Sn
合金箔を接合部に挿入する方法は、Au−Sn合金が極
めてもろく、難加工材であることから実用的とはいえな
い。
In order to achieve the above object, the present invention uses a metallized layer having a three-layer structure in which Sn is sandwiched with Au as a bonding layer. The technique of forming the bonding layer of the Au—Sn alloy as a single alloy layer on the bonding surface has not been established, and it is extremely difficult to control the composition of the bonding layer with high accuracy, and it is not practical. Au-Sn
The method of inserting the alloy foil into the joint is not practical because the Au—Sn alloy is extremely brittle and difficult to machine.

【0006】本発明では、合金部材側から第1メタライ
ズ層としてAu、第2メタライズ層としてSn、第3メ
タライズ層としてAuの順に全体でのSn含有率が20
mass%を超え40mass%未満となるようにそれ
ぞれの厚さを調整した全体の厚さが3μm以上の3層の
メタライズ層(以下接合層と称する)を形成し、接合面
をArビームにて活性化した後、大気中にて位置合わせ
して密着させ、その後真空中あるいは不活性ガス中にて
加熱するものである。
In the present invention, the Sn content is 20 in the order of Au as the first metallization layer, Sn as the second metallization layer, and Au as the third metallization layer from the alloy member side.
The metallized layers (hereinafter referred to as bonding layers) having a total thickness of 3 μm or more in which the respective thicknesses are adjusted so as to be more than mass% and less than 40 mass% are formed, and the bonding surface is activated by an Ar beam. After being converted, the materials are aligned and brought into close contact in the atmosphere, and then heated in vacuum or in an inert gas.

【0007】また第1、第2及び第3メタライズ層の厚
さを接合層全体でのSn含有率が20mass%を超え
40mass%未満となるよう調整しつつ、第1メタラ
イズ層の厚さを1μm以上、全体の厚さが3μm以上の
接合層を前記合金部材の第1及び第2面の上に形成して
接合に供するものである。
Further, while adjusting the thicknesses of the first, second and third metallized layers so that the Sn content in the entire bonding layer is more than 20 mass% and less than 40 mass%, the thickness of the first metallized layer is 1 μm. As described above, the joining layer having a total thickness of 3 μm or more is formed on the first and second surfaces of the alloy member and is used for joining.

【0008】また第1、第2及び第3メタライズ層の厚
さを接合層全体でのSn含有率が20mass%を超え
40mass%未満となるよう調整しつつ、第1メタラ
イズ層と第3メタライズ層との厚さを同一とし、全体の
厚さが3μm以上の接合層を前記合金部材の第1あるい
は第2面のうちのいずれか一方の上に形成して接合に供
するものである。
Further, while adjusting the thicknesses of the first, second and third metallized layers so that the Sn content in the entire bonding layer is more than 20 mass% and less than 40 mass%, the first metallized layer and the third metallized layer are adjusted. And the same thickness, and a bonding layer having a total thickness of 3 μm or more is formed on one of the first and second surfaces of the alloy member and is used for bonding.

【0009】更に、加熱に際しては接合面を位置合わせ
した後、真空中あるいは不活性ガス中にて加熱する前に
抵抗溶接あるいは機械的締結を利用して固定された被接
合物に対して予め所定温度に加熱保持された治具を押し
当てて加熱し、被接合物が所定温度に到達後、不活性ガ
スを被接合物に吹き付けて冷却するものである。
Further, in heating, after the joining surfaces are aligned, before heating in a vacuum or in an inert gas, resistance welding or mechanical fastening is used to preliminarily determine a fixed object to be joined. A jig which is heated and held at a temperature is pressed to heat it, and after the object to be bonded reaches a predetermined temperature, an inert gas is blown onto the object to be cooled to cool it.

【0010】[0010]

【作用】Au、Sn及びAuの3層のメタライズからな
る接合層は、接合加熱時に553K以上に加熱すること
によりSnが溶融し、Auと相互拡散してAu−Sn合
金の融液層を形成する。この時Snが合金部材にも拡散
して化合物を形成することにより、接合層中のSn濃度
が減少して接合層の融点を変化させる。本発明による3
層メタライズからなる接合層によれば、AuがSnの拡
散に対してバリア層となり、合金部材とSnとの化合物
形成を抑制する。この作用により接合層中のSn濃度の
変化が低く抑えられ、結果として接合層の融点の変化も
低く抑えられる。本発明によれば第1メタライズ層とし
てのAuの厚さを1μm以上とすることにより、拡散に
よるSnの濃度変化を十分に低く抑えることができる。
第1メタライズ層としてのAuの厚さが1μm未満の場
合には、SnとAuとの拡散により短時間のうちにAu
が溶融し、バリア層としての機能を失う。
In the bonding layer consisting of three metallized layers of Au, Sn and Au, Sn is melted by heating to 553K or higher during bonding heating and interdiffuses with Au to form a melt layer of Au-Sn alloy. To do. At this time, Sn diffuses into the alloy member to form a compound, so that the Sn concentration in the bonding layer is reduced and the melting point of the bonding layer is changed. 3 according to the invention
According to the bonding layer made of the layer metallized layer, Au serves as a barrier layer against the diffusion of Sn and suppresses the compound formation between the alloy member and Sn. Due to this action, the change in Sn concentration in the bonding layer can be suppressed low, and as a result, the change in melting point of the bonding layer can also be suppressed low. According to the present invention, by making the thickness of Au as the first metallization layer 1 μm or more, it is possible to sufficiently suppress the Sn concentration change due to diffusion.
When the thickness of Au as the first metallized layer is less than 1 μm, Au diffuses within a short time due to diffusion of Sn and Au.
Melts and loses its function as a barrier layer.

【0011】Sn含有量が20mass%Sn以下の接
合層は、前述の通り加熱接合中の化合物形成に起因して
接合層中のSn濃度が低下することにより、接合層融点
が顕著に上昇する。その結果、接合部に十分な融液が生
じる前にはんだが凝固して、接合部の密着が不完全とな
る。しかし本発明によるSn含有量が20mass%を
超え40mass%未満の接合層を用いれば、加熱接合
中の化合物形成に起因する接合層中のSn濃度が低下す
ることにより接合層融点が低下し、接合部に十分な融液
が生じて接合部の密着性を向上させる。
In the bonding layer having an Sn content of 20 mass% Sn or less, the melting point of the bonding layer remarkably rises due to the decrease in the Sn concentration in the bonding layer due to the compound formation during the heat bonding as described above. As a result, the solder is solidified before sufficient melt is generated at the joint, resulting in incomplete adhesion of the joint. However, when the bonding layer having an Sn content of more than 20 mass% and less than 40 mass% according to the present invention is used, the Sn concentration in the bonding layer due to the compound formation during the heating bonding is decreased, and the melting temperature of the bonding layer is decreased. A sufficient melt is generated in the part to improve the adhesion of the joint part.

【0012】真空中で接合面にArビームを照射するこ
とによって、接合表面に付着している油脂や水分、酸化
皮膜などが取り除かれる。それによって接合表面は接合
性の高い活性な面となり、接合性が向上する。大気中で
の位置合わせは真空中での位置合わせよりも容易であ
り、位置合わせに必要な時間の短縮が図れる。真空中あ
るいは不活性ガス中で加熱加圧することにより、活性化
された接合面が再汚染されることがないので接合性が向
上する。接合面を位置合わせした後、真空中あるいは不
活性ガス中にて加熱加圧する前にスポット溶接あるいは
機械的締結を利用して被接合物を固定することにより、
接合中の位置ずれが生じず、歩留まり及び作業効率の向
上が図れる。被接合物に対して予め所定温度に加熱保持
された治具を押し当てて加熱加圧し、被接合物が所定温
度に到達後、不活性ガスを被接合物に吹き付けて冷却す
ることにより、化合物の形成を抑制して接合強度を向上
させることができる。
By irradiating the bonding surface with an Ar beam in a vacuum, oils and fats, water, and oxide films adhering to the bonding surface are removed. As a result, the bonding surface becomes an active surface having a high bonding property, and the bonding property is improved. The alignment in the atmosphere is easier than the alignment in vacuum, and the time required for the alignment can be shortened. By heating and pressurizing in a vacuum or in an inert gas, the activated bonding surface is not re-contaminated, so that the bonding property is improved. After aligning the joint surfaces and fixing the objects to be joined using spot welding or mechanical fastening before heating and pressurizing in vacuum or in inert gas,
The position shift during joining does not occur, and the yield and work efficiency can be improved. By pressing a jig that has been heated and maintained at a predetermined temperature against the object to be bonded and applying heat and pressure, and after the object to be bonded reaches a predetermined temperature, an inert gas is blown onto the object to be cooled to obtain a compound. It is possible to improve the bonding strength by suppressing the formation of.

【0013】[0013]

【実施例】以下本発明の接合方法にかかる実施例を図
1、図2及び図3により説明する。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS An embodiment of the joining method of the present invention will be described below with reference to FIGS. 1, 2 and 3.

【0014】まず合金部材へのメタライズ層形成方法に
ついて図1を用いて述べる。101は厚さ50μmのS
US304製第1合金部材、102は厚さ1μmのNi
メタライズ層、103は厚さ2.0μmのAuよりなる
第1メタライズ層、104は厚さ1.8μmのSnより
なる第2メタライズ層、105は厚さ0.3μmのAu
よりなる第3メタライズ層、107は厚さ2.0μmの
Auよりなる第1メタライズ層、108は厚さ1.8μ
mのSnよりなる第2メタライズ層、109は厚さ0.
3μmのAuよりなる第3メタライズ層、111は厚さ
27μmのNi製第2合金部材である。
First, a method of forming a metallized layer on an alloy member will be described with reference to FIG. 101 is S having a thickness of 50 μm
US304 first alloy member, 102 is 1 μm thick Ni
A metallization layer, 103 is a first metallization layer made of Au having a thickness of 2.0 μm, 104 is a second metallization layer made of Sn having a thickness of 1.8 μm, and 105 is Au having a thickness of 0.3 μm.
Is a third metallization layer made of Au, 107 is a first metallization layer made of Au having a thickness of 2.0 μm, and 108 is a thickness of 1.8 μm.
The second metallization layer 109 made of Sn of 109 has a thickness of 0.
A third metallization layer made of Au having a thickness of 3 μm, and 111 is a second alloy member made of Ni and having a thickness of 27 μm.

【0015】SUS304製第1合金部材101に湿式
めっきにより厚さ1μmのNi−P無電解めっきを施
す。厚さは必ずしも1μmでなくともよいが、接合後に
Niの全てがSnとの化合物として消費され尽くさない
だけの厚さが必要である。Ni−Sn化合物はSUS3
04との接合性に乏しく、接合後にNiの全てがSnと
の化合物として消費され尽くすと、接合強度は極端に低
下する。次に第1メタライズ層103として厚さ2.0
μmのAuを湿式めっきにより形成する。次に第2メタ
ライズ層104として厚さ1.8μmのSnを湿式めっ
きにより形成する。更に第3メタライズ層105として
厚さ0.3μmのAuを湿式めっきにより形成する。
The first alloy member 101 made of SUS304 is electrolessly plated with Ni—P having a thickness of 1 μm by wet plating. The thickness does not necessarily have to be 1 μm, but it is necessary that the Ni is not completely consumed as a compound with Sn after bonding. Ni-Sn compound is SUS3
If the bonding property with 04 is poor and all of Ni is consumed as a compound with Sn after bonding, the bonding strength will be extremely lowered. Next, as the first metallized layer 103, a thickness of 2.0
μm Au is formed by wet plating. Next, as the second metallized layer 104, Sn having a thickness of 1.8 μm is formed by wet plating. Further, Au having a thickness of 0.3 μm is formed by wet plating as the third metallized layer 105.

【0016】Ni製第2合金部材111は電鋳により製
作される。電鋳NiはAu−Sn系合金との接合性が良
好にあるので、接合面にはNiメタライズを施す必要は
なく、直接第1メタライズ層107として厚さ2.0μ
mのAuを湿式めっきにより形成する。次に第2メタラ
イズ層108として厚さ1.8μmのSnを湿式めっき
により形成する。更に第3メタライズ層109として厚
さ0.3μmのAuを湿式めっきにより形成する。本発
明ではメタライズ層を全て湿式めっきにより形成してい
るが、全てのメタライズ層、あるいは一部にメタライズ
層を真空蒸着あるいはスパッタリング等の他の成膜手段
によって形成しても同等の効果が得られる。
The Ni second alloy member 111 is manufactured by electroforming. Since the electroformed Ni has good bondability with the Au-Sn alloy, it is not necessary to apply Ni metallization to the bonding surface, and the thickness of the first metallized layer 107 is 2.0 μm directly.
m of Au is formed by wet plating. Next, Sn having a thickness of 1.8 μm is formed as a second metallization layer 108 by wet plating. Further, Au having a thickness of 0.3 μm is formed by wet plating as the third metallized layer 109. In the present invention, the metallized layers are all formed by wet plating, but the same effect can be obtained by forming all or part of the metallized layers by another film forming means such as vacuum deposition or sputtering. .

【0017】次に接合に伴う接合部組織変化について、
図2及び図3を用いて述べる。図2は接合の各過程にお
ける接合部の組織を示す図、図3は接合の各過程におけ
る接合層の組織及び融点を示す図である。
Next, with respect to the change in the microstructure of the joint due to the joining,
It will be described with reference to FIGS. 2 and 3. FIG. 2 is a diagram showing the structure of the joint portion in each process of bonding, and FIG. 3 is a diagram showing the structure and melting point of the bonding layer in each process of bonding.

【0018】101は厚さ50μmのSUS304製第
1合金部材、102は第1合金部材側の厚さ1μmのN
iメタライズ層、103は第1合金部材側の厚さ2.0
μmのAuよりなる第1メタライズ層、104は第1合
金部材側の厚さ1.8μmのSnよりなる第2メタライ
ズ層、105は第1合金部材側の厚さ0.3μmのAu
よりなる第3メタライズ層、106は第1合金部材側の
Ni−Sn金属間化合物、107は第2合金部材側の厚
さ2.0μmのAuよりなる第1メタライズ層、108
は第2合金部材側の厚さ1.8μmのSnよりなる第2
メタライズ層、109は第2合金部材側の厚さ0.3μ
mのAuよりなる第3メタライズ層、110は第2合金
部材側のNi−Sn金属間化合物、111は厚さ27μ
mのNi製第2合金部材、130はAu−Sn合金融液
である。
Reference numeral 101 denotes a 50 μm thick SUS304 first alloy member, and 102 denotes a 1 μm thick N on the first alloy member side.
i metallized layer, 103 has a thickness of 2.0 on the first alloy member side
The first metallization layer made of Au having a thickness of 104 μm, the second metallization layer 104 made of Sn having a thickness of 1.8 μm on the first alloy member side, and the Au having a thickness of 0.3 μm on the first alloy member side.
A third metallized layer 106 made of Ni, a Ni-Sn intermetallic compound on the first alloy member side, a first metallized layer 107 made of Au having a thickness of 2.0 μm on the second alloy member side,
Is a second alloy made of Sn having a thickness of 1.8 μm on the second alloy member side.
The metallization layer 109 is 0.3 μm thick on the second alloy member side.
m is a third metallization layer made of Au, 110 is a Ni—Sn intermetallic compound on the second alloy member side, and 111 is a thickness of 27 μm.
m second Ni alloy member, 130 is Au—Sn combined financial liquid.

【0019】接合の各過程における接合部の組織は次の
通りとなる。接合部の加熱昇温速度が20K/sと高い
場合について述べる。
The structure of the joint in each step of joining is as follows. A case where the heating rate of heating the joint is as high as 20 K / s will be described.

【0020】(1)状態A 第1合金部材101及び第2合金部材111を接合層を
介して密着させた状態が状態Aである。この状態では全
ての層が固体である。
(1) State A The state A is the state in which the first alloy member 101 and the second alloy member 111 are in close contact with each other with the joining layer interposed therebetween. In this state, all layers are solid.

【0021】(2)状態B 状態AからSnの融点直上まで加熱した状態が状態Bで
ある。第1合金部材側の厚さ1.8μmのSnよりなる
第2メタライズ層104及び第2合金部材側の厚さ1.
8μmのSnよりなる第2メタライズ層108が溶融す
る。
(2) State B State B is the state in which the state A is heated to just above the melting point of Sn. The second metallization layer 104 made of Sn having a thickness of 1.8 μm on the first alloy member side and the thickness on the second alloy member side 1.
The second metallization layer 108 made of 8 μm Sn melts.

【0022】(3)状態B、C間 更に加熱を続けると、第1合金部材側の厚さ2.0μm
のAuよりなる第1メタライズ層103、第1合金部材
側の厚さ0.3μmのAuよりなる第3メタライズ層1
05、第2合金部材側の厚さ2.0μmのAuよりなる
第1メタライズ層107及び第2合金部材側の厚さ0.
3μmのAuよりなる第3メタライズ層109からAu
が溶融したSnよりなる第2メタライズ層108に溶け
出してAu−Sn合金融液130を形成する。Au−S
n合金融液130の融点はAu濃度の増大に伴い一旦低
下するが、Sn濃度約87mass%を境として再び上
昇する。加熱昇温速度が低い場合にはAu−Sn合金融
液130が凝固する場合もあるが、本実施例の場合には
加熱昇温速度が十分に高いので凝固することはない。
(3) Between states B and C If the heating is further continued, the thickness of the first alloy member side is 2.0 μm.
First metallization layer 103 made of Au, and the third metallization layer 1 made of Au having a thickness of 0.3 μm on the first alloy member side
05, the first metallization layer 107 of Au having a thickness of 2.0 μm on the second alloy member side and the thickness of the second alloy member side of 0.
3 μm Au third metallization layer 109 to Au
Melts into the second metallized layer 108 of molten Sn to form an Au—Sn combined financial liquid 130. Au-S
The melting point of the n-financing liquid 130 once drops with an increase in the Au concentration, but rises again at the Sn concentration of about 87 mass%. When the heating / heating rate is low, the Au—Sn mixed financial liquid 130 may solidify, but in the present embodiment, the heating / heating rate is sufficiently high so that it does not solidify.

【0023】(4)状態C、D間 593Kまで加熱したら、温度を保持する。この間もA
u−Sn合金融液130へのAuの溶解は進行する。
(4) Between states C and D After heating to 593K, the temperature is maintained. A during this time
Dissolution of Au in the u-Sn combined financial liquid 130 proceeds.

【0024】(5)状態D 本実施例では、Au−Sn合金融液130へのAuの溶
解が終了した時に状態Dとなるように、各メタライズ層
の厚さを調整している。従って状態DではAu−Sn合
金融液と第1合金部材側の厚さ1μmのNiメタライズ
層102及び厚さ27μmのNi製第2合金部材111
とが直接接触する。
(5) State D In this embodiment, the thickness of each metallization layer is adjusted so that the state D is reached when the dissolution of Au in the Au-Sn mixed financial liquid 130 is completed. Therefore, in the state D, the Au-Sn alloy financial liquid, the Ni metallized layer 102 having a thickness of 1 μm on the first alloy member side, and the Ni second alloy member 111 having a thickness of 27 μm.
Makes direct contact with.

【0025】(6)状態D、E間 Au−Sn合金融液と第1合金部材側の厚さ1μmのN
iメタライズ層102及び厚さ27μmのNi製第2合
金部材111とが直接接触することにより、これらの界
面には急速にNi−Sn金属間化合物106が形成され
る。同化合物106には少量のAuも含有されるが、そ
のほとんどはNi及びSnである。この化合物106の
形成により、Au−Sn合金融液130中のSn濃度が
低下し、同合金融液130の融点も低下する。これによ
りAu−Sn合金融液の流動性が向上し、接合部の密着
性が向上する。
(6) Between states D and E Au-Sn mixed financial liquid and N having a thickness of 1 μm on the first alloy member side.
By direct contact between the i metallized layer 102 and the Ni second alloy member 111 having a thickness of 27 μm, the Ni—Sn intermetallic compound 106 is rapidly formed at their interface. The compound 106 also contains a small amount of Au, but most of them are Ni and Sn. Due to the formation of the compound 106, the Sn concentration in the Au—Sn financial liquid 130 decreases, and the melting point of the financial liquid 130 also decreases. This improves the fluidity of the Au-Sn synthetic financial liquid and improves the adhesion of the joint.

【0026】(7)状態E 状態Dから約10s加熱すると、Ni−Sn金属間化合
物106の成長により、Au−Sn合金融液中のSn濃
度が低下し、Au−Sn合金の共晶組成のAu−20m
ass%Snとなる。
(7) State E When the state D is heated for about 10 s, the Ni—Sn intermetallic compound 106 grows, so that the Sn concentration in the Au—Sn alloy financial solution decreases, and the eutectic composition of the Au—Sn alloy is changed. Au-20m
It becomes ass% Sn.

【0027】(8)状態F 状態Eから接合部を冷却すれば、強度信頼性及び耐食性
に優れるAu−Sn共晶合金により接合された接合部を
得ることができる。
(8) State F If the joint portion is cooled from the state E, it is possible to obtain the joint portion which is joined by the Au—Sn eutectic alloy having excellent strength reliability and corrosion resistance.

【0028】(9)状態E’ Au−Sn合金融液130へのAuの溶解が終了した時
に状態Dとならず、なお未溶解のAuが残る場合はAu
−Sn合金融液130の融点は数秒で593Kを超えて
状態E’となり固体の晶出が始まり、Au−Sn合金融
液130の流動性は極端に低下する。接合部の密着が完
全に行われないうちにAu−Sn合金融液130の凝固
が始まるので、接合部の強度信頼性は低下する。
(9) State E'When the dissolution of Au in the Au-Sn combined financial liquid 130 is completed, the state is not changed to D, and when undissolved Au remains, Au is left.
The melting point of the -Sn combined financial liquid 130 exceeds 593 K within a few seconds, the state E'becomes established, and solid crystallization begins, and the fluidity of the Au-Sn combined financial liquid 130 is extremely lowered. Since the solidification of the Au—Sn mixed financial liquid 130 starts before the joint is completely adhered, the strength reliability of the joint decreases.

【0029】状態Dから状態Eへの移行が状態E’への
移行よりも短時間のうちに起こるのは、状態Dから状態
Eへの移行が拡散律速であるNi−Sn化合物の成長に
よっているのに対して、状態Dから状態E’への移行が
Au−Sn合金中130へのAuの溶解によっているこ
とによる。
The transition from the state D to the state E occurs in a shorter time than the transition to the state E'due to the growth of the diffusion-controlled Ni-Sn compound in which the transition from the state D to the state E is diffusion-controlled. On the other hand, the transition from the state D to the state E ′ is due to the dissolution of Au in the Au—Sn alloy 130.

【0030】状態E’では接合部の強度信頼性は低下す
るが、一般にAu濃度が高いほどAu−Sn合金の耐食
性は増大するので、耐食性を第一に要求される接合部と
しては十分に使用に耐える場合もある。
In the state E ', the strength reliability of the joint is lowered, but generally, the higher the Au concentration is, the higher the corrosion resistance of the Au-Sn alloy is. Therefore, the joint is required to have the corrosion resistance first. In some cases,

【0031】本実施例ではNi−Sn化合物の成長が状
態Dから開始するものとして扱ったが、実際にはわずか
ではあるが状態Cに先立ってNi−Sn化合物の成長が
生じる。この場合はSnはAuよりなる第1合金部材側
の第1メタライズ層103及び第2合金部材側の第1メ
タライズ層107の内部を拡散してNiに到達し、Ni
−Sn化合物を形成する。このプロセスは拡散律速であ
るので、単位時間当りのSnの供給量は状態D、E間よ
りも極端に少なく、従って化合物成長速度も極めて小さ
くなる。本実施例の如く、加熱昇温速度を20K/s以
上とすれば、状態D以前の化合物形成に伴うAu−Sn
合金融液の組成変化は無視しうる量となる。
In this embodiment, the growth of the Ni—Sn compound is treated as starting from the state D, but in reality, the growth of the Ni—Sn compound occurs slightly before the state C. In this case, Sn diffuses inside the first metallization layer 103 on the first alloy member side and the first metallization layer 107 on the second alloy member side made of Au and reaches Ni.
-Sn compound is formed. Since this process is diffusion-controlled, the supply amount of Sn per unit time is extremely smaller than between states D and E, and therefore the compound growth rate is also extremely small. As in the present example, when the heating temperature rising rate is 20 K / s or more, Au—Sn accompanying the compound formation before the state D is generated.
The composition change of the synergistic liquid is negligible.

【0032】次に接合プロセスについて述べる。Next, the joining process will be described.

【0033】211は図1に示すAuよりなる第1メタ
ライズ層103、Snよりなる第2メタライズ層104
及びAuよりなる第3メタライズ層105の3層のメタ
ライズ層からなる接合層、221は図1に示すAuより
なる第1メタライズ層107、107、Snよりなる第
2メタライズ層108及びAuよりなる第3メタライズ
層109の3層のメタライズ層からなる接合層、212
及び222は酸化膜や水、有機物からなる汚染物層、2
30は溶融して一体となった接合層、300はArアト
ムビーム、301は抵抗溶接機、302は抵抗溶接チッ
プ、303はアース端子、304は導電性ベース、30
5及び308はヒータを内蔵した加熱加圧治具、306
は厚さ0.5mmのチッ化アルミニウム製合金部材保持
治具、307はコイルばね、309は冷却ガスノズル、
310はガス導入フィードスルー、311はアトムソー
ス、400は真空チャンバである。
Reference numeral 211 denotes the first metallization layer 103 made of Au and the second metallization layer 104 made of Sn shown in FIG.
And a third metallization layer 105 made of Au, a bonding layer made of three metallization layers, and 221 are first metallization layers 107, 107 made of Au, a second metallization layer 108 made of Sn and a second metallization layer made of Au shown in FIG. A bonding layer composed of three metallized layers of the three metallized layers 109, 212
Reference numerals 222 and 222 denote a pollutant layer composed of an oxide film, water, and an organic substance, 2
30 is a fused and integrated joining layer, 300 is an Ar atom beam, 301 is a resistance welding machine, 302 is a resistance welding tip, 303 is a ground terminal, 304 is a conductive base, 30
Reference numerals 5 and 308 are heating and pressing jigs having a built-in heater, and 306.
Is an aluminum nitride alloy member holding jig having a thickness of 0.5 mm, 307 is a coil spring, 309 is a cooling gas nozzle,
Reference numeral 310 is a gas introduction feedthrough, 311 is an atom source, and 400 is a vacuum chamber.

【0034】(1)セッティング 真空チャンバ400中に第1合金部材101及び第2合
金部材111を装填し、真空排気する。
(1) Setting The first alloy member 101 and the second alloy member 111 are loaded in the vacuum chamber 400, and the chamber is evacuated.

【0035】第1合金部材101にはNiメタライズ層
102及び図1に示すAuよりなる第1メタライズ層1
03、Snよりなる第2メタライズ層104及びAuよ
りなる第3メタライズ層105の3層のメタライズ層か
らなる接合層211が形成されている。また第2合金部
材111には図1に示すAuよりなる第1メタライズ層
107、Snよりなる第2メタライズ層108及びAu
よりなる第3メタライズ層109の3層のメタライズ層
からなる接合層221が形成されている。真空排気され
た状態では接合層211及び221上には酸化物層や
水、有機物等の吸着物層からなる汚染物層212及び2
22が形成されている。
The first alloy member 101 has a Ni metallization layer 102 and a first metallization layer 1 made of Au shown in FIG.
03, a second metallization layer 104 made of Sn and a third metallization layer 105 made of Au. The second alloy member 111 has a first metallization layer 107 made of Au, a second metallization layer 108 made of Sn and Au shown in FIG.
The bonding layer 221 formed of three metallized layers of the third metallized layer 109 is formed. In the state of being evacuated, the contaminant layers 212 and 2 composed of an oxide layer and an adsorbed layer of water, an organic substance or the like are formed on the bonding layers 211 and 221.
22 is formed.

【0036】(2)活性化 アトムソース311にArガスを導入し、発生したAr
アトムビーム300によるスパッタリング現象を利用し
て、汚染物層212及び222を除去する。この処理に
より接合層211及び221の表面は清浄となり、接合
性、ぬれ性に富んだ面となる。
(2) Ar gas generated by introducing Ar gas into the activation atom source 311
The contaminant layers 212 and 222 are removed by utilizing the sputtering phenomenon by the atom beam 300. By this treatment, the surfaces of the bonding layers 211 and 221 are cleaned, and the surfaces are rich in bondability and wettability.

【0037】(3)大気中位置決め、固定 第1合金部材101及び第2合金部材111を大気中に
取り出し、アース端子303により接地された導電性ベ
ース304上に設置し、接合層211及び221を対向
させ、第1合金部材101及び第2合金部材111の相
対位置を調整したのち密着させ、抵抗溶接機301及び
抵抗溶接チップ302を用いて抵抗溶接を行い、第1合
金部材101及び第2合金部材111の相対位置を固定
する。この処理により位置決め治具などを用いなくと
も、第1合金部材101及び第2合金部材111の相対
位置のずれを生じさせることなく以降の処理を続けるこ
とができる。
(3) Positioning and Fixing in the Atmosphere The first alloy member 101 and the second alloy member 111 are taken out into the atmosphere and placed on the conductive base 304 grounded by the ground terminal 303, and the bonding layers 211 and 221 are attached. The first alloy member 101 and the second alloy member 111 are opposed to each other, the relative positions of the first alloy member 101 and the second alloy member 111 are adjusted and brought into close contact with each other, and resistance welding is performed using the resistance welding machine 301 and the resistance welding tip 302. The relative position of the member 111 is fixed. By this processing, the subsequent processing can be continued without causing a shift in the relative positions of the first alloy member 101 and the second alloy member 111 without using a positioning jig or the like.

【0038】(4)治具予熱 位置決め固定された第1合金部材101及び第2合金部
材111を真空チャンバ400中の合金部材保持治具3
06上に設置し、一旦真空排気した後チッ素やArなど
の不活性ガスを導入する。同時にヒータを内蔵した加熱
加圧治具305及び308を予熱し、573〜593K
に保つ。この状態では合金部材保持治具306はコイル
ばね307で加熱加圧治具308から浮いており、また
加熱加圧治具305は第2合金部材111に接触しない
位置に引き上げられている。従って第1合金部材101
及び第2合金部材111は加熱加圧治具305及び30
8と熱的に接触していないので、加熱加圧治具305及
び308を593Kに予熱しても第1合金部材101及
び第2合金部材111の温度は420K程度までしか上
昇せず、接合層211及び221は溶融しない。これに
よりNiメタライズ層102と接合層211との相互拡
散もほとんど生じない。
(4) Jig preheating The alloy member holding jig 3 in the vacuum chamber 400 for holding the first alloy member 101 and the second alloy member 111, which are positioned and fixed, in the vacuum chamber 400.
After being evacuated once, an inert gas such as nitrogen or Ar is introduced. At the same time, preheat the heating / pressurizing jigs 305 and 308 with built-in heaters, and 573-593K
Keep on. In this state, the alloy member holding jig 306 is floated from the heating / pressurizing jig 308 by the coil spring 307, and the heating / pressurizing jig 305 is pulled up to a position where it does not contact the second alloy member 111. Therefore, the first alloy member 101
And the second alloy member 111 is heated and pressed by the jigs 305 and 30.
8, the temperature of the first alloy member 101 and the second alloy member 111 rises only up to about 420K even if the heating / pressurizing jigs 305 and 308 are preheated to 593K. 211 and 221 do not melt. As a result, there is almost no mutual diffusion between the Ni metallized layer 102 and the bonding layer 211.

【0039】(5)加圧、加熱 加熱加圧治具305を図示しない加圧装置を用いて押下
し、第1合金部材101及び第2合金部材111を加圧
して密着させる。この時、コイルばね307が縮み、合
金部材保持治具306が加熱加圧治具308と接触する
ので、合金部材保持治具306を介して熱が急速に第1
合金部材101及び第2合金部材111に伝わり、急速
加熱される。同時に加熱加圧治具305も第2合金部材
111と接触しているので熱が第1合金部材101及び
第2合金部材111に伝わり急速加熱される。加熱加圧
の結果、まず接合層211及び221中のSnが溶融
し、隣接するAuを溶融してAu−Sn合金融液を形成
する。AuがAu−Sn合金融液中に完全に溶解するま
では、AuはSnのNiメタライズ層102及び第2合
金部材111への拡散に対するバリア層として機能す
る。Sn中のAuの濃度が増大するにつれAu−Sn合
金融液の融点は上昇するので、加熱昇温速度がこの融点
上昇速度よりも低い場合には融液は一旦凝固する。しか
しこの間にもSnとAuとの相互拡散は進行し、Au−
Sn合金の融点は連続的に変化する。加熱温度が553
Kを超えると、AuとSnの共晶反応により融液が生じ
て接合部の密着化が進行する。加熱昇温速度がAu−S
n合金の融点上昇速度よりも大きい場合には、Au−S
n合金層は凝固せず、溶融状態を保つ。
(5) Pressing and heating The heating and pressing jig 305 is pressed down using a pressing device (not shown), and the first alloy member 101 and the second alloy member 111 are pressed and brought into close contact with each other. At this time, the coil spring 307 contracts and the alloy member holding jig 306 comes into contact with the heating / pressurizing jig 308, so that heat is rapidly transferred through the alloy member holding jig 306.
It is transmitted to the alloy member 101 and the second alloy member 111 and rapidly heated. At the same time, since the heating / pressurizing jig 305 is also in contact with the second alloy member 111, heat is transferred to the first alloy member 101 and the second alloy member 111 and rapidly heated. As a result of the heating and pressurization, first, Sn in the bonding layers 211 and 221 is melted, and adjacent Au is melted to form an Au-Sn combined financial liquid. Until Au is completely dissolved in the Au-Sn synthetic financial liquid, Au functions as a barrier layer against the diffusion of Sn into the Ni metallized layer 102 and the second alloy member 111. Since the melting point of the Au—Sn synthetic financial liquid rises as the concentration of Au in Sn increases, the melt once solidifies when the heating temperature raising rate is lower than the melting point raising rate. However, during this time, the mutual diffusion of Sn and Au progresses, and Au-
The melting point of the Sn alloy changes continuously. Heating temperature is 553
When it exceeds K, a eutectic reaction of Au and Sn produces a melt to promote adhesion of the joint. The heating rate is Au-S
If the melting point increase rate of the n-alloy is higher than that of Au-S
The n-alloy layer does not solidify and remains molten.

【0040】接合層411が完全に溶融すると、接合部
の密着化が促進されると共にAu−Sn合金融液中のS
nとNiメタライズ層102及び第2合金部材111と
が直接接触してNi−Sn化合物の形成が促進され、接
合層中のSn濃度が急激に減少する。
When the bonding layer 411 is completely melted, adhesion of the bonding portion is promoted and S in the Au-Sn mixed financial liquid is promoted.
The n is directly contacted with the Ni metallized layer 102 and the second alloy member 111 to promote the formation of the Ni—Sn compound, and the Sn concentration in the bonding layer is rapidly reduced.

【0041】本実施例の場合には、加熱昇温速度が20
K/sec以上とすれば接合層中のSn濃度がAu−S
n共晶組成である20mass%よりも低くなる前に接
合を完了し、強固で気密性のある接合部を得ることがで
きる。また、加熱温度もAu−Sn系合金の共晶点であ
る553Kよりもわずかに高い573〜593Kとすれ
ばよく、第1合金部材101及び第2合金部材111へ
の熱的ダメージを小さく抑えることができる。加熱加圧
時間の最適値は実験により予め求めておく。
In the case of this embodiment, the heating temperature rising rate is 20.
If K / sec or more, the Sn concentration in the bonding layer is Au-S.
The joining can be completed before the n-eutectic composition becomes lower than 20 mass% to obtain a strong and airtight joint. Further, the heating temperature may be set to 573 to 593K, which is slightly higher than the eutectic point of Au-Sn alloy, which is 553K, and suppresses thermal damage to the first alloy member 101 and the second alloy member 111 to be small. You can The optimum value of the heating / pressurizing time is obtained in advance by experiments.

【0042】(6)冷却 所定時間加熱加圧した後、加熱加圧治具305を引き上
げて第2合金部材111から離す。この際コイルばね3
07が伸び、合金部材保持治具306を持ち上げるの
で、加熱加圧治具305及び308から第1合金部材1
01及び第2合金部材111への熱の流入は減少する。
次にガス導入フィードスルー310及び冷却ガスノズル
309を通してArあるいはN2などの不活性ガスを第
1合金部材101及び第2合金部材111と一体化した
接合層230へ吹き付けることにより接合部は急速に冷
却される。この急速冷却により、接合層230とNiメ
タライズ層102及び第2合金部材111との界面に形
成されるNi−Sn化合物層の成長を抑制することがで
き、強固で気密性のある接合部を得ることができる。
(6) Cooling After heating and pressing for a predetermined time, the heating and pressing jig 305 is pulled up and separated from the second alloy member 111. At this time, coil spring 3
07 expands and lifts the alloy member holding jig 306, so that the heating and pressing jigs 305 and 308 cause the first alloy member 1 to move.
01 and the heat inflow to the second alloy member 111 are reduced.
Next, an inert gas such as Ar or N 2 is sprayed onto the bonding layer 230 integrated with the first alloy member 101 and the second alloy member 111 through the gas introduction feedthrough 310 and the cooling gas nozzle 309 to rapidly cool the bonding portion. To be done. By this rapid cooling, the growth of the Ni—Sn compound layer formed at the interface between the bonding layer 230, the Ni metallized layer 102, and the second alloy member 111 can be suppressed, and a strong and airtight bonded portion can be obtained. be able to.

【0043】(7)取り出し 真空チャンバ400から第1合金部材101及び第2合
金部材111を取り出して接合は完了する。第1合金部
材101及び第2合金部材111は一体化した接合層2
30により強固に接合されている。
(7) Taking out The first alloy member 101 and the second alloy member 111 are taken out from the vacuum chamber 400, and the joining is completed. The joining layer 2 in which the first alloy member 101 and the second alloy member 111 are integrated
It is firmly joined by 30.

【0044】本実施例の場合、加熱昇温速度が20K/
secよりも小さい場合には接合層が溶融したのち完全
に一体となる前に接合層中のSn濃度がAu−Sn共晶
組成である20mass%よりも低くなる。その結果、
接合層融点が急激に上昇し、接合層の一体化が不完全な
まま接合層が凝固するので、強固で気密性のある接合部
は得られない。ただし、接合層の組成が本実施例と異な
る場合には加熱昇温速度を必ずしも20K/sec以上
とする必要はない。
In the case of this embodiment, the heating rate is 20 K /
When it is smaller than sec, the Sn concentration in the bonding layer becomes lower than 20 mass% which is the Au—Sn eutectic composition before the bonding layer melts and becomes completely integrated. as a result,
Since the melting point of the bonding layer rises rapidly and the bonding layer solidifies with the bonding layer being incompletely integrated, a strong and airtight bonded portion cannot be obtained. However, when the composition of the bonding layer is different from that of the present embodiment, the heating temperature rising rate does not necessarily need to be 20 K / sec or more.

【0045】本実施例では接合層のSn濃度を23ma
ss%としたが、Sn濃度は20mass%を超え40
mass%未満ならば良好な接合が可能である。この範
囲では前述の如くNi−Sn化合物の形成により接合層
中のSn濃度が低下すると接合層組成は共晶組成に近付
くので、接合層融点は低下する。その結果、加熱加圧中
に接合層が溶融して一体化するのに十分な時間的余裕が
あり、強固で気密性のある接合部を得ることができる。
一方、接合層組成が20mass%以下及び40mas
s%以上の場合には、Sn濃度が低下すると、接合層融
点は急速に上昇し、接合層が溶融して一体化する時間的
余裕がない。その結果、接合部にはボイドや未接合部な
どの接合欠陥が発生し、接合強度及び気密性を低下させ
る。
In this embodiment, the Sn concentration of the bonding layer is set to 23 ma.
Although the ss% is set, the Sn concentration exceeds 20 mass% and is 40
If it is less than mass%, good joining is possible. In this range, as described above, when the Sn concentration in the bonding layer decreases due to the formation of the Ni-Sn compound, the composition of the bonding layer approaches the eutectic composition, and the melting point of the bonding layer decreases. As a result, there is sufficient time for the bonding layer to melt and integrate during heating and pressing, and a strong and airtight bonded portion can be obtained.
On the other hand, the bonding layer composition is 20 mass% or less and 40 mass% or less.
When the Sn concentration is s% or more, the melting point of the bonding layer rises rapidly when the Sn concentration decreases, and there is no time margin for the bonding layer to melt and integrate. As a result, a bonding defect such as a void or an unbonded portion is generated in the bonded portion, which lowers the bonding strength and airtightness.

【0046】本実施例では接合層をAu−Sn系合金と
したが、接合中の接合層組成の変化により接合層融点が
変化する合金であれば、その合金組成を接合中に融点が
低下する組成に設定することにより本実施例と同様にし
て良好な接合部を得ることができる。
In the present embodiment, the joining layer is made of Au--Sn alloy, but if the melting point of the joining layer changes due to the change of the joining layer composition during joining, the melting point is lowered during joining. By setting the composition, a good bonded portion can be obtained as in the present embodiment.

【0047】本実施例では合金部材を第1合金部材と第
2合金部材の2枚としたが、本発明による接合プロセス
を繰り返すことにより何枚でも積層接合することが可能
である。また位置合わせと抵抗溶接による固定プロセス
を繰り返すことにより3枚以上の合金部材の位置合わせ
固定を行い、一度に加熱接合することもできる。
In this embodiment, two alloy members, the first alloy member and the second alloy member, are used, but any number of laminated members can be joined by repeating the joining process according to the present invention. It is also possible to position-fix and fix three or more alloy members by repeating the positioning process and the fixing process by resistance welding, and heat-bonding them all at once.

【0048】次に本発明の接合方法にかかる他の実施例
を図5及び図6により説明する。
Next, another embodiment of the joining method of the present invention will be described with reference to FIGS.

【0049】まず合金部材へのメタライズ層形成方法に
ついて述べる。
First, a method for forming a metallized layer on an alloy member will be described.

【0050】101は厚さ50μmのSUS304製第
1合金部材、102は厚さ1μmのNiメタライズ層、
501は厚さ1.15μmのAuよりなる第1メタライ
ズ層、502は厚さ1.8μmのSnよりなる第2メタ
ライズ層、503は厚さ1.15μmのAuよりなる第
3メタライズ層、111は厚さ27μmのNi製第2合
金部材である。
101 is a 50 μm thick SUS304 first alloy member, 102 is a 1 μm thick Ni metallized layer,
Reference numeral 501 denotes a first metallization layer made of Au having a thickness of 1.15 μm, 502 denotes a second metallization layer made of Sn having a thickness of 1.8 μm, 503 denotes a third metallization layer made of Au having a thickness of 1.15 μm, and 111 denotes It is a Ni second alloy member having a thickness of 27 μm.

【0051】SUS304製第1合金部材101に湿式
めっきにより厚さ1μmのNi−P無電解めっきを施
す。厚さは必ずしも1μmでなくともよいが、接合後に
Niの全てがSnとの化合物として消費され尽くさない
だけの厚さが必要である。Ni−Sn化合物はSUS3
04との接合性に乏しく、接合後にNiの全てがSnと
の化合物として消費され尽くすと、接合強度は極端に低
下する。次に第1メタライズ層501として厚さ1.1
5μmのAuを湿式めっきにより形成する。次に第2メ
タライズ層502として厚さ1.8μmのSnを湿式め
っきにより形成する。更に第3メタライズ層503とし
て厚さ1.15μmのAuを湿式めっきにより形成す
る。Ni製第2合金部材111は電鋳により製作され
る。電鋳NiはAu−Sn系合金との接合性が良好であ
るので、接合面にはNiメタライズを施す必要はない。
The first alloy member 101 made of SUS304 is electrolessly plated with Ni—P to a thickness of 1 μm by wet plating. The thickness does not necessarily have to be 1 μm, but it is necessary that the Ni is not completely consumed as a compound with Sn after bonding. Ni-Sn compound is SUS3
If the bonding property with 04 is poor and all of Ni is consumed as a compound with Sn after bonding, the bonding strength will be extremely lowered. Next, as the first metallized layer 501, the thickness 1.1
Au of 5 μm is formed by wet plating. Next, as the second metallized layer 502, Sn having a thickness of 1.8 μm is formed by wet plating. Further, Au having a thickness of 1.15 μm is formed by wet plating as the third metallized layer 503. The Ni second alloy member 111 is manufactured by electroforming. Since electroformed Ni has good bondability with the Au-Sn alloy, it is not necessary to apply Ni metallization to the bonded surface.

【0052】本発明ではメタライズ層を全て湿式めっき
により形成しているが、全てのメタライズ層、あるいは
一部にメタライズ層を真空蒸着あるいはスパッタリング
等の他の成膜手段によって形成しても同等の効果が得ら
れる。
In the present invention, all the metallized layers are formed by wet plating, but the same effect can be obtained by forming all or part of the metallized layers by other film forming means such as vacuum deposition or sputtering. Is obtained.

【0053】次に接合プロセスについて述べる。Next, the joining process will be described.

【0054】212及び222は酸化膜や水、有機物か
らなる汚染物層、430は溶融して一体となった接合
層、300はArアトムビーム、301は抵抗溶接機、
302は抵抗溶接チップ、303はアース端子、304
は導電性ベース、305及び308はヒータを内蔵した
加熱加圧治具、306は厚さ0.5mmのチッ化アルミ
ニウム製合金部材保持治具、307はコイルばね、30
9は冷却ガスノズル、310はガス導入フィードスル
ー、311はアトムソース、400は真空チャンバであ
る。
Reference numerals 212 and 222 denote a contaminant layer made of an oxide film, water, or an organic material, 430 a fused and integrated joining layer, 300 an Ar atom beam, 301 a resistance welding machine,
302 is a resistance welding tip, 303 is a ground terminal, 304
Is a conductive base, 305 and 308 are heating and pressing jigs with built-in heaters, 306 is an aluminum nitride alloy member holding jig having a thickness of 0.5 mm, 307 is a coil spring, 30
Reference numeral 9 is a cooling gas nozzle, 310 is a gas introduction feedthrough, 311 is an atom source, and 400 is a vacuum chamber.

【0055】(1)セッティング 真空チャンバ400中に第1合金部材101及び第2合
金部材111を装填し、真空排気する。
(1) Setting The first alloy member 101 and the second alloy member 111 are loaded into the vacuum chamber 400, and the chamber is evacuated.

【0056】第1合金部材101にはNiメタライズ層
102及び図5に示すAuよりなる第1メタライズ層5
01、Snよりなる第2メタライズ層502及びAuよ
りなる第3メタライズ層503の3層のメタライズ層か
らなる接合層411が形成されている。真空排気された
状態では接合層411及び第2合金部材111上には、
酸化物層や水、有機物等の吸着物層からなる汚染物層2
12及び222が形成されている。
The first alloy member 101 has a Ni metallization layer 102 and a first metallization layer 5 made of Au shown in FIG.
A bonding layer 411 made up of three metallized layers, that is, a second metallized layer 502 made of 01 and Sn and a third metallized layer 503 made of Au is formed. When evacuated, the bonding layer 411 and the second alloy member 111 have
Contaminant layer 2 consisting of oxide layer and adsorbed layer of water, organic matter, etc.
12 and 222 are formed.

【0057】(2)活性化 アトムソース311にArガスを導入し、発生したAr
アトムビーム300によるスパッタリング現象を利用し
て汚染物層212及び222を除去する。この処理によ
り接合層411及び第2合金部材111の表面は清浄と
なり、接合性、ぬれ性に富んだ面となる。
(2) Ar gas generated by introducing Ar gas into the activation atom source 311
The contaminant layers 212 and 222 are removed by utilizing the sputtering phenomenon by the atom beam 300. By this treatment, the surfaces of the bonding layer 411 and the second alloy member 111 are cleaned, and the surfaces are rich in bondability and wettability.

【0058】(3)大気中位置決め、固定 第1合金部材101及び第2合金部材111を大気中に
取り出し、アース端子303により接地された導電性ベ
ース304上に設置し、接合層411及び第2合金部材
111を対向させ、第1合金部材101及び第2合金部
材111の相対位置を調整したのち密着させ、抵抗溶接
機301及び抵抗溶接チップ302を用いて抵抗溶接を
行い、第1合金部材101及び第2合金部材111の相
対位置を固定する。この処理により位置決め治具などを
用いなくとも、第1合金部材101及び第2合金部材1
11の相対位置のずれを生じさせることなく以降の処理
を続けることができる。
(3) Positioning and Fixing in the Atmosphere The first alloy member 101 and the second alloy member 111 are taken out into the atmosphere and placed on the conductive base 304 grounded by the ground terminal 303, and the bonding layer 411 and the second layer The alloy members 111 are made to face each other, the relative positions of the first alloy member 101 and the second alloy member 111 are adjusted and then closely contacted, and resistance welding is performed using the resistance welding machine 301 and the resistance welding tip 302. And the relative position of the second alloy member 111 is fixed. By this process, the first alloy member 101 and the second alloy member 1 can be used without using a positioning jig or the like.
Subsequent processing can be continued without causing a shift in the relative position of 11.

【0059】(4)治具予熱 位置決め固定された第1合金部材101及び第2合金部
材111を真空チャンバ400中の合金部材保持治具3
06上に設置し、一旦真空排気した後チッ素やArなど
の不活性ガスを導入する。同時にヒータを内蔵した加熱
加圧治具305及び308を予熱し、573〜593K
に保つ。この状態では合金部材保持治具306はコイル
ばね307で加熱加圧治具308から浮いており、また
加熱加圧治具305は第2合金部材111に接触しない
位置に引き上げられている。従って第1合金部材101
及び第2合金部材111は加熱加圧治具305及び30
8と熱的に接触していないので、加熱加圧治具305及
び308を593Kに予熱しても第1合金部材101及
び第2合金部材111の温度は420K程度までしか上
昇せず、接合層411は溶融しない。これによりNiメ
タライズ層102と接合層411との相互拡散もほとん
ど生じない。
(4) Jig preheating The alloy member holding jig 3 in the vacuum chamber 400 is provided with the first alloy member 101 and the second alloy member 111 which are positioned and fixed.
After being evacuated once, an inert gas such as nitrogen or Ar is introduced. At the same time, preheat the heating / pressurizing jigs 305 and 308 with built-in heaters, and 573-593K
Keep on. In this state, the alloy member holding jig 306 is floated from the heating / pressurizing jig 308 by the coil spring 307, and the heating / pressurizing jig 305 is pulled up to a position where it does not contact the second alloy member 111. Therefore, the first alloy member 101
And the second alloy member 111 is heated and pressed by the jigs 305 and 30.
8, the temperature of the first alloy member 101 and the second alloy member 111 rises only up to about 420K even if the heating / pressurizing jigs 305 and 308 are preheated to 593K. 411 does not melt. As a result, there is almost no mutual diffusion between the Ni metallized layer 102 and the bonding layer 411.

【0060】(5)加圧、加熱 加熱加圧治具305を図示しない加圧装置を用いて押下
し、第1合金部材101及び第2合金部材111を加圧
して密着させる。この時、コイルばね307が縮み、合
金部材保持治具306が加熱加圧治具308と接触する
ので、合金部材保持治具306を介して熱が急速に第1
合金部材101及び第2合金部材111に伝わり急速加
熱される。同時に加熱加圧治具305も第2合金部材1
11と接触しているので、熱が第1合金部材101及び
第2合金部材111に伝わり急速加熱される。加熱加圧
の結果、まず接合層411中のSnが溶融し、隣接する
Auを溶融してAu−Sn合金融液を形成する。本実施
例ではSnに隣接する第1及び第2メタライズ層として
のAuは同一の厚さであり、AuがAu−Sn合金融液
中に完全に溶解するまでは、SnのNiメタライズ層1
02及び第2合金部材111への拡散に対するバリア層
として機能する。Sn中のAuの濃度が増大するにつ
れ、Au−Sn合金融液の融点は上昇するので、加熱昇
温速度がこの融点上昇速度よりも低い場合には、融液は
一旦凝固する。しかしこの間にもSnとAuとの相互拡
散は進行し、Au−Sn合金の融点は連続的に変化す
る。加熱温度が553Kを超えると、AuとSnの共晶
反応により融液が生じて接合部の密着化が進行する。加
熱昇温速度がAu−Sn合金の融点上昇速度よりも大き
い場合には、Au−Sn合金層は凝固せず、溶融状態を
保つ。
(5) Pressurization and heating The heating and pressurizing jig 305 is pressed down using a pressurizing device (not shown), and the first alloy member 101 and the second alloy member 111 are pressed and brought into close contact with each other. At this time, the coil spring 307 contracts and the alloy member holding jig 306 comes into contact with the heating / pressurizing jig 308, so that heat is rapidly transferred through the alloy member holding jig 306.
It is transmitted to the alloy member 101 and the second alloy member 111 and rapidly heated. At the same time, the heating / pressurizing jig 305 is also attached to the second alloy member 1.
Since it is in contact with 11, the heat is transferred to the first alloy member 101 and the second alloy member 111 to be rapidly heated. As a result of the heating and pressurization, first, Sn in the bonding layer 411 is melted, and adjacent Au is melted to form an Au-Sn synthetic financial liquid. In the present embodiment, Au as the first and second metallized layers adjacent to Sn have the same thickness, and until the Au is completely dissolved in the Au-Sn mixed financial liquid, the Ni metallized layer 1 of Sn is formed.
02 and the second alloy member 111 function as a barrier layer against diffusion. As the concentration of Au in Sn increases, the melting point of the Au-Sn combined financial liquid rises. Therefore, when the heating temperature rising rate is lower than the melting point rising rate, the melt temporarily solidifies. However, during this time, the mutual diffusion of Sn and Au proceeds, and the melting point of the Au—Sn alloy continuously changes. When the heating temperature exceeds 553 K, a eutectic reaction of Au and Sn produces a melt, which promotes adhesion of the joint. When the heating temperature rising rate is higher than the melting point rising rate of the Au-Sn alloy, the Au-Sn alloy layer does not solidify and maintains the molten state.

【0061】接合層411が完全に溶融すると、接合部
の密着化が促進されると共にAu−Sn合金融液中のS
nとNiメタライズ層102及び第2合金部材111と
が直接接触してNi−Sn化合物の形成が促進され、接
合層中のSn濃度が急激に減少する。本実施例の場合に
は、加熱昇温速度が20K/sec以上とすれば接合層
中のSn濃度がAu−Sn共晶組成である20mass
%よりも低くなる前に接合を完了し、強固で気密性のあ
る接合部を得ることができる。また加熱温度もAu−S
n系合金の共晶点である553Kよりもわずかに高い5
73〜593Kとすればよく、第1合金部材101及び
第2合金部材111への熱的ダメージを小さく抑えるこ
とができる。加熱加圧時間の最適値は実験により予め求
めておく。
When the bonding layer 411 is completely melted, adhesion of the bonding portion is promoted and S in the Au-Sn mixed financial liquid is promoted.
The n is directly contacted with the Ni metallized layer 102 and the second alloy member 111 to promote the formation of the Ni—Sn compound, and the Sn concentration in the bonding layer is rapidly reduced. In the case of the present embodiment, if the heating rate is 20 K / sec or more, the Sn concentration in the bonding layer is 20 mass, which is the Au—Sn eutectic composition.
It is possible to complete the joining before it becomes lower than 10% and obtain a strong and airtight joined portion. The heating temperature is Au-S.
Slightly higher than 553K, which is the eutectic point for n-based alloys
It should be 73 to 593K, and thermal damage to the first alloy member 101 and the second alloy member 111 can be suppressed to be small. The optimum value of the heating / pressurizing time is obtained in advance by experiments.

【0062】(6)冷却 所定時間加熱加圧した後、加熱加圧治具305を引き上
げて第2合金部材111から離す。この際コイルばね3
07が伸び、合金部材保持治具306を持ち上げるの
で、加熱加圧治具305及び308から第1合金部材1
01及び第2合金部材111への熱の流入は減少する。
次にガス導入フィードスルー310及び冷却ガスノズル
309を通してArあるいはN2などの不活性ガスを第
1合金部材101及び第2合金部材111と一体化した
接合層430へ吹き付けることにより接合部は急速に冷
却される。この急速冷却により、接合層430とNiメ
タライズ層及び第2合金部材111との界面に形成され
るNi−Sn化合物層の成長を抑制することができ、強
固で気密性のある接合部を得ることができる。
(6) Cooling After heating and pressing for a predetermined time, the heating and pressing jig 305 is pulled up and separated from the second alloy member 111. At this time, coil spring 3
07 expands and lifts the alloy member holding jig 306, so that the heating and pressing jigs 305 and 308 cause the first alloy member 1 to move.
01 and the heat inflow to the second alloy member 111 are reduced.
Next, an inert gas such as Ar or N 2 is sprayed onto the bonding layer 430 integrated with the first alloy member 101 and the second alloy member 111 through the gas introduction feedthrough 310 and the cooling gas nozzle 309 to rapidly cool the bonding portion. To be done. By this rapid cooling, the growth of the Ni—Sn compound layer formed at the interface between the bonding layer 430 and the Ni metallized layer and the second alloy member 111 can be suppressed, and a strong and airtight bonded portion can be obtained. You can

【0063】(7)取り出し 真空チャンバ400から第1合金部材101及び第2合
金部材111を取り出して接合は完了する。第1合金部
材101及び第2合金部材111は一体化した接合層4
30により強固に接合されている。
(7) Taking out The first alloy member 101 and the second alloy member 111 are taken out from the vacuum chamber 400, and the joining is completed. The joining layer 4 in which the first alloy member 101 and the second alloy member 111 are integrated
It is firmly joined by 30.

【0064】本実施例の場合、加熱昇温速度が20K/
secよりも小さい場合には接合層が溶融したのち完全
に一体となると同時に接合層中のSn濃度がAu−Sn
共晶組成である20mass%よりも低くなる。その結
果、接合層融点が急激に上昇し、接合層の密着化が不完
全なまま接合層が凝固するので、強固で気密性のある接
合部は得られない。しかし、接合層の組成が本実施例と
異なる場合には加熱昇温速度を必ずしも20K/sec
以上とする必要はない。
In the case of this embodiment, the heating rate is 20 K /
When it is smaller than sec, the bonding layer is melted and then completely integrated, and at the same time, the Sn concentration in the bonding layer is Au—Sn.
It becomes lower than 20 mass% which is a eutectic composition. As a result, the melting point of the bonding layer rapidly rises and the bonding layer solidifies while the adhesion of the bonding layer is incomplete, so that a strong and airtight bonded portion cannot be obtained. However, if the composition of the bonding layer is different from that of this embodiment, the heating rate is not necessarily 20 K / sec.
There is no need to go above.

【0065】本実施例では接合層のSn濃度を23ma
ss%としたが、Sn濃度は20mass%を超え40
mass%未満ならば良好な接合が可能である。この範
囲では前述の如くNi−Sn化合物の形成により接合層
中のSn濃度が低下すると接合層組成は共晶組成に近付
くので、接合層融点は低下する。その結果、加熱加圧中
に接合層が溶融した後接合部が完全に密着するのに十分
な時間的余裕があり、強固で気密性のある接合部を得る
ことができる。一方、接合層組成が20mass%以下
及び40mass%以上の場合には、Sn濃度が低下す
ると、接合層融点は急速に上昇し、接合部が完全に密着
化する時間的余裕がない。その結果、接合部にはボイド
や未接合部などの接合欠陥が発生し、接合強度及び気密
性を低下させる。
In this embodiment, the Sn concentration of the bonding layer is 23 ma.
Although the ss% is set, the Sn concentration exceeds 20 mass% and is 40
If it is less than mass%, good joining is possible. In this range, as described above, when the Sn concentration in the bonding layer decreases due to the formation of the Ni-Sn compound, the composition of the bonding layer approaches the eutectic composition, and the melting point of the bonding layer decreases. As a result, there is enough time for the bonding portion to completely adhere after the bonding layer melts during heating and pressing, and a strong and airtight bonding portion can be obtained. On the other hand, when the composition of the bonding layer is 20 mass% or less and 40 mass% or more, when the Sn concentration decreases, the melting point of the bonding layer rapidly rises, and there is no time to fully bond the bonding portion. As a result, a bonding defect such as a void or an unbonded portion is generated in the bonded portion, which lowers the bonding strength and airtightness.

【0066】本実施例では接合層をAu−Sn系合金と
したが、接合中の接合層組成の変化により接合層融点が
変化する合金であれば、その合金組成を接合中に融点が
低下する組成に設定することにより本実施例と同様にし
て良好な接合部を得ることができる。
In the present embodiment, the bonding layer is made of Au--Sn alloy, but if the melting point of the bonding layer changes due to the change of the bonding layer composition during bonding, the melting point of the alloy composition decreases during bonding. By setting the composition, a good bonded portion can be obtained as in the present embodiment.

【0067】本実施例では合金部材を第1合金部材と第
2合金部材の2枚としたが、本発明による接合プロセス
を繰り返すことにより何枚でも積層接合することが可能
である。また位置合わせと抵抗溶接による固定プロセス
を繰り返すことにより3枚以上の合金部材の位置合わせ
固定を行い、一度に加熱接合することもできる。
In this embodiment, two alloy members, the first alloy member and the second alloy member, are used. However, it is possible to carry out laminated bonding by repeating the bonding process according to the present invention. It is also possible to position-fix and fix three or more alloy members by repeating the positioning process and the fixing process by resistance welding, and heat-bonding them all at once.

【0068】[0068]

【発明の効果】本発明によれば、厚さ10ミクロン〜5
0ミクロンのSUS304板及びNi製の薄板の組み合
わせからなる被接合物を、Au、Sn及びAuの3層の
メタライズ層からなる接合層を用いて、真空中でアルゴ
ンアトムビームで清浄化し、その後大気中にて位置合わ
せ及び位置固定を行い、次に真空中あるいは不活性ガス
中にて加圧加熱接合するもので、SUS304板及び電
鋳Ni板に熱的ダメージを与えずに耐食性に優れた接合
を行うことができる。
According to the present invention, the thickness is 10 μm to 5 μm.
An object to be bonded, which is composed of a combination of a 0-micron SUS304 plate and a thin plate made of Ni, is cleaned with an argon atom beam in a vacuum by using a bonding layer composed of three metallized layers of Au, Sn, and Au, and then air. Positioning and fixing are performed inside, and then pressure heating bonding is performed in vacuum or in an inert gas. Bonding with excellent corrosion resistance without thermal damage to SUS304 plate and electroformed Ni plate. It can be performed.

【図面の簡単な説明】[Brief description of drawings]

【図1】 本発明の接合方法のメタライズ層形成方法に
かかる実施例を説明する図である。
FIG. 1 is a diagram illustrating an example according to a metallized layer forming method of a joining method of the present invention.

【図2】 本発明の接合方法にかかる実施例の各接合過
程における接合部組織を説明する図である。
FIG. 2 is a diagram illustrating a joint structure in each joining process of the embodiment according to the joining method of the present invention.

【図3】 本発明の接合方法にかかる実施例の各接合過
程におけるAu−Sn合金融液層の組織及び融点を説明
する図である。
FIG. 3 is a view for explaining the structure and melting point of the Au—Sn synthetic financial liquid layer in each joining process of the example according to the joining method of the present invention.

【図4】 本発明の接合方法にかかる実施例を説明する
図である。
FIG. 4 is a diagram illustrating an example according to the joining method of the present invention.

【図5】 本発明の接合方法のメタライズ層形成方法に
かかる実施例を説明する図である。
FIG. 5 is a diagram illustrating an example of a metallized layer forming method of the joining method of the present invention.

【図6】 本発明の接合方法にかかる実施例を説明する
図である。
FIG. 6 is a diagram illustrating an example according to the joining method of the present invention.

【符号の説明】[Explanation of symbols]

101は厚さ50μmのSUS304製第1合金部材、
102は厚さ1μmのNiメタライズ層、103は厚さ
2.0μmのAuよりなる第1メタライズ層、104は
厚さ1.8μmのSnよりなる第2メタライズ層、10
5は厚さ0.3μmのAuよりなる第3メタライズ層、
106は第1合金部材側のNi−Sn金属間化合物、1
07は第2合金部材側の厚さ2.0μmのAuよりなる
第1メタライズ層、108は第2合金部材側の厚さ1.
8μmのSnよりなる第2メタライズ層、109は第2
合金部材側の厚さ0.3μmのAuよりなる第3メタラ
イズ層、110は第2合金部材側のNi−Sn金属間化
合物、111は厚さ27μmのNi製合金部材、130
はAu−Sn合金融液、300はArアトムビーム、3
01は抵抗溶接機、302は抵抗溶接チップ、303は
アース端子、304は導電性ベース、305、308は
ヒータを内蔵した加熱加圧治具、306は厚さ0.5m
mのチッ化アルミニウム製合金部材保持治具、307は
コイルばね、309は冷却ガスノズル、310はガス導
入フィードスルー、311はアトムソース、400は真
空チャンバー、411は接合層、430は溶融して一体
となった接合層、501は厚さ1.15μmのAuより
なる第1メタライズ層、502は厚さ1.8μmのSn
よりなる第2メタライズ層、503は厚さ1.15μm
のAuよりなる第3メタライズ層である。
101 is a 50 μm thick SUS304 first alloy member,
102 is a Ni metallization layer having a thickness of 1 μm, 103 is a first metallization layer made of Au having a thickness of 2.0 μm, 104 is a second metallization layer made of Sn having a thickness of 1.8 μm, 10
5 is a third metallization layer made of Au having a thickness of 0.3 μm,
106 is a Ni-Sn intermetallic compound on the first alloy member side, 1
07 is a first metallization layer made of Au having a thickness of 2.0 μm on the second alloy member side, and 108 is a thickness of 1.
Second metallization layer made of 8 μm Sn, 109 is second
A third metallization layer made of Au having a thickness of 0.3 μm on the alloy member side, 110 is a Ni—Sn intermetallic compound on the second alloy member side, 111 is a Ni alloy member having a thickness of 27 μm, 130
Is Au-Sn combined financial liquid, 300 is Ar atom beam, 3
01 is a resistance welding machine, 302 is a resistance welding tip, 303 is a ground terminal, 304 is a conductive base, 305 and 308 are heating and pressing jigs with a built-in heater, and 306 is a thickness of 0.5 m.
m alloy jig made of aluminum nitride, 307 coil spring, 309 cooling gas nozzle, 310 gas feed feedthrough, 311 atom source, 400 vacuum chamber, 411 bonding layer, 430 melted and integrated The joining layer 501 is a first metallization layer 501 made of Au having a thickness of 1.15 μm, and 502 is Sn having a thickness of 1.8 μm.
A second metallized layer 503, which has a thickness of 1.15 μm
Is a third metallization layer made of Au.

───────────────────────────────────────────────────── フロントページの続き (72)発明者 玉橋 邦裕 茨城県勝田市武田1060番地 日立工機株式 会社内 (72)発明者 古家 佑治 茨城県勝田市武田1060番地 日立工機株式 会社内 (72)発明者 久貝 健一 茨城県勝田市武田1060番地 日立工機株式 会社内 ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Inventor Kunihiro Tamahashi 1060 Takeda, Katsuta-shi, Ibaraki Hitachi Koki Co., Ltd. (72) Inventor Yuji Furuya 1060 Takeda, Katsuta-shi, Ibaraki Hitachi Koki Co., Ltd. (72) ) Inventor Kenichi Hisagai 1060 Takeda, Katsuta City, Ibaraki Hitachi Koki Co., Ltd.

Claims (6)

【特許請求の範囲】[Claims] 【請求項1】 インクジェットプリントヘッドを構成す
る複数の合金部材の第1合金部材の第1面を第2合金部
材の第2面に接合する部材において、 前記合金部材の第1面及び第2面のうち少なくとも一つ
の面の上に母材側から第1メタライズ層としてAu、第
2メタライズ層としてSn、第3メタライズ層としてA
uの順に3層メタライズ層を形成し、前記第1面及び第
2面を向い合わせに配置し、前記第1面及び第2面の相
対位置を調整した後密着させ、前記第1及び第2合金部
材を溶融することなく553K以上の温度に加熱して前
記3層メタライズ層を溶融させて、前記第1及び第2合
金部材を接合することを特徴とするインクジェットプリ
ントヘッドの接合方法。
1. A member for joining a first surface of a first alloy member to a second surface of a second alloy member of a plurality of alloy members constituting an ink jet print head, the first surface and the second surface of the alloy member. Of the first metallization layer, Au as the second metallization layer, and A as the third metallization layer on at least one surface from the base material side.
A three-layer metallized layer is formed in the order of u, and the first surface and the second surface are arranged face to face, the relative positions of the first surface and the second surface are adjusted, and then the layers are brought into close contact with each other. A method for joining an inkjet print head, comprising heating the alloy member to a temperature of 553 K or higher to melt the three-layer metallized layer and joining the first and second alloy members without melting the alloy member.
【請求項2】 第1、第2及び第3メタライズ層の厚さ
をこれら3層メタライズ層全体でのSn含有率が20m
ass%を超え40mass%未満とし、かつ第1メタ
ライズ層の厚さが1μm以上、3層メタライズ層全体の
厚さが3μm以上の3層メタライズを前記合金部材の第
1及び第2面の上に形成して接合に供することを特徴と
する請求項1記載のインクジェットプリントヘッドの接
合方法。
2. The thickness of each of the first, second and third metallized layers is such that the Sn content in the entire three metallized layers is 20 m.
a three-layer metallized layer with a thickness of the first metallized layer of 1 μm or more and a total thickness of the three-layered metallized layer of 3 μm or more on the first and second surfaces of the alloy member. The method for joining an inkjet print head according to claim 1, wherein the method is formed and used for joining.
【請求項3】 第1、第2及び第3メタライズ層の厚さ
をこれら3層メタライズ層全体でのSn含有率が20m
ass%を超え40mass%未満とし、かつ第1メタ
ライズ層と第3メタライズ層との厚さを同一とし、3層
メタライズ層全体の厚さが3μm以上の3層メタライズ
を前記合金部材の第1あるいは第2面のうちのいずれか
一方の上に形成して接合に供することを特徴とするイン
クジェットプリントヘッドの接合方法。
3. The thickness of each of the first, second and third metallized layers is such that the Sn content in the entire three metallized layers is 20 m.
more than ass% and less than 40 mass%, the first metallization layer and the third metallization layer have the same thickness, and the total thickness of the three-layer metallization layer is 3 μm or more. A method for joining an ink jet print head, comprising forming on any one of the second surfaces and using it for joining.
【請求項4】 第1合金部材の第1面及び第2合金部材
の第2面をArビームにて活性化した後、前記第1面及
び第2面の相対位置を大気中にて調整した後密着させ、
その後真空中あるいは不活性ガス中にて前記第1及び第
2合金部材を溶融することなく553K以上の温度に加
熱して前記3層メタライズ層を溶融させて、前記第1及
び第2合金部材を接合することを特徴とする請求項1、
2及び3記載のインクジェットプリントヘッドの接合方
法。
4. After activating the first surface of the first alloy member and the second surface of the second alloy member with an Ar beam, the relative positions of the first surface and the second surface are adjusted in the atmosphere. Make it close,
After that, the first and second alloy members are heated in a vacuum or in an inert gas to a temperature of 553 K or higher without melting the first and second alloy members to melt the three-layer metallized layer. It joins, The claim 1 characterized by the above-mentioned.
The method for joining inkjet print heads according to 2 and 3.
【請求項5】 予め所定温度に加熱保持された治具を、
相対位置を調整した後密着させられた前記第1及び第2
合金部材に押し当てて553K以上の温度に加熱し、3
層メタライズ層を溶融させ、前記第1及び第2の合金部
材が所定温度に到達後、不活性ガスを前記第1及び第2
の合金部材に吹き付けて冷却することを特徴とする請求
項4記載のインクジェットプリントヘッドの接合方法。
5. A jig preheated and maintained at a predetermined temperature,
The first and second parts are brought into close contact with each other after adjusting the relative position.
Press on the alloy member and heat it to a temperature of 553K or higher, and
After the layer metallized layer is melted and the first and second alloy members reach a predetermined temperature, an inert gas is added to the first and second alloy members.
The method for joining inkjet print heads according to claim 4, wherein the alloy member is sprayed and cooled.
【請求項6】 第1合金部材の第1面及び第2合金部材
の第2面の相対位置を調整した後、加熱する前に抵抗溶
接あるいは機械的締結を利用して第1合金部材と第2合
金部材とを固定することを特徴とする請求項4記載のイ
ンクジェットプリントヘッドの接合方法。
6. After adjusting the relative position of the first surface of the first alloy member and the second surface of the second alloy member, and before heating, resistance welding or mechanical fastening is used to make the first alloy member and The method for joining inkjet print heads according to claim 4, wherein the two alloy members are fixed.
JP7691793A 1993-04-02 1993-04-02 Method of joining inkjet print head Expired - Fee Related JP3293224B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7691793A JP3293224B2 (en) 1993-04-02 1993-04-02 Method of joining inkjet print head

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7691793A JP3293224B2 (en) 1993-04-02 1993-04-02 Method of joining inkjet print head

Publications (2)

Publication Number Publication Date
JPH06286148A true JPH06286148A (en) 1994-10-11
JP3293224B2 JP3293224B2 (en) 2002-06-17

Family

ID=13619050

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7691793A Expired - Fee Related JP3293224B2 (en) 1993-04-02 1993-04-02 Method of joining inkjet print head

Country Status (1)

Country Link
JP (1) JP3293224B2 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012210024A (en) * 2011-03-29 2012-10-25 Nikon Corp Vibrator, vibration actuator, lens barrel, camera, and connection method of vibrator
WO2014042214A1 (en) * 2012-09-12 2014-03-20 株式会社Kelk Peltier module for laser diode

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012210024A (en) * 2011-03-29 2012-10-25 Nikon Corp Vibrator, vibration actuator, lens barrel, camera, and connection method of vibrator
WO2014042214A1 (en) * 2012-09-12 2014-03-20 株式会社Kelk Peltier module for laser diode
JPWO2014042214A1 (en) * 2012-09-12 2016-08-18 株式会社Kelk Peltier module for laser diode
US9490412B2 (en) 2012-09-12 2016-11-08 Kelk Ltd. Peltier module for laser diode

Also Published As

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JP3293224B2 (en) 2002-06-17

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