JPH0627678Y2 - Cleaning equipment for liquid stream processing equipment such as cloth - Google Patents

Description

[Detailed description of the device]

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a cleaning device in a liquid stream processing apparatus for performing dyeing and other processing while circulating a textile product such as cloth with a liquid stream of a processing liquid.

[0002]

2. Description of the Related Art In a liquid stream processing apparatus for performing dyeing and other processing while circulating a textile product such as cloth with a liquid flow of a processing liquid, the processing liquid is treated in accordance with the type of processing object and processing means. Various dyes and other chemicals and auxiliaries are used. Further, oligomers, fluffs, scales, etc. separate from the object to be treated and float in the treatment liquid. Since these chemicals and suspended matters remain on the inner wall of the retention tank of the apparatus and remain after discharging the treatment liquid, they are accumulated by repeated use and form a deposition layer on the inner wall of the inner tank of the retention tank. When the deposited layer is formed on the inner wall, impure components that are eluted and separated from the deposited layer are mixed in the treatment liquid to contaminate the object to be treated, which causes a problem that the quality of the treated product deteriorates. Further, when the inner surface of the stainless steel can body is covered with the above-mentioned deposited layer, this portion cannot contact oxygen, which leads to corrosion of the stainless steel and shortens the life of the device.

Therefore, recently, a method has been proposed in which the inside of the flow path can be cleaned each time the processing step is completed so that the residue such as chemicals does not adhere to or deposit on the inner wall of the processing liquid retention tank. Has been done. As shown in FIG. 6, this cleaning device includes a retention tank 1 for a cloth and the like, an annular processing path connecting the retention tank 1 and a cloth transfer passage 2, and a suction section 5 at the bottom of the retention tank (this The processing liquid is sucked from four locations in the figure), and the transfer passage 2 is transferred through the pump 6 and the heat exchanger 7.
In a liquid flow treatment device having a treatment liquid circulation passage 8 which is circulated in a liquid injection portion 4 attached to one end of the treatment liquid circulation passage 8, one end is connected to the discharge side of the pump 6 of the treatment liquid circulation passage 8 and the other end is connected to the retention tank 1
The cleaning pipe 9 introduced between the outer tank 1b and the inner tank 1a of
It is provided via the cleaning liquid supply pipe 10. The cleaning pipe 9 extends obliquely along the inclination of the retention tank 1 on the ceiling side between the inner tank 1a and the outer tank 1b on the upstream side of the retention tank 1, and the outer surface of the cleaning pipe 9 is Nozzle holes for spraying the cleaning liquid are provided at predetermined intervals toward the inner wall of the tank 1b. In addition, 11 is a sluice valve, 12 is a water supply valve, 13 is a drainage valve, 1
4 is a nozzle valve. Therefore, according to this device,
After the completion of the liquid flow treatment step, the treatment liquid or newly supplied water is introduced into the cleaning pipe 9 to apply the cleaning liquid to the outer tank 1b and the inner tank 1a of the retention tank 1 to immediately wash the attached residue. You can

[0004]

However, the cleaning by the cleaning pipe 9 cannot completely remove the adhered residue from the sides of the inner tank 1a and the outer tank 1b of the retention tank 1 extending in the longitudinal direction. A gas-liquid boundary portion in which the liquid level of the processing liquid undulates on the outer wall of the tank 1a and the inner wall of the outer tank 1b, and the inner tank 1a and the outer tank 1
It was found that the deposition layer is likely to be thick due to the adhesion residue in the downstream portion where the gap with b is narrow. That is, with respect to the inner wall of the inner tank 1a, since the cloth or the like is slidably transferred to the inner wall during the treatment, the residue is unlikely to adhere to the inner wall of the inner tank 1a and the inner wall of the outer tank 1b. At the gas-liquid boundary where the waves are wavy, the treatment liquid attached to the wall surface at the same time as the liquid surface is lowered (the treatment liquid is usually heated to a high temperature, so the wall surface of the retention tank 1 is also heated). Evaporated and the dissolved and suspended components in the treatment liquid adhere to the wall surface, and this is repeated to form a fixed layer that is extremely difficult to remove. Further, in the downstream side portion where the gap between the inner tank 1a and the outer tank 1b is narrow, the flow resistance of the treatment liquid is large and the residue does not easily move, so that the residue is likely to be concentrated in a concentrated manner.

As described above, when the residue deposits are accumulated in the retention tank 1, the object to be treated is contaminated or the stainless steel is corroded, as described above.
After completion of the treatment process, the cleaning liquid is stretched up to the ceiling of the retention tank 1 to circulate the liquid, but the effect is not achieved although the cleaning liquid and power energy consumption costs are required. Therefore, it is possible to chemically decompose and remove the deposited layer by using a strong agent, but the use of the agent is not preferable because the can itself may be damaged by the use of the agent. For this reason, in the end, it is necessary to disassemble the retention tank 1 and manually scrape off the accumulated layer generated inside, and in reality, it takes a lot of time and effort.

The present invention has been made in view of the above circumstances, and includes a portion on the side of the retention tank where the liquid surface of the processing liquid is wavy,
An object of the present invention is to provide a cleaning device capable of intensively cleaning a downstream portion where a gap between an inner tank and an outer tank is narrow.

[0007]

In order to achieve the above object, the present invention provides a retention tank inclined toward the advancing direction of a cloth and the like, and a transfer passage connected from one end to the other end of the retention tank. And a processing liquid circulation passage that circulates from a suction portion at the bottom of the retention tank through a pump and a heat exchanger to a processing liquid injection portion attached to one end of the transfer passage. In a liquid flow treatment device for treating cloth and the like while transferring it with a treatment liquid in an annular treatment passage, one end is connected to the pump discharge side of the treatment liquid circulation passage and the other end is inside the outer tank of the retention tank. A horizontal cleaning pipe extending horizontally between the tank and the tank was provided, and the horizontal pipe for cleaning was provided with a cleaning nozzle for injecting the cleaning liquid toward a position near the liquid surface of the outer tank inner wall and the inner tank outer wall of the retention tank. Cleaning in a liquid stream treatment device for cloth In the same cleaning apparatus as described above, the inclined pipe for cleaning inclined along the longitudinal direction of the outer tank is provided on the downstream side between the outer tank and the inner tank of the retention tank. A washing device for a liquid flow treatment device such as a cloth provided with a plurality of parallel pipes at predetermined intervals, and a washing nozzle for injecting a washing liquid toward the inner wall of the outer tank and the outer wall of the inner tank of each of the slant pipes for washing are provided in the washing pipe. This is the second summary.

[0008]

That is, according to the present invention, a horizontal cleaning pipe extending horizontally is provided between the outer tank and the inner tank of the retention tank, and the cleaning horizontal pipe is provided with liquid on the inner wall of the outer tank and the outer wall of the inner tank. A cleaning nozzle for ejecting the cleaning liquid is provided toward the position near the surface. As a result, it is possible to intensively remove the adhered residue in the vicinity of the liquid surface, which was conventionally difficult to remove, by the jet cleaning liquid from the cleaning nozzle, and to keep the inside of the retention tank clean. . In addition to the horizontal pipe for cleaning, a plurality of inclined pipes for cleaning along the longitudinal direction of the outer tank are provided in parallel on the downstream side between the outer tank and the inner tank of the retention tank at a predetermined interval in parallel to each other. By spraying the cleaning liquid toward the inner wall and the outer wall of the inner tank, not only the adhered residue in the vicinity of the liquid surface but also the adhered residue on the side surface of the narrow part between the inner wall of the outer tank and the inner tank can be sufficiently removed. can do. Therefore, according to the present invention, it is not necessary to disassemble and clean the retention tank or to perform circulation cleaning with a powerful chemical agent. Instead, the cleaning liquid is sprayed from the cleaning pipe at each end of the circulation treatment process. The residue attached to the inner wall and the outer wall of the inner tank can be removed, and the inside of the retention tank can be maintained in a clean state.

Next, the present invention will be described in detail based on embodiments.

[0009]

1 is a block diagram of an embodiment of the present invention, and FIG. 2 is a sectional view taken along the line AA 'in FIG. The cleaning device in this liquid flow treatment device is provided with a second cleaning liquid supply pipe 20 branching from the cleaning liquid supply pipe 10 shown in FIG. 6, and the tip side thereof branches downward in a semicircular shape at the upper part of the retention tank 1. To form the header portion 20a. Further, horizontal pipes 21 and 21 'for cleaning extending horizontally between the outer tank 1b and the inner tank 1a of the retention tank 1 are connected to the respective ends of the header portion 20a via branching narrow tubes 22, respectively. . The height of the cleaning horizontal pipes 21 and 21 'is equal to the level X of the processing liquid.
It is set to match the height of. As shown in an enlarged view of the portion surrounded by the chain line Y in FIG. 2 (the cross-sectional position is shifted to a cross section not passing through the branch thin tube 22) in these cleaning horizontal pipes 21 and 21 ', A nozzle hole 23 for jetting the cleaning liquid toward the inner wall of the outer tank 1b, and the inner tank 1
Nozzle holes 24 for spraying the cleaning liquid toward the outer wall of a are formed at predetermined intervals along the longitudinal direction of the pipe. The other parts are the same as those in FIG. 6, and the same parts are denoted by the same reference numerals.

According to this cleaning device, after the processing of the cloth 3 by the liquid flow processing device is completed, the nozzle valve 14 is closed and the partition valve 30 is opened, so that the processing liquid or fresh water (cleaning liquid) by new supply of water is supplied. It is possible to inject from the nozzle holes 23 and 24 of the horizontal cleaning pipes 21 and 21 'as shown by the arrow in FIG. Therefore, the spray cleaning liquid can intensively clean the inner wall of the outer tank 1b and the outer wall of the inner tank 1a in the vicinity of the liquid surface X of the retention tank 1, and cleanly remove the residue attached to these parts. can do.
In addition, the dirty water after cleaning is discharged to the outside from a drain valve 13 provided on the suction side of the pump 6.

As described above, according to this cleaning apparatus, the horizontal pipe for cleaning 21, which is conventionally used in the vicinity of the liquid surface where the residue has been firmly adhered by heat, is formed every time the circulation processing step is completed. It can be washed off with the jet cleaning liquid from 21 ',
Since the adhered residue does not remain, the inside of the retention tank 1 can be always kept clean. Therefore, it is possible to perform high-quality processing over a long period of time without causing problems such as contamination of the object to be processed and corrosion of stainless steel.

At the same time when the gate valve 30 is opened,
The sluice valve 31 connected to the cleaning pipe 9 which is a conventional cleaning device is opened, and the cleaning pipe 9 and the horizontal pipes 21 and 2 for cleaning are opened.
The cleaning liquid can be sprayed simultaneously from both 1 '. Further, by closing one of the sluice valves 30 (31) and injecting the cleaning liquid only from one side, the injection pressure can be increased to intensively clean one part. On the contrary, by opening both sluice valves 30 and 31, and adjusting the opening of each valve on the sluice valves 30, 31, both pipes 9, 21,
It is also possible to wash the inside of the retention tank 1 in a balanced state from 21 '.

Further, in the above cleaning apparatus, the nozzle holes 23 and 24 of the horizontal cleaning pipes 21 and 21 'are provided only in the horizontal direction, but as shown in FIG. There is no problem even if the nozzle hole 25 is provided and the cleaning liquid is applied to the inner wall of the outer tank 1b and the outer wall of the inner tank 1a to be reflected. Further, the nozzle holes 23 to 25 may be arranged on the same circumference in the circumferential direction, or may be staggered.

FIG. 4 is a block diagram of another embodiment of the present invention, FIG.
4 is a sectional view taken along line BB ′ of FIG. 4. In the cleaning device in this liquid flow treatment device, the tip side of the second cleaning liquid supply pipe 20 branched from the cleaning liquid supply pipe 10 shown in FIG. 6 annularly surrounds the periphery of the retention tank 1 to form a header portion 20b. There is. Then, the inner peripheral side of the header 20b is provided on the downstream side between the outer tank 1b of the retention tank 1 and the inner tank 1a.
The inclined pipes for cleaning 35, which are inclined along the longitudinal direction of b, are connected to each other via the branched thin pipes 22. The three inclined cleaning pipes 35 are provided on the ceiling side and two on the bottom side of the outer tub 1b. Together with the two horizontal cleaning pipes 21 and 21 ', the cleaning inclined pipes 35 are substantially equal to each other. They are arranged on the same circumference so as to be spaced apart. However, in the portion indicated by S in FIG.
5 is not provided. This is the inclined pipe 35 for cleaning.
Two of the suction ports 5 (see FIG. 4) are arranged at the bottom of the portion provided with, and a strong flow of the processing liquid flowing into these suction ports 5 causes almost no residue to be attached. Because it does not occur. Then, each cleaning inclined pipe 35
Nozzle holes 23 to 25 (see FIG. 3 << a >>) similar to those of the horizontal pipes 21 and 21 'for cleaning are bored in the cleaning liquid toward the inner wall of the outer tank 1b and the outer wall of the inner tank 1a. Is being jetted. The other parts are shown in Fig. 1.
The same numbers are given to the same parts.

According to this cleaning device, the horizontal pipe 2 for cleaning is used.
In addition to being able to wash the adhered residue near the liquid surface X with the aid of 1, 21 ', in the narrow portion on the downstream side of the gap between the outer tank 1b and the inner tank 1a of the retention tank 1, which is conventionally easily soiled. Also, since the inner wall of the outer tank 1b and the outer wall of the inner tank 1a can be intensively cleaned, this portion can be always kept clean. Therefore, the inside of the retention tank 1 can be kept more clean than in the above-mentioned embodiment.

[0015]

As described above, according to the present invention, the cleaning liquid is horizontally jetted along the liquid surface of the inner and outer tanks of the retention tank after the processing by the liquid flow processing device is completed. Therefore, since the gas-liquid boundary portion where the treatment liquid is repeatedly evaporated and the chemicals or the like tend to be concentrated and fixed in the related art can be intensively washed, the inside of the retention tank can be always kept clean. In addition to the horizontal injection, on the downstream side of the retention tank,
By spraying the cleaning liquid even in a portion where the gap between the inner wall of the outer tank and the inner tank is narrow, the cleaning liquid can be sprayed in an inclined arrangement along the inclination of the retention tank, so that the inside of the retention tank can be cleaned more effectively. Moreover, in the present invention, since the processing liquid is used as the cleaning liquid and the pump for circulating the processing liquid provided in the liquid flow processing device can be used as it is, the liquid can be pressurized.
Effective cleaning can be performed at an extremely low cost.

[Brief description of drawings]

FIG. 1 is a block diagram showing an embodiment of the present invention.

FIG. 2 is a sectional view taken along the line AA ′ of FIG.

FIG. 3 is an explanatory diagram of the arrangement of nozzle holes in the above embodiment.

FIG. 4 is a block diagram showing another embodiment of the present invention.

5 is a sectional view taken along line BB ′ of FIG.

FIG. 6 is a configuration diagram showing a conventional cleaning device.

[Explanation of symbols]

 1 Retaining tank 1a Inner tank 1b Outer tank 2 Transfer passage 3 Fabric 4 Injection part 5 Suction part 6 Pump 7 Heat exchanger 8 Treatment liquid circulation path 10, 20 Cleaning liquid supply pipe 21, 21 'Horizontal pipe for cleaning 22 Branch thin tube 23- 25 Nozzle hole 35 Sloping pipe for cleaning X Liquid level

Claims (2)

[Scope of utility model registration request] 1. An annular processing passage constituted by a retention tank inclined toward the advancing direction of cloth and the like, a transfer passage connected from one end to the other end of the retention tank, and a suction portion at the bottom of the retention tank. From the pump through a pump and a heat exchanger to a treatment liquid circulating passage that is circulated to a treatment liquid jetting part attached to one end of the transfer passage, and the fabric and the like are treated while being transported together with the treatment liquid in the annular treatment passage. In the liquid flow treatment device thus configured, one end is connected to the pump discharge side of the treatment liquid circulation path and the other end is provided with a horizontal pipe for cleaning that extends horizontally between the outer tank and the inner tank of the retention tank, A cleaning device in a liquid flow treatment device for a cloth or the like, characterized in that the cleaning horizontal pipe is provided with a cleaning nozzle for injecting a cleaning liquid toward positions near the liquid surfaces of the outer tank inner wall and the inner tank outer wall of the retention tank. 2. The cleaning apparatus according to claim 1, wherein inclined pipes for cleaning which are inclined along the longitudinal direction of the outer tank are provided at predetermined intervals on the downstream side between the outer tank and the inner tank of the retention tank. In a liquid flow treatment device for a cloth or the like, a plurality of parallel nozzles are provided in parallel, and each of the cleaning inclined pipes is provided with a cleaning nozzle for injecting a cleaning liquid toward the outer tank inner wall and the inner tank outer wall of the retention tank. Cleaning device.