JPH06260412A - Shower type single sheet processing developing device - Google Patents

Abstract

PURPOSE:To extract sufficiently the merits of cost effectiveness of a device by a method wherein the drag-out amount of a developing solution due to a work is lessened to the utmost while the drying unevenness of the developing solution is prevented from being generated. CONSTITUTION:A work (w) is made to pass through in a developing chamber (a) and a developing solution is atomized on the work (w) through developing solution shower nozzles 4 to develop the work (w). The solution is circulated in a developing solution tank 1 from the chamber (a) and is repeatedly used. Drain of the developing solution is conducted by an N2 knife 7 the work (w) carried out from the chamber (a). In a neutral (b) to reach to a water washing chamber (c), the work (w) is transferred at high speed from the moment of the drain to make it reach to a developing stop water washing nozzle 17 within one second, the recesses and projections of the developing solution subsequent to the drain are flattened by jetting pure water from the nozzle 17 and at the same time, the developing is forcedly made to stop.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a shower type single-wafer developing apparatus used in a photolithography process for finely patterning a work such as a liquid crystal panel.

[0002]

2. Description of the Related Art As a developing device used in a manufacturing process of a liquid crystal panel, a shower type single-wafer developing device which has a cost advantage is generally used. Since it is a single-wafer type, it can be easily connected inline to the steps before and after development, and since the developer is repeatedly used by the shower type, it is advantageous in terms of cost.

FIG. 3 is a sectional view showing a schematic structure of a conventional shower type single-wafer developing apparatus. In FIG. 3, a is a development processing chamber, b is neutral, c is a water washing chamber, and d is a drying chamber. 1 is a developer tank, 2 is a developer supply pipe, 3
Is a pump, 4 is a developer shower nozzle arranged in plural in the development chamber a, 5 is a developer reflux pipe, 6 is a conveying device, 7 is an N ₂ knife arranged at the outlet of the development chamber a,
8 is a transfer device provided in the neutral b, 9 is a cleaning liquid supply pipe, 10 is a plurality of cleaning liquid shower nozzles arranged in the washing chamber c, 11 is a drain pipe, 12 is a transfer device, 13 and 14 are drying chambers d An air knife provided therein, 15 is a drain pipe that joins the drain pipe 11 from the washing chamber c, and 16 is a transfer device.

By driving the pump 3, the developer is pumped up from the developer tank 1 to the developer shower nozzle 4 through the developer supply pipe 2 to develop the work (substrate) w on the transfer device 6. The developer is sprayed and supplied from the liquid shower nozzle 4. The work w supplied with the developer is
While the developing process is being carried out, it is carried out from the exit of the developing process chamber a by the carrying device 6. The developer on the work w is drained by the N ₂ knife 7 arranged near the outlet of the developer chamber a, and the carry-out amount of the developer from the developer chamber a is limited. The developer sprayed from the shower nozzle 4 but not on the work w, the developer dropped from the work w, and the developer drained by the N ₂ knife 7 reach the bottom of the development processing chamber a and flow back to the developer. It returns to the developer tank 1 through the pipe 5 and is repeatedly used. This contributes to cost merit.

Work w drained by N ₂ knife 7
While being transported to the washing chamber c by the transport device 8 in the neutral b, the developing solution thereon is dried. The work w is inherited from the transfer device 8 to the transfer device 12 and enters the washing chamber c. Pure water is supplied as a cleaning liquid from the cleaning liquid supply pipe 9, and is sprayed from the cleaning liquid shower nozzle 10 toward the work w in the water washing chamber c to wash and remove unnecessary components and dirt components on the work w. The liquid after cleaning is drained through the drain pipe 11. The work w is further transferred from the transfer device 12 to the transfer device 16 to reach the drying chamber d, and the cleaning liquid on the work w is blown off and dried by the air knives 13 and 14. The blown cleaning liquid is drained through the drain pipe 15. The dried work w is conveyed to a baking oven (not shown).

[0006]

The condition of the N ₂ knife 7 for limiting the carry-out amount of the developing solution that gets out of the room by riding on the work w from the development processing chamber a is very difficult to set. . The injection pressure of the N ₂ knife 7 is, for example, 0.
When it is as high as about 1 to 0.15 kg / m ² (when the N ₂ flow rate is large), the developing solution on the work w is nonuniformly dried and uneven drying occurs, resulting in a poor product yield. This drying unevenness cannot be removed even by washing with water in the next step.

Therefore, in the conventional example, the injection pressure (N ₂ flow rate) of the N ₂ knife 7 is usually 0.02 to 0.0.
The setting is fairly low, around 5 kg / m ² . Then, unevenness is less likely to occur in the developing solution on the work w, and the occurrence of uneven drying is suppressed. However, the carry-out amount of the developer due to the work w is increased, and the cost merit of repeatedly using the developer is lost.
Further, the number of times the developer tank 1 is replaced is increased, which is not preferable in terms of work efficiency.

For example, the size of the work w is 300 mm ×
At 400 mm, in the conventional example, since the injection pressure of the N ₂ knife 7 is as low as 0.02 to 0.05 kg / m ² , the carry-out amount of the developer by the work w is 150 to 30.
It was 0 ml. When the carry-out amount by the work w per one sheet is 150 to 300 ml, the speed at which the developing solution in the developing solution tank 1 decreases decreases, and the frequency of replacement with a new solution must be increased. For example, in the case of a developer tank of 120 liters, a minimum amount of 60 liters is required to protect the pump 3, and the remaining usable amount is 60 liters. Then, the number of works w that can be developed in one developer tank 1 is 60 × 1000.
÷ 300 to 60 × 1000 ÷ 150, 200 to 40
It will be 0. It cannot be said that the cost advantages of the shower-type single-wafer developing device are fully utilized. In order to fully realize the cost merit, it is desired to process at least 1,000 sheets with a developing solution of 60 liters.

The present invention has been devised in view of the above circumstances, and has a sufficient cost merit by minimizing the carry-out amount of the developing solution by the work while preventing the drying unevenness of the developing solution. The purpose is to be able to pull out.

[0010]

A shower type single-wafer developing apparatus according to the present invention includes a developing processing chamber provided with a developing solution shower nozzle for spraying a developing solution onto a work, and the vicinity of the outlet of the developing processing chamber. Between the developing treatment chamber and the washing chamber, a gas flow knife for draining the developing liquid on the workpiece, a washing chamber provided with a washing liquid shower nozzle for injecting the washing liquid onto the dried and dried workpiece. In the shower-type single-wafer developing device having a neutral position in which the gas flow knife is arranged, the developing part forcibly stops the development on the neutral part by jetting pure water to the work immediately after draining. A stop water washing nozzle is arranged.

The timing of the pure water spraying onto the work by the development stop water washing nozzle is preferably within 1 second from the moment of drainage by the gas flow knife. It is better to set the work transfer speed.

[0012]

When the jet pressure of the gas flow knife is low, the developer on the work is flat but the amount taken out increases. When the jet pressure of the gas flow knife is high, the amount of developer carried out by the work is small, but the developer on the work is uneven, and unevenness in drying is likely to occur. By injecting pure water from the development stop water washing nozzle newly provided in the present invention to the developer on the work after draining with the gas flow knife, the development is forcibly stopped while flattening the unevenness of the developer. However, if the timing of the pure water injection is late, the irregularities harden and dry. Since the pure water is sprayed before the unevenness is solidified, that is, immediately after the developing solution is drained by the gas flow knife, the unevenness is flattened. In other words, even if the injection pressure of the gas flow knife is increased and the developer has irregularities, the irregularities are eliminated by the quick pure water injection. Then, by increasing the injection pressure of the gas flow knife, the carry-out amount of the developer by the work is reduced.

[0013]

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS An embodiment of a shower type single-wafer developing apparatus according to the present invention will be described below in detail with reference to the drawings.

FIG. 1 is a vertical sectional view showing a schematic structure of a shower type single-wafer developing apparatus of the embodiment. A development processing chamber a, a neutral chamber b, a water washing chamber c, and a drying chamber d are arranged in this order. A developer tank 1 is arranged below the development processing chamber a, and a pump 3 is interposed in the middle of a developer supply pipe 2 extending from the developer tank 1. The developing solution supply pipe 2 is introduced into the developing processing chamber a and is connected to a plurality of developing solution shower nozzles 4 arranged in the developing processing chamber a. The bottom of the development processing chamber a and the developer tank 1 are connected by a developer return pipe 5. A transfer device 6 is provided in the development processing chamber a below the developer shower nozzle 4. Each shower nozzle 4 is arranged in a horizontal posture perpendicular to the transport direction, and a large number of injection holes (not shown) are formed in the longitudinal direction thereof.

In the neutral b, an N ₂ knife 7 is arranged near the outlet of the developing processing chamber a. A transport device 8 for transporting the work w from the outlet of the development processing chamber a to the inlet of the washing chamber c is provided in the neutral b.

A washing liquid supply pipe 9 for supplying pure water toward the inside of the washing chamber c is extended, and the washing liquid supply pipes 9 are connected to and connected to a plurality of washing liquid shower nozzles 10 arranged above and below the washing chamber c. Has been done. A drainage pipe 11 extends from the bottom of the washing chamber c. The transfer device 12 is provided at an upper and lower intermediate position inside the water washing chamber c.

Air knives 13 and 14 are provided inside the drying chamber d.
Is provided and the drain pipe 15 extending from the bottom of the drying chamber d is joined and connected to the drain pipe 11 from the washing chamber c.

A transfer device 16 is provided inside the drying chamber d.

The above construction is the same as that of the conventional example, but in addition, in the neutral b portion, pure water is sprayed onto the work w immediately after draining of the developing solution by the N ₂ knife 7 to force development. Development stop water washing nozzle 1 to stop
7 are arranged. This development stop water washing nozzle 17
As shown in FIG. 2, a plurality of injection holes 17b are formed at a constant pitch in the longitudinal direction of the bottom surface of a pipe-shaped nozzle body 17a, and a pure water supply pipe 18 is provided from one end of the nozzle body 17a. Has been extended. The pure water supply pipe 18 and the cleaning liquid supply pipe 9 are connected to the same supply source. The nozzle body 17a is arranged in a posture perpendicular to the transport device 8.

As an example of the size of the development stop water washing nozzle 17, the diameter of the injection hole 17b is 1 m.
The pitch is about m and the pitch is about 5 mm, which is uniform throughout. The injection pressure is preferably about 6 kg / m ² .

It is necessary to dispose the development stop water washing nozzle 17 at a certain distance from the N ₂ knife 7 so that pure water sprayed therefrom does not flow into the development processing chamber a. The distance is about 100 mm. Then, it is desirable to inject pure water from the development stop washing nozzle 17 to the developing solution on the work w within 1 second after the developing solution on the work w is drained by the N ₂ knife 7. , Work w by the transfer device 8
6 times, which is 10 times the normal 600 mm / min.
It is preferable to set it to about 000 mm / min.

Next, the operation of the shower type single-wafer developing apparatus constructed as described above will be described.

When the pump 3 is driven, the developing solution in the developing solution tank 1 is pumped up to the developing solution shower nozzle 4 via the developing solution supply pipe 2, and with respect to the work (the substrate of the liquid crystal panel) w on the carrying device 6. The developer is sprayed from the shower nozzle 4. The work w to be subjected to the development processing by the supply of the development solution is carried out from the exit of the development processing chamber a by the carrying device 6, and the development solution on the work is drained by the N ₂ knife 7.

The injection pressure of the N ₂ knife 7 is 0.1 to 0.1.
It is set to about 5 kg / m ² which is considerably higher than the conventional example. Therefore, the carry-out amount of the developer from the development processing chamber a by the work w is reduced. Specifically, 1
150 to 300 in the case of the conventional example
It was 40 ml in the case of the example of the present invention.
It is drastically reduced to about 50 ml, and the original cost advantage of the shower type single-wafer developing device can be fully brought out.

Then, the work w from which the developing solution has been drained by the N ₂ knife 7 is 600
At a high speed of 0 mm / min = 100 mm / sec, the neutral b is conveyed toward the washing chamber c. During the transportation, the work w is the development stop water washing nozzle 17
To the pure water injection point. If the distance from the N ₂ knife 7 to the development stop water washing nozzle 17 is within 100 mm,
The work w will be injected with pure water within 1 second after draining. The developer on the work w is flattened by the injected pure water. That is, the injection pressure of the N ₂ knife 7 is 0.1.
Since it is relatively high at about 0.15 kg / m ² , the developer on the work w is likely to be uneven, but since the work w is exposed to pure water within a short time of less than 1 second, the unevenness is quickly flattened. Moreover, the development can be forcibly stopped, and the developer is solidified in the flattened state, so that unevenness in drying can be eliminated.

The work w in which the developing solution has solidified is the conveying device 12
The cleaning liquid shower nozzle 10 injects pure water from the cleaning liquid shower nozzle 10 to remove unnecessary components and stain components on the workpiece w for cleaning. Then, it is dried by the air knives 13 and 14 in the drying chamber d and is transported to a baking oven (not shown).

It is assumed that the developer tank 1 has a capacity of 120 liters, and that 60 liters of the developer tank 1 needs to remain to protect the pump 3. The amount of developer that can be used is 6
Although it is 0 liters, the carry-out amount of the developing solution per one sheet of the work w is drastically reduced to about 40 to 50 ml.
The number of processed sheets is 1500, which is much larger than the number of processed sheets of 150 to 300 ml and the number of processed sheets of 200 to 400. In addition, the frequency of replacement of new liquid is significantly reduced, and work efficiency is improved.

Further, in patterning various arrangements in a thin film transistor type liquid crystal panel, a work (semiconductor substrate)
The larger the size of, the larger the unevenness of the developing solution after draining, but the present invention can sufficiently deal with this, and uniform development without unevenness in drying is possible.

In addition to the N ₂ knife, a H ₂ knife, an O ₂ knife, an Ar knife or other fluid gas may be used if necessary.

[0030]

As described above, according to the present invention, the development stop water washing nozzle provided in the neutral position sprays pure water onto the developer on the work immediately after draining to stop the development. Therefore, by increasing the injection pressure of the gas flow knife, it is possible to prevent uneven development of the developing solution and minimize the carry-out amount of the developing solution by the work, so that the cost merit can be fully utilized.

[Brief description of drawings]

FIG. 1 is a vertical sectional view showing a schematic configuration of a shower type single-wafer developing apparatus according to an embodiment of the present invention.

FIG. 2 is a perspective view showing a development stop water washing nozzle in the embodiment.

FIG. 3 is a vertical cross-sectional view showing a schematic configuration of a shower-type single-wafer developing device according to a conventional example.

[Explanation of symbols]

a ... Development chamber b ... Neutral c ... Washing room d ... Drying room w ... Work 1 ... Developer tank 2 ... Developer supply pipe 3 ... Pump 4 ... Developer shower nozzle 5 ... … Developer recirculation pipe 7 …… N ₂ knife 10 …… Cleaning solution shower nozzle 13 …… Air knife 14 …… Air knife 17 …… Development stop water washing nozzle 17a …… Nozzle body 17b …… Injection hole 18 …… Pure water supply pipe

Claims (3)

[Claims] 1. A developing processing chamber provided with a developing solution shower nozzle for spraying a developing solution onto a work, a gas flow knife for draining the developing solution on the work near the outlet of the developing processing chamber, and a solution. A washing chamber provided with a washing liquid shower nozzle for injecting a washing liquid onto the work after cutting and drying, and a neutral formed between the development processing chamber and the washing chamber and in which the gas flow knife is arranged were provided. In the shower-type single-wafer developing device, a shower-type single-wafer developing nozzle is disposed in the neutral portion to stop the development forcibly by deionizing pure water with respect to the work immediately after draining. Developing device. 2. The developing device according to claim 1, wherein the position of the development stop water washing nozzle and the conveyance speed of the work are set such that the timing of the pure water injection to the work by the development stop water washing nozzle is set to the liquid drainage by the gas flow knife. A shower-type single-wafer developing device characterized in that it is set within 1 second from the moment. 3. The shower type single-wafer developing apparatus according to claim 1, wherein the gas flow knife is an N ₂ knife.