JPH06205970A - 反応器装置 - Google Patents
反応器装置Info
- Publication number
- JPH06205970A JPH06205970A JP5233676A JP23367693A JPH06205970A JP H06205970 A JPH06205970 A JP H06205970A JP 5233676 A JP5233676 A JP 5233676A JP 23367693 A JP23367693 A JP 23367693A JP H06205970 A JPH06205970 A JP H06205970A
- Authority
- JP
- Japan
- Prior art keywords
- unit
- reactor device
- reactor
- radiator
- lamp unit
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000001816 cooling Methods 0.000 claims description 6
- 239000007789 gas Substances 0.000 claims description 6
- 239000010453 quartz Substances 0.000 claims description 5
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 5
- 239000007788 liquid Substances 0.000 claims description 4
- 229910000831 Steel Inorganic materials 0.000 claims description 3
- 229910052782 aluminium Inorganic materials 0.000 claims description 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 3
- 239000000463 material Substances 0.000 claims description 3
- 239000010959 steel Substances 0.000 claims description 3
- 229920005372 Plexiglas® Polymers 0.000 claims description 2
- 229910052751 metal Inorganic materials 0.000 claims description 2
- 239000002184 metal Substances 0.000 claims description 2
- 239000004926 polymethyl methacrylate Substances 0.000 claims description 2
- 238000012545 processing Methods 0.000 claims description 2
- 230000005855 radiation Effects 0.000 claims description 2
- 239000011343 solid material Substances 0.000 claims description 2
- 238000005260 corrosion Methods 0.000 claims 1
- 230000007797 corrosion Effects 0.000 claims 1
- 238000000034 method Methods 0.000 claims 1
- 238000005259 measurement Methods 0.000 abstract description 3
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 description 6
- 238000010586 diagram Methods 0.000 description 6
- 239000011248 coating agent Substances 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 238000012986 modification Methods 0.000 description 3
- 230000004048 modification Effects 0.000 description 3
- 239000012530 fluid Substances 0.000 description 2
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 239000012043 crude product Substances 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000001465 metallisation Methods 0.000 description 1
- 238000012544 monitoring process Methods 0.000 description 1
- 150000002902 organometallic compounds Chemical class 0.000 description 1
- 238000006303 photolysis reaction Methods 0.000 description 1
- 230000015843 photosynthesis, light reaction Effects 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 239000011265 semifinished product Substances 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000000638 solvent extraction Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 238000003466 welding Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/48—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating by irradiation, e.g. photolysis, radiolysis, particle radiation
- C23C16/482—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating by irradiation, e.g. photolysis, radiolysis, particle radiation using incoherent light, UV to IR, e.g. lamps
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J19/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
- B01J19/12—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electromagnetic waves
- B01J19/122—Incoherent waves
- B01J19/123—Ultraviolet light
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Toxicology (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- General Health & Medical Sciences (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
- Chemical Vapour Deposition (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE4231367.8 | 1992-09-18 | ||
| DE4231367A DE4231367A1 (de) | 1992-09-18 | 1992-09-18 | Reaktorvorrichtung |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH06205970A true JPH06205970A (ja) | 1994-07-26 |
Family
ID=6468320
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP5233676A Pending JPH06205970A (ja) | 1992-09-18 | 1993-09-20 | 反応器装置 |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US5422488A (de) |
| EP (1) | EP0588044B1 (de) |
| JP (1) | JPH06205970A (de) |
| DE (2) | DE4231367A1 (de) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE19545252A1 (de) * | 1995-11-24 | 1997-05-28 | Helmut Kaeufer | Aggregatkapsel als Verfahrensbaustein |
| DE19937360A1 (de) * | 1999-08-12 | 2001-02-22 | Innolabtec Gmbh | Reaktionsapparat |
| DE10101816A1 (de) * | 2001-01-17 | 2002-07-18 | Peter Ueberall | Flachdiffusor zur Änderung des Strömungsquerschnittes in einem Strömungskanal |
| US20050250346A1 (en) * | 2004-05-06 | 2005-11-10 | Applied Materials, Inc. | Process and apparatus for post deposition treatment of low k dielectric materials |
| US20060251827A1 (en) | 2005-05-09 | 2006-11-09 | Applied Materials, Inc. | Tandem uv chamber for curing dielectric materials |
| US20060249175A1 (en) * | 2005-05-09 | 2006-11-09 | Applied Materials, Inc. | High efficiency UV curing system |
Family Cites Families (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE888447C (de) * | 1942-05-22 | 1953-09-03 | Siemens Ag | Einrichtung zur Ultraviolettbestrahlung von Stoffen, insbesondere von Fluessigkeiten |
| US3079498A (en) * | 1960-07-15 | 1963-02-26 | Ruffin Hoebel Corp | Swimming pool water purifier |
| US3864571A (en) * | 1971-02-10 | 1975-02-04 | Wheeler International Inc | Method and Apparatus for Automatically, Identifying and Counting Various Cells in Body Fluids |
| DE2205598A1 (de) * | 1971-04-23 | 1973-08-16 | Georg Horstmann | Vorrichtung zum entkeimen von fluessigkeiten oder gasen |
| DE2300273C3 (de) * | 1972-01-07 | 1982-05-06 | Toray Industries, Inc., Tokyo | Vorrichtung für Abwasserreinigung |
| US3769517A (en) * | 1972-01-21 | 1973-10-30 | Ppg Industries Inc | Controlled atmosphere chamber |
| DE2515604C2 (de) * | 1975-04-10 | 1977-06-08 | Alfred Graentzel | Apparatur zur bestrahlung stroemungsfaehiger medien zum erzielen chemischer reaktionen bzw. reaktionsprodukte |
| DE2904242A1 (de) * | 1979-02-05 | 1980-08-14 | Guenther O Prof Dr Schenck | Verfahren und vorrichtung zur reinigung, insbesondere zur entkeimung und desinfektion |
| DE8111288U1 (de) * | 1981-04-14 | 1982-12-16 | Dornier System Gmbh, 7990 Friedrichshafen | "einrichtung zur durchfuehrung verfahrenstechnischer prozesse" |
| US4448750A (en) * | 1981-06-05 | 1984-05-15 | Fuesting Michael L | Sterilization method |
| US4798702A (en) * | 1986-09-10 | 1989-01-17 | Tucker Robert E | Sterilizer unit for fluid media and process |
| US4786812A (en) * | 1986-11-28 | 1988-11-22 | Dora Dicamillo 1988 Trust | Portable germicidal ultraviolet lamp |
| DE3740005A1 (de) * | 1987-11-25 | 1989-06-08 | Katadyn Produkte Ag | Vorrichtung zur desinfektion von abwasser |
| US4899056A (en) * | 1988-07-07 | 1990-02-06 | Ultraviolet Purification Systems, Inc. | Cleaning system for ultraviolet light producing lamps |
| US5156820A (en) * | 1989-05-15 | 1992-10-20 | Rapro Technology, Inc. | Reaction chamber with controlled radiant energy heating and distributed reactant flow |
| US5227140A (en) * | 1990-04-13 | 1993-07-13 | Peroxidation Systems, Inc. | Modular self-cleaning oxidation chamber |
| US5144144A (en) * | 1991-07-19 | 1992-09-01 | American Vision, Inc. | Contact lens cleaning and disinfecting system |
-
1992
- 1992-09-18 DE DE4231367A patent/DE4231367A1/de not_active Withdrawn
-
1993
- 1993-08-05 EP EP93112559A patent/EP0588044B1/de not_active Expired - Lifetime
- 1993-08-05 DE DE59301403T patent/DE59301403D1/de not_active Expired - Fee Related
- 1993-09-17 US US08/123,522 patent/US5422488A/en not_active Expired - Fee Related
- 1993-09-20 JP JP5233676A patent/JPH06205970A/ja active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| DE4231367A1 (de) | 1994-03-24 |
| EP0588044B1 (de) | 1996-01-10 |
| EP0588044A1 (de) | 1994-03-23 |
| US5422488A (en) | 1995-06-06 |
| DE59301403D1 (de) | 1996-02-22 |
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