JPH06132272A - Chemical recovering system of wet cleaner - Google Patents

Chemical recovering system of wet cleaner

Info

Publication number
JPH06132272A
JPH06132272A JP27758392A JP27758392A JPH06132272A JP H06132272 A JPH06132272 A JP H06132272A JP 27758392 A JP27758392 A JP 27758392A JP 27758392 A JP27758392 A JP 27758392A JP H06132272 A JPH06132272 A JP H06132272A
Authority
JP
Japan
Prior art keywords
tank
cooling
concentration
diluting
chemical solution
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP27758392A
Other languages
Japanese (ja)
Inventor
Hiroshi Takizawa
滝沢  浩
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fuji Electric Co Ltd
Original Assignee
Fuji Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Electric Co Ltd filed Critical Fuji Electric Co Ltd
Priority to JP27758392A priority Critical patent/JPH06132272A/en
Publication of JPH06132272A publication Critical patent/JPH06132272A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:To provide a chemical recovering system which enables used chemicals to be recovered and managed, adjusting them to the designated concentration suitable for being reused in separate process, within the chemical recovery system of a cleaner. CONSTITUTION:This system is equipped with a cooling and diluting vessel 7 with a built-in cooling coil 7a connected to the drainage side of a cleaning vessel 1, a dilute water supply pipe 9 connected to the vessel, and dilute water supply valve 8 interposed in the dilute water supply pipe, and a concentration meter 10 for detecting the concentration of the chemicals in the cooling and diluting vessel, and in the first place, used chemicals at high temperature and in high concentration discharged from a cleaning vessel is cooled, being introduced into a cleaning and diluting vessel. Next, the quantity of supplied dilute water is controlled so that the concentration of the chemicals inside the vessel may be designated concentration while adding dilute water to the cooling and diluting vessel, and after dilution and adjustment into designated concentration, they are recovered to a recovery tank 4.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、半導体ウェーハの処理
工程で使用するウエット洗浄装置から発生する使用済み
薬液の回収システムに関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a system for recovering used chemicals generated from a wet cleaning device used in a semiconductor wafer processing step.

【0002】[0002]

【従来の技術】周知のように半導体ウェーハの処理工程
では、汚染物質の除去を目的としてウェーハ洗浄が行わ
れている。ここで、有機物質の汚染に対しては例えば硫
酸などが洗浄薬液として使用され、該薬液を満たした洗
浄槽にウェーハを浸漬して洗浄を行う。ところで、前記
薬液はウェーハ洗浄処理を繰り返すことにより不純物が
溶解して次第に劣化することから、一定期間使用した薬
液は洗浄槽から排出して回収し、新しい薬液と交換する
ようにしている。
2. Description of the Related Art As is well known, in the process of processing semiconductor wafers, wafer cleaning is performed for the purpose of removing contaminants. Here, for contamination of organic substances, for example, sulfuric acid or the like is used as a cleaning chemical, and the wafer is cleaned by immersing the wafer in a cleaning tank filled with the chemical. By the way, since impurities are dissolved and the chemical solution gradually deteriorates as the wafer cleaning process is repeated, the chemical solution used for a certain period is discharged from the cleaning tank and recovered, and is replaced with a new chemical solution.

【0003】次に硫酸を薬液に使用した洗浄装置を例
に、従来における洗浄槽の薬液回収システムを図4,図
5に示す。図において、1は洗浄槽、2は洗浄槽内に収
容されている薬液、3は洗浄槽1の排液側に接続した冷
却槽、4は薬液回収タンクであり、図4の方式において
は、冷却槽3が冷却コイル3aを内蔵している。ここ
で、洗浄槽1から高温,高濃度の使用済み薬液(例えば
濃度98%,温度150℃の硫酸)を回収するには、冷
却槽3の冷却コイル3aに冷却水を流した状態でドレン
弁5を開き、洗浄槽1から排出した薬液2を冷却槽3に
導入して高温の薬液2を常温に近い45℃程度まで冷却
した後、冷却槽3の出口弁6を開いて薬液2を所内の回
収タンク4に移して回収する。また、図5の方式では、
冷却槽3に冷却水供給管路3bを接続しておき、薬液回
収時には弁3cを通じて冷却槽3に冷却水を供給し、洗
浄槽1から導入した薬液2を冷却水で希釈しながら常温
近くの液温になるまで冷却した後、出口弁6を開いて回
収タンク4に回収する。
Next, taking a cleaning apparatus using sulfuric acid as a chemical solution as an example, a conventional chemical solution recovery system for a cleaning tank is shown in FIGS. In the figure, 1 is a cleaning tank, 2 is a chemical solution contained in the cleaning tank, 3 is a cooling tank connected to the drain side of the cleaning tank 1, 4 is a chemical solution recovery tank, and in the system of FIG. The cooling tank 3 has a built-in cooling coil 3a. Here, in order to collect a high temperature and high concentration used chemical liquid (for example, sulfuric acid having a concentration of 98% and a temperature of 150 ° C.) from the cleaning tank 1, the drain valve is operated while the cooling water is flowing through the cooling coil 3 a of the cooling tank 3. 5 is opened and the chemical liquid 2 discharged from the cleaning tank 1 is introduced into the cooling tank 3 to cool the high temperature chemical liquid 2 to about 45 ° C. near room temperature, and then the outlet valve 6 of the cooling tank 3 is opened to store the chemical liquid 2 inside the facility. It is transferred to the recovery tank 4 of No. 1 and collected. In addition, in the method of FIG.
The cooling water supply pipe line 3b is connected to the cooling tank 3, the cooling water is supplied to the cooling tank 3 through the valve 3c at the time of collecting the chemical liquid, and the chemical liquid 2 introduced from the cleaning tank 1 is diluted with the cooling water to keep the temperature near room temperature. After cooling to the liquid temperature, the outlet valve 6 is opened to collect in the recovery tank 4.

【0004】そして、回収タンク4に回収した薬液は、
通常は廃液として所内の廃液処理系にて処理するか、あ
るいは産業廃液の処理業者に引き渡して処理するように
している。
The chemical solution recovered in the recovery tank 4 is
Usually, the waste liquid is treated by a waste liquid treatment system in the plant, or is handed over to an industrial waste liquid treatment company for treatment.

【0005】[0005]

【発明が解決しようとする課題】ところで、最近にな
り、前記の洗浄装置から回収した使用済み薬液を所定濃
度に調整,管理した上で、別なプロセスで再利用するリ
サイクルを図ることが検討されいる。しかして、図4,
図5に示した従来の薬液回収システムでは、回収タンク
4に回収した薬液の濃度は、洗浄槽1でウェーハ洗浄処
理に使用した薬液2の濃度で決まる(図4の方式)、あ
るいは冷却槽3に外部から投入した冷却水の量で決まる
(図5の方式)ため、回収システムから回収された薬液
の濃度は一定せず、このままでは回収薬液を別なプロセ
スで直ちに再利用することができない。したがって、前
記回収システムで回収した薬液を別なプロセスで再利用
しようとするには、前記の薬液回収システムとは別な処
理設備で回収薬液を改めて濃度調整することが必要であ
る。しかしながら、この方式では処理設備の設備費,運
転管理費を含めた処理コストが高く付き、使用済み薬液
のリサイクル体制としては経済的に採算がとれなくな
る。
By the way, recently, it has been considered to adjust the used chemical solution recovered from the cleaning device to a predetermined concentration and manage it, and then to recycle it in another process. There is. Then, Fig. 4,
In the conventional chemical solution recovery system shown in FIG. 5, the concentration of the chemical solution recovered in the recovery tank 4 is determined by the concentration of the chemical solution 2 used for the wafer cleaning process in the cleaning tank 1 (method of FIG. 4) or the cooling tank 3 Since it is determined by the amount of cooling water supplied from the outside (system of FIG. 5), the concentration of the chemical solution recovered from the recovery system is not constant, and the recovered chemical solution cannot be immediately reused in another process as it is. Therefore, in order to reuse the chemical solution recovered by the recovery system in a different process, it is necessary to adjust the concentration of the recovered chemical solution again in a processing facility different from that of the chemical solution recovery system. However, with this method, the processing cost including the equipment cost of the processing equipment and the operation management cost is high, and the system for recycling the used chemical liquid is economically unprofitable.

【0006】本発明は上記の点にかんがみなされたもの
であり、その目的は前記課題を解決し、洗浄装置の薬液
回収システム内で、使用済み薬液を別なプロセスで再利
用するのに適合する指定濃度に調整して回収,管理でき
るようにした薬液回収システムを提供することにある。
The present invention has been made in view of the above points, and an object thereof is to solve the above-mentioned problems and to reuse a used chemical in another process in a chemical recovery system of a cleaning apparatus. It is to provide a chemical solution recovery system that can be collected and managed by adjusting it to a specified concentration.

【0007】[0007]

【課題を解決するための手段】上記目的は、本発明によ
り薬液回収システムを次記のように構成することで達成
される。 (1)洗浄槽の排液側に接続した冷却コイル内蔵の冷却
・希釈槽と、該槽に接続した希釈水供給管路と、希釈水
供給管路に介挿した希釈水供給弁と、冷却・希釈槽の槽
内における薬液濃度を検出する濃度計とを備え、まず洗
浄槽から排出した薬液を冷却・希釈槽に導入して冷却
し、次に冷却・希釈槽に希釈水を加えながら、該槽内の
薬液濃度が指定濃度になるよう希釈水の供給量を制御し
て指定濃度に管理された回収薬液を得る。
The above object can be achieved by the present invention by constructing a chemical liquid recovery system as follows. (1) A cooling / diluting tank with a built-in cooling coil connected to the drain side of the cleaning tank, a dilution water supply pipe connected to the tank, a dilution water supply valve inserted in the dilution water supply pipe, and cooling・ It is equipped with a concentration meter that detects the concentration of the chemical liquid in the diluting tank, and first introduces the chemical liquid discharged from the washing tank into the cooling / diluting tank to cool it, and then while adding dilution water to the cooling / diluting tank, The supply amount of the diluting water is controlled so that the concentration of the chemical liquid in the tank becomes the designated concentration to obtain the recovered chemical liquid controlled to the designated concentration.

【0008】(2)洗浄槽の排液側に接続した冷却コイ
ル内蔵の冷却・希釈槽と、該槽に接続した希釈水供給管
路と、希釈水供給管路に介挿した希釈水供給弁と、冷却
・希釈槽の槽内における液面高さを検出する液面レベル
計とを備え、まず冷却・希釈槽に希釈水を所定の液面レ
ベルまで供給しておき、次に洗浄槽から排出した薬液を
冷却・希釈槽に導入しながら、希釈水と薬液とを合わせ
た液面レベルが指定濃度に対応する液面レベルになるよ
う薬液の供給量を制御して指定濃度の管理された回収薬
液を得る。
(2) A cooling / dilution tank with a built-in cooling coil connected to the drain side of the cleaning tank, a dilution water supply pipe connected to the tank, and a dilution water supply valve inserted in the dilution water supply pipe. And a liquid level meter that detects the liquid level in the cooling / diluting tank. First, supply the dilution water to the cooling / diluting tank to a predetermined liquid level, and then from the cleaning tank. While the discharged chemical liquid was introduced into the cooling / diluting tank, the specified amount was controlled by controlling the supply amount of the chemical liquid so that the combined liquid surface level of the dilution water and the chemical liquid would be the liquid surface level corresponding to the specified concentration. Obtain the recovered drug solution.

【0009】(3)前項(2)において、冷却・希釈槽
の前段に冷却コイル内蔵の予冷槽を備え、洗浄槽から排
出した薬液を予冷槽内に一旦収容して常温まで冷却した
後に、後段の冷却・希釈槽に投入する。
(3) In the preceding paragraph (2), a pre-cooling tank with a built-in cooling coil is provided in the preceding stage of the cooling / diluting tank, and the chemical liquid discharged from the washing tank is temporarily stored in the pre-cooling tank and cooled to room temperature, and then the latter stage. Add to the cooling / diluting tank.

【0010】[0010]

【作用】上記(1)項の構成においては、洗浄槽から排
出した高温,高濃度の薬液を冷却・希釈槽に導入し、冷
却コイルとの熱交換により薬液を冷却しつつ、一方では
濃度計により冷却・希釈槽内の薬液濃度を測定しながら
希釈水(純水)を加え、槽内の薬液が指定濃度に達した
ところで、希釈水の供給を停止する。これにより、薬液
回収システム内で回収した薬液が指定の濃度に調整,管
理されることになり、ここで得た回収薬液はそのまま別
なプロセスに移して再利用することができる。
In the configuration of the above (1), the high temperature and high concentration chemical solution discharged from the cleaning tank is introduced into the cooling / diluting tank, and the chemical solution is cooled by heat exchange with the cooling coil, while the concentration meter is used. The dilution water (pure water) is added while measuring the concentration of the chemical liquid in the cooling / dilution tank, and when the concentration of the chemical liquid in the tank reaches the specified concentration, the supply of the dilution water is stopped. As a result, the chemical solution recovered in the chemical solution recovery system is adjusted and managed to a specified concentration, and the recovered chemical solution obtained here can be directly transferred to another process for reuse.

【0011】一方、前記(2)項の構成においては、洗
浄槽側の薬液濃度、冷却・希釈槽の容積が既知であり、
薬液回収に際して最初に冷却・希釈槽内に一定レベルの
希釈水を供給して溜めておき、ここに洗浄槽から排出し
た薬液を冷却・希釈槽に投入しながら、希釈水と薬液と
を合わせた液面レベルが指定濃度に対応するレベルにな
るよう薬液の供給量を制御すれば、冷却・希釈槽内で指
定濃度に調整された回収薬液が得られる。
On the other hand, in the constitution of the above item (2), the chemical concentration on the cleaning tank side and the volume of the cooling / diluting tank are known,
At the time of collecting the chemical solution, a certain level of dilution water was first supplied and stored in the cooling / diluting tank, and the chemical solution discharged from the cleaning tank was put into the cooling / dilution tank while the dilution water and the chemical solution were combined. If the supply amount of the chemical liquid is controlled so that the liquid surface level corresponds to the designated concentration, the recovered chemical liquid adjusted to the designated concentration in the cooling / diluting tank can be obtained.

【0012】また、この場合に希釈水中に高温の薬液
(例えば硫酸)を直接投入すると激しい発熱反応が生じ
て冷却・希釈槽の耐熱温度以上に上昇するおそれがあ
る。そこで、この場合には前項(3)のように冷却・希
釈槽の前段に冷却コイル内蔵の予冷槽を設け、この予冷
槽に洗浄槽から排出した高温の薬液を一旦収容して冷却
した後に後段の冷却・希釈槽に導入すれば、反応熱も少
なくて安全に薬液を指定濃度に希釈できる。
Further, in this case, if a high temperature chemical solution (for example, sulfuric acid) is directly added to the diluting water, a violent exothermic reaction may occur and the temperature may rise above the heat resistant temperature of the cooling / diluting tank. Therefore, in this case, a pre-cooling tank with a built-in cooling coil is provided in the preceding stage of the cooling / diluting tank as described in (3) above, and the high-temperature chemical liquid discharged from the cleaning tank is temporarily stored in this pre-cooling tank and then cooled. If it is introduced into the cooling / diluting tank, the reaction heat is small and the chemical solution can be safely diluted to the specified concentration.

【0013】[0013]

【実施例】以下、本発明の実施例を図面に基づいて説明
する。なお、各実施例において、図4,図5に対応する
同一部材には同じ符号が付してある。 実施例1:図1は本発明の請求項1に対応する実施例を
示すものであり、この実施例においては、洗浄槽1の排
液側に図4の冷却槽と同様に冷却コイル7aを内蔵した
冷却・希釈槽7が設置されており、該槽7には希釈水供
給弁8を介して希釈水供給管路9が外部接続されてお
り、さらに槽内の薬液濃度を測定する濃度計10を装備
している。また、11は液撹拌機である。なお、洗浄槽
1の使用済み薬液2は例えば硫酸(液温150℃,濃度
98%)である。
Embodiments of the present invention will be described below with reference to the drawings. In each embodiment, the same members corresponding to FIGS. 4 and 5 are designated by the same reference numerals. Embodiment 1 FIG. 1 shows an embodiment corresponding to claim 1 of the present invention. In this embodiment, a cooling coil 7a is provided on the drain side of the cleaning tank 1 as in the cooling tank of FIG. A built-in cooling / diluting tank 7 is installed, and a dilution water supply pipe 9 is externally connected to the tank 7 via a dilution water supply valve 8. Further, a concentration meter for measuring the concentration of a chemical solution in the tank. Equipped with 10. Further, 11 is a liquid stirrer. The used chemical liquid 2 in the cleaning tank 1 is, for example, sulfuric acid (liquid temperature 150 ° C., concentration 98%).

【0014】かかる構成で、洗浄槽1から高温,高濃度
な薬液2を回収する際には、ドレン弁5を開いて洗浄槽
1から排出した薬液2を冷却・希釈槽7に収容し、冷却
コイル7aに流した冷却水との熱交換により薬液2を常
温に近い温度(例えば45℃程度)まで冷却した後、希
釈水供給弁8を開いて冷却・希釈槽7に希釈水(純水を
使用)を供給開始する。そして、液撹拌機11により薬
液と希釈水とを撹拌しながら、濃度計10により槽内の
薬液濃度を測定,監視し、薬液濃度があらかじめ指定し
た濃度(例えば70%)に希釈されると、濃度計10か
らの信号で希釈水供給弁8を閉じて希釈水の供給を停止
するとともに、その後に弁6を開いて冷却・希釈槽7で
希釈した薬液を回収タンク4に移して保管する。これに
より、洗浄槽1から回収した使用済み薬液2を指定濃度
に調整,管理された回収薬液13として回収タンク4に
回収することができる。なお、回収薬液を回収タンク4
に移す際に配管中にフィルタ12を介装しておけば、薬
液中に混在している塵埃などの固形不純物をフィルタ1
2に捕集,除去して回収薬液13を清浄にできる。ま
た、前記した薬液回収の一連の操作は、プログラマブル
コントローラ,シーケンサなどを用いることにより、全
自動で行うことが可能である。
With this configuration, when the high temperature and high concentration chemical solution 2 is collected from the cleaning tank 1, the drain valve 5 is opened and the chemical solution 2 discharged from the cleaning tank 1 is stored in the cooling / diluting tank 7 and cooled. After the chemical solution 2 is cooled to a temperature close to room temperature (for example, about 45 ° C.) by heat exchange with the cooling water flowing in the coil 7a, the dilution water supply valve 8 is opened and the dilution water (pure water is supplied to the cooling / dilution tank 7). Supply). Then, while stirring the chemical liquid and the diluting water with the liquid stirrer 11, the concentration meter 10 measures and monitors the chemical liquid concentration in the tank, and when the chemical liquid concentration is diluted to a predetermined concentration (for example, 70%), The dilution water supply valve 8 is closed by the signal from the densitometer 10 to stop the supply of the dilution water, and then the valve 6 is opened to transfer the chemical liquid diluted in the cooling / diluting tank 7 to the recovery tank 4 for storage. As a result, the used chemical liquid 2 collected from the cleaning tank 1 can be collected in the collection tank 4 as the collected chemical liquid 13 adjusted to a designated concentration and managed. It should be noted that the recovery chemicals are collected in the recovery tank 4
If a filter 12 is provided in the pipe when transferring to a filter, solid impurities such as dust mixed in the chemical solution can be removed from the filter 1.
The collected chemical liquid 13 can be cleaned by collecting and removing it in 2. In addition, the series of operations for collecting the chemical solution described above can be fully automated by using a programmable controller, a sequencer, or the like.

【0015】そして、回収タンク4に保管されている回
収薬液13は、必要時に別なプロセスへ持ち込んで再利
用される。 実施例2:図2は本発明の請求項2に対応する実施例を
示すものであり、この実施例においては、実施例1にお
ける濃度計の代わりに冷却・希釈槽7に液面レベル計1
4を備えている。なお、洗浄槽1で使用した薬液2の濃
度、および冷却・希釈槽7の容積はあらかじめ判ってい
るものとする。
Then, the recovered chemical liquid 13 stored in the recovery tank 4 is brought into another process and reused when necessary. Example 2 FIG. 2 shows an example corresponding to claim 2 of the present invention. In this example, a liquid level meter 1 is provided in a cooling / diluting tank 7 instead of the concentration meter in Example 1.
It is equipped with 4. The concentration of the chemical liquid 2 used in the cleaning tank 1 and the volume of the cooling / diluting tank 7 are known in advance.

【0016】かかる構成で、洗浄槽1の薬液2を回収す
る際には、まず希釈水供給弁8を開き、冷却・希釈槽7
の槽内液面高さをレベル計14で測定しながら所定レベ
ルになるまで希釈水を導入した後、弁8を閉じる。次に
洗浄槽1のドレン弁5を開いて薬液2を冷却・希釈槽7
に溜まっている希釈水の中に少量ずつ投入し、ここで槽
7の液面高さが指定された薬液濃度に対応するレベルに
達したところで、レベル計14の信号を基にドレン弁5
を閉じる。これにより、あらかじめ槽内に溜めておいた
希釈水量と洗浄槽側から排出した薬液との割合から、あ
らかじめ指定した濃度に希釈調整されることになる。な
お、洗浄槽1から冷却・希釈槽7に導入した高温の薬液
2は冷却コイル7aにより冷却される。その後に実施例
1と同様に回収薬液を冷却・希釈槽7から回収タンク4
に移して保管する。
With such a structure, when the chemical solution 2 in the cleaning tank 1 is collected, the dilution water supply valve 8 is first opened and the cooling / dilution tank 7 is opened.
While the liquid level height in the tank is measured by the level meter 14, the dilution water is introduced until it reaches a predetermined level, and then the valve 8 is closed. Next, the drain valve 5 of the cleaning tank 1 is opened to cool and dilute the chemical solution 2
When the liquid level of the tank 7 reaches a level corresponding to the specified chemical concentration, the drain valve 5 is added based on the signal of the level meter 14
Close. As a result, the dilution is adjusted to a previously designated concentration based on the ratio between the amount of dilution water stored in the tank in advance and the chemical solution discharged from the cleaning tank side. The high temperature chemical liquid 2 introduced from the cleaning tank 1 into the cooling / diluting tank 7 is cooled by the cooling coil 7a. Thereafter, as in the first embodiment, the recovered chemical liquid is cooled and diluted from the recovery tank 7 to the recovery tank 4
Move to and store.

【0017】実施例3:図3は前記実施例2に本発明の
請求項3に記載の予冷槽を組合わせた実施例を示すもの
であり、冷却・希釈槽7の前段には冷却コイル15aを
内蔵した予冷槽15を備えている。なお、16は予冷槽
15の出口弁、17,18は槽内の液温を測定する温度
計である。
Embodiment 3 FIG. 3 shows an embodiment in which the precooling tank according to claim 3 of the present invention is combined with the embodiment 2, and a cooling coil 15a is provided in the preceding stage of the cooling / diluting tank 7. A pre-cooling tank 15 having a built-in is provided. In addition, 16 is an outlet valve of the precooling tank 15, and 17 and 18 are thermometers for measuring the liquid temperature in the tank.

【0018】かかる構成で、洗浄槽1から使用済みの薬
液2を回収する際には、まず、ドレン弁5を開いて洗浄
槽1から薬液2を予冷槽15に移し、ここで冷却コイル
との熱交換により薬液2を常温近くまで冷却しておく。
一方、これと並行して冷却・希釈槽7には実施例2で述
べたと同様に所定量の希釈水を供給して溜めておく。そ
して、予冷槽15の液温が低下すれば、温度計17の信
号を基に予冷槽15の出口弁16を開き、低温になった
薬液を冷却・希釈槽7に前以て溜めて置いた希釈水の中
に投入し、槽7の液面高さが指定濃度に対応するレベル
に到達すれば、レベル計14の信号を基に出口弁16を
閉じて予冷槽15からの薬液投入を停止する。これによ
り、冷却・希釈槽7での激しい反応熱の発生なしに薬液
を指定濃度に希釈できる。さらに、冷却・希釈槽7内の
液温を温度計18で測定し、液温が常温まで十分に冷却
されていることを確認した上で、冷却・希釈槽7の出口
弁6を開いて回収薬液を回収タンク4に移す。
With such a structure, when collecting the used chemical solution 2 from the cleaning tank 1, first, the drain valve 5 is opened to transfer the chemical solution 2 from the cleaning tank 1 to the pre-cooling tank 15, where it is connected to the cooling coil. The chemical solution 2 is cooled to near room temperature by heat exchange.
On the other hand, in parallel with this, in the cooling / diluting tank 7, a predetermined amount of dilution water is supplied and stored in the same manner as described in the second embodiment. When the liquid temperature of the pre-cooling tank 15 decreases, the outlet valve 16 of the pre-cooling tank 15 is opened based on the signal from the thermometer 17, and the low temperature chemical liquid is stored in the cooling / diluting tank 7 in advance. When the liquid level in the tank 7 reaches the level corresponding to the specified concentration after pouring it into the diluting water, the outlet valve 16 is closed based on the signal from the level meter 14 to stop the chemical liquid injection from the precooling tank 15. To do. As a result, the chemical solution can be diluted to the specified concentration without the generation of intense reaction heat in the cooling / diluting tank 7. Furthermore, after measuring the liquid temperature in the cooling / diluting tank 7 with a thermometer 18 and confirming that the liquid temperature is sufficiently cooled to room temperature, the outlet valve 6 of the cooling / diluting tank 7 is opened to collect. The chemical solution is transferred to the recovery tank 4.

【0019】[0019]

【発明の効果】以上述べたように、本発明の薬液回収シ
ステムによれば、洗浄槽から発生した使用済み薬液を、
当該回収システム内で指定された薬液濃度に調整して回
収,管理することができる。これにより、いままでは廃
棄処分していた洗浄槽の使用済み薬液を、薬液回収シス
テムから直接別なプロセスに持ち込んで再利用すること
ができる。
As described above, according to the chemical liquid recovery system of the present invention, the used chemical liquid generated from the cleaning tank is
It is possible to collect and manage the chemical solution by adjusting it to the specified concentration in the recovery system. As a result, the used chemical solution in the cleaning tank, which has been discarded until now, can be directly recycled from the chemical solution recovery system to another process.

【0020】しかも、その構成は既設の薬液回収システ
ムの設備をそのまま利用し、これに僅かな機器を追加装
備するだけで済むので、十分に採算のとれる使用済み薬
液のリサイクル体制を確立できる。
Moreover, since the structure of the existing chemical liquid recovery system can be used as it is, and only a few devices can be additionally provided, it is possible to establish a sufficiently profitable system for recycling the used chemical liquid.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の実施例1に対応する薬液回収システム
のシステムフロー図
FIG. 1 is a system flow diagram of a chemical liquid recovery system corresponding to Example 1 of the present invention.

【図2】本発明の実施例2に対応する薬液回収システム
のシステムフロー図
FIG. 2 is a system flow diagram of a chemical liquid recovery system corresponding to Example 2 of the present invention.

【図3】本発明の実施例3に対応する薬液回収システム
のシステムフロー図
FIG. 3 is a system flow diagram of a chemical liquid recovery system corresponding to Example 3 of the present invention.

【図4】従来における薬液回収システムのシステムフロ
ー図
FIG. 4 is a system flow diagram of a conventional chemical recovery system.

【図5】図4と異なる従来の薬液回収システムのシステ
ムフロー図
5 is a system flow diagram of a conventional chemical liquid recovery system different from that in FIG.

【符号の説明】[Explanation of symbols]

1 洗浄槽 2 使用済み薬液 4 回収タンク 7 冷却・希釈槽 7a 冷却コイル 8 希釈水供給弁 9 希釈水供給管路 10 濃度計 13 回収薬液 14 液面レベル計 15 予冷槽 15a 冷却コイル 1 Cleaning Tank 2 Used Chemical Solution 4 Recovery Tank 7 Cooling / Diluting Tank 7a Cooling Coil 8 Diluting Water Supply Valve 9 Diluting Water Supply Pipeline 10 Concentration Meter 13 Collecting Chemical Solution 14 Liquid Level Meter 15 Precooling Tank 15a Cooling Coil

Claims (3)

【特許請求の範囲】[Claims] 【請求項1】ウエット洗浄装置で使用した使用済み薬液
の回収システムであり、洗浄槽から排出した高温, 高濃
度の薬液を冷却し、かつ指定された濃度に希釈した上で
回収するものにおいて、洗浄槽の排液側に接続した冷却
コイル内蔵の冷却・希釈槽と、該槽に接続した希釈水供
給管路と、希釈水供給管路に介挿した希釈水供給弁と、
冷却・希釈槽の槽内における薬液濃度を検出する濃度計
とを備え、まず洗浄槽から排出した薬液を冷却・希釈槽
に導入して冷却し、次に冷却・希釈槽に希釈水を加えな
がら、該槽内の薬液濃度が指定濃度になるよう希釈水の
供給量を制御して指定濃度に管理された回収薬液を得る
ことを特徴とするウエット洗浄装置の薬液回収システ
ム。
1. A system for recovering used chemicals used in a wet cleaning apparatus, which cools a high-temperature, high-concentration chemical discharged from a cleaning tank, dilutes it to a specified concentration, and then recovers it. A cooling / dilution tank with a built-in cooling coil connected to the drain side of the cleaning tank, a dilution water supply pipe connected to the tank, and a dilution water supply valve inserted in the dilution water supply pipe,
The cooling / diluting tank is equipped with a concentration meter that detects the concentration of the chemical liquid, and the chemical liquid discharged from the cleaning tank is first introduced into the cooling / diluting tank for cooling, and then while adding the dilution water to the cooling / diluting tank. A chemical solution recovery system for a wet cleaning device, characterized in that the chemical solution recovery amount is controlled so that the chemical solution concentration in the tank becomes a specified concentration to obtain a recovered chemical solution controlled to a specified concentration.
【請求項2】ウエット洗浄装置で使用した使用済み薬液
の回収システムであり、洗浄槽から排出した高温, 高濃
度の薬液を冷却し、かつ指定された濃度に希釈した上で
回収するものにおいて、洗浄槽の排液側に接続した冷却
コイル内蔵の冷却・希釈槽と、該槽に接続した希釈水供
給管路と、希釈水供給管路に介挿した希釈水供給弁と、
冷却・希釈槽の槽内における液面高さを検出する液面レ
ベル計とを備え、まず冷却・希釈槽に希釈水を所定の液
面レベルまで供給しておき、次に洗浄槽から排出した薬
液を冷却・希釈槽に導入しながら、希釈水と薬液とを合
わせた液面レベルが指定濃度に対応する液面レベルにな
るよう薬液の供給量を制御して指定濃度の管理された回
収薬液を得ることを特徴とするウエット洗浄装置の薬液
回収システム。
2. A system for recovering used chemicals used in a wet cleaning apparatus, which cools high-temperature, high-concentration chemicals discharged from a cleaning tank, dilutes it to a specified concentration, and then recovers it. A cooling / dilution tank with a built-in cooling coil connected to the drain side of the cleaning tank, a dilution water supply pipe connected to the tank, and a dilution water supply valve inserted in the dilution water supply pipe,
It is equipped with a liquid level meter that detects the liquid level in the cooling / diluting tank. First, diluting water is supplied to the cooling / diluting tank up to a predetermined liquid level and then discharged from the cleaning tank. While introducing the chemical solution into the cooling / diluting tank, the supply amount of the chemical solution is controlled so that the combined liquid level of the diluting water and the chemical solution corresponds to the specified concentration. A chemical solution recovery system for a wet cleaning device, which is characterized in that
【請求項3】請求項2記載の薬液回収システムにおい
て、冷却・希釈槽の前段に冷却コイル内蔵の予冷槽を備
え、洗浄槽から排出した薬液を予冷槽内に一旦収容して
常温まで冷却した後に、後段の冷却・希釈槽に投入する
ことを特徴とするウエット洗浄装置の薬液回収システ
ム。
3. The chemical liquid recovery system according to claim 2, wherein a precooling tank having a built-in cooling coil is provided in front of the cooling / diluting tank, and the chemical liquid discharged from the cleaning tank is temporarily stored in the precooling tank and cooled to room temperature. A chemical solution recovery system for a wet cleaning device, which is later put into a cooling / diluting tank in the latter stage.
JP27758392A 1992-10-16 1992-10-16 Chemical recovering system of wet cleaner Pending JPH06132272A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP27758392A JPH06132272A (en) 1992-10-16 1992-10-16 Chemical recovering system of wet cleaner

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP27758392A JPH06132272A (en) 1992-10-16 1992-10-16 Chemical recovering system of wet cleaner

Publications (1)

Publication Number Publication Date
JPH06132272A true JPH06132272A (en) 1994-05-13

Family

ID=17585493

Family Applications (1)

Application Number Title Priority Date Filing Date
JP27758392A Pending JPH06132272A (en) 1992-10-16 1992-10-16 Chemical recovering system of wet cleaner

Country Status (1)

Country Link
JP (1) JPH06132272A (en)

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4823855A (en) * 1987-11-23 1989-04-25 The Goodyear Tire & Rubber Company Pneumatic tire tread pattern
KR100790727B1 (en) * 2002-12-14 2007-12-31 동부일렉트로닉스 주식회사 Apparatus and method for controlling a temperature of a chemical for a wet-etching equipment
US7910007B2 (en) 2005-09-28 2011-03-22 Semiconductor Energy Laboratory Co., Ltd. Treatment method of waste liquid and treatment apparatus
JP2011520038A (en) * 2008-05-06 2011-07-14 ワッカー ケミー アクチエンゲゼルシャフト Method for hydrolyzing solid metal salts using aqueous salt solution
JP2012049391A (en) * 2010-08-27 2012-03-08 Kurita Water Ind Ltd Cleaning method and cleaning system
KR101262842B1 (en) * 2006-12-18 2013-05-09 주식회사 케이씨텍 Device for cooling solution in wet station
JP2013212445A (en) * 2012-03-30 2013-10-17 Ebara Corp Device and method for collection of wastewater by vacuum suction having temperature control function
US11227780B2 (en) 2018-09-20 2022-01-18 Taiwan Semiconductor Manufacturing Co., Ltd. System and method for operating the same
TWI759630B (en) * 2018-09-20 2022-04-01 台灣積體電路製造股份有限公司 Cooling system and cooling method

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4823855A (en) * 1987-11-23 1989-04-25 The Goodyear Tire & Rubber Company Pneumatic tire tread pattern
KR100790727B1 (en) * 2002-12-14 2007-12-31 동부일렉트로닉스 주식회사 Apparatus and method for controlling a temperature of a chemical for a wet-etching equipment
US7910007B2 (en) 2005-09-28 2011-03-22 Semiconductor Energy Laboratory Co., Ltd. Treatment method of waste liquid and treatment apparatus
KR101262842B1 (en) * 2006-12-18 2013-05-09 주식회사 케이씨텍 Device for cooling solution in wet station
JP2011520038A (en) * 2008-05-06 2011-07-14 ワッカー ケミー アクチエンゲゼルシャフト Method for hydrolyzing solid metal salts using aqueous salt solution
JP2012049391A (en) * 2010-08-27 2012-03-08 Kurita Water Ind Ltd Cleaning method and cleaning system
JP2013212445A (en) * 2012-03-30 2013-10-17 Ebara Corp Device and method for collection of wastewater by vacuum suction having temperature control function
US11227780B2 (en) 2018-09-20 2022-01-18 Taiwan Semiconductor Manufacturing Co., Ltd. System and method for operating the same
TWI759630B (en) * 2018-09-20 2022-04-01 台灣積體電路製造股份有限公司 Cooling system and cooling method
US11721567B2 (en) 2018-09-20 2023-08-08 Taiwan Semiconductor Manufacturing Co., Ltd. System and method for operating the same

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