JPH06120185A - Jig for washing - Google Patents

Abstract

PURPOSE:To reduce pattern defects by excluding particles stuck to the rears of the substrates washed from being transcribed to the surfaces of the other substrates washed. CONSTITUTION:At least two side walls 4, 4 are set up on the base plate 5. Then, a plurality of fixing parts 6, 6,... fixing and holding a plurality of substrates 2 washed are formed on the base plate 5. In addition thereto, the base plate 5 is provided with a plurality of partition plates 3, 3,... being located between the substrates washed 2, 2,... fixed and held by the fixing parts 6, 6,.... These partition plates 3, 3,... prevent sticking of particles to the other substrates washed 2, 2,....

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a cleaning jig used for cleaning a substrate of a semiconductor device, a liquid crystal display device or the like, and more particularly to measures for re-adhesion of particles.

[0002]

2. Description of the Related Art In recent years, in the substrate cleaning process, low dust generation has been promoted mainly in the manufacturing process of semiconductor devices and the like. Therefore, an example of a conventional cleaning jig will be described below with reference to FIGS. 5 and 6. FIG. 5 shows a cross-sectional structure of a conventional cleaning jig. In FIG. 5, 1 is a cleaning jig and 2 is a substrate to be cleaned.
The side plates 4 and 4 are erected on both sides of the bottom plate 5, and a plurality of concave fixing portions 6, 6, ... Are formed on the bottom plate 5, and the fixing portion supporting portions 6, 6 ,. The substrate 2 to be cleaned is fixedly supported. FIG. 6 is a configuration diagram of a cleaning device including the cleaning jig 1. In FIG. 6, 7 is a cleaning tank, and the cleaning jig 1 is installed in the cleaning tank 7. Further, 8 is a water supply port, and 11 is a water surface. Then, high-purity water is introduced into the cleaning tank 7 through the water supply port 8 in the water supply direction 9 to clean the substrate 2 to be cleaned, while the cleaned water is discharged from the upper opening of the cleaning tank 7 in the drainage direction 10. There is.

[0003]

However, in the cleaning jig 1 having the above structure, the cleaning jig 1 is used.
, Only a plurality of substrates to be cleaned 2 are held in parallel and adjacent to each other. Therefore, the particles P attached to the back surface of the substrate to be cleaned 2 by the transport mechanism in the previous process float in water, The particles P will reattach to the other substrate 2 to be cleaned. As a result, there is a problem in that the pattern formed on the surface of the substrate to be cleaned 2 becomes defective and the yield is reduced.

The present invention has been made in view of the above problems, and a cleaning jig for reducing pattern defects by preventing particles adhering to the back surface of a substrate to be cleaned from being transferred to the surface of another substrate to be cleaned. It is also intended to provide.

[0005]

In order to achieve the above object, in the means of the invention according to claim 1, at least two side walls are provided upright on the bottom plate. A plurality of fixing parts for fixing and holding a plurality of substrates to be cleaned are formed on the bottom plate. In addition, the bottom plate is provided with a plurality of partition plates located between the substrates to be cleaned that are fixedly held by the fixing portion. The means taken by the invention according to claim 2 is that in the invention according to claim 1,
The partition plate is made of a material that can be charged by friction with a high resistance fluid. The means taken by the invention according to claim 3 is the same as in the invention according to claim 2 above.
The partition plate is made of polytetrafluoroethylene, polypropylene or polyvinyl chloride.

[0006]

With the above structure, in the present invention, when the substrate to be cleaned is cleaned, particles attached to the back surface of the substrate to be cleaned float in the cleaning water. Since it is located, the particles are received by the partition plate and adhere to the partition plate or are drained, which prevents re-adhesion on the surface of another substrate to be cleaned. Particularly, in the inventions of claims 2 and 3, since the partition plate is charged with static electricity, the particles adhere to the partition plate, and the re-adhesion of the particles is more reliably prevented.

[0007]

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS A cleaning jig according to an embodiment of the present invention will be described in detail below with reference to the drawings. It should be noted that the same components as those of the related art are denoted by the same reference numerals. FIG. 1 shows a sectional structure of a cleaning jig in an embodiment of the present invention, and FIG. 2 is a plan view of the cleaning jig. Reference numeral 1 is a cleaning jig, and 2 is a substrate to be cleaned held by the cleaning jig 1. The cleaning jig 1 has at least two side walls 4, 4
, A bottom plate 5 for holding the substrate 2 to be cleaned, and partition plates 3, 3, ... Between the substrate 2 to be cleaned.
The side plates 4 and 4 are provided upright on both sides of the bottom plate 5, and the inverted V-shaped concave fixing portions 6, 6 for holding the substrate 2 to be cleaned are provided on the upper surface of the bottom plate 5. Are formed in parallel at a predetermined interval.

Further, the partition plates 3, 3, ... Are features of the present invention. The partition plates 3, 3, ... Are erected on the bottom plate 5 continuously with the convex portions between the fixing portions 6, 6 ,. It is located between the substrates 2, 2, ... And is provided so as to partition the substrate to be cleaned 2, 2. And, the partition plates 3, 3, ...
High resistance fluids, such as materials that are not charged to friction with water, such as materials formed of aluminum or that are charged to friction with water, such as polytetrafluoroethylene (Teflon), polypropylene or It is made of either polyvinyl chloride.

FIG. 3 is a block diagram of a cleaning device equipped with the cleaning jig 1. In FIG. 3, 7 is a cleaning tank, and the cleaning jig 1 is installed in the cleaning tank 7. Further, 8 is a water supply port, and 11 is a water surface. And
In the cleaning tank 7, high-purity water is introduced from the water supply port 8 in the water supply direction 9 into the cleaning tank 7 to clean the substrate 2 to be cleaned.
The washed water is discharged from the upper opening of the washing tank 7 in the drainage direction 10.

Next, the cleaning operation of the cleaning jig 1 configured as described above will be described with reference to FIGS. 1 to 3. First, cleaning water, for example, high-purity water is introduced into the cleaning tank 1 through the water supply port 8, and the water is discharged from the upper portion of the opened cleaning tank 7 in the drainage direction 10. There is. On the other hand, the substrate 2 to be cleaned is held by the cleaning jig 1,
Specifically, it is fixedly supported by the fixed portion 6. The partition plates 3, 3, ... Are provided between the cleaning target substrates 2, 2 ,.
Is located to partition each substrate to be cleaned 2, 2, .... In this state, each of the substrates to be cleaned 2, 2, ... Is washed with the high-purity water.
Particles P washed off once from the back of 2, ...
Although suspended in water, the particles P are blocked by the partition plates 3, 3, ... And are prevented from reattaching to the other substrate 2 to be cleaned. As described above, according to the present embodiment, since the particles P suspended in water are received by the partition plates 3, 3, ..., The particles P should be reattached to the surface of the substrate 2 to be cleaned placed in parallel. Can be reduced. As a result, it is possible to improve the yield and reliability without damaging the pattern formed on the surface of the substrate to be cleaned 2.

Next, selection of materials for the partition plate 3 in FIG. 1 will be described. As described above, the partition plate 3
May use a non-chargeable material or a chargeable material. For example, if aluminum is used,
Although static electricity is not generated by friction with a high-purity water stream, for example, in the case of Teflon, static electricity is generated and this static electricity charges the partition plate 3. Therefore, the adhesion amount of the particles P when the partition plate 3 is made of aluminum and when it is made of Teflon will be described in comparison with a conventional example. As shown in FIG. In this state, if cleaning is performed for 10 minutes, for example, about 5000 particles P are re-deposited on the surface of the substrate 2 to be cleaned which is placed facing each other. To do. On the other hand, in the cleaning jig 1 of the present invention, when the partition plate 3 is made of aluminum and cleaned under the same conditions, the reattachment amount of the particles P can be reduced to about 100 particles. Further, if the partition plate 3 is Teflon, it is 60
It can be reduced to individual pieces. As described above, by providing the cleaning jig 1 with the partition plates 3, 3, ... Positioned between the substrates 2, 2, ... To be reattached to the surface of the substrate 2 to be cleaned. When the partition plate 3 is made of a material that is electrically charged, such as Teflon, the effect of further reducing particles can be reduced.

Although the partition plates 3, 3, ... Are fixed to the cleaning jig 1 in the first embodiment, the partition plates 3, 3 ,.
3, a substrate to be cleaned may be used, on the surface of which particles P may adhere. In the invention according to claim 1, the material of the partition plates 3, 3, ... Is not limited to the embodiment.

[0013]

As described above, according to the invention of claim 1, by providing the cleaning jig with the partition plate, it is possible to reliably reduce the adhesion of particles to the surface of the substrate to be cleaned. Therefore, the yield and reliability of semiconductor devices and liquid crystal display devices can be improved. Also,
According to the inventions according to claims 2 and 3, since the partition plate is formed of a material that is charged, particles can be adsorbed to the partition plate by the charged static electricity, so that the surface of the substrate to be cleaned can be more reliably transferred. Adhesion of particles can be reduced.

[Brief description of drawings]

FIG. 1 is a cross-sectional view of a cleaning jig according to an embodiment of the present invention.

FIG. 2 is a plan view of a cleaning jig according to an embodiment of the present invention.

FIG. 3 is a configuration diagram of a cleaning device according to an embodiment of the present invention.

FIG. 4 is a characteristic diagram of particle adhesion between the present invention and a conventional example.

FIG. 5 is a cross-sectional view of a cleaning jig in a conventional example.

FIG. 6 is a configuration diagram of a cleaning device in a conventional example.

[Explanation of symbols]

 1 Cleaning jig 2 Substrate to be cleaned 3 Partition plate 4 Side wall 5 Bottom plate 6 Fixed part 7 Cleaning tank 8 Water supply port 9 Water supply direction 10 Drainage direction 11 Water surface

Claims (3)

[Claims] 1. A bottom plate is provided with at least two side walls, and a plurality of fixing parts for fixing and holding a plurality of substrates to be cleaned are formed on the bottom plate, while the bottom plate is fixed to the fixing part. A cleaning jig, characterized in that a plurality of partition plates are provided between the held substrates to be cleaned. 2. The cleaning jig according to claim 1, wherein the partition plate is made of a material that can be charged by friction with a high resistance fluid. 3. The cleaning jig according to claim 2, wherein the partition plate is made of any one of polytetrafluoroethylene, polypropylene or polyvinyl chloride.