JPH0590380A - Board conveyor for film forming apparatus - Google Patents

Abstract

PURPOSE:To suppress mixture of impurities in a vacuum vessel without using a base holder and to shorten a processing time by independently moving a board in X-, Y- and Z-axis directions when the boards are vertically mounted and conveyed. CONSTITUTION:A board conveying truck 21 is moved in an X-axis direction in a vacuum vessel 11 in a state supporting a board 15 to an arm 19 provided at a truck lifter 18. After it arrives at a film forming chamber, the lifter 18 is raised to lift the board 15 to a position higher than the height of a pawl 16 attached to a positioner 13 in the Z-axis direction. Thereafter, the positioner 13 is moved to a position in contact with the board 15 in the Y-axis direction. The lifter 18 is moved down, and the board 15 is delivered to the positioner 13. Then, the positioner 13 is pressed in contact with a heater 12 disposed at the center of the vacuum vessel to process such as independently heat only the board 15. Accordingly, mixture of impurities in the vessel can be suppressed to the minimum.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION The present invention relates to, for example, plasma CVD.
The present invention relates to a substrate transfer device of a film forming device that transfers, for example, glass, a silicon wafer substrate, or the like into a vacuum container for forming a thin film in a vacuum such as an apparatus or a sputtering device.

[0002]

2. Description of the Related Art Conventionally, when a substrate is put in or taken out of a vacuum container such as a plasma CVD device or a sputtering device, a method of fixing the substrate to a substrate holder and carrying the substrate holder together with the substrate is generally adopted. ing.

An example of this conventional film forming apparatus will be described with reference to FIG. As shown in the figure, the film formation is performed in a vacuum container 01, and an electrode 03 is provided on a door 02 that can be opened and closed. In order to transfer the substrates 04, a plurality of substrates 04 are usually attached to the substrate holder 05, and the substrate holders 05 are suspended by the substrate transfer unit 06 provided in the upper part of the vacuum container 01 by a moving device (not shown). It is adapted to move together with the substrate transport unit 06.

Further, a heater 07 is provided at the center of the vacuum container 01, and the substrate holder 05 suspended by the transfer unit 06 moves between the heater 07 and the electrode 03 and stops. A film is to be formed on the substrate 04.

[0005]

However, in the transfer method according to the prior art described above, it takes a lot of time to mount the substrate 04 on the substrate holder 05, and a very complicated robot is required for automation. There's a problem.

When, for example, glass, which is a typical example of the substrate 04, is heated in a vacuum, the substrate holder 05 is also heated, which causes not only a trouble in the transfer system but also a break in the glass. ..

Further, as compared with the case where only glass is heated and cooled, a longer processing time is required in the case where the glass is attached to the substrate holder 05 and heated.

Further, since the substrate holder 05 moves in the vacuum container 01, it causes impurities to be mixed, and there is a problem that the substrate holder 05 to which the substrate is attached must be returned from the outlet to the inlet.

In view of the above-mentioned circumstances, the present invention eliminates the need for a substrate holder, prevents impurities from being mixed into the vacuum container, and shortens the time required for heating and cooling the substrate. The purpose is to provide.

[0010]

The structure of the substrate transfer apparatus of the film forming apparatus according to the present invention which achieves the above object is such that the substrate is automatically placed in a vacuum container for forming a film on the substrate using a heater and electrodes. In a transfer device, a substrate transfer carriage that transfers a substrate in the X-axis direction parallel to a heater and an electrode in a vacuum container, a carriage lifter that raises and lowers the substrate in a Z-axis direction orthogonal to the X-axis direction, and a substrate A positioner that moves in a Y-axis direction that is orthogonal to the X-axis and the Z-axis to a set position where a film forming process is performed, and when the substrate is vertically mounted and conveyed, the X-axis, the Y-axis, and the Z-axis The feature is that movement in each axial direction is performed independently.

[0011]

In the above construction, the substrate is fixed on the dolly lifter in an upright state, the substrate carrier is moved into the space between the vacuum containers, and only the substrate is carried. After the substrate is moved, the dolly lifter is lifted up and delivered to a positioner that holds the substrate, and the positioner is moved to be brought into close contact with a heater to perform processing such as film formation and the substrate processing is performed. As a result, the substrate holder for arranging the substrate, which has been used conventionally, becomes unnecessary.

[0012]

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENT A preferred embodiment of the present invention will be described below with reference to the drawings. FIG. 1 is a perspective view of a substrate transfer device of a film forming apparatus according to this embodiment, FIGS. 2 to 5 are detailed views thereof, and FIGS. ..

The film forming apparatus according to this embodiment is a plasma CVD
An example of application to a device or the like will be shown. As shown in FIG. 1, the vacuum container 11 is completely sealed so that it can be kept in a vacuum by a suction device (not shown), but it is shown in a cut open state in order to explain each part arranged inside. At the center of the inside of the vacuum container 11, a heater 12 that transfers heat to both sides and a positioner 13 that holds the substrate on both sides are arranged in parallel.

The positioner 13 is fixed to a lateral feed device 14 outside the vacuum container 11 via a support arm 14a, and is a flat plate-shaped center that is movable in a direction approaching the heater 12 (horizontal direction: Y axis). The portion is provided with a hole that is somewhat narrower than the substrate 15, and two pawls 16 for mounting the substrate 15 project from the lower end of the hole.

Further, the heater 12 is provided with a recess 17 at a position where the pawl 16 of the positioner 13 abuts, and the pawl 1 of the positioner 13 on which the substrate 15 is placed.
The substrate 15 is brought into close contact with the heater 12 so that 6 is accommodated, and the whole is uniformly heated. The lateral feed device 14 can be moved from the outside of the vacuum container 11 by a hydraulic cylinder (not shown) or the like (see FIG. 2).

Next, a flat glass plate or the like is used for the substrate 15, which is clamped in a groove 20 at the top end of an arm 19 extending above the carriage lifter 18 and is detachably fixed in an upright state. It is conveyed in the X-axis direction parallel to the heater 12 together with the dolly lifter 18 which is detachably mounted on the carriage (see FIGS. 1, 2 and 5).

As shown in FIG. 2, the substrate carrier 21 has a guide rail 22 provided at the bottom of the vacuum container 11.
A table mounted on a guide roller (wheels, etc.) 23 on the top of which a drive transmission part 24 is provided in the lateral direction, and a drive device 25 which stands upright from the bottom of the vacuum container 11 to penetrate therethrough.
Touches.

A plurality of the driving devices 24 are arranged along the guide rails 22 at regular intervals (smaller than the length of the drive transmission portion 24 of the carriage 21), and the rotational force is transmitted from the outside. 25 rotates, and this rotational force is transmitted to the drive transmission unit 24 to move the substrate transfer carriage 21.

In this embodiment, a roller is used for the drive unit 25 and a flat plate or the like is used for the drive transmission unit 24. However, these may be replaced with a rack and pinion, or if necessary. Other transmission means may be used as appropriate.

On the other hand, in the carriage lifter 18 mounted on the substrate transfer carriage 21, two rows of arms 19 having a space larger than the width of the heater 12 are vertically installed, and a groove 20 provided at the tip of the arm 19 is provided. The substrate 15 is clamped by, and in that state, it moves in the X-axis direction together with the carriage 21.
The substrate 15 is stopped when it reaches a predetermined position between the heater 12 and the positioner 13.

Next, a support frame 27 provided on the upper part of the vertical movement device 26 which is erected from the bottom of the vacuum container 11 so as to penetrate therethrough.
Ascends, and the central hole portion (not shown) of the substrate transfer carriage 21
The dolly lifter 18 is lifted in the Z-axis direction after passing through.

The substrates 15 are supported one by one on the carriage lifter 18, transferred to the positioners 13 located on both sides of the heater 12 for double-sided heating, and pressed against the heater 12 to heat the substrate 15. At this time, the pawl 16 of the positioner 13 has a recess 17 provided in the heater 12.
It is designed to be stored in the storage space (see FIGS. 2 to 4).

In this state, the film is formed on the substrate 15, and by using this transfer means in the plasma CVD apparatus, it is possible to minimize the mixing of impurities into the substrate 15, and the heating / cooling time. The processing speed can be increased by shortening.

Next, the operation procedure will be described.

A dolly lifter 18 is placed on a substrate transfer dolly 21, and an arm 19 for supporting the substrate 15 is provided on the dolly lifter 18. The substrate carrier 21 moves in the X-axis direction between the vacuum containers 11 with the arm 15 supporting the bag 15 (see FIGS. 1 and 2).

When the substrate 15 is moved and reaches the target film forming chamber, the dolly lifter 18 is raised and the positioner 13 is moved.
Board 15 to a position higher than the height of pawl 16 attached to
Is pushed up in the Z-axis direction (see FIGS. 6 and 7).

After pushing up the substrate 15 in the Z-axis direction, the positioner 13 is moved in the Y-axis direction which is close to the substrate 15 and is moved to a position where the positioner 13 contacts the substrate 15 (see FIG. 8).

When the truck lifter 18 is lowered in this state, the substrate 15 is transferred to the positioner 13 (see FIG. 9). Once the positioner 13 is returned to its original position, the dolly lifter 18 is also moved to another vacuum container for each substrate transfer carriage 21, and then the positioner 13 is pressed against the heater 12 in the center of the vacuum container so that only the substrate 15 is independent. Then, the substrate is processed in the vacuum container 11 such as by heating (see FIG. 1).
0).

As described above, the X-axis, Y-axis, and Z-axis movements are independently performed to reliably transfer and set the substrate in a vacuum. The operation of transferring the substrate 15 to the dolly lifter 18 and carrying it may be basically the reverse operation.

[0030]

As described above in detail with reference to the embodiments, according to the present invention, the substrate processing can be performed without using the substrate holder, so that the mixing of impurities in the vacuum container can be minimized. It is possible to shorten the time for heating and cooling the substrate. In addition, a vacuum substrate transfer device that does not require the return function of the conventional substrate holder is possible, and is extremely effective when used in a thin film manufacturing device that requires a vacuum, such as a plasma CVD device and sputtering.

[Brief description of drawings]

FIG. 1 is a perspective view of a substrate transfer device of a film forming apparatus according to this embodiment.

FIG. 2 is a schematic side view of FIG.

FIG. 3 is a perspective view of a positioner.

FIG. 4 is a side view of FIG.

FIG. 5 is a detailed view of the upper end of the arm.

FIG. 6 is a schematic diagram showing an operation procedure of the present embodiment.

FIG. 7 is a schematic diagram showing an operation procedure of the present embodiment.

FIG. 8 is a schematic diagram showing an operation procedure of the present embodiment.

FIG. 9 is a schematic diagram showing an operation procedure of the present embodiment.

FIG. 10 is a schematic diagram showing an operation procedure of the present embodiment.

FIG. 11 is a schematic view of a film forming apparatus according to a conventional technique.

[Explanation of symbols]

 11 Vacuum Container 12 Heater 13 Positioner 14 Lateral Feeding Device 15 Substrate 16 Pawl 17 Dimple 18 Cargo Lifter 19 Arm 20 Groove 21 Substrate Transfer Carriage 22 Guide Rail 23 Guide Roller 24 Drive Transmission Unit 25 Drive Device

 ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Masayoshi Murata 1-1, Atsunoura-cho, Nagasaki-shi, Nagasaki Nagasaki Research Laboratories, Mitsubishi Heavy Industries, Ltd. (72) Inventor Katsuko Kodama 1-1, Atsunoura-cho, Nagasaki-shi, Nagasaki Mitsubishi Heavy Industry Co., Ltd. Nagasaki Research Institute (72) Inventor Yoshiaki Takeuchi 1-1, Atsunouracho, Nagasaki City, Nagasaki Prefecture Mitsubishi Heavy Industries, Ltd. Nagasaki Research Institute

Claims (1)

[Claims] 1. An apparatus for automatically transporting a substrate into a vacuum container for forming a film on the substrate using the heater and the electrode, wherein the substrate is X-parallel to the heater and the electrode in the vacuum container.
A substrate transfer carriage that conveys the substrate in the axial direction, a carriage lifter that raises and lowers the substrate in the Z-axis direction that is orthogonal to the X-axis direction, and a Y that is orthogonal to the X-axis and the Z-axis up to a setting position where a film is formed on the substrate.
And a positioner that moves in the axial direction, and when the substrate is placed vertically and is transported, the X-axis, the Y-axis, and the Z-axis are independently moved in each axial direction. Substrate transfer device for film equipment.