JPH0586650B2 - - Google Patents
Info
- Publication number
- JPH0586650B2 JPH0586650B2 JP58052079A JP5207983A JPH0586650B2 JP H0586650 B2 JPH0586650 B2 JP H0586650B2 JP 58052079 A JP58052079 A JP 58052079A JP 5207983 A JP5207983 A JP 5207983A JP H0586650 B2 JPH0586650 B2 JP H0586650B2
- Authority
- JP
- Japan
- Prior art keywords
- diffusion
- boron
- gas
- flow rate
- hydrogen
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/22—Diffusion of impurity materials, e.g. doping materials, electrode materials, into or out of a semiconductor body, or between semiconductor regions; Interactions between two or more impurities; Redistribution of impurities
- H01L21/223—Diffusion of impurity materials, e.g. doping materials, electrode materials, into or out of a semiconductor body, or between semiconductor regions; Interactions between two or more impurities; Redistribution of impurities using diffusion into or out of a solid from or into a gaseous phase
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Formation Of Insulating Films (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5207983A JPS59177923A (ja) | 1983-03-28 | 1983-03-28 | 半導体への硼素拡散方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5207983A JPS59177923A (ja) | 1983-03-28 | 1983-03-28 | 半導体への硼素拡散方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS59177923A JPS59177923A (ja) | 1984-10-08 |
JPH0586650B2 true JPH0586650B2 (enrdf_load_stackoverflow) | 1993-12-13 |
Family
ID=12904808
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP5207983A Granted JPS59177923A (ja) | 1983-03-28 | 1983-03-28 | 半導体への硼素拡散方法 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS59177923A (enrdf_load_stackoverflow) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CA1244969A (en) * | 1986-10-29 | 1988-11-15 | Mitel Corporation | Method for diffusing p-type material using boron disks |
JP2583681B2 (ja) * | 1991-03-20 | 1997-02-19 | 信越半導体株式会社 | 半導体ウェーハへの硼素拡散方法 |
JP4827131B2 (ja) * | 2006-07-24 | 2011-11-30 | タカオカ化成工業株式会社 | モールド変圧器 |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5538046A (en) * | 1978-09-12 | 1980-03-17 | Toshiba Corp | Transformer for condenser type meter |
JPS56169322A (en) * | 1980-05-30 | 1981-12-26 | Fujikura Ltd | Selective diffusion of boron into silicon |
-
1983
- 1983-03-28 JP JP5207983A patent/JPS59177923A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS59177923A (ja) | 1984-10-08 |
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