JPH0582491A - Wafer peeling device - Google Patents

Wafer peeling device

Info

Publication number
JPH0582491A
JPH0582491A JP3269995A JP26999591A JPH0582491A JP H0582491 A JPH0582491 A JP H0582491A JP 3269995 A JP3269995 A JP 3269995A JP 26999591 A JP26999591 A JP 26999591A JP H0582491 A JPH0582491 A JP H0582491A
Authority
JP
Japan
Prior art keywords
wafer
jig
solvent
thin
wax
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP3269995A
Other languages
Japanese (ja)
Inventor
Kazue Kawasaki
和重 川崎
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP3269995A priority Critical patent/JPH0582491A/en
Publication of JPH0582491A publication Critical patent/JPH0582491A/en
Pending legal-status Critical Current

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  • Mechanical Treatment Of Semiconductor (AREA)

Abstract

PURPOSE:To make it possible to peel off a wafer from a wafer mounting jig without making a force act directly on the wafer by a method wherein the jig adhered with the wafer is arranged in a solvent and a bonding material for adhering the wafer to the-jig is dissolved into the solvent. CONSTITUTION:A wafer mounting jig 6 adhered with a thin wafer 1 is held by a holder 9 and the jig 6 is made to dip in a solvent 8 until it is completely dipped in the solvent 8. When the jig 6 is left to stand for a desired time in this state, the solvent 8 passes through holes from the back of the jig 6 to reach a wax 2 on the surface of the jig 6 and this wax 2 is dissolved into the solvent. When the wax 2 is dissolved to some degree, the adhesive force of the wafer 1 to the jig 6 is eliminated and the wafer 1 is peeled off from the jig 6 by the gravity of the wafer 1 and is caught by a bottom 9a of the holder 9. In such a way, the wafer can be peeled off from the jig without making a force act directly on the water from the outside.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】この発明は、研磨等により薄くさ
れたウエハを治具からはがし取るためのウエハはがし装
置に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a wafer peeling device for peeling a wafer thinned by polishing or the like from a jig.

【0002】[0002]

【従来の技術】図3は、従来のワックスにて研磨治具に
貼り付けられた薄ウエハを研磨治具からはがすための装
置を示す斜視図であり、図において、1は薄ウエハ、2
はワックス、3は研磨治具、4はホットプレート、5は
ウエハ押し出し治具である。
2. Description of the Related Art FIG. 3 is a perspective view showing an apparatus for peeling a thin wafer attached to a polishing jig with a conventional wax, in which 1 is a thin wafer and 2 is a thin wafer.
Is a wax, 3 is a polishing jig, 4 is a hot plate, and 5 is a wafer pushing jig.

【0003】次に動作について説明する。一方の平坦面
にワックス2にて薄ウエハ1が貼り付けられた研磨治具
3を、薄ウエハ1が上面となるように、ホットプレート
4の上面に置く。次いで、ホットプレート4をワックス
2が融解する温度まで昇温させる。次いで、ワックス2
が融解した後、ウエハ押し出し治具5を薄ウエハ1の側
面に押し当て、研磨治具3の平坦面に平行な力を加える
ことにより、薄ウエハ1を研磨治具3の平坦面上から押
し出し、薄ウエハ1が研磨治具からはがし取られる。
Next, the operation will be described. The polishing jig 3 having the thin wafer 1 adhered to one flat surface with the wax 2 is placed on the upper surface of the hot plate 4 so that the thin wafer 1 is the upper surface. Next, the hot plate 4 is heated to a temperature at which the wax 2 melts. Then wax 2
After melting, the wafer pushing jig 5 is pressed against the side surface of the thin wafer 1 and a force parallel to the flat surface of the polishing jig 3 is applied to push the thin wafer 1 out of the flat surface of the polishing jig 3. , The thin wafer 1 is peeled off from the polishing jig.

【0004】[0004]

【発明が解決しようとする課題】従来のウエハはがし装
置は以上のように構成されているので、薄ウエハ1に押
し出し治具5を押し当て、ウエハに対して直接力を作用
させていたため、薄ウエハが作業中に割れるという問題
点があった。
Since the conventional wafer peeling apparatus is constructed as described above, since the pushing jig 5 is pressed against the thin wafer 1 and a force is directly applied to the thin wafer 1, There is a problem that the wafer is broken during the work.

【0005】また、ウエハを研磨治具3の平坦面から押
し出す際、押し出し治具5が薄ウエハ1の側面から外れ
て薄ウエハ1の表面に当たり、ウエハ表面を損傷すると
いう問題点があった。
Further, when the wafer is pushed out from the flat surface of the polishing jig 3, the pushing jig 5 comes off the side surface of the thin wafer 1 and hits the surface of the thin wafer 1 to damage the wafer surface.

【0006】この発明は上記のような問題点を解消する
ためになされたもので、ウエハに対して直接力を作用さ
せることなく、取り付け治具からウエハをはがし取るこ
とができるウエハはがし装置を得ることを目的とする。
The present invention has been made to solve the above problems, and provides a wafer peeling device capable of peeling a wafer from a mounting jig without directly applying a force to the wafer. The purpose is to

【0007】[0007]

【課題を解決するための手段】この発明にかかるウエハ
はがし装置は、ウエハが貼り付けられた治具を溶剤中に
配置し、ウエハと治具とを貼り付ける接着物質を該溶剤
にて溶解できるようにしたものである。
In the wafer peeling apparatus according to the present invention, a jig to which a wafer is attached is placed in a solvent, and an adhesive substance for attaching the wafer and the jig can be dissolved in the solvent. It was done like this.

【0008】[0008]

【作用】この発明にかかるウエハはがし装置において
は、ウエハを貼り付けた治具の裏面から貫通穴を通して
ウエハと治具との間に介在する接着物質に溶剤が浸透
し、この溶剤によって接着物質が溶解し、治具とウエハ
とを分離することができる。
In the wafer peeling apparatus according to the present invention, the solvent penetrates into the adhesive substance interposed between the wafer and the jig through the through hole from the back surface of the jig to which the wafer is attached. It can be melted and the jig and the wafer can be separated.

【0009】[0009]

【実施例】図1はこの発明の一実施例によるウエハはが
し装置の使用状態を示す概略図であり、溶剤槽内の溶剤
中にウエハが貼り付ついたウエハ取り付け治具が浸かっ
た状態を示している。
FIG. 1 is a schematic view showing a usage state of a wafer peeling apparatus according to an embodiment of the present invention, showing a state in which a wafer mounting jig with a wafer attached is immersed in a solvent in a solvent tank. ing.

【0010】図において、1は薄ウエハであり、該薄ウ
エハ1はワックス2を介して裏面と表面とを貫通する貫
通穴が複数形成された板状のウエハ取り付け治具6に貼
り付けられ、このウエハ取り付け治具6はホルダー9に
よって保持されて溶剤槽7内に収容された有機溶剤8中
に浸入している。そして、このウエハ取り付け治具を保
持するホルダー9は、有機溶剤8がウエハ取り付け治具
9の裏面から貫通穴に浸入できるように、ウエハ取り付
け治具6を支持する枠体からなり、更に、ウエハ取り付
け治具9からはがれた薄ウエハ1が溶剤槽7内に落ちな
いように、底部に薄いウエハ1を受ける領域9aが形成
されている。
In the figure, reference numeral 1 is a thin wafer, and the thin wafer 1 is attached to a plate-shaped wafer mounting jig 6 having a plurality of through holes penetrating the back surface and the front surface through a wax 2. The wafer mounting jig 6 is held by a holder 9 and is immersed in the organic solvent 8 contained in the solvent tank 7. The holder 9 for holding the wafer mounting jig is composed of a frame body that supports the wafer mounting jig 6 so that the organic solvent 8 can enter the through holes from the back surface of the wafer mounting jig 9. An area 9a for receiving the thin wafer 1 is formed at the bottom so that the thin wafer 1 peeled off from the attachment jig 9 does not fall into the solvent bath 7.

【0011】次に、図2を用いて、ウエハ取り付け治具
9に貼り付いた薄ウエハ1がウエハ取り付け治具9から
はがれる工程を説明する。
Next, the process of peeling the thin wafer 1 attached to the wafer mounting jig 9 from the wafer mounting jig 9 will be described with reference to FIG.

【0012】図2(a) ,(b) は溶剤槽7に収容された溶
剤8中に薄ウエハ1が貼り付いたウエハ取り付け治具6
をホルダー9に保持して浸入させた状態を示す図であ
り、それぞれ、薄ウエハ1がウエハ取り付け治具6から
はがれる前とはがれた後の状態を示している。
2A and 2B show a wafer mounting jig 6 in which a thin wafer 1 is stuck in a solvent 8 contained in a solvent tank 7.
6A and 6B are views showing a state where the wafer 1 is held in a holder 9 to be infiltrated therein, respectively, showing a state before the thin wafer 1 is peeled from the wafer mounting jig 6 and a state after the thin wafer 1 is peeled off.

【0013】先ず、薄ウエハ1が貼り付いたウエハ取り
付け治具6をホルダー9によって保持し、図2(a) に示
すようにウエハ取り付け治具6が溶剤8中に浸かりきる
まで浸入させる。
First, the wafer mounting jig 6 to which the thin wafer 1 is attached is held by the holder 9, and is immersed until the wafer mounting jig 6 is completely immersed in the solvent 8 as shown in FIG. 2 (a).

【0014】次いで、この状態で所望の時間放置すると
溶剤8がウエハ取り付け治具9の裏から貫通穴を通って
ウエハ取り付け治具6の表面のワックス2に到達し、こ
のワックス2が溶解する。
Then, when the wafer 8 is left in this state for a desired time, the solvent 8 reaches the wax 2 on the surface of the wafer mounting jig 6 from the back of the wafer mounting jig 9 through the through hole, and the wax 2 is dissolved.

【0015】そして、ワックス2がある程度溶解すると
薄ウエハ1とウエハ取り付け治具6との接着力がなくな
り、図2(b) に示すように、薄ウエハ1の重力によって
薄ウエハ1がウエハ取り付け治具6からはがれ、ホルダ
ー9の底面9aによって受けとめられる。尚、この時、
ウエハ取り付け治具6を支えるホルダー9の枠体は傾斜
した角度にあり、はがれた薄ウエハ1が前方に倒れるこ
となくホルダー9に受け止められる構造になっている。
When the wax 2 is dissolved to some extent, the adhesive force between the thin wafer 1 and the wafer mounting jig 6 is lost, and as shown in FIG. It is peeled off from the tool 6 and received by the bottom surface 9 a of the holder 9. At this time,
The frame of the holder 9 that supports the wafer mounting jig 6 is at an inclined angle, and the thin wafer 1 that has been peeled off is received by the holder 9 without falling forward.

【0016】このような本実施例のウエハはがし装置で
は、溶剤8が複数の貫通穴を有するウエハ取り付け治具
6の裏面から貫通穴を通って表面に伝わり、ウエハ取り
付け治具6と薄ウエハ1とを接着するワックスを溶解す
るため、不要な力を外部から薄ウエハ1に作用させるこ
となく、薄ウエハ1の重力にてウエハ取り付け治具6か
ら薄ウエハ1をはがすことができ、しかも、はがれた薄
ウエハ1はホルダー9によって液中で受け止められるた
め、ウエハが割れたり、ウエハ表面に傷をつけることが
ない。
In such a wafer peeling apparatus of this embodiment, the solvent 8 is transferred from the back surface of the wafer mounting jig 6 having a plurality of through holes to the front surface through the through holes, and the wafer mounting jig 6 and the thin wafer 1 Since the wax that adheres to and is melted, the thin wafer 1 can be peeled from the wafer mounting jig 6 by the gravity of the thin wafer 1 without exerting an unnecessary force on the thin wafer 1 from the outside, and peeling can be performed. Since the thin wafer 1 is received in the liquid by the holder 9, the wafer is not cracked or the surface of the wafer is not scratched.

【0017】尚、上記溶剤としては、ウエハ取り付け治
具6と薄ウエハ1とを接着する物質に対して、その物質
を溶解する溶剤を選択的に用いることかできる。
As the solvent, it is possible to selectively use a solvent that dissolves the substance for adhering the wafer mounting jig 6 and the thin wafer 1 to each other.

【0018】また、ウエハ取り付け治具、ホルダーの形
状は上記実施例に限らず、所望の形状に変更できること
は言うまでもない。
Further, it goes without saying that the shapes of the wafer mounting jig and the holder are not limited to those in the above embodiment, and can be changed to desired shapes.

【0019】[0019]

【発明の効果】以上のように、この発明によれば、ウエ
ハが貼り付けられた治具を溶剤中に配置し、ウエハと治
具とを貼り付ける接着物質を上記溶剤にて溶解するよう
にしたので、外部からウエハに対して直接力を作用させ
ることなくウエハを治具からはがすことができ、ウエハ
が割れたり、ウエハ表面に傷がつくことがなくなるた
め、高歩留りが得られる効果がある。
As described above, according to the present invention, the jig to which the wafer is attached is placed in the solvent, and the adhesive substance for attaching the wafer and the jig is dissolved in the solvent. Therefore, the wafer can be peeled off from the jig without directly exerting a force on the wafer from the outside, and the wafer is not cracked or the surface of the wafer is not scratched, so that a high yield can be obtained. .

【図面の簡単な説明】[Brief description of drawings]

【図1】この発明の一実施例によるウエハはがし装置の
使用状態を示す概略図。
FIG. 1 is a schematic view showing a usage state of a wafer peeling device according to an embodiment of the present invention.

【図2】図1で示すウエハはがし装置のウエハが治具か
らはがれる前とはがれた後の状態を示す図。
FIG. 2 is a view showing a state of the wafer peeling apparatus shown in FIG. 1 before and after being peeled off from the jig.

【図3】従来のウエハはがし装置を概略的に示す斜視
図。
FIG. 3 is a perspective view schematically showing a conventional wafer peeling device.

【符号の説明】[Explanation of symbols]

1 薄ウエハ 2 ワックス 3 研磨治具 4 ホットプレート 5 ウエハ押し治具 6 穴あき研磨治具 7 槽 8 有機溶剤 9 ホルダー 9a ホルダーの底部 1 Thin Wafer 2 Wax 3 Polishing Jig 4 Hot Plate 5 Wafer Pushing Jig 6 Perforating Polishing Jig 7 Tank 8 Organic Solvent 9 Holder 9a Bottom of Holder

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】 所望の物質によって治具に貼り付け固定
されたウエハを該治具からはがし取るウエハはがし装置
において、 表面と裏面とを貫通する複数の貫通穴を有し、該表面の
平坦面上に所望の物質を介してウエハが貼り付け固定さ
れる板状のウエハ取り付け治具と、 後述する溶剤が上記貫通穴に侵入できるよう上記ウエハ
とり付け治具を保持する治具保持手段と、 内部に上記所望の物質を溶解する溶剤が収容され、上記
保持手段に保持されたウエハとり付け治具が上記溶剤中
に浸かりきる構造の溶剤槽とを備えたことを特徴とする
ウエハはがし装置
1. A wafer peeling apparatus for peeling a wafer fixed to a jig by a desired substance from the jig, wherein the wafer peeling apparatus has a plurality of through holes penetrating a front surface and a back surface, and a flat surface of the surface. A plate-shaped wafer mounting jig on which a wafer is attached and fixed via a desired substance; jig holding means for holding the wafer mounting jig so that a solvent described later can enter the through hole; A wafer peeling device, characterized in that a solvent for dissolving the desired substance is housed therein, and a wafer mounting jig held by the holding means is provided with a solvent tank having a structure capable of being completely immersed in the solvent.
JP3269995A 1991-09-20 1991-09-20 Wafer peeling device Pending JPH0582491A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3269995A JPH0582491A (en) 1991-09-20 1991-09-20 Wafer peeling device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3269995A JPH0582491A (en) 1991-09-20 1991-09-20 Wafer peeling device

Publications (1)

Publication Number Publication Date
JPH0582491A true JPH0582491A (en) 1993-04-02

Family

ID=17480098

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3269995A Pending JPH0582491A (en) 1991-09-20 1991-09-20 Wafer peeling device

Country Status (1)

Country Link
JP (1) JPH0582491A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN100401494C (en) * 2005-02-28 2008-07-09 大日本网目版制造株式会社 Wafer treating apparatus
JP2011228337A (en) * 2010-04-15 2011-11-10 Mitsubishi Electric Corp Wafer stripping method and wafer stripping device
CN103258764A (en) * 2012-02-21 2013-08-21 欣兴电子股份有限公司 Carrier for wafer thinning and preparation method thereof

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN100401494C (en) * 2005-02-28 2008-07-09 大日本网目版制造株式会社 Wafer treating apparatus
JP2011228337A (en) * 2010-04-15 2011-11-10 Mitsubishi Electric Corp Wafer stripping method and wafer stripping device
CN103258764A (en) * 2012-02-21 2013-08-21 欣兴电子股份有限公司 Carrier for wafer thinning and preparation method thereof

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