JPH0580814B2 - - Google Patents

Info

Publication number
JPH0580814B2
JPH0580814B2 JP58119351A JP11935183A JPH0580814B2 JP H0580814 B2 JPH0580814 B2 JP H0580814B2 JP 58119351 A JP58119351 A JP 58119351A JP 11935183 A JP11935183 A JP 11935183A JP H0580814 B2 JPH0580814 B2 JP H0580814B2
Authority
JP
Japan
Prior art keywords
alignment
mark
mask
amount
wafer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP58119351A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6010727A (ja
Inventor
Mitsuo Tabata
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Shibaura Electric Co Ltd filed Critical Tokyo Shibaura Electric Co Ltd
Priority to JP58119351A priority Critical patent/JPS6010727A/ja
Publication of JPS6010727A publication Critical patent/JPS6010727A/ja
Publication of JPH0580814B2 publication Critical patent/JPH0580814B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Electron Beam Exposure (AREA)
JP58119351A 1983-06-30 1983-06-30 位置合わせ方法 Granted JPS6010727A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58119351A JPS6010727A (ja) 1983-06-30 1983-06-30 位置合わせ方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58119351A JPS6010727A (ja) 1983-06-30 1983-06-30 位置合わせ方法

Publications (2)

Publication Number Publication Date
JPS6010727A JPS6010727A (ja) 1985-01-19
JPH0580814B2 true JPH0580814B2 (enExample) 1993-11-10

Family

ID=14759335

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58119351A Granted JPS6010727A (ja) 1983-06-30 1983-06-30 位置合わせ方法

Country Status (1)

Country Link
JP (1) JPS6010727A (enExample)

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5396676A (en) * 1977-02-03 1978-08-24 Nippon Telegr & Teleph Corp <Ntt> Method and apparatus for positioning by electron beam exposure
GB2066487B (en) * 1979-12-18 1983-11-23 Philips Electronic Associated Alignment of exposure masks

Also Published As

Publication number Publication date
JPS6010727A (ja) 1985-01-19

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