JPS6010727A - 位置合わせ方法 - Google Patents

位置合わせ方法

Info

Publication number
JPS6010727A
JPS6010727A JP58119351A JP11935183A JPS6010727A JP S6010727 A JPS6010727 A JP S6010727A JP 58119351 A JP58119351 A JP 58119351A JP 11935183 A JP11935183 A JP 11935183A JP S6010727 A JPS6010727 A JP S6010727A
Authority
JP
Japan
Prior art keywords
electron beam
alignment
mask
mark
wafer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP58119351A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0580814B2 (enExample
Inventor
Mitsuo Tabata
光雄 田畑
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp filed Critical Toshiba Corp
Priority to JP58119351A priority Critical patent/JPS6010727A/ja
Publication of JPS6010727A publication Critical patent/JPS6010727A/ja
Publication of JPH0580814B2 publication Critical patent/JPH0580814B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Electron Beam Exposure (AREA)
JP58119351A 1983-06-30 1983-06-30 位置合わせ方法 Granted JPS6010727A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58119351A JPS6010727A (ja) 1983-06-30 1983-06-30 位置合わせ方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58119351A JPS6010727A (ja) 1983-06-30 1983-06-30 位置合わせ方法

Publications (2)

Publication Number Publication Date
JPS6010727A true JPS6010727A (ja) 1985-01-19
JPH0580814B2 JPH0580814B2 (enExample) 1993-11-10

Family

ID=14759335

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58119351A Granted JPS6010727A (ja) 1983-06-30 1983-06-30 位置合わせ方法

Country Status (1)

Country Link
JP (1) JPS6010727A (enExample)

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5396676A (en) * 1977-02-03 1978-08-24 Nippon Telegr & Teleph Corp <Ntt> Method and apparatus for positioning by electron beam exposure
JPS5698830A (en) * 1979-12-18 1981-08-08 Philips Nv Method of manufacturing microminiature solidstate device

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5396676A (en) * 1977-02-03 1978-08-24 Nippon Telegr & Teleph Corp <Ntt> Method and apparatus for positioning by electron beam exposure
JPS5698830A (en) * 1979-12-18 1981-08-08 Philips Nv Method of manufacturing microminiature solidstate device

Also Published As

Publication number Publication date
JPH0580814B2 (enExample) 1993-11-10

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