JPH0577316B2 - - Google Patents
Info
- Publication number
- JPH0577316B2 JPH0577316B2 JP62095855A JP9585587A JPH0577316B2 JP H0577316 B2 JPH0577316 B2 JP H0577316B2 JP 62095855 A JP62095855 A JP 62095855A JP 9585587 A JP9585587 A JP 9585587A JP H0577316 B2 JPH0577316 B2 JP H0577316B2
- Authority
- JP
- Japan
- Prior art keywords
- superconducting
- superconducting material
- oxide superconducting
- impurity
- control electrode
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 239000012535 impurity Substances 0.000 claims description 28
- 239000000463 material Substances 0.000 claims description 24
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 15
- 239000000758 substrate Substances 0.000 claims description 10
- 229910052782 aluminium Inorganic materials 0.000 claims description 9
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 9
- 238000000034 method Methods 0.000 claims description 9
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims description 7
- 238000004519 manufacturing process Methods 0.000 claims description 7
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 6
- 229910052710 silicon Inorganic materials 0.000 claims description 6
- 239000010703 silicon Substances 0.000 claims description 6
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 claims description 5
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 claims description 5
- 229910052785 arsenic Inorganic materials 0.000 claims description 5
- RQNWIZPPADIBDY-UHFFFAOYSA-N arsenic atom Chemical compound [As] RQNWIZPPADIBDY-UHFFFAOYSA-N 0.000 claims description 5
- 229910052796 boron Inorganic materials 0.000 claims description 5
- 229910017052 cobalt Inorganic materials 0.000 claims description 5
- 239000010941 cobalt Substances 0.000 claims description 5
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 claims description 5
- 229910052732 germanium Inorganic materials 0.000 claims description 5
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 claims description 5
- 229910052759 nickel Inorganic materials 0.000 claims description 5
- 229910052698 phosphorus Inorganic materials 0.000 claims description 5
- 239000011574 phosphorus Substances 0.000 claims description 5
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 claims 4
- 239000000654 additive Substances 0.000 claims 4
- 230000000996 additive effect Effects 0.000 claims 4
- 239000000470 constituent Substances 0.000 claims 4
- 229910052733 gallium Inorganic materials 0.000 claims 4
- 239000000919 ceramic Substances 0.000 description 54
- 239000010408 film Substances 0.000 description 9
- 238000000576 coating method Methods 0.000 description 6
- 239000011248 coating agent Substances 0.000 description 5
- 238000005468 ion implantation Methods 0.000 description 5
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- 230000000737 periodic effect Effects 0.000 description 4
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 3
- 230000004888 barrier function Effects 0.000 description 3
- 229910010293 ceramic material Inorganic materials 0.000 description 3
- 239000013078 crystal Substances 0.000 description 3
- 230000007423 decrease Effects 0.000 description 3
- 229910052760 oxygen Inorganic materials 0.000 description 3
- 239000001301 oxygen Substances 0.000 description 3
- 229920002120 photoresistant polymer Polymers 0.000 description 3
- 230000003321 amplification Effects 0.000 description 2
- 229910052788 barium Inorganic materials 0.000 description 2
- DSAJWYNOEDNPEQ-UHFFFAOYSA-N barium atom Chemical compound [Ba] DSAJWYNOEDNPEQ-UHFFFAOYSA-N 0.000 description 2
- 239000011575 calcium Substances 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 239000011777 magnesium Substances 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- 238000003199 nucleic acid amplification method Methods 0.000 description 2
- 238000000206 photolithography Methods 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 229910052727 yttrium Inorganic materials 0.000 description 2
- VWQVUPCCIRVNHF-UHFFFAOYSA-N yttrium atom Chemical compound [Y] VWQVUPCCIRVNHF-UHFFFAOYSA-N 0.000 description 2
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 229910052692 Dysprosium Inorganic materials 0.000 description 1
- 229910052691 Erbium Inorganic materials 0.000 description 1
- 229910052693 Europium Inorganic materials 0.000 description 1
- 229910052688 Gadolinium Inorganic materials 0.000 description 1
- 241001101998 Galium Species 0.000 description 1
- 229910052689 Holmium Inorganic materials 0.000 description 1
- 229910052765 Lutetium Inorganic materials 0.000 description 1
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 1
- 229910052775 Thulium Inorganic materials 0.000 description 1
- 229910052768 actinide Inorganic materials 0.000 description 1
- 150000001255 actinides Chemical class 0.000 description 1
- 238000000137 annealing Methods 0.000 description 1
- 230000002238 attenuated effect Effects 0.000 description 1
- 229910052790 beryllium Inorganic materials 0.000 description 1
- ATBAMAFKBVZNFJ-UHFFFAOYSA-N beryllium atom Chemical compound [Be] ATBAMAFKBVZNFJ-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 229910052791 calcium Inorganic materials 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- KBQHZAAAGSGFKK-UHFFFAOYSA-N dysprosium atom Chemical compound [Dy] KBQHZAAAGSGFKK-UHFFFAOYSA-N 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- UYAHIZSMUZPPFV-UHFFFAOYSA-N erbium Chemical compound [Er] UYAHIZSMUZPPFV-UHFFFAOYSA-N 0.000 description 1
- OGPBJKLSAFTDLK-UHFFFAOYSA-N europium atom Chemical compound [Eu] OGPBJKLSAFTDLK-UHFFFAOYSA-N 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 239000000835 fiber Substances 0.000 description 1
- UIWYJDYFSGRHKR-UHFFFAOYSA-N gadolinium atom Chemical compound [Gd] UIWYJDYFSGRHKR-UHFFFAOYSA-N 0.000 description 1
- KJZYNXUDTRRSPN-UHFFFAOYSA-N holmium atom Chemical compound [Ho] KJZYNXUDTRRSPN-UHFFFAOYSA-N 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 229910052747 lanthanoid Inorganic materials 0.000 description 1
- 150000002602 lanthanoids Chemical class 0.000 description 1
- OHSVLFRHMCKCQY-UHFFFAOYSA-N lutetium atom Chemical compound [Lu] OHSVLFRHMCKCQY-UHFFFAOYSA-N 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 229910052574 oxide ceramic Inorganic materials 0.000 description 1
- 239000011224 oxide ceramic Substances 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 229910052705 radium Inorganic materials 0.000 description 1
- HCWPIIXVSYCSAN-UHFFFAOYSA-N radium atom Chemical compound [Ra] HCWPIIXVSYCSAN-UHFFFAOYSA-N 0.000 description 1
- 229910052706 scandium Inorganic materials 0.000 description 1
- SIXSYDAISGFNSX-UHFFFAOYSA-N scandium atom Chemical compound [Sc] SIXSYDAISGFNSX-UHFFFAOYSA-N 0.000 description 1
- 238000007650 screen-printing Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 229910052712 strontium Inorganic materials 0.000 description 1
- CIOAGBVUUVVLOB-UHFFFAOYSA-N strontium atom Chemical compound [Sr] CIOAGBVUUVVLOB-UHFFFAOYSA-N 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 238000007738 vacuum evaporation Methods 0.000 description 1
- 239000012808 vapor phase Substances 0.000 description 1
- 229910052845 zircon Inorganic materials 0.000 description 1
- GFQYVLUOOAAOGM-UHFFFAOYSA-N zirconium(iv) silicate Chemical compound [Zr+4].[O-][Si]([O-])([O-])[O-] GFQYVLUOOAAOGM-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N60/00—Superconducting devices
- H10N60/01—Manufacture or treatment
- H10N60/0268—Manufacture or treatment of devices comprising copper oxide
- H10N60/0661—Processes performed after copper oxide formation, e.g. patterning
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N60/00—Superconducting devices
- H10N60/01—Manufacture or treatment
- H10N60/0884—Treatment of superconductor layers by irradiation, e.g. ion-beam, electron-beam, laser beam or X-rays
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Superconductor Devices And Manufacturing Methods Thereof (AREA)
Description
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ã«é¢ãããDETAILED DESCRIPTION OF THE INVENTION Field of Application of the Invention The present invention relates to a method for manufacturing a solid-state electronic device using a ceramic superconducting (also referred to as superconducting) material.
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ããšãããã®ã§ããã The present invention relates to a method for manufacturing a four-terminal (including three-terminal) element having an input terminal and an output terminal. The present invention provides such an element with an amplifying function and a switching function, and also detects an output signal from the output by applying an input signal to a control input.
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ã€ãã€ã¹ãäœãè©Šã¿ããªãããŠããã"Prior Art" Conventionally, attempts have been made to fabricate solid-state electronic devices using superconducting materials, such as metal materials such as Nb-Ge (Nb 3 Ge, for example).
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ã®ã§ãïŒç«¯ååè·¯ãããªã€ãŠããã A typical example is the Josephson device. This Josephson element attempts to perform switching by combining superconductivity and tunnel current phenomena, and consists of a two-terminal circuit.
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æ¬ ç¹ãæããã"Conventional Problems" However, since such a Josephson device is a two-terminal circuit device, the input signal and output signal cannot be used as independent signals. For this reason, when considering industrial applications, although it has the feature of being able to operate at ultra-high frequencies, circuit design is extremely difficult, and it is difficult to use the design technology that has been cultivated in conventional semiconductor integrated circuits. It has the disadvantage that it cannot.
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æ¬ ç¹ãæããã In particular, since it is a two-terminal element, it does not have a signal amplification function, and the signal is attenuated slightly from the input end to the output end in the entire system, making it impossible to achieve a so-called gain of 1 or more. It has major drawbacks.
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ãé»æ¥µãšãæãããããšãããã®ã§ããã The present invention aims to eliminate such drawbacks, operate at very high frequencies, and provide a four-terminal circuit element, that is, a control electrode for applying an input signal and an electrode for deriving an output signal.
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ã§ããã"Means to Solve the Problem" In order to solve the problem, the present invention provides a four-terminal solid-state electronic element (device) structure using superconducting ceramic material (ceramics).
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é»å°ã»ã©ããã¯ã¹ãèšããŠããã In the present invention, a superconducting ceramic is provided on a substrate having a non-superconducting insulating surface, and a first superconducting ceramic having a finite resistance at an operating temperature is provided in a partial region thereof. A second superconducting ceramic having zero resistance is provided on one and the other of the ceramics.
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ç¹ã«çµ¶çžèãèšããããŠããã Ceramics with finite resistance are made by adding impurities to superconducting ceramics, and the impurities weakly destroy the superconductivity. Furthermore, a control electrode is provided on the upper or lower surface of the first superconducting ceramic to control the current flowing therethrough. Between this control electrode and the ceramics, there is a coating that should prohibit the transfer of current.
In particular, an insulating film is provided.
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ãäžçŽç©ãæ·»å ãããã®ã§ããã In the present invention, the first superconducting ceramic having finite resistance uses the same components as the second superconducting ceramic having zero resistance, and impurities are added thereto by ion implantation or the like.
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1019ãïŒÃ1021cm-3ã®ãªãŒãã§ããã This impurity may be an element constituting the superconducting ceramic, such as Y (yttrium), copper (Cu), barium (Ba), or oxygen (O). Such impurities need to be added in large amounts to the extent that they disturb the chemical stoichiometric ratio that exhibits superconductivity. Specifically 5Ã
It is on the order of 10 19 to 5Ã10 21 cm â3 .
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ãŒã ïŒGeïŒãããŠçŽ (B)ãã¢ã«ãããŠãŒã ïŒAlïŒã
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ãšããã In addition, other impurities include iron (Fe), nickel (Ni), cobalt (Co), silicon (Si), germanium (Ge), boron (B), aluminum (Al),
There is one or more types selected from galium (Ga), phosphorus (P), and arsenic (As). In such a case, the concentration of the impurity is between 5Ã10 15 and 3Ã10 20 cm -3
And so.
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ãã¯ã¹ã«äžçŽç©ãæ·»å ãããããã«ãããTco
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ããšTcoãšã®å·®ãåºãããäžè¬ã«10K以äžãæã
ããåŸãã In the superconducting element of the present invention, impurities are added to the second superconducting ceramic to form the first superconducting ceramic. This allows Tco
(the temperature at which resistance becomes zero) decreases, but Tc onset does not change much. As a result, the difference between Tc onset and Tco widens and can generally be greater than 10K.
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ãã奜ãŸããã Ceramic materials are more preferred for use in the device of the present invention than conventionally known metallic superconducting materials, which have a difference of only 1K or less.
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ãŸãã¯äž¡é¢ã«èšãããã®ã§ããã The present invention has a sufficiently large electric resistance between electrodes connected between a pair of output superconducting ceramics.
Preferably the electrical resistance of the first superconducting material is 10
A coating having an electrical resistance more than double that is provided on the upper surface, lower surface, or both surfaces.
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ã€ãŠå€åãå¶åŸ¡ãããããšãã§ããã In the present invention, a film, preferably an insulating film, having an electrical resistance sufficiently higher than the electrical resistance of the superconducting ceramic is provided between the control electrode and the superconducting film, and a voltage is applied from the control electrode, which is an input terminal. Then, a voltage is applied to the superconducting ceramic underneath. This ceramic is produced in an intermediate state between completely superconducting and completely non-superconducting (partly superconducting and partially non-superconducting, that is, at a temperature between Tc onset and Tco). (region state), it is possible to change and control its own potential according to the voltage applied to the input control electrode.
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å¯ã§ããã The insulating properties of the coating interposed between the control electrode and the ceramic used in the present invention can be removed even if the current applied to the input signal can be ignored in terms of the mechanism. It is also possible to use a coating whose resistance is 10 times or less.
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ããŠçŽïŒåã§ãã€ãŠãããã In the present invention, the superconducting ceramic has a control electrode as shown in FIG. 1A or B.
If there is only one layer, it is important to make it relatively thin, 0.01 to 10 ÎŒm, so that the potential can be changed even on the opposite side. In addition, when two control electrodes are provided above and below the ceramic as shown in FIG. 1C, the thickness may be 0.1 to 50 ÎŒm, which is about 5 times the thickness on average.
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å³ã瀺ãã 1A, B, and C show longitudinal cross-sectional views of the solid-state device of the present invention.
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é¶ãŸãã¯é¶ã«ååè¿ãå€ãšãªãã 2 in Fig. 1 is superconducting ceramics 3,
5 uses characteristic 16 in characteristics 3 and 5 in FIG. With this characteristic, Tco28 has a resistance of zero or a value sufficiently close to zero at the operating temperature (liquid nitrogen temperature in this case) of the solid state element of the present invention.
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ãçšããã In the present invention, a second superconducting ceramic is formed over the entire surface and photoetched into a desired shape.
Thereafter, impurities were selectively added only to this region in order to produce the first superconducting ceramic.
Only this region was made to have a Tco26 different from Tco28 of the second superconducting ceramic. The width of this impurity addition is 0.01 to 5Ό, preferably 0.1 to 5Ό
The length of the channel was made as short as possible, 1ÎŒ, using photolithography technology. The impurity by ion implantation is 5Ã10 15 to 3Ã10 21 cm â3 and is implanted across the film in the depth direction. Furthermore, the whole was annealed in oxygen at 400 to 1000°C, for example 600°C, for 10 hours to oxidize the impurities and adjust the crystal structure. Thus,
First superconducting ceramic 4 in FIG.
For example, curve 4 of the temperature-specific resistance characteristics of superconducting ceramics in FIG. 3 is used. This uses the intermediate region between Tco 26 and Tc onset 25.
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çšé»æ¥µïŒïŒäžã«ã¯è¢«èïŒïŒãèšããŠããã In FIG. 1A, a first superconducting ceramic 4 and a second superconducting ceramic 3 and 5 on a substrate 1 having a non-superconducting insulating surface are shown.
The ceramics 2 is made up of: A pair of output electrodes 8 and 9 (not shown in the drawing) may be provided at the left and right ends in the drawing. Further, a coating 11 is provided under the control electrode 10.
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ããŠããã In FIG. 1A, the control electrode 10 is provided on the upper side of the first superconducting ceramic 4, and in FIG. 1B, it is provided on the lower side. In FIG. 1C, coatings are provided on both the upper and lower surfaces of the superconducting ceramic 4, and control electrodes 10 and 10' are provided, respectively.
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æ§ã§ããã In the manufacturing method shown in FIG. 1B, a control electrode is provided on a substrate having a non-superconducting surface, and a film having a sufficiently high electrical resistance is formed to cover this electrode. Next, a second superconducting ceramic is formed over the entire structure. Thereafter, only the upper surface of the control electrode is left, the rest is covered with a photomask, and impurities are added by ion implantation. After removing this photoresist, the entire structure is heated and oxidized in an oxygen atmosphere to form a first superconducting ceramic. The rest is the same as in FIG. 1A.
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ã®å¶åŸ¡çšé»æ¥µãèšãããã®ã§ããã In FIG. 2C, after the structure shown in FIG. 2B has been formed, an insulating film is again formed on this ceramic, and another control electrode is provided.
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ããŠçšããããšãã§ããã"Operation" With such a structure, the input signal and the output signal can be controlled as independent functions, and this element can be used as a switching element or an element having an amplification function.
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ãã The present invention makes it possible to create a plurality of solid-state devices on the same substrate, and when trying to create a superconducting integrated circuit by connecting such devices based on design logic, the mutual wiring can be created with zero resistance. I can do it.
以äžã«å³é¢ã«åŸã€ãŠå®æœäŸã説æããã Examples will be described below with reference to the drawings.
å®æœäŸ ïŒ ãã®å®æœäŸã¯ç¬¬ïŒå³ïŒ¡ã®æ§é ã瀺ããExample 1 This embodiment shows the structure of FIG. 1A.
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æ¥çºè¡ïŒã«ãããã®ã§ããã YSZ (yttrium stabilized zircon) was used as the substrate. This can be applied using the screen printing method, sputtering method, MBE (Molecular
Beam epitaxial) method, CVD (vapor phase reaction)
A superconducting material is formed using a method or the like. As an example of this superconducting material, (A 1-x Bx)yCuzOw, x=
0-1, y=2.0-4.0 preferably 2.5-3.5, z=
1 to 4, preferably 1.5 to 3.5, W=4 to 10, preferably 6 to 8. A is Y (Itztriyum),
Gu (Gadolinium), Yb (Itterbiyum),
Eu (europium), Tb (terubium), Dy
(dysprosium), Ho (holmium), Er (erbium), Tm (thulium), Lu (lutetium),
B selected from Sc (scandium) or one or more other elements in group a of the periodic table is Ra
(radium), Ba (barium), Sr (strontium), Ca (calcium), Mg (magnesium), Be (beryllium), group A of the periodic table of elements. Especially as a specific example (YBa 2 )
Cu3O6-8 was used . Further, as A, a lanthanide element or an actinide element other than the above-mentioned elements in the periodic table of elements can be used. In addition, the periodic table of elements in the specification is from the Physical and Chemistry Dictionary (Iwanami Shoten April 1, 1963).
(Published on 2017).
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It was fabricated by thermal annealing at a temperature of 5 to 20 hours. In this way, properties 3 and 5 in Figure 3 could be obtained as a second superconducting ceramic.
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ã®é åãšããããã Next, known photolithography is used. That is, in FIG. 1A, a photoresist is provided on regions 5 and 6, and impurities are selectively added only to region 4 where there is no resist by ion implantation. Impurities such as aluminum, silicon or iron are contained in an amount of 5Ã10 15 to 3Ã10 21 cm -3 , e.g. 5Ã10 19
It was added to a concentration of cm -3 . After this, the photoresist is removed and aluminum is applied over the entire area.
Vacuum evaporation or light deposition to ~500Ã
, e.g. 100Ã
thickness
Formed by CVD method. Thereafter, the entire aluminum is oxidized in an oxidizing atmosphere at a temperature of about 400 to 1000 degrees Celsius, for example, 700 degrees Celsius, to form the aluminum oxide insulating film 11, and impurities added by ion implantation are oxidized to insulate the aluminum. transformed into a thing. As a result, as shown in FIG. 3, the Tco of region 4 was made to be only partially in the region of finite resistance with superconducting property 15.
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ãããããããŠç¬¬ïŒå³æ²ç·ïŒãåŸãã It is effective to add this impurity by using the elements constituting the second superconducting ceramic, changing the values of x, y, z, and w, and performing the same process to obtain the first superconducting ceramic. Using such a method, Tc onset 25 was lowered below Tco'. Thus, curve 4 in Figure 3 was obtained.
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ã«å¯æ¥ãããªãŒã æ¥è§Šããªãããã¹ãããã Next, the control electrode 10 was manufactured using the same superconducting ceramic as the other second superconducting ceramic by the same method. The output electrode was placed in close contact with the ceramic thin film to make ohmic contact.
第ïŒå³ã¯ãã®å®æœäŸã§ã®åäœã瀺ãã FIG. 2 shows the operation of this embodiment.
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ãã In this drawing, the horizontal axis indicates distance corresponding to FIG. 1, and the vertical axis indicates energy level (potential).
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ãŠã¯ïŒïŒãšããŠèŠ³å¯ãããã In FIG. 2A, a voltage is applied to the second superconducting ceramic, ie the other end 5 of the output. Then you will get a potential of 30. As a result, the electron is 2
0 and 20' exist in quantum theoretical wave nature, but since 20 is sufficiently larger, it is observed as 22 as a current.
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å°å ãããŠããªãã In FIG. 2A, no voltage is applied to the control electrode.
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ã¯æŒãããããã In FIG. 2B, a negative voltage is applied to the control electrode. The potential 21 of the first superconducting ceramic, region 4, then moves from 24 in FIG. 2A to 24' in FIG. 2B. As a result, 20' becomes even smaller in relation to the formed barrier, and 20'
0 is extremely small because it is a barrier. Thus, when a voltage 30 is applied between the pair of output electrodes to cause a current 22' to flow from the region 3 of the second superconducting ceramic to the other region 5 of the second superconducting ceramic, the current is substantially It becomes difficult to flow and its value is suppressed.
çµæãšããŠãå¶åŸ¡çšé»æ¥µã«è² ã®é»å§ãå°å ãã
ããšé»æµïŒïŒâ²ã¯å°ãããªãã As a result, current 22' becomes smaller when a negative voltage is applied to the control electrode.
ãŸã第ïŒå³ïŒ£ã¯å¶åŸ¡çšé»æ¥µã«æ£ã®é»å§ïŒïŒâ²ã
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ããã«è¿ãé»æµïŒïŒâ³ãæµããã Further, FIG. 2C shows the case where a positive voltage 21' is applied to the control electrode. The electron fiber probability 20' increases, and conversely 20 decreases. However, this well in region 4 is filled with electrons, and the barrier at 24'' virtually disappears after moving to the apparent potential at 25.As a result, a current 22'' equal to or close to that of Figure 2A flows. .
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ããŠæ€åºã§ãããå³ã¡ã€ã³ããŒã¿ãäœãåŸãã In this way, the output current can be detected based on the potential of the input signal. At this time, if the resistance of the film under the control electrode is sufficient and the output signal can be extracted larger than the energy structure for supplying the input signal, then the width has been increased, and it is a 4-terminal element and can be used as an amplifier. obtain. If you want to detect this output as a voltage, connect a resistor in series with the output as shown in Figure 2A.
If it is added as shown in the figure, the current can be detected as a voltage. In other words, an inverter can be made.
第ïŒå³ã¯ã第ïŒå³ã«é¢é£ããŠæ¢ã«èª¬æãããã
æ¬çºæãå®æœããããã«äœããã第ïŒã®è¶
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é»å°ã»ã©ããã¯ã¹
ïŒïŒïŒã®å®éã®ããŒã¿ã瀺ãã Although FIG. 3 has already been explained in connection with FIG.
Actual data of the first superconducting ceramic 4 and the second superconducting ceramics 3, 5 made to carry out the present invention are shown.
å³é¢ã«ãããŠã暪軞ã¯çµ¶å¯Ÿæž©åºŠ(K)ãããŸã瞊軞
ã¯åºææµæã瀺ãããã®ããŒã¿ã§ã¯4.2KãŸã§æž¬
å®ããŠããããããããã®å³é¢ã«ãããŠæãããª
åŠãã第ïŒã®è¶
é»å°æ§ã»ã©ããã¯ã¹ïŒã§ã¯è¶
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ããããTcãªã³ã»ããããäœã枩床ã§ã¯æ¯æµæ
ã挞æžããæµæãé¶ãšãªã枩床Tco以äžã§ã¯æµæ
ãé¶ã«ãªãããã®Tcãªã³ã»ããããã³Tcoãšã®
éã®10ïŒ
ããã³90ïŒ
ãããã§ã¯Tc10ïŒTc90ãšã
ãŠç€ºããŠãããæ¬çºæã®è¶
é»å°çŽ åã¯ãTcãªã³
ã»ãããšTcoãšã®éã§ããã°ããããåäœããã
å®å®åãããããTc10ïŒTc90ãçšããããšã奜
ãŸããããŸããã®åäœã¹ããŒããéãããããã
ãã«ã¯ãTcoãTc10ã®éã®ç¹æ§ãçšãããšå¥œãŸã
ãã In the drawings, the horizontal axis represents absolute temperature (K), and the vertical axis represents specific resistance. This data measures up to 4.2K. However, as is clear from this drawing, in the first superconducting ceramic 4, the specific resistance gradually decreases at a temperature lower than the Tc onset at which superconductivity occurs, and the resistance becomes zero below the temperature Tco at which the resistance becomes zero. The 10% and 90% between this Tc onset and Tco are shown here as Tc 10 and Tc 90 . The superconducting element of the present invention may have any value between Tc onset and Tco, but it is preferable to use Tc 10 and Tc 90 in order to further stabilize the operation. Further, in order to increase the operating speed, it is preferable to use a characteristic between Tco and Tc 10 .
ããã«ç¬¬ïŒã®è¶
é»å°ã»ã©ããã¯ã¹ïŒïŒïŒãåæ§
ã«Tcãªã³ã»ããïŒïŒãTcoâ²ïŒïŒãæ§æããŠããã Further, the second superconducting ceramics 3 and 5 similarly constitute the Tc onset 27 and Tco'28.
第ïŒå³ã«ãããŠãTcoïŒïŒã¯ææã«æ·»å ããã
äžçŽç©ã®çš®é¡ãéãå¶åŸ¡ããããšã«ããå¯å€ãã
åŸãã In FIG. 3, Tco26 can be varied by controlling the type and amount of impurities added to the material.
ãã®ããŒã¿ã¯é«æž©åŽããäœæž©åŽã«ããŸãäœæž©åŽ
ããé«æž©åŽã«æž©åºŠãæ¿ããŠãšã€ãŠãåçŸæ§ãæã
ãŠãããå®æœäŸïŒã®å®éšã¯æ¶²äœçªçŽ 枩床ïŒïŒã§å®
éšãããã®ã§ããã This data was highly reproducible when changing the temperature from a high temperature side to a low temperature side, and from a low temperature side to a high temperature side. The experiment of Example 1 was conducted at a liquid nitrogen temperature of 30°C.
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åãïŒç«¯åçŽ åãšããããšã«ããããã®å¶åŸ¡çšé»
極äžã«ããã®é»æ¥µã«ããããã³ã·ã€ã«ã®å€åãã
Tcãªã³ã»ãããšTcoãšã®äžéã®ç¶æ
ãåºã枩床
ç¯å²ã§æãã第ïŒã®è¶
é»å°æ§ã»ã©ããã¯ã¹ãèš
ããããã«ãã®é»æ¥µã»ãªãŒããæ§æãããããã
ããã枩床é åã§ã¯æµæãé¶ãŸãã¯é¶ã«ååè¿ã
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ã€ãã"Effects" The present invention consists in changing the superconducting element, which has hitherto been a two-terminal element, to a four-terminal element. Under this control electrode, the potential changes with this electrode.
In order to provide a first superconducting ceramic that has a state intermediate between Tc onset and Tco over a wide temperature range, and to configure its electrodes and leads,
In such a temperature range, the interconnection is made of a second superconducting ceramic whose resistance is zero or sufficiently close to zero. In this way, it has become possible to amplify and control the output current according to the voltage of the control electrode.
ãã®ããããã®è¶
é»å°åºäœçŽ åãåäžåºæ¿ã«å€
æ°åèšããéç©åãããããšãå¯èœãšãªã€ãã Therefore, it has become possible to provide a large number of these superconducting solid-state devices on the same substrate and integrate them.
æ¬çºæã«ãããŠã¯å¶åŸ¡çšé»æ¥µãïŒã±ã瀺ãã
ãããããïŒã±ãŸãã¯ãã以äžãçŽåãŸãã¯äžŠå
ã«èšããŠãããã Although one control electrode is shown in the present invention, two or more control electrodes may be provided in series or in parallel.
æ¬çºæã«ãããŠãè¶
é»å°ææãšããŠã»ã©ããã¯
ææãçšããããããæ¬çºæã®æè¡ææ³ããæã
ããªåŠããTcãšTcoãšã®éã®æž©åºŠç¯å²ãåºãæ
æ奜ãŸããã¯10ã以äžããææã§ããã°ãé
žåç©
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èŠã¯ãªããä»»æã«éžã¶ããš
ãã§ããããšã¯ãããŸã§ããªãã In the present invention, a ceramic material was used as the superconducting material. However, as is clear from the technical concept of the present invention, any material having a wide temperature range between Tc and Tco, preferably 10ã or more, does not need to be an oxide ceramic and can be selected arbitrarily. Needless to say.
æ¬çºæã«ãããŠãè¶
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ãŠãããŸãåçµæ¶ã§ãã€ãŠãããããšã¯ãæ¬çºæ
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é»å°ææãçšããã«éããåºæ¿
äžã«ãšãã¿ãã·ã¢ã«æé·ãããã°ããã In the present invention, the title superconducting ceramics is used. However, this is due to the fact that the superconducting material is an oxide. It is clear from the technical concept of the present invention that the crystal structure may be polycrystalline or single crystalline. In particular, in the case of a single crystal structure, when using a superconducting material, it is sufficient to epitaxially grow it on the substrate.
第ïŒå³ã¯æ¬çºæã®è¶
é»å°åºäœçŽ åã®çžŠæé¢å³ã
瀺ãã第ïŒå³ã¯æ¬çºæã®è¶
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çã瀺ãã第ïŒå³ã¯æ¬çºæã«çšããè¶
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æããã»ã©ããã¯ã¹ã®æž©åºŠç¹æ§äŸã瀺ãã
FIG. 1 shows a longitudinal cross-sectional view of a superconducting solid-state device of the present invention. FIG. 2 shows the operating principle of the superconducting solid state device of the present invention. FIG. 3 shows an example of the temperature characteristics of ceramics having superconducting properties used in the present invention.
Claims (1)
å°ææã圢æããå·¥çšãšã è©²é žåç©è¶ é»å°ææã®äžéšé åã«éžæçã«äžçŽ
ç©ãæ·»å ããŠåèšé žåç©è¶ é»å°ææããäœãTcp
ãæããããå·¥çšãšã åèšäžéšé åäžã«å¶åŸ¡çšé»æ¥µã圢æããå·¥çšãš
ãæãã åèšäžçŽç©ã¯åèšé žåç©è¶ é»å°ææã®æ§æå çŽ
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ãŒã ïŒGeïŒãããŠçŽ (B)ãã¢ã«ãããŠãŒã ïŒAlïŒã
ã¬ãªãŠãŒã ïŒGaïŒããªã³(P)ãç çŽ ïŒAsïŒããéž
ã°ããå çŽ ã§ããã åèšé žåç©è¶ é»å°ææã®æ§æå çŽ ããéžã°ãã
äžçŽç©ã¯ããã®æ·»å æ¿åºŠãïŒÃ1019ãïŒÃ1021cm
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çŽ (B)ãã¢ã«ãããŠãŒã ïŒAlïŒãã¬ãªãŠãŒã ïŒGaïŒã
ãªã³(P)ãç çŽ ïŒAsïŒããéžã°ããäžçŽç©ã¯ãã
ã®æ·»å æ¿åºŠãïŒÃ1015ãïŒÃ1020cm-3ã§ããããš
ãç¹åŸŽãšããè¶ é»å°çŽ åã®äœè£œæ¹æ³ã ïŒ ç¹èš±è«æ±ã®ç¯å²ç¬¬ïŒé ã«ãããŠãå¶åŸ¡çšé»æ¥µ
ã¯é žåç©è¶ é»å°ææãèŠã€ãŠé žåç©è¶ é»å°ææã
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æ³ã ïŒ éè¶ é»å°æ§è¡šé¢ãæããåºäœäžã«å¶åŸ¡çšé»æ¥µ
ã圢æããå·¥çšãšã åèšåºäœäžããã³åèšé»æ¥µäžã«é žåç©è¶ é»å°æ
æã圢æããå·¥çšãšãåèšå¶åŸ¡çšé»æ¥µäžã®é žåç©
è¶ é»å°ææã«äžçŽç©ãæ·»å ããåèšé žåç©è¶ é»å°
ææããäœãTcoãæããããå·¥çšãšãæãã åèšäžçŽç©ã¯åèšé žåç©è¶ é»å°ææã®æ§æå çŽ
ããéžã°ããå çŽ ããŸãã¯éïŒFeïŒãããã±ã«
ïŒNiïŒãã³ãã«ãïŒCoïŒãçªçŽ ïŒSiïŒãã²ã«ãããŠ
ãŒã ïŒGeïŒãããŠçŽ (B)ãã¢ã«ãããŠãŒã ïŒAlïŒã
ã¬ãªãŠãŒã ïŒGaïŒããªã³(P)ãç çŽ ïŒAsïŒããéž
ã°ããå çŽ ãããªãã åèšé žåç©è¶ é»å°ææã®æ§æå çŽ ããéžã°ãã
äžçŽç©ã¯ããã®æ·»å æ¿åºŠãïŒÃ1019ãïŒÃ1021cm
ã§ããã åèšéïŒFeïŒãããã±ã«ïŒNiïŒãã³ãã«ã
ïŒCoïŒãçªçŽ ïŒSiïŒãã²ã«ãããŠãŒã ïŒGeïŒãããŠ
çŽ (B)ãã¢ã«ãããŠãŒã ïŒAlïŒãã¬ãªãŠãŒã ïŒGaïŒã
ãªã³(P)ãç çŽ ïŒAsïŒããéžã°ããäžçŽç©ã¯ãã
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ãç¹åŸŽãšããè¶ é»å°çŽ åã®äœè£œæ¹æ³ã ïŒ ç¹èš±è«æ±ã®ç¯å²ç¬¬ïŒé ã«ãããŠãé žåç©è¶ é»
å°ææã¯å¶åŸ¡çšé»æ¥µäžã«é žåç©è¶ é»å°ææããã
ååæµæã®å€§ãã被èã圢æããåŸã«åœ¢æããã
ãšãç¹åŸŽãšããè¶ é»å°çŽ åã®äœè£œæ¹æ³ã[Claims] 1. A step of forming an oxide superconducting material on a substrate having a non-superconducting surface, and selectively adding an impurity to a partial region of the oxide superconducting material to make the oxide superconducting material thinner. Low T cp
and a step of forming a control electrode on the partial region, and the impurity is an element selected from the constituent elements of the oxide superconducting material, iron (Fe), nickel (Ni), etc. ), cobalt (Co), silicon (Si), germanium (Ge), boron (B), aluminum (Al),
The impurity is an element selected from gallium (Ga), phosphorus (P), and arsenic (As), and the impurity selected from the constituent elements of the oxide superconducting material has an additive concentration of 5Ã10 19 to 5Ã10 21 cm
-3 , and the above-mentioned iron (Fe), nickel (Ni), cobalt (Co), silicon (Si), germanium (Ge), boron (B), aluminum (Al), gallium (Ga),
A method for producing a superconducting element, wherein the impurity selected from phosphorus (P) and arsenic (As) has an additive concentration of 5 x 1015 to 5 x 1020 cm -3 . 2. A method for producing a superconducting element according to claim 1, characterized in that the control electrode is formed after forming a film covering the oxide superconducting material and having a sufficiently higher electrical resistance than the oxide superconducting material. 3. Forming a control electrode on a substrate having a non-superconducting surface; Forming an oxide superconducting material on the substrate and the electrode; and adding impurities to the oxide superconducting material on the control electrode. the impurity is an element selected from the constituent elements of the oxide superconducting material, or iron (Fe), nickel (Ni), cobalt ( Co), silicon (Si), germanium (Ge), boron (B), aluminum (Al),
The impurity is made of an element selected from gallium (Ga), phosphorus (P), and arsenic (As), and the impurity selected from the constituent elements of the oxide superconducting material has an additive concentration of 5Ã10 19 to 5Ã10 21 cm
The above iron (Fe), nickel (Ni), cobalt (Co), silicon (Si), germanium (Ge), boron (B), aluminum (Al), gallium (Ga),
A method for producing a superconducting element, wherein the impurity selected from phosphorus (P) and arsenic (As) has an additive concentration of 5 x 1015 to 5 x 1020 cm -3 . 4. A method for manufacturing a superconducting element according to claim 3, characterized in that the oxide superconducting material is formed after forming a film having a sufficiently higher resistance than the oxide superconducting material on the control electrode.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62095855A JPS63261768A (en) | 1987-04-18 | 1987-04-18 | Manufacture of superconducting element |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62095855A JPS63261768A (en) | 1987-04-18 | 1987-04-18 | Manufacture of superconducting element |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS63261768A JPS63261768A (en) | 1988-10-28 |
JPH0577316B2 true JPH0577316B2 (en) | 1993-10-26 |
Family
ID=14148982
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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JP62095855A Granted JPS63261768A (en) | 1987-04-18 | 1987-04-18 | Manufacture of superconducting element |
Country Status (1)
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JP (1) | JPS63261768A (en) |
Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS564290A (en) * | 1979-06-25 | 1981-01-17 | Nippon Telegr & Teleph Corp <Ntt> | Superconductive element |
JPS5873172A (en) * | 1981-10-27 | 1983-05-02 | Nippon Telegr & Teleph Corp <Ntt> | Superconductive integrated circuit device |
JPS60160675A (en) * | 1984-02-01 | 1985-08-22 | Hitachi Ltd | Quasi-particle injection type superconducting element |
JPS60223175A (en) * | 1984-04-19 | 1985-11-07 | Hitachi Ltd | Superconductive switching device |
JPS61206279A (en) * | 1985-03-11 | 1986-09-12 | Hitachi Ltd | Superconductive element |
JPS62238674A (en) * | 1986-04-09 | 1987-10-19 | Rikagaku Kenkyusho | Manufacture of superconductor |
-
1987
- 1987-04-18 JP JP62095855A patent/JPS63261768A/en active Granted
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS564290A (en) * | 1979-06-25 | 1981-01-17 | Nippon Telegr & Teleph Corp <Ntt> | Superconductive element |
JPS5873172A (en) * | 1981-10-27 | 1983-05-02 | Nippon Telegr & Teleph Corp <Ntt> | Superconductive integrated circuit device |
JPS60160675A (en) * | 1984-02-01 | 1985-08-22 | Hitachi Ltd | Quasi-particle injection type superconducting element |
JPS60223175A (en) * | 1984-04-19 | 1985-11-07 | Hitachi Ltd | Superconductive switching device |
JPS61206279A (en) * | 1985-03-11 | 1986-09-12 | Hitachi Ltd | Superconductive element |
JPS62238674A (en) * | 1986-04-09 | 1987-10-19 | Rikagaku Kenkyusho | Manufacture of superconductor |
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