JPH0576186B2 - - Google Patents

Info

Publication number
JPH0576186B2
JPH0576186B2 JP57084763A JP8476382A JPH0576186B2 JP H0576186 B2 JPH0576186 B2 JP H0576186B2 JP 57084763 A JP57084763 A JP 57084763A JP 8476382 A JP8476382 A JP 8476382A JP H0576186 B2 JPH0576186 B2 JP H0576186B2
Authority
JP
Japan
Prior art keywords
film
opening
forming
insulating film
impurity region
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP57084763A
Other languages
English (en)
Japanese (ja)
Other versions
JPS58202550A (ja
Inventor
Hideo Sunami
Tokuo Kure
Yoshifumi Kawamoto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP8476382A priority Critical patent/JPS58202550A/ja
Publication of JPS58202550A publication Critical patent/JPS58202550A/ja
Publication of JPH0576186B2 publication Critical patent/JPH0576186B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
JP8476382A 1982-05-21 1982-05-21 半導体装置の製造方法 Granted JPS58202550A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8476382A JPS58202550A (ja) 1982-05-21 1982-05-21 半導体装置の製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8476382A JPS58202550A (ja) 1982-05-21 1982-05-21 半導体装置の製造方法

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP12670990A Division JPH0316124A (ja) 1990-05-18 1990-05-18 半導体装置

Publications (2)

Publication Number Publication Date
JPS58202550A JPS58202550A (ja) 1983-11-25
JPH0576186B2 true JPH0576186B2 (enExample) 1993-10-22

Family

ID=13839715

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8476382A Granted JPS58202550A (ja) 1982-05-21 1982-05-21 半導体装置の製造方法

Country Status (1)

Country Link
JP (1) JPS58202550A (enExample)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5270256A (en) * 1991-11-27 1993-12-14 Intel Corporation Method of forming a guard wall to reduce delamination effects

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52129279A (en) * 1976-04-22 1977-10-29 Fujitsu Ltd Production of semiconductor device

Also Published As

Publication number Publication date
JPS58202550A (ja) 1983-11-25

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