JPH0572579B2 - - Google Patents
Info
- Publication number
- JPH0572579B2 JPH0572579B2 JP15264583A JP15264583A JPH0572579B2 JP H0572579 B2 JPH0572579 B2 JP H0572579B2 JP 15264583 A JP15264583 A JP 15264583A JP 15264583 A JP15264583 A JP 15264583A JP H0572579 B2 JPH0572579 B2 JP H0572579B2
- Authority
- JP
- Japan
- Prior art keywords
- blank mask
- resist
- mask
- frame
- cooling
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000001816 cooling Methods 0.000 claims description 18
- 238000000034 method Methods 0.000 claims description 13
- 239000000463 material Substances 0.000 claims description 6
- 239000002245 particle Substances 0.000 claims 1
- 239000010408 film Substances 0.000 description 19
- 230000035945 sensitivity Effects 0.000 description 10
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- 238000007796 conventional method Methods 0.000 description 4
- 230000000694 effects Effects 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- 101100269850 Caenorhabditis elegans mask-1 gene Proteins 0.000 description 2
- 238000011161 development Methods 0.000 description 2
- 238000010894 electron beam technology Methods 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- 238000011282 treatment Methods 0.000 description 2
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 1
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 1
- 230000001133 acceleration Effects 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 230000002596 correlated effect Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000010884 ion-beam technique Methods 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 1
- 239000004926 polymethyl methacrylate Substances 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 239000012487 rinsing solution Substances 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/16—Coating processes; Apparatus therefor
- G03F7/168—Finishing the coated layer, e.g. drying, baking, soaking
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58152645A JPS6043655A (ja) | 1983-08-22 | 1983-08-22 | レジストパタ−ンの形成方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58152645A JPS6043655A (ja) | 1983-08-22 | 1983-08-22 | レジストパタ−ンの形成方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6043655A JPS6043655A (ja) | 1985-03-08 |
| JPH0572579B2 true JPH0572579B2 (US06272168-20010807-M00014.png) | 1993-10-12 |
Family
ID=15544934
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP58152645A Granted JPS6043655A (ja) | 1983-08-22 | 1983-08-22 | レジストパタ−ンの形成方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6043655A (US06272168-20010807-M00014.png) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3368200B2 (ja) | 1998-02-26 | 2003-01-20 | シャープ株式会社 | フォトマスク作成方法および熱処理装置 |
| JP5172092B2 (ja) * | 2005-12-16 | 2013-03-27 | 大日本印刷株式会社 | フォトマスクの製造方法 |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5863134A (ja) * | 1981-10-12 | 1983-04-14 | Hitachi Ltd | レジスト硬化方法及びその装置 |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5552677Y2 (US06272168-20010807-M00014.png) * | 1977-11-15 | 1980-12-06 |
-
1983
- 1983-08-22 JP JP58152645A patent/JPS6043655A/ja active Granted
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5863134A (ja) * | 1981-10-12 | 1983-04-14 | Hitachi Ltd | レジスト硬化方法及びその装置 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6043655A (ja) | 1985-03-08 |
