JPH0571294B2 - - Google Patents

Info

Publication number
JPH0571294B2
JPH0571294B2 JP10024586A JP10024586A JPH0571294B2 JP H0571294 B2 JPH0571294 B2 JP H0571294B2 JP 10024586 A JP10024586 A JP 10024586A JP 10024586 A JP10024586 A JP 10024586A JP H0571294 B2 JPH0571294 B2 JP H0571294B2
Authority
JP
Japan
Prior art keywords
cylindrical resonator
plasma
rectangular waveguide
substrate
base material
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP10024586A
Other languages
English (en)
Japanese (ja)
Other versions
JPS62254834A (ja
Inventor
Kohei Ootake
Fumio Takamura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Japan Radio Co Ltd
Original Assignee
Japan Radio Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Japan Radio Co Ltd filed Critical Japan Radio Co Ltd
Priority to JP61100245A priority Critical patent/JPS62254834A/ja
Publication of JPS62254834A publication Critical patent/JPS62254834A/ja
Publication of JPH0571294B2 publication Critical patent/JPH0571294B2/ja
Granted legal-status Critical Current

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J19/00Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J19/08Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
    • B01J19/087Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy

Landscapes

  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • General Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Drying Of Semiconductors (AREA)
  • Control Of Motors That Do Not Use Commutators (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
JP61100245A 1986-04-30 1986-04-30 プラズマ装置 Granted JPS62254834A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP61100245A JPS62254834A (ja) 1986-04-30 1986-04-30 プラズマ装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP61100245A JPS62254834A (ja) 1986-04-30 1986-04-30 プラズマ装置

Publications (2)

Publication Number Publication Date
JPS62254834A JPS62254834A (ja) 1987-11-06
JPH0571294B2 true JPH0571294B2 (enrdf_load_stackoverflow) 1993-10-06

Family

ID=14268857

Family Applications (1)

Application Number Title Priority Date Filing Date
JP61100245A Granted JPS62254834A (ja) 1986-04-30 1986-04-30 プラズマ装置

Country Status (1)

Country Link
JP (1) JPS62254834A (enrdf_load_stackoverflow)

Also Published As

Publication number Publication date
JPS62254834A (ja) 1987-11-06

Similar Documents

Publication Publication Date Title
JPH05190103A (ja) マイクロ波エネルギーを結合するための装置
KR970071945A (ko) 플라즈마처리방법 및 장치
JPH10512391A (ja) プラズマ誘導マイクロ波エネルギーによってプラズマを発生するための装置
JP2000012292A (ja) プラズマ処理装置
WO1988008659A1 (en) Method and apparatus for processing with plasma
KR100638716B1 (ko) 플라즈마 처리장치 및 플라즈마 처리방법
JP3056772B2 (ja) プラズマの制御方法ならびにプラズマ処理方法およびその装置
US4992763A (en) Microwave resonator for operation in the whispering-gallery mode
KR0174070B1 (ko) 마이크로파 플라즈마 처리 장치 및 방법
JPH01184923A (ja) プラズマ処理装置及びプラズマ処理方法
JP2552140B2 (ja) プラズマ発生反応装置
JPH1167492A (ja) プラズマ処理装置及びプラズマ処理方法
JPH0571294B2 (enrdf_load_stackoverflow)
JPH0544798B2 (enrdf_load_stackoverflow)
JP3957374B2 (ja) マイクロ波プラズマ処理装置
JP3491190B2 (ja) プラズマ処理装置
JPH0623569Y2 (ja) プラズマ発生反応装置
JP2000277296A (ja) プラズマ処理装置およびプラズマ処理方法
JP2779997B2 (ja) プラズマ処理装置
JPH064898Y2 (ja) プラズマ装置
JPH07263186A (ja) プラズマ処理装置
JPH02107778A (ja) 偏波制御マイクロ波プラズマ処理装置
JPH079359Y2 (ja) プラズマ装置
JP2727748B2 (ja) マイクロ波プラズマ発生装置
JPH11204295A (ja) マイクロ波プラズマ処理装置