JPS62254834A - プラズマ装置 - Google Patents
プラズマ装置Info
- Publication number
- JPS62254834A JPS62254834A JP61100245A JP10024586A JPS62254834A JP S62254834 A JPS62254834 A JP S62254834A JP 61100245 A JP61100245 A JP 61100245A JP 10024586 A JP10024586 A JP 10024586A JP S62254834 A JPS62254834 A JP S62254834A
- Authority
- JP
- Japan
- Prior art keywords
- cylindrical resonator
- plasma
- resonator
- cylindrical
- tubular wall
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000005684 electric field Effects 0.000 claims abstract description 8
- 230000005540 biological transmission Effects 0.000 claims abstract description 5
- 239000000463 material Substances 0.000 claims description 15
- 239000010409 thin film Substances 0.000 claims description 10
- 239000013078 crystal Substances 0.000 claims description 5
- 230000005672 electromagnetic field Effects 0.000 claims 1
- 230000005389 magnetism Effects 0.000 abstract 1
- 239000000758 substrate Substances 0.000 description 14
- 230000008878 coupling Effects 0.000 description 13
- 238000010168 coupling process Methods 0.000 description 13
- 238000005859 coupling reaction Methods 0.000 description 13
- 239000007789 gas Substances 0.000 description 7
- 238000010586 diagram Methods 0.000 description 6
- 230000015572 biosynthetic process Effects 0.000 description 5
- 238000000605 extraction Methods 0.000 description 5
- 238000003780 insertion Methods 0.000 description 4
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 4
- 239000010453 quartz Substances 0.000 description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- 239000006096 absorbing agent Substances 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 230000037431 insertion Effects 0.000 description 3
- 230000002093 peripheral effect Effects 0.000 description 3
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 230000008021 deposition Effects 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 229910052739 hydrogen Inorganic materials 0.000 description 2
- 239000001257 hydrogen Substances 0.000 description 2
- 238000002347 injection Methods 0.000 description 2
- 239000007924 injection Substances 0.000 description 2
- 230000001902 propagating effect Effects 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 230000002238 attenuated effect Effects 0.000 description 1
- 230000004323 axial length Effects 0.000 description 1
- 239000010953 base metal Substances 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 239000010408 film Substances 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J19/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
- B01J19/087—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy
Landscapes
- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- General Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Drying Of Semiconductors (AREA)
- Control Of Motors That Do Not Use Commutators (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61100245A JPS62254834A (ja) | 1986-04-30 | 1986-04-30 | プラズマ装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61100245A JPS62254834A (ja) | 1986-04-30 | 1986-04-30 | プラズマ装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS62254834A true JPS62254834A (ja) | 1987-11-06 |
| JPH0571294B2 JPH0571294B2 (enrdf_load_stackoverflow) | 1993-10-06 |
Family
ID=14268857
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP61100245A Granted JPS62254834A (ja) | 1986-04-30 | 1986-04-30 | プラズマ装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS62254834A (enrdf_load_stackoverflow) |
-
1986
- 1986-04-30 JP JP61100245A patent/JPS62254834A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0571294B2 (enrdf_load_stackoverflow) | 1993-10-06 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP4759668B2 (ja) | マイクロ波加熱装置 | |
| EP1397939B1 (en) | Microwave heating applicator for heating a moving fluid | |
| JPH05190103A (ja) | マイクロ波エネルギーを結合するための装置 | |
| TWI548311B (zh) | Surface wave plasma generation antenna and surface wave plasma processing device | |
| JP2000012292A (ja) | プラズマ処理装置 | |
| CN114189973A (zh) | 一种具有双微波谐振腔的微波等离子体炬装置及其使用方法 | |
| JP4837854B2 (ja) | 整合器およびプラズマ処理装置 | |
| KR100638716B1 (ko) | 플라즈마 처리장치 및 플라즈마 처리방법 | |
| JPH10512391A (ja) | プラズマ誘導マイクロ波エネルギーによってプラズマを発生するための装置 | |
| JP3957135B2 (ja) | プラズマ処理装置 | |
| US4992763A (en) | Microwave resonator for operation in the whispering-gallery mode | |
| JP2004363074A (ja) | 円偏波マイクロ波を用いた非回転無電極放電ランプシステム | |
| JP4678905B2 (ja) | プラズマ処理装置 | |
| KR100311433B1 (ko) | 마이크로파 플라즈마 처리장치 및 마이크로파 플라즈마 처리방법 | |
| JPH1167492A (ja) | プラズマ処理装置及びプラズマ処理方法 | |
| JP2552140B2 (ja) | プラズマ発生反応装置 | |
| JPS62254834A (ja) | プラズマ装置 | |
| Tulle | Off-resonance microwave-created plasmas | |
| JP2007180034A (ja) | プラズマ処理装置 | |
| JP3957374B2 (ja) | マイクロ波プラズマ処理装置 | |
| JP3491190B2 (ja) | プラズマ処理装置 | |
| JP2000277296A (ja) | プラズマ処理装置およびプラズマ処理方法 | |
| JPH1012594A (ja) | スロットアンテナを有するプラズマ処理装置 | |
| JPH02107778A (ja) | 偏波制御マイクロ波プラズマ処理装置 | |
| JPH07263186A (ja) | プラズマ処理装置 |