JPH0567050B2 - - Google Patents

Info

Publication number
JPH0567050B2
JPH0567050B2 JP61308704A JP30870486A JPH0567050B2 JP H0567050 B2 JPH0567050 B2 JP H0567050B2 JP 61308704 A JP61308704 A JP 61308704A JP 30870486 A JP30870486 A JP 30870486A JP H0567050 B2 JPH0567050 B2 JP H0567050B2
Authority
JP
Japan
Prior art keywords
alignment marks
alignment
alignment mark
marks
patterns
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP61308704A
Other languages
English (en)
Japanese (ja)
Other versions
JPS63164316A (ja
Inventor
Hiroyuki Funatsu
Myoshi Aizawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Oki Electric Industry Co Ltd
Original Assignee
Oki Electric Industry Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Oki Electric Industry Co Ltd filed Critical Oki Electric Industry Co Ltd
Priority to JP61308704A priority Critical patent/JPS63164316A/ja
Publication of JPS63164316A publication Critical patent/JPS63164316A/ja
Publication of JPH0567050B2 publication Critical patent/JPH0567050B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP61308704A 1986-12-26 1986-12-26 アライメントマ−クの形成方法 Granted JPS63164316A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP61308704A JPS63164316A (ja) 1986-12-26 1986-12-26 アライメントマ−クの形成方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP61308704A JPS63164316A (ja) 1986-12-26 1986-12-26 アライメントマ−クの形成方法

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP21085494A Division JP2614418B2 (ja) 1994-09-05 1994-09-05 アライメントマーク

Publications (2)

Publication Number Publication Date
JPS63164316A JPS63164316A (ja) 1988-07-07
JPH0567050B2 true JPH0567050B2 (enExample) 1993-09-24

Family

ID=17984275

Family Applications (1)

Application Number Title Priority Date Filing Date
JP61308704A Granted JPS63164316A (ja) 1986-12-26 1986-12-26 アライメントマ−クの形成方法

Country Status (1)

Country Link
JP (1) JPS63164316A (enExample)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL1036476A1 (nl) * 2008-02-01 2009-08-04 Asml Netherlands Bv Alignment mark and a method of aligning a substrate comprising such an alignment mark.
JP5006889B2 (ja) 2008-02-21 2012-08-22 エーエスエムエル ネザーランズ ビー．ブイ． 粗ウェーハ位置合わせ用マーク構造及びこのようなマーク構造の製造方法

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5617017A (en) * 1979-07-20 1981-02-18 Nippon Kogaku Kk <Nikon> Positioning device using bidirectional diffraction grating

Also Published As

Publication number Publication date
JPS63164316A (ja) 1988-07-07

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Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term