JPH0564455B2 - - Google Patents

Info

Publication number
JPH0564455B2
JPH0564455B2 JP58204816A JP20481683A JPH0564455B2 JP H0564455 B2 JPH0564455 B2 JP H0564455B2 JP 58204816 A JP58204816 A JP 58204816A JP 20481683 A JP20481683 A JP 20481683A JP H0564455 B2 JPH0564455 B2 JP H0564455B2
Authority
JP
Japan
Prior art keywords
end point
intensity
detection
detected
change
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP58204816A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6098631A (ja
Inventor
Tetsujiro Kotani
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP20481683A priority Critical patent/JPS6098631A/ja
Publication of JPS6098631A publication Critical patent/JPS6098631A/ja
Publication of JPH0564455B2 publication Critical patent/JPH0564455B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Drying Of Semiconductors (AREA)
JP20481683A 1983-11-02 1983-11-02 終点検出装置 Granted JPS6098631A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP20481683A JPS6098631A (ja) 1983-11-02 1983-11-02 終点検出装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP20481683A JPS6098631A (ja) 1983-11-02 1983-11-02 終点検出装置

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP5284596A Division JP2790111B2 (ja) 1996-03-11 1996-03-11 プラズマ処理方法

Publications (2)

Publication Number Publication Date
JPS6098631A JPS6098631A (ja) 1985-06-01
JPH0564455B2 true JPH0564455B2 (enExample) 1993-09-14

Family

ID=16496850

Family Applications (1)

Application Number Title Priority Date Filing Date
JP20481683A Granted JPS6098631A (ja) 1983-11-02 1983-11-02 終点検出装置

Country Status (1)

Country Link
JP (1) JPS6098631A (enExample)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0628252B2 (ja) * 1987-03-27 1994-04-13 株式会社日立製作所 プラズマ処理終点判定方法及び装置
JP2619403B2 (ja) * 1987-08-19 1997-06-11 株式会社日立製作所 プラズマ処理装置およびプラズマ処理終点判定方法
JP2001007084A (ja) 1999-06-21 2001-01-12 Nec Corp エッチング終点判定方法

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4208240A (en) * 1979-01-26 1980-06-17 Gould Inc. Method and apparatus for controlling plasma etching
JPS56114329A (en) * 1980-02-15 1981-09-08 Chiyou Lsi Gijutsu Kenkyu Kumiai Method for sensing time of completion of dry etching

Also Published As

Publication number Publication date
JPS6098631A (ja) 1985-06-01

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