JPH0564452B2 - - Google Patents
Info
- Publication number
- JPH0564452B2 JPH0564452B2 JP59204160A JP20416084A JPH0564452B2 JP H0564452 B2 JPH0564452 B2 JP H0564452B2 JP 59204160 A JP59204160 A JP 59204160A JP 20416084 A JP20416084 A JP 20416084A JP H0564452 B2 JPH0564452 B2 JP H0564452B2
- Authority
- JP
- Japan
- Prior art keywords
- mask
- exposed
- ray
- substrate
- wafer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59204160A JPS6184018A (ja) | 1984-10-01 | 1984-10-01 | X線露光装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59204160A JPS6184018A (ja) | 1984-10-01 | 1984-10-01 | X線露光装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6184018A JPS6184018A (ja) | 1986-04-28 |
| JPH0564452B2 true JPH0564452B2 (enrdf_load_stackoverflow) | 1993-09-14 |
Family
ID=16485826
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP59204160A Granted JPS6184018A (ja) | 1984-10-01 | 1984-10-01 | X線露光装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6184018A (enrdf_load_stackoverflow) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2799575B2 (ja) * | 1988-09-30 | 1998-09-17 | キヤノン株式会社 | 露光方法 |
| JP5526714B2 (ja) * | 2009-11-10 | 2014-06-18 | 凸版印刷株式会社 | 基板露光装置 |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS58219735A (ja) * | 1982-06-16 | 1983-12-21 | Hitachi Ltd | ステップアンドリピート方式のプロキシミティ露光装置 |
-
1984
- 1984-10-01 JP JP59204160A patent/JPS6184018A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6184018A (ja) | 1986-04-28 |
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