JPH0562835A - Magneto-optical recording medium and its manufacture - Google Patents

Magneto-optical recording medium and its manufacture

Info

Publication number
JPH0562835A
JPH0562835A JP3219695A JP21969591A JPH0562835A JP H0562835 A JPH0562835 A JP H0562835A JP 3219695 A JP3219695 A JP 3219695A JP 21969591 A JP21969591 A JP 21969591A JP H0562835 A JPH0562835 A JP H0562835A
Authority
JP
Japan
Prior art keywords
film
bismuth
magneto
garnet
recording medium
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP3219695A
Other languages
Japanese (ja)
Inventor
Keiji Shono
敬二 庄野
Sumio Kuroda
純夫 黒田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP3219695A priority Critical patent/JPH0562835A/en
Publication of JPH0562835A publication Critical patent/JPH0562835A/en
Withdrawn legal-status Critical Current

Links

Abstract

PURPOSE:To obtain a magneto-optical recording medium wherein a bismuth- substituted garnet film can be obtained at low costs and easily by using a sputtering method by a method wherein a substratum layer provided with a garnet structure is formed on a glass substrate and a recording layer composed of a bismuth-substituted garnet is formed on the substratum layer. CONSTITUTION:An amorphous layer as a derivative of YIG (yttrium iron garnet Y3Fe502) is formed, by a sputtering method, on a borosilicate glass substrate 1 composed of an alkaline-free metal glass. It is heat-treated at a temperature of 700 deg.C or lower. A substratum layer 2 composed of a crystalline YIG film is formed. A recording film 3 composed of a bismuth-substituted garnet film (Bi2DyGa0.8Fe4.2O12) is formed on the substratum layer 2 by a sputtering method at a substrate temperature of 550 deg.C. Crystals constituting the recording film 3 by a polycrystalline film are constituted of dense column-shaped fine crystals 4, and this structure is completely the same as a film which has been made crystalline during the formaiton operation of a film on a GGG substrate.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は光磁気記録媒体とその製
造方法に係り、特に基板にガラス基板を用い、その上に
スパッタ法によりビスマス置換ガーネット膜を記録膜と
して形成した光磁気記録媒体およびその製造方法に関す
る。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a magneto-optical recording medium and a method for manufacturing the same, and more particularly to a magneto-optical recording medium in which a glass substrate is used as a substrate and a bismuth-substituted garnet film is formed as a recording film thereon by a sputtering method. The manufacturing method is related.

【0002】[0002]

【従来の技術】スパッタ法で形成されたビスマス置換ガ
ーネット膜は、ファラデー回転角が大きく、また保磁
力、角形比の大きい垂直磁気特性を示すために、短波長
レーザ光を用いて高密度に光磁気記録するための高密度
光磁気記録用媒体として最近、注目されている。
2. Description of the Related Art A bismuth-substituted garnet film formed by a sputtering method has a large Faraday rotation angle and a perpendicular magnetic characteristic with a large coercive force and squareness ratio. Recently, it has attracted attention as a high-density magneto-optical recording medium for magnetic recording.

【0003】ところで、このスパッタ法で形成されるビ
スマス置換ガーネット膜のスパッタ用基板として、従来
よりチョクラルスキ法で形成される単結晶のガドリニウ
ム・ガリウム・ガーネット(GGG;Gd3Ga5O12)基板
や、耐熱性の高いガラス基板が用いられてきた。
By the way, as a substrate for sputtering a bismuth-substituted garnet film formed by this sputtering method, a single crystal gadolinium gallium garnet (GGG; Gd 3 Ga 5 O 12 ) substrate conventionally formed by the Czochralski method or A glass substrate having high heat resistance has been used.

【0004】このような単結晶のGGG基板を用いてそ
の上にビスマス置換ガーネット膜を高温で成膜すると、
単結晶と同等な膜が成膜され、このようなビスマス置換
ガーネット膜は媒体ノイズの発生が少なく、良好な記録
再生特性が得られる。然し、この単結晶のGGG基板は
極めて高純度な原料を用いる必要から高価であり、その
ため、形成される光磁気記録媒体の製造コストが大とな
り実用的でない欠点を有する。
When a bismuth-substituted garnet film is formed on such a single crystal GGG substrate at a high temperature,
A film equivalent to a single crystal is formed, and such a bismuth-substituted garnet film produces little medium noise, and good recording / reproducing characteristics can be obtained. However, this single-crystal GGG substrate is expensive because it requires an extremely high-purity raw material, and therefore has a drawback that the manufacturing cost of the magneto-optical recording medium to be formed is large and it is not practical.

【0005】一方、ガラス基板を用いてその上にビスマ
ス置換ガーネット膜を成膜する場合には、このビスマス
置換ガーネット膜の誘導体である非晶質膜をまず形成し
た後、これを熱処理によって結晶化する方法が取られ
る。
On the other hand, when a bismuth-substituted garnet film is formed on a glass substrate, an amorphous film which is a derivative of the bismuth-substituted garnet film is first formed and then crystallized by heat treatment. The way to do is taken.

【0006】然し、この熱処理によって結晶化する場合
は、優勢方位の無い多結晶膜となり、この多結晶膜を構
成する結晶粒が大きく成り、また結晶粒界も顕著に形成
される。このため、これを光磁気記録媒体として用いる
と光散乱が生じ、記録再生すると大きい媒体ノイズが発
生する。
However, in the case of crystallization by this heat treatment, a polycrystalline film having no dominant orientation is formed, the crystal grains constituting this polycrystalline film become large, and the crystal grain boundaries are remarkably formed. Therefore, when this is used as a magneto-optical recording medium, light scattering occurs, and when recording / reproducing, a large medium noise occurs.

【0007】GGG基板を用いた場合のように、成膜中
に結晶化することができると結晶粒界が顕著に形成され
ず、媒体ノイズが小さく成ることが期待されるが、ガラ
ス基板上へ直接ビスマス置換ガーネット膜を成膜中に結
晶化する技術は現在のところ確立されていない。
As in the case of using a GGG substrate, if it is possible to crystallize during film formation, it is expected that crystal grain boundaries will not be significantly formed and medium noise will be reduced. A technique for directly crystallizing a bismuth-substituted garnet film during deposition has not been established so far.

【0008】[0008]

【発明が解決しようとする課題】本発明は上記した問題
点を解決し、安価なガラス基板上に媒体ノイズの小さい
結晶化したビスマス置換ガーネット膜が形成され得るよ
うな光磁気記録媒体およびその製造方法の提供を目的と
する。
SUMMARY OF THE INVENTION The present invention solves the above-mentioned problems, and a magneto-optical recording medium in which a crystallized bismuth-substituted garnet film with low medium noise can be formed on an inexpensive glass substrate, and its manufacture. The purpose is to provide a method.

【0009】[0009]

【課題を解決するための手段】本発明の光磁気記録媒体
は、ガラス基板上にガーネット構造を有する下地層を設
け、該下地層上にビスマス置換ガーネットより成る記録
膜を設けたことを特徴とする。
The magneto-optical recording medium of the present invention is characterized in that an underlayer having a garnet structure is provided on a glass substrate, and a recording film made of bismuth-substituted garnet is provided on the underlayer. To do.

【0010】更に前記ビスマス置換ガーネットより成る
記録膜が、スパッタ法で成膜中に結晶化する高温成膜法
により形成されていることを特徴とする。また前記ビス
マス置換ガーネット膜が、一般式のBix R3-xM YFe5-Y O
12 (O≦X ≦3 、0 ≦Y <2)で表され、R はイットリウ
ム、或いは希土類元素の中より選択した元素の内の少な
くとも1 元素を、また上記Aは鉄元素と置換し得る元素
であることを特徴とする。
Further, the recording film made of the bismuth-substituted garnet is characterized by being formed by a high temperature film forming method in which the film is crystallized during film formation by a sputtering method. Further, the bismuth-substituted garnet film has a general formula of Bi x R 3-x M Y Fe 5-Y O
12 (O ≦ X ≦ 3, 0 ≦ Y <2), R is yttrium or at least one element selected from rare earth elements, and A is an element capable of substituting with iron element. Is characterized in that

【0011】更に前記下地層が、一般式のA x R3-xM Y
Fe5-Y O12 (O≦X <1 、0 ≦Y <5)で表され、A はビス
マス、或いは鉛元素を示し、R はイットリウム、或いは
希土類元素の中より選択した元素の内の少なくとも1 元
素を、また上記Mは鉄元素と置換し得る元素であること
を特徴とする。
Further, the underlayer has a general formula of A x R 3-x M Y
Fe 5-Y O 12 (O ≦ X <1, 0 ≦ Y <5), A represents bismuth or a lead element, and R represents at least yttrium or an element selected from rare earth elements. One element, and M is an element capable of substituting for iron element.

【0012】また前記ガラス基板が、アルカリ金属を含
有しない硼珪酸系ガラスであることを特徴とする。更に
本発明の光磁気記録媒体の製造方法は、ガラス基板上に
スパッタ法でガーネット構造の誘導体である非晶質膜を
成膜後、該基板を700 ℃以下の温度で熱処理して前記非
晶質膜を結晶化して下地層を形成し、該結晶化した下地
層上にビスマス置換ガーネット膜の多結晶膜を、成膜中
に結晶化する高温成膜法によるスパッタ法で形成するこ
とを特徴とするものである。
Further, the glass substrate is borosilicate glass containing no alkali metal. Further, in the method of manufacturing a magneto-optical recording medium of the present invention, after forming an amorphous film which is a derivative of a garnet structure on a glass substrate by a sputtering method, the substrate is heat-treated at a temperature of 700 ° C. or less to obtain the amorphous film. Characterized in that a crystalline film is crystallized to form an underlayer, and a polycrystalline film of a bismuth-substituted garnet film is formed on the crystallized underlayer by a sputtering method by a high-temperature film-forming method for crystallizing during film formation. It is what

【0013】[0013]

【作用】ガラス基板上に形成された非晶質のビスマス置
換ガーネット膜を、熱処理によって結晶化すると結晶粒
が大きく結晶粒界も顕著に形成されるが、この傾向はビ
スマスの置換量を少なくするか、或いは全くビスマスを
含有しない状態にすると、熱処理に依る結晶化を行って
も良好なガーネット膜が形成される。
When the amorphous bismuth-substituted garnet film formed on the glass substrate is crystallized by the heat treatment, the crystal grains become large and the grain boundaries are remarkably formed. This tendency reduces the substitution amount of bismuth. Alternatively, when the bismuth is not contained at all, a good garnet film is formed even if crystallization is performed by heat treatment.

【0014】そこで、ガラス基板上にビスマスを全く含
まない、或いは多少ビスマスで置換した薄いガーネット
膜を結晶化し、次いでビスマス置換量の多いガーネット
膜を成膜中に結晶化することで良好なビスマス置換ガー
ネット膜が得られる。
Therefore, a good bismuth substitution is achieved by crystallizing a thin garnet film which does not contain bismuth on the glass substrate or which is substituted with bismuth to some extent, and then crystallizing a garnet film having a large amount of bismuth substitution during film formation. A garnet film is obtained.

【0015】そのため、ガラス基板上にビスマスを含有
しない、或いはビスマス置換量の少ないガーネット構造
の薄膜を結晶化して得ることが必要となる。ところで、
スパッタ法で形成した非晶質の膜を熱処理によって結晶
化する場合、この結晶化の温度はビスマス置換量に依存
する。
Therefore, it is necessary to crystallize a garnet structure thin film containing no bismuth or having a small amount of bismuth substitution on the glass substrate. by the way,
When an amorphous film formed by sputtering is crystallized by heat treatment, the crystallization temperature depends on the bismuth substitution amount.

【0016】一分子式当たりのビスマス置換ガーネット
膜でビスマス原子を2原子程度含む場合は、結晶化温度
は650 ℃であるが、ビスマス原子を全く含まないガーネ
ット膜はその結晶化の温度は700 ℃以上であり、この間
の結晶化温度はビスマスの置換量によって略比例して低
下する。
When the bismuth-substituted garnet film per one molecular formula contains about 2 bismuth atoms, the crystallization temperature is 650 ° C., but the garnet film containing no bismuth atoms has a crystallization temperature of 700 ° C. or more. During this period, the crystallization temperature decreases substantially in proportion to the amount of bismuth substitution.

【0017】基板材料として用いるガラスは、アルカリ
金属を含まない硼珪酸系ガラスであると、耐熱性が大で
あるが、それでも700 ℃以上の温度で長時間( 数10分以
上)熱処理すると軟化する。そのため、ビスマス原子を
全く含有しない非晶質膜を通常の電気加熱炉で熱処理し
て結晶化しようとすると、該非晶質膜とガラス基板の間
で拡散が生じ、結晶化された記録膜には顕著な凹凸が生
じ、下地膜としては不適当となる。
When the glass used as the substrate material is a borosilicate glass containing no alkali metal, it has high heat resistance, but it is still softened by heat treatment at a temperature of 700 ° C. or higher for a long time (several tens of minutes or longer). .. Therefore, when an amorphous film containing no bismuth atoms is heat-treated in an ordinary electric heating furnace to be crystallized, diffusion occurs between the amorphous film and the glass substrate, and a crystallized recording film is not formed. Remarkable unevenness is generated, which makes it unsuitable as a base film.

【0018】そのため、この非晶質膜を結晶化する場合
は赤外線ランプ等を用いて急速に基板を加熱して結晶化
するのが効果的である。この方法によると、素早く結晶
化できるので、基板のガラスの軟化や、非晶質膜と基板
との間の拡散が抑えられ、良好な結晶質膜を得ることが
できる。
Therefore, when crystallizing this amorphous film, it is effective to rapidly heat the substrate to crystallize it by using an infrared lamp or the like. According to this method, crystallization can be performed quickly, so that softening of the glass of the substrate and diffusion between the amorphous film and the substrate are suppressed, and a good crystalline film can be obtained.

【0019】そしてこのように結晶化されたYIG膜よ
りなる下地層の上に、本出願人が以前に特開平2-239448
号に於いて開示した高温成膜方法のスパッタ法によって
成膜中に結晶化する方法を用いてビスマス置換ガーネッ
ト膜を形成した。
On the underlayer made of the YIG film crystallized in this way, the applicant of the present invention previously disclosed in Japanese Patent Laid-Open No. 2-239448.
The bismuth-substituted garnet film was formed by the method of crystallization during film formation by the sputtering method of the high temperature film formation method disclosed in No.

【0020】このようにすることで、単結晶のGGG基
板をスパッタ用基板として用いた場合と同様な光磁気記
録特性を有する光磁気記録媒体が形成でき、ファラデー
回転角が大きく、また保磁力、角形比の大きい垂直磁気
特性を示す光磁気記録媒体を安価で容易に得ることがで
きるのを確認した。
By doing so, a magneto-optical recording medium having a magneto-optical recording characteristic similar to that when a single crystal GGG substrate is used as a sputtering substrate can be formed, a Faraday rotation angle is large, and a coercive force, It was confirmed that a magneto-optical recording medium exhibiting a perpendicular magnetic characteristic having a large squareness ratio can be easily obtained at low cost.

【0021】[0021]

【実施例】以下、図面を用いて本発明の実施例につき詳
細に説明する。図1(a) に示すように、無アルカリ金属
ガラスより成る硼珪酸系ガラス基板1上には、請求項4
で表示した一般式のA x R3-xM Y Fe5-Y O12 に於いて、
x =0、Y =0 でR をイットリウムとした場合のYIG
(イットリウム鉄ガーネット,Y3Fe5O12) の誘導体であ
る非晶質膜がスパッタ法により形成され、これが700 ℃
以下の温度で熱処理されて結晶化され、結晶質のYIG
膜よりなる下地層2が形成されている。
Embodiments of the present invention will be described in detail below with reference to the drawings. As shown in FIG. 1 (a), the borosilicate glass substrate 1 made of non-alkali metal glass has
In the general formula A x R 3-x M Y Fe 5-Y O 12 represented by,
YIG when x = 0, Y = 0 and R is yttrium
An amorphous film, which is a derivative of (yttrium iron garnet, Y 3 Fe 5 O 12 ), was formed by the sputtering method, and this was 700 ° C.
Crystallized by being heat-treated at the following temperature, crystalline YIG
A base layer 2 made of a film is formed.

【0022】この下地層2の上に基板温度を550 ℃とし
てスパッタ法により、請求項3に於いて表示された一般
式のBix R3-xM Y Fe5-Y O12 (0≦x ≦3 、0 ≦Y <2)に
於いてx =2 、R はジスプロシウム(Dy)、M を鉄元素と
置換し得るGa元素、Y =0.8としたビスマス置換ガーネ
ット膜(Bi2DyGa0.8Fe4.2O12)より成る記録膜3が形成さ
れている。このようにして形成されたビスマス置換ガー
ネット膜は、X線回折法を用いて検査した処、優勢方位
の無い多結晶膜で有った。
A Bi x R 3-x M Y Fe 5-Y O 12 (0 ≦ x) of the general formula expressed in claim 3 is formed on the underlayer 2 by a sputtering method at a substrate temperature of 550 ° C. ≤3, 0 ≤ Y <2), x = 2, R is dysprosium (Dy), Ga element that can replace M with iron element, and bismuth-substituted garnet film with Y = 0.8 (Bi 2 DyGa 0.8 Fe 4.2 A recording film 3 made of O 12 ) is formed. The bismuth-substituted garnet film thus formed was a polycrystalline film having no dominant orientation when inspected using an X-ray diffraction method.

【0023】また図1(b)に示すようにこの多結晶膜の記
録膜3を構成する結晶は、稠密なコラム状( 柱状) 微結
晶4で構成されており、この構造はGGG基板上に成膜
中に結晶化した膜と全く同じものである。そのため、光
散乱が非常に小さく、光磁気記録特性の良好な記録膜と
成る。
Further, as shown in FIG. 1 (b), the crystal forming the recording film 3 of the polycrystalline film is composed of dense columnar (columnar) microcrystals 4, and this structure is formed on the GGG substrate. It is exactly the same as the film crystallized during film formation. Therefore, the light scattering is very small, and the recording film has excellent magneto-optical recording characteristics.

【0024】またこの記録膜3は、従来の単結晶のGG
G基板をスパッタ用基板として用いた場合と同様な温度
で高温成膜ができ、この記録膜3の表面を400 倍の微分
干渉顕微鏡で観察した処、下地層のYIG膜と同様に表
面が平滑であり、また結晶粒の存在が殆ど見られない高
品位な記録膜が得られた。
The recording film 3 is made of a conventional single crystal GG.
High-temperature film formation can be performed at the same temperature as when the G substrate is used as a substrate for sputtering. When the surface of this recording film 3 is observed by a 400 × differential interference microscope, the surface is smooth like the YIG film of the underlying layer. In addition, a high-quality recording film in which the presence of crystal grains was hardly seen was obtained.

【0025】このような本発明のガラス/YIG/ビス
マス置換ガーネット膜の構造を有する光磁気記録媒体の
ファラデーヒステリシスループを測定した処、図2に示
すように角形比が1で保磁力が2KOeの垂直磁化膜が
得られた。
When the Faraday hysteresis loop of the magneto-optical recording medium having the structure of the glass / YIG / bismuth-substituted garnet film of the present invention was measured, the squareness ratio was 1 and the coercive force was 2 KOe as shown in FIG. A perpendicular magnetic film was obtained.

【0026】この値は、単結晶GGG基板の上に直接に
ビスマス置換ガーネット膜を成膜中に結晶化させた従来
の方法により形成した光磁気記録媒体と同様な結果が得
られた。
This value was similar to that of a magneto-optical recording medium formed by a conventional method in which a bismuth-substituted garnet film was crystallized directly during film formation on a single crystal GGG substrate.

【0027】このような本発明の光磁気記録媒体の製造
方法について述べる。前記したアルカリ金属を含有しな
い硼珪酸系ガラス(HOYA株式会社製、商品名;NA-40、旭
硝子株式会社製、商品名;AN 、Corning 社製、商品名;7
059)) よりなるガラス基板1を用いて、高周波マグネト
ロンスパッタ法により、スパッタガスとしてアルゴン
(Ar) ガスを用い、基板温度を300 ℃としてYIG(イ
ットリウム鉄ガーネット,Y3Fe5O12) の誘導体である非
晶質を0.1 μm の厚さに形成する。
A method of manufacturing such a magneto-optical recording medium of the present invention will be described. Borosilicate glass containing no alkali metal as described above (HOYA Co., Ltd., trade name; NA-40, Asahi Glass Co., Ltd., trade name; AN, Corning Co., trade name; 7
(059)), a high frequency magnetron sputtering method is used, and argon (Ar) gas is used as a sputtering gas at a substrate temperature of 300 ° C. to obtain a YIG (yttrium iron garnet, Y 3 Fe 5 O 12 ) derivative. To form an amorphous material having a thickness of 0.1 μm.

【0028】この場合、上記した無アルカリ金属の硼珪
酸系ガラスの軟化点は約700 ℃程度と高く、前記した下
地層を結晶化する温度に耐え、かつ熱膨張率が5 ×10-6
/ ℃と高く、YIG膜に近接しているので、YIG膜を
熱処理後、冷却する際にクラックが入らない。
In this case, the above-mentioned alkali-free metal borosilicate glass has a high softening point of about 700 ° C., is resistant to the temperature for crystallizing the above-mentioned underlayer, and has a thermal expansion coefficient of 5 × 10 −6.
Since it is as high as / ° C and is close to the YIG film, cracks do not occur when the YIG film is cooled after heat treatment.

【0029】石英ガラスはYIG膜と熱膨張率が異なり
過ぎるので、該YIG膜を熱処理後、冷却する際にクラ
ック等が発生するので不適当である。次いで、この非晶
質膜を付けたガラス基板1を、窒素ガス雰囲気で昇温速
度を10℃/secとし、最高到達温度700 ℃としてこの温度
で2分間保持し、次いで窒素ガスで急冷することで、上
記非晶質膜を結晶化して下地層2を形成した。
Since the coefficient of thermal expansion of quartz glass is too different from that of the YIG film, cracks and the like are generated when the YIG film is cooled after heat treatment, which is not suitable. Then, the glass substrate 1 provided with this amorphous film is heated in a nitrogen gas atmosphere at a temperature rising rate of 10 ° C./sec to a maximum attainable temperature of 700 ° C., held at this temperature for 2 minutes, and then rapidly cooled with nitrogen gas. Then, the amorphous film was crystallized to form the underlayer 2.

【0030】この下地層の熱処理の加熱手段としては、
基板の温度を急速に上昇させるために赤外線ランプを用
い、かつ該基板をカーボン製のサセプタ上に設置して赤
外線の吸収効率を高め、ガラス基板の軟化を防止した。
As a heating means for the heat treatment of the underlayer,
An infrared lamp was used to rapidly raise the temperature of the substrate, and the substrate was placed on a carbon susceptor to enhance the infrared absorption efficiency and prevent the glass substrate from softening.

【0031】この結晶化された下地層のYIG膜をX線
回折法で検査した処、YIGが単一相の状態で結晶化し
ており、異相は見られなかった。また400 倍の微分干渉
顕微鏡でYIG膜の表面を観察した処平滑な表面であっ
た。
When the crystallized underlayer YIG film was inspected by an X-ray diffraction method, YIG was crystallized in a single phase and no heterogeneous phase was observed. Further, the surface of the YIG film was observed with a 400 × differential interference microscope, and the surface was smooth.

【0032】次いでこの下地層2を形成したガラス基板
1を550 ℃の温度に保持し、該基板1上に高周波マグネ
トロンスパッタ法を用いて記録膜としてのビスマス置換
ガーネット膜よりなる記録膜3を形成した。このビスマ
ス置換ガーネット膜よりなる記録膜3は、本発明者が以
前に特開平2-239448号に於いて開示した方法を用いて形
成した。
Next, the glass substrate 1 on which the underlayer 2 is formed is kept at a temperature of 550 ° C., and a recording film 3 made of a bismuth-substituted garnet film as a recording film is formed on the substrate 1 by a high frequency magnetron sputtering method. did. The recording film 3 made of this bismuth-substituted garnet film was formed by the method previously disclosed by the present inventor in Japanese Patent Laid-Open No. 2-239448.

【0033】つまり高周波2極マグネトロンスパッタ法
により、ターゲットとして見かけ上の組成がBi2DyGa0.7
Fe4.3O12のものを用い、スパッタガスとして酸素ガスを
容量で10%混入したアルゴンガスを用い、1Pa のガス圧
で成膜した。
That is, the apparent composition of the target was Bi 2 DyGa 0.7 by the high frequency bipolar magnetron sputtering method.
Films were formed at a gas pressure of 1 Pa by using Fe 4.3 O 12 as the sputtering gas and argon gas containing 10% by volume of oxygen gas as the sputtering gas.

【0034】このようにすることで、単結晶GGG基板
の上に直接にビスマス置換ガーネット膜を成膜中に結晶
化させた従来の方法により形成した光磁気記録媒体と同
様な光磁気記録媒体が得られた。
By doing so, a magneto-optical recording medium similar to the magneto-optical recording medium formed by the conventional method in which the bismuth-substituted garnet film is crystallized directly during deposition on the single crystal GGG substrate. Was obtained.

【0035】なお、本実施例の他に記録膜としてビスマ
ス置換ガーネット膜(Bi2DyGa0.8Fe4 .2O12)の代わりに、
Bi2DyGaFe4O12 の組成のビスマス置換ガーネット膜を用
いても良いし、また下地層としてYIG(イットリウム
鉄ガーネット,Y3Fe5O12) 膜の代わりに、Y3Ga2Fe3O12
のようなイットリウムガリウム鉄ガーネット膜や、YI
G膜の希土類元素のイットリウムを、他の希土類元素と
置換したRIG膜(Rは希土類元素)を用いても良い。
[0035] Instead of the addition to the bismuth-substituted garnet film as a recording film of this example (Bi 2 DyGa 0.8 Fe 4 .2 O 12),
A bismuth-substituted garnet film having a composition of Bi 2 DyGaFe 4 O 12 may be used, and Y 3 Ga 2 Fe 3 O 12 may be used instead of a YIG (yttrium iron garnet, Y 3 Fe 5 O 12 ) film as an underlayer.
Yttrium gallium iron garnet film such as YI
A RIG film (R is a rare earth element) in which yttrium, which is a rare earth element of the G film, is replaced with another rare earth element may be used.

【0036】[0036]

【発明の効果】以上述べたように本発明によれば、記録
再生特性が良好で、かつ製造コストの低いビスマス置換
ガーネットの光磁気記録媒体が得られる効果がある。
As described above, according to the present invention, it is possible to obtain a magneto-optical recording medium of bismuth-substituted garnet which has good recording / reproducing characteristics and is low in manufacturing cost.

【図面の簡単な説明】[Brief description of drawings]

【図1】 本発明の光磁気記録媒体の断面図である。FIG. 1 is a sectional view of a magneto-optical recording medium of the present invention.

【図2】 本発明の光磁気記録媒体の特性図である。FIG. 2 is a characteristic diagram of the magneto-optical recording medium of the present invention.

【符号の説明】[Explanation of symbols]

1 硼珪酸系ガラス基板 2 下地層 3 記録膜 4 コラム状微結晶 1 Borosilicate glass substrate 2 Underlayer 3 Recording film 4 Column-shaped microcrystal

Claims (6)

【特許請求の範囲】[Claims] 【請求項1】 ガラス基板(1) 上にガーネット構造を有
する下地層(2) を設け、該下地層(2) 上にビスマス置換
ガーネットより成る記録膜(3) を設けたことを特徴とす
る光磁気記録媒体。
1. An underlayer (2) having a garnet structure is provided on a glass substrate (1), and a recording film (3) made of bismuth-substituted garnet is provided on the underlayer (2). Magneto-optical recording medium.
【請求項2】 請求項1記載のビスマス置換ガーネット
より成る記録膜(3)が、スパッタ法で成膜中に結晶化す
る高温成膜法により形成されていることを特徴とする光
磁気記録媒体。
2. A magneto-optical recording medium, characterized in that the recording film (3) made of the bismuth-substituted garnet according to claim 1 is formed by a high temperature film forming method in which crystallization occurs during film formation by a sputtering method. ..
【請求項3】 請求項1記載の記録膜(3) のビスマス置
換ガーネット膜が、一般式のBix R3-xM Y Fe5-Y O12 (O
≦X ≦3 、0 ≦Y <2)で表され、R はイットリウム、或
いは希土類元素の中より選択した元素の内の少なくとも
1 元素を、また上記Mは鉄元素と置換し得る元素である
ことを特徴とする光磁気記録媒体。
3. The bismuth-substituted garnet film of the recording film (3) according to claim 1, wherein the bismuth-substituted garnet film has a general formula of Bi x R 3-x M Y Fe 5-Y O 12 (O
≦ X ≦ 3, 0 ≦ Y <2), and R is at least yttrium or an element selected from rare earth elements.
1. A magneto-optical recording medium, characterized in that one element can be replaced with M, and the element M can be replaced with an iron element.
【請求項4】 請求項1記載の下地層(2) が、一般式の
A x R3-xM Y Fe5-Y O12 (O≦X <1 、0 ≦Y <5)で表さ
れ、A はビスマス、或いは鉛元素を示し、Rはイットリ
ウム、或いは希土類元素の中より選択した元素の内の少
なくとも1 元素を、また上記Mは鉄元素と置換し得る元
素であることを特徴とする光磁気記録媒体。
4. The underlayer (2) according to claim 1, wherein
A x R 3-x M Y Fe 5-Y O 12 (O ≦ X <1, 0 ≦ Y <5), A is bismuth or lead element, R is yttrium or rare earth element A magneto-optical recording medium, wherein at least one element selected from the more selected elements and M is an element capable of substituting with an iron element.
【請求項5】 請求項1記載のガラス基板(1) が、アル
カリ金属を含有しない硼珪酸系ガラスであることを特徴
とする光磁気記録媒体。
5. A magneto-optical recording medium, wherein the glass substrate (1) according to claim 1 is a borosilicate glass containing no alkali metal.
【請求項6】 ガラス基板(1) 上にスパッタ法でガーネ
ット構造の誘導体である非晶質膜を成膜後、該基板を70
0 ℃以下の温度で熱処理して前記非晶質膜を結晶化し、
該結晶化した下地層(2) 上にビスマス置換ガーネット膜
よりなる記録膜(3) を、スパッタ法を用い、かつ成膜中
に結晶化する高温成膜法で形成することを特徴とする光
磁気記録媒体の製造方法。
6. A glass substrate (1) is formed with an amorphous film, which is a derivative of a garnet structure, on a glass substrate (1) by a sputtering method, and then the substrate is treated with 70
Heat treatment at a temperature of 0 ° C. or lower to crystallize the amorphous film,
A recording film (3) made of a bismuth-substituted garnet film is formed on the crystallized underlayer (2) by using a sputtering method and a high-temperature film-forming method in which the film is crystallized during film formation. Manufacturing method of magnetic recording medium.
JP3219695A 1991-08-30 1991-08-30 Magneto-optical recording medium and its manufacture Withdrawn JPH0562835A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3219695A JPH0562835A (en) 1991-08-30 1991-08-30 Magneto-optical recording medium and its manufacture

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3219695A JPH0562835A (en) 1991-08-30 1991-08-30 Magneto-optical recording medium and its manufacture

Publications (1)

Publication Number Publication Date
JPH0562835A true JPH0562835A (en) 1993-03-12

Family

ID=16739516

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3219695A Withdrawn JPH0562835A (en) 1991-08-30 1991-08-30 Magneto-optical recording medium and its manufacture

Country Status (1)

Country Link
JP (1) JPH0562835A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2004068485A1 (en) * 2003-01-31 2004-08-12 Fujitsu Limited Magnetooptic recording medium and method for producing the same

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2004068485A1 (en) * 2003-01-31 2004-08-12 Fujitsu Limited Magnetooptic recording medium and method for producing the same

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