JP2553145B2 - Magneto-optical recording medium - Google Patents
Magneto-optical recording mediumInfo
- Publication number
- JP2553145B2 JP2553145B2 JP63102403A JP10240388A JP2553145B2 JP 2553145 B2 JP2553145 B2 JP 2553145B2 JP 63102403 A JP63102403 A JP 63102403A JP 10240388 A JP10240388 A JP 10240388A JP 2553145 B2 JP2553145 B2 JP 2553145B2
- Authority
- JP
- Japan
- Prior art keywords
- magneto
- optical recording
- recording medium
- substrate
- film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
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- Compounds Of Iron (AREA)
- Thin Magnetic Films (AREA)
Description
【発明の詳細な説明】 ［利用分野］ 本発明はレーザー等の光により情報の記録・再生・消
去等を行う光磁気記録媒体に関する。更に詳細には、耐
熱性を有する基板上に膜面に垂直な方向に磁化容易方向
を有した酸化物薄膜よりなる記録層を形成し、磁気光学
効果により情報を記録・再生する光磁気記録媒体に関す
る。TECHNICAL FIELD The present invention relates to a magneto-optical recording medium for recording / reproducing / erasing information by using light from a laser or the like. More specifically, a magneto-optical recording medium in which a recording layer made of an oxide thin film having an easy magnetization direction in a direction perpendicular to the film surface is formed on a substrate having heat resistance, and information is recorded / reproduced by a magneto-optical effect. Regarding
［従来の技術と問題点］ 光記録媒体は、高密度・大容量の情報記録媒体として
種々の研究開発が行われている。特に情報の消去可能な
光磁気記録媒体は応用分野が広く、種々材料・システム
が発表されており、その実用化が待望されている。[Prior Art and Problems] Optical recording media have undergone various research and development as high-density, large-capacity information recording media. In particular, a magneto-optical recording medium capable of erasing information has a wide range of application fields, various materials and systems have been announced, and their practical application is expected.
上述の光磁気記録材料としては、TbFeCo,GdTbFe,NdDy
FeCo等，希土類と遷移金属からなるアモルファス合金膜
が主として検討され、実用段階にはいったと言える。し
かし、これらの記憶材料の大半は酸化等の腐蝕を起し易
い為、その耐酸化性を求めた耐久性を向上させることが
必要と言われている。The above-mentioned magneto-optical recording materials include TbFeCo, GdTbFe, NdDy
Amorphous alloy films composed of rare earths and transition metals such as FeCo have been mainly studied, and it can be said that they have reached the stage of practical use. However, since most of these memory materials are susceptible to corrosion such as oxidation, it is said that it is necessary to improve the durability required for their oxidation resistance.
これに対し、六方晶フェライト，スピネルフェライ
ト,Bi置換ガーネット等の酸化物磁性薄膜は、酸化によ
る腐蝕の心配がなく、さらに従来の希土類−遷移金属ア
モルファス合金薄膜のもつKerr回転角0.2゜〜0.4゜に比
べて１桁大きい値１〜３゜をもつため高いCN比が得られ
る可能性があるという２つの点で注目され、光磁気記録
材料として研究が行われている。ところが、これらの材
料は、常温で基板上に製膜した場合には非晶質であり、
磁気光学特性はあらわれない。光磁気記録媒体として使
用するためには製膜中基板加熱及びまたは製膜後の熱処
理によって結晶化させることが必要で、その温度範囲
は、例えば特開昭60−107815号公報記載の640℃〜740
℃，特開昭60−185237号公報記載の800℃，特開昭62−1
82047号公報記載の630℃等、およそ600〜800℃である。
したがって、基板材料としては耐熱性の高い材料に限定
されるため安価な並板ガラスや合成樹脂基板等は使用不
可能である。そのため高価な石英ガラスや無アルカリガ
ラス等を使う必要があり、熱処理温度の低下をはかるこ
とが望まれている。On the other hand, oxide magnetic thin films such as hexagonal ferrite, spinel ferrite, Bi substituted garnet, etc. have no fear of corrosion due to oxidation, and the Kerr rotation angle of 0.2 ° to 0.4 ° which the conventional rare earth-transition metal amorphous alloy thin film has. Since it has a value of 1 to 3 degrees, which is one digit larger than that of, it is possible to obtain a high CN ratio, and it has been studied as a magneto-optical recording material. However, these materials are amorphous when formed on a substrate at room temperature,
Magneto-optical characteristics do not appear. In order to use as a magneto-optical recording medium, it is necessary to crystallize by heating the substrate during film formation and / or heat treatment after film formation, and the temperature range is, for example, 640 ° C. described in JP-A-60-107815. 740
C, 800 ° C. described in JP-A-60-185237, JP-A-62-1
The temperature is about 600 to 800 ° C, such as 630 ° C described in 82047.
Therefore, since the substrate material is limited to a material having high heat resistance, inexpensive ordinary flat glass or synthetic resin substrate cannot be used. Therefore, it is necessary to use expensive quartz glass, alkali-free glass, or the like, and it is desired to lower the heat treatment temperature.
［発明の目的］ 本発明はかかる現状に鑑みなされたもので、基板上に
形成された非晶質Bi置換ガーネット膜を結晶化させるた
めの製膜中基板加熱及びまたは製膜後熱処理の温度を極
力低下させ、安価な並板ガラス等の上にも成形可能なBi
置換磁性ガーネット薄膜からなる光磁気記録媒体を提供
することを目的とするものである。[Object of the Invention] The present invention has been made in view of the above circumstances, and the temperature of substrate heating during film formation and / or heat treatment after film formation for crystallizing an amorphous Bi-substituted garnet film formed on a substrate is controlled. Bi that can be formed on low-priced flat sheet glass, etc.
An object of the present invention is to provide a magneto-optical recording medium composed of a substituted magnetic garnet thin film.
［発明の構成・作用］ 上述の目的は、以下の本発明により達成される。即
ち、本発明は、耐熱性を有する基板上に、光磁気記録層
としてBi置換希土類−鉄ガーネット薄膜を形成した光磁
気記録媒体において、組成 BixR3-xFe5-y（Ga1-zAz）yO12, （x,yは化学量論組成で０＜ｘ≦3,0＜ｙ≦2;zは原子分
率で、0.1＜Ｚ≦0.2;RはDy）中の元素ＡがInであるBi置
換磁性ガーネット膜を用いることを特徴とするものであ
り、Bi置換磁性ガーネットの結晶化をはかるための製膜
時基板加熱及びまたは製膜後熱処理の温度を、安価な並
板ガラスが使用可能な550℃以下の熱処理温度まで低減
させるという待望の効果を奏するものである。[Structure / Operation of the Invention] The above-mentioned object is achieved by the present invention described below. That is, the present invention relates to a magneto-optical recording medium in which a Bi-substituted rare earth-iron garnet thin film is formed as a magneto-optical recording layer on a substrate having heat resistance, and the composition Bi x R 3-x Fe 5-y (Ga 1- z A z ) y O 12 , (x, y is stoichiometric composition, 0 <x ≦ 3,0 <y ≦ 2; z is atomic fraction, 0.1 <Z ≦ 0.2; R is Dy) A Bi-substituted magnetic garnet film in which A is In is used, and the temperature of substrate heating during film formation and / or heat treatment after film formation for crystallization of Bi-substituted magnetic garnet is set at a low level. It has the long-awaited effect of reducing the heat treatment temperature to 550 ° C or lower at which plate glass can be used.
本発明に使用する基板としては、ガラス基板，金属，
半導体，絶縁体等の結晶性基板等で、450〜550℃程度の
加熱に耐える基板であればよい。The substrate used in the present invention includes a glass substrate, metal,
A crystalline substrate such as a semiconductor or an insulator may be used as long as it can withstand heating at about 450 to 550 ° C.
本発明の光磁気記録層のBi置換磁性ガーネットは、結
晶化温度を低減させるという点で組成 BixR3-xFe5-y（Ga1-zAz）yO12, （x,yは化学量論組成で０＜ｘ≦3,0＜ｙ≦2;zは原子分
率ＲはDy）において、元素ＡがInであるもので且つ原子
分率ｚがＯ＜ｚ≦0.5ものであり、更には好ましくは、
安価な並板ガラス等の使用できるという点でInの含有量
がＯ＜ｚ≦0.2であるものである。なお、希土類元素Ｒ
は、磁気特性面から好ましくはDyである。The Bi-substituted magnetic garnet of the magneto-optical recording layer of the present invention has the composition Bi x R 3-x Fe 5-y (Ga 1-z A z ) y O 12 , (x, y Is a stoichiometric composition and 0 <x ≦ 3, 0 <y ≦ 2; z is an atomic fraction R of Dy), the element A is In, and the atomic fraction z is O <z ≦ 0.5. Yes, and more preferably,
The content of In is O <z ≦ 0.2 from the viewpoint that an inexpensive parallel plate glass or the like can be used. The rare earth element R
Is preferably Dy in terms of magnetic properties.
本発明に於ける光磁気記録媒体の製膜法としては、真
空蒸着，スパッタリング，スピンコート,LPE,CVD等が可
能であるが、光磁気記録媒体のように広い面積にわたっ
て安定に製膜する為にはスパッタリング法が好ましい。As the method for forming the magneto-optical recording medium in the present invention, vacuum deposition, sputtering, spin coating, LPE, CVD, etc. can be used, but it is possible to form a stable film over a wide area like the magneto-optical recording medium. For this, a sputtering method is preferable.
上述の本発明の作用は以下の通りである。従来のBi置
換のガーネット膜では、前述の通り製膜時の基板加熱及
びまたは製膜後の熱処理が必要であり、その温度は600
〜650℃またはそれ以上の温度である。従って、安価な
並板ガラス等は軟化点が低いために使用不可能であっ
た。ところが本発明の組成BixR3-xFe5-y（Ga1-zInz）yO
12, （Ｏ＜ｘ≦3,0＜ｙ≦2,0.1＜ｚ≦0.2:x,yは化学量論組
成,zは原子分率,RはDy）からなるBi置換ガーネット薄膜
は、ガーネット相があらわれる結晶化温度が、、Inを添
加しない場合に比べ50〜100℃低減し、熱処理温度500〜
550℃でも十分な磁気光学特性があらわれることを見出
した。この熱処理温度であれば基板材料として安価な並
板ガラスを使用することも可能である。The operation of the present invention described above is as follows. As described above, the conventional Bi-substituted garnet film requires substrate heating during film formation and / or heat treatment after film formation.
Temperatures of ~ 650 ° C or higher. Therefore, it is not possible to use low-priced flat glass or the like because of its low softening point. However, the composition of the present invention Bi x R 3-x Fe 5-y (Ga 1-z In z ) y O
12 (O <x ≦ 3,0 <y ≦ 2,0.1 <z ≦ 0.2: x, y is stoichiometric composition, z is atomic fraction, R is Dy) The crystallization temperature that appears is reduced by 50 to 100 ° C compared to the case where In is not added, and the heat treatment temperature is 500 to
It was found that sufficient magneto-optical characteristics appeared even at 550 ° C. With this heat treatment temperature, it is also possible to use inexpensive parallel plate glass as the substrate material.
尚、本発明における、組成 BixR3-xFe5-y（Ga1-zInz）yO12, （Ｏ＜ｘ≦3,0＜ｙ≦2,0.1＜ｚ≦0.2:x,yは化学量論組
成,zは原子分率,RはDy）からなるBi置換ガーネット薄膜
は、光磁気記録媒体として用途に限らず、光アイソレー
ター等の光素子としても使用も可能である。In the present invention, the composition Bi x R 3-x Fe 5-y (Ga 1-z In z ) y O 12 , (O <x ≦ 3,0 <y ≦ 2,0.1 <z ≦ 0.2: x, The Bi-substituted garnet thin film composed of y is a stoichiometric composition, z is an atomic fraction, and R is Dy) can be used not only as a magneto-optical recording medium but also as an optical element such as an optical isolator.
以下、本発明の実施例を説明する。 Examples of the present invention will be described below.
［実施例］ 以下のようにしてサンプルを作成し、評価した。無ア
ルカリガラスからなるスライドガラス（26mm×76mm×1m
mt）を高周波マクネトロンスパッタ装置（アネルバ
（株）製SPF−430型）の真空槽内に固定し、４×10-7To
rrrになるまで排気する。尚、膜形成時には、基板は400
℃に加熱した。[Example] A sample was prepared and evaluated as follows. Slide glass made of non-alkali glass (26mm × 76mm × 1m
mt) was fixed in a vacuum chamber of a high frequency McNetron sputter device (SPF-430 type manufactured by Anelva Co., Ltd.) and 4 × 10 −7 To
Exhaust until rrr. When forming the film, the substrate is 400
Heated to ° C.
次に、Arガス（5N）を真空槽内に導入し圧力１×10-2
TorrになるようにArガス流量を調整した。ターゲットと
しては、直径100mm,厚さ5mmで、その構成元素の組成がB
i2.8Dy0.6Fe3.5Ga1.1O12の焼結体からなる円盤上に、サ
イズが2mm×2mm×1mmtの小片からなる酸化インジウムIn
2O3を配置し、放電電力100W,放電周波数13.56MHzで高周
波スパタリングを行い、元素組成 Ｂ2.5Dy0.5Fe3.5（Ga1-zInz）1.5O12からなる膜を約１
μｍ堆積した。Inの含有量は、ターゲット上のIn2O3小
片の数を調整することにより、原子分率ｚで0.1,0.2,0.
3,0.5であるような４種類のサンプルを用意した。これ
らのサンプルを電気炉中で種々の熱処理温度で１〜３時
間熱処理した後、ファラデー回転角及びＸ線回析を測定
した。表１の実施例にこの結果を示す。Next, Ar gas (5N) was introduced into the vacuum chamber and the pressure was 1 × 10 -2.
The Ar gas flow rate was adjusted so as to be Torr. The target has a diameter of 100 mm and a thickness of 5 mm, and the composition of its constituent elements is B.
i 2.8 Dy 0.6 Fe 3.5 Ga 1.1 O 12 Indium oxide In consisting of small pieces 2 mm × 2 mm × 1 mmt on a disk made of a sintered body.
2 O 3 was placed, high-frequency sputtering was performed at a discharge power of 100 W and a discharge frequency of 13.56 MHz, and a film composed of the elemental composition B 2.5 Dy 0.5 Fe 3.5 (Ga 1-z In z ) 1.5 O 12 was about 1
μm deposited. The content of In is 0.1, 0.2, 0 in atomic fraction z by adjusting the number of In 2 O 3 small pieces on the target.
We prepared four types of samples that were 3,0.5. These samples were heat-treated in an electric furnace at various heat-treatment temperatures for 1 to 3 hours, and then the Faraday rotation angle and X-ray diffraction were measured. The results are shown in the examples of Table 1.
［比較例］ 無アルカリガラスからなるスライドガラス（26mm×76
mm×1mmt）を、実施例と同じ装置中に、全く同じ条件で
設置した。[Comparative Example] Slide glass made of non-alkali glass (26 mm x 76
mm × 1 mmt) was installed in the same apparatus as the example under exactly the same conditions.
次にArガス（5N）を真空槽内に導入し、圧力１×10-2
TorrになるようにArガス流量を調整した。ターゲットと
しては、直径100mm,厚さ5mmで、その構成元素の組成がB
i2.8Dy0.6Fe3.5Ga1.1O12の焼結体からなる円盤を用い、
実施例と全く同じ放電条件でスパッタリングを行い、元
素組成Bi2.5Dy0.5Fe3.5Ga1.5O12からなる膜を約１μｍ
堆積した。このサンプルを電気炉中で１〜３時間熱処理
した後、ファラデー回転角，及びＸ線回析を測定した。
この結果を表１の比較例に示す。Next, Ar gas (5N) was introduced into the vacuum chamber, and the pressure was 1 × 10 -2.
The Ar gas flow rate was adjusted so as to be Torr. The target has a diameter of 100 mm and a thickness of 5 mm, and the composition of its constituent elements is B.
Using a disk made of a sintered body of i 2.8 Dy 0.6 Fe 3.5 Ga 1.1 O 12 ,
Sputtering was performed under exactly the same discharge conditions as in the example, and a film composed of the elemental composition Bi 2.5 Dy 0.5 Fe 3.5 Ga 1.5 O 12 was deposited to a thickness of about 1 μm.
Deposited. After heat-treating this sample for 1 to 3 hours in an electric furnace, the Faraday rotation angle and X-ray diffraction were measured.
The results are shown in the comparative example of Table 1.
なお表１で○印は膜厚１μｍ当りのファラデー回転角
が１度以上でガーネット相を示すＸ線パターンが有るこ
とを示し、Ｘ印はファラデー回転角，ガーネット相を示
すＸ線パターンが共にないことを示す。 In Table 1, ◯ indicates that there is an X-ray pattern indicating a garnet phase when the Faraday rotation angle per 1 μm film thickness is 1 degree or more, and X indicates neither a Faraday rotation angle nor an X-ray pattern indicating a garnet phase. Indicates that.
以上の結果により本発明により従来例より大巾に熱処
理温度が低下できることがわかる。そして、並板ガラス
の使用可能温度という点からInの含有率は原子分率ｚで
0.1＜ｚ≦0.2が好ましいことがわかる。From the above results, it is understood that the present invention can significantly lower the heat treatment temperature than the conventional example. From the viewpoint of the usable temperature of the parallel plate glass, the In content is the atomic fraction z.
It can be seen that 0.1 <z ≦ 0.2 is preferable.
───────────────────────────────────────────────────── フロントページの続き (56)参考文献 特開 昭64−32444（ＪＰ，Ａ) 特開 昭64−17237（ＪＰ，Ａ) 特開 昭63−98855（ＪＰ，Ａ) 特開 昭63−91849（ＪＰ，Ａ) 特開 昭60−177453（ＪＰ，Ａ) ─────────────────────────────────────────────────── --- Continuation of the front page (56) References JP-A-64-32444 (JP, A) JP-A-64-17237 (JP, A) JP-A-63-98855 (JP, A) JP-A-63- 91849 (JP, A) JP-A-60-177453 (JP, A)
Claims (1)
を用いた光磁気記録媒体において、該Bi置換磁気性ガー
ネットが、 BixR3-xFe5-y（Ga1-zInz）yO12, （x,yは化学量論組成で０ｘ≦3,0＜ｙ≦2;zは原子分
率で、0.1＜ｚ≦0.2;RはDy）の組成であることを特徴と
する光磁気記録媒体。1. A magneto-optical recording medium using a Bi-substituted magnetic garnet as a magneto-optical recording layer, wherein the Bi-substituted magnetic garnet is Bi x R 3-x Fe 5-y (Ga 1 -z In z ) y. O 12 , (x, y is stoichiometric composition 0x ≦ 3,0 <y ≦ 2; z is atomic fraction, 0.1 <z ≦ 0.2; R is Dy) Magnetic recording medium.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP63102403A JP2553145B2 (en) | 1988-04-27 | 1988-04-27 | Magneto-optical recording medium |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP63102403A JP2553145B2 (en) | 1988-04-27 | 1988-04-27 | Magneto-optical recording medium |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH01276450A JPH01276450A (en) | 1989-11-07 |
| JP2553145B2 true JP2553145B2 (en) | 1996-11-13 |
Family
ID=14326480
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP63102403A Expired - Lifetime JP2553145B2 (en) | 1988-04-27 | 1988-04-27 | Magneto-optical recording medium |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2553145B2 (en) |
-
1988
- 1988-04-27 JP JP63102403A patent/JP2553145B2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPH01276450A (en) | 1989-11-07 |
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