JPH0562814B2 - - Google Patents

Info

Publication number
JPH0562814B2
JPH0562814B2 JP60117684A JP11768485A JPH0562814B2 JP H0562814 B2 JPH0562814 B2 JP H0562814B2 JP 60117684 A JP60117684 A JP 60117684A JP 11768485 A JP11768485 A JP 11768485A JP H0562814 B2 JPH0562814 B2 JP H0562814B2
Authority
JP
Japan
Prior art keywords
gas
electrodes
porous body
gas introduction
plasma
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP60117684A
Other languages
English (en)
Japanese (ja)
Other versions
JPS61278144A (ja
Inventor
Hideki Fujimoto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Anelva Corp
Original Assignee
Anelva Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Anelva Corp filed Critical Anelva Corp
Priority to JP11768485A priority Critical patent/JPS61278144A/ja
Publication of JPS61278144A publication Critical patent/JPS61278144A/ja
Publication of JPH0562814B2 publication Critical patent/JPH0562814B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • ing And Chemical Polishing (AREA)
  • Drying Of Semiconductors (AREA)
JP11768485A 1985-06-01 1985-06-01 プラズマ処理装置 Granted JPS61278144A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11768485A JPS61278144A (ja) 1985-06-01 1985-06-01 プラズマ処理装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11768485A JPS61278144A (ja) 1985-06-01 1985-06-01 プラズマ処理装置

Publications (2)

Publication Number Publication Date
JPS61278144A JPS61278144A (ja) 1986-12-09
JPH0562814B2 true JPH0562814B2 (cs) 1993-09-09

Family

ID=14717731

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11768485A Granted JPS61278144A (ja) 1985-06-01 1985-06-01 プラズマ処理装置

Country Status (1)

Country Link
JP (1) JPS61278144A (cs)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4104193B2 (ja) * 1997-11-14 2008-06-18 株式会社エフオーアイ プラズマ処理装置
JP2003007682A (ja) 2001-06-25 2003-01-10 Matsushita Electric Ind Co Ltd プラズマ処理装置用の電極部材
US7074720B2 (en) 2001-06-25 2006-07-11 Matsushita Electric Industrial Co., Ltd. Plasma treating apparatus, plasma treating method and method of manufacturing semiconductor device
JP5216660B2 (ja) * 2009-03-30 2013-06-19 富士通株式会社 ダイオキシン含有被処理物質の浄化方法及びダイオキシン含有被処理物質の浄化装置
JP2012004160A (ja) * 2010-06-14 2012-01-05 Tokyo Electron Ltd 基板処理方法及び基板処理装置

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4367114A (en) * 1981-05-06 1983-01-04 The Perkin-Elmer Corporation High speed plasma etching system
JPS6039832A (ja) * 1983-08-12 1985-03-01 Fujitsu Ltd プラズマ処理装置

Also Published As

Publication number Publication date
JPS61278144A (ja) 1986-12-09

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