JPH0562734B2 - - Google Patents

Info

Publication number
JPH0562734B2
JPH0562734B2 JP60001640A JP164085A JPH0562734B2 JP H0562734 B2 JPH0562734 B2 JP H0562734B2 JP 60001640 A JP60001640 A JP 60001640A JP 164085 A JP164085 A JP 164085A JP H0562734 B2 JPH0562734 B2 JP H0562734B2
Authority
JP
Japan
Prior art keywords
resist
polystyrene
developer
mixture
methyl ethyl
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP60001640A
Other languages
English (en)
Japanese (ja)
Other versions
JPS61160742A (ja
Inventor
Katsumi Tanigaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Electric Co Ltd filed Critical Nippon Electric Co Ltd
Priority to JP60001640A priority Critical patent/JPS61160742A/ja
Publication of JPS61160742A publication Critical patent/JPS61160742A/ja
Publication of JPH0562734B2 publication Critical patent/JPH0562734B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C5/00—Photographic processes or agents therefor; Regeneration of such processing agents
    • G03C5/18—Diazo-type processes, e.g. thermal development, or agents therefor

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP60001640A 1985-01-09 1985-01-09 レジストの現像液 Granted JPS61160742A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60001640A JPS61160742A (ja) 1985-01-09 1985-01-09 レジストの現像液

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60001640A JPS61160742A (ja) 1985-01-09 1985-01-09 レジストの現像液

Publications (2)

Publication Number Publication Date
JPS61160742A JPS61160742A (ja) 1986-07-21
JPH0562734B2 true JPH0562734B2 (enExample) 1993-09-09

Family

ID=11507121

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60001640A Granted JPS61160742A (ja) 1985-01-09 1985-01-09 レジストの現像液

Country Status (1)

Country Link
JP (1) JPS61160742A (enExample)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08262738A (ja) * 1995-03-27 1996-10-11 Agency Of Ind Science & Technol 微細パターン形成方法

Also Published As

Publication number Publication date
JPS61160742A (ja) 1986-07-21

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