JPH0561613B2 - - Google Patents
Info
- Publication number
- JPH0561613B2 JPH0561613B2 JP4375986A JP4375986A JPH0561613B2 JP H0561613 B2 JPH0561613 B2 JP H0561613B2 JP 4375986 A JP4375986 A JP 4375986A JP 4375986 A JP4375986 A JP 4375986A JP H0561613 B2 JPH0561613 B2 JP H0561613B2
- Authority
- JP
- Japan
- Prior art keywords
- sample
- polygon mirror
- sample stage
- stage
- laser
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Landscapes
- Facsimile Scanning Arrangements (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Mechanical Optical Scanning Systems (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61043759A JPS62201414A (ja) | 1986-02-28 | 1986-02-28 | レ−ザ描画装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61043759A JPS62201414A (ja) | 1986-02-28 | 1986-02-28 | レ−ザ描画装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS62201414A JPS62201414A (ja) | 1987-09-05 |
| JPH0561613B2 true JPH0561613B2 (enEXAMPLES) | 1993-09-06 |
Family
ID=12672688
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP61043759A Granted JPS62201414A (ja) | 1986-02-28 | 1986-02-28 | レ−ザ描画装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS62201414A (enEXAMPLES) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH02173609A (ja) * | 1988-12-26 | 1990-07-05 | Nec Corp | レーザ描画装置 |
| SE516347C2 (sv) * | 1999-11-17 | 2001-12-17 | Micronic Laser Systems Ab | Laserskanningssystem och metod för mikrolitografisk skrivning |
| JP4997073B2 (ja) * | 2007-11-19 | 2012-08-08 | 日立ビアメカニクス株式会社 | レーザ直接描画装置 |
| JP2009128499A (ja) * | 2007-11-21 | 2009-06-11 | Hitachi Via Mechanics Ltd | レーザ直接描画方法およびレーザ直接描画装置 |
-
1986
- 1986-02-28 JP JP61043759A patent/JPS62201414A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS62201414A (ja) | 1987-09-05 |
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