JPH0561578B2 - - Google Patents
Info
- Publication number
- JPH0561578B2 JPH0561578B2 JP57115429A JP11542982A JPH0561578B2 JP H0561578 B2 JPH0561578 B2 JP H0561578B2 JP 57115429 A JP57115429 A JP 57115429A JP 11542982 A JP11542982 A JP 11542982A JP H0561578 B2 JPH0561578 B2 JP H0561578B2
- Authority
- JP
- Japan
- Prior art keywords
- pattern
- chip
- memory
- defect inspection
- patterns
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
- G03F1/82—Auxiliary processes, e.g. cleaning or inspecting
- G03F1/84—Inspecting
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57115429A JPS596536A (ja) | 1982-07-05 | 1982-07-05 | 欠陥検査装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57115429A JPS596536A (ja) | 1982-07-05 | 1982-07-05 | 欠陥検査装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS596536A JPS596536A (ja) | 1984-01-13 |
| JPH0561578B2 true JPH0561578B2 (cs) | 1993-09-06 |
Family
ID=14662344
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP57115429A Granted JPS596536A (ja) | 1982-07-05 | 1982-07-05 | 欠陥検査装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS596536A (cs) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2716896B2 (ja) * | 1991-11-05 | 1998-02-18 | 株式会社イトーキクレビオ | 物品の保管・搬送システム |
| JP2531404B2 (ja) * | 1992-01-29 | 1996-09-04 | 村田機械株式会社 | ピッキングシステム |
| JP5799271B2 (ja) | 2010-09-30 | 2015-10-21 | パナソニックIpマネジメント株式会社 | 無線通信機 |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5480087A (en) * | 1977-12-09 | 1979-06-26 | Hitachi Ltd | External appearance test unit |
| JPS54111774A (en) * | 1978-02-22 | 1979-09-01 | Hitachi Ltd | Inspection method of mask and its unit |
| JPS57207335A (en) * | 1981-06-15 | 1982-12-20 | Fujitsu Ltd | Pattern checking system |
-
1982
- 1982-07-05 JP JP57115429A patent/JPS596536A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS596536A (ja) | 1984-01-13 |
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