JPH0560269B2 - - Google Patents
Info
- Publication number
- JPH0560269B2 JPH0560269B2 JP59016771A JP1677184A JPH0560269B2 JP H0560269 B2 JPH0560269 B2 JP H0560269B2 JP 59016771 A JP59016771 A JP 59016771A JP 1677184 A JP1677184 A JP 1677184A JP H0560269 B2 JPH0560269 B2 JP H0560269B2
- Authority
- JP
- Japan
- Prior art keywords
- pressure
- force
- receiving surface
- sensitive
- directions
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000000758 substrate Substances 0.000 claims description 8
- 238000009826 distribution Methods 0.000 description 14
- 238000000034 method Methods 0.000 description 6
- 238000012545 processing Methods 0.000 description 5
- 238000004422 calculation algorithm Methods 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- 229920000049 Carbon (fiber) Polymers 0.000 description 3
- 239000004917 carbon fiber Substances 0.000 description 3
- 238000009792 diffusion process Methods 0.000 description 3
- 229920001971 elastomer Polymers 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 3
- 239000011888 foil Substances 0.000 description 3
- 230000006870 function Effects 0.000 description 3
- 238000005259 measurement Methods 0.000 description 3
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 3
- 229920002379 silicone rubber Polymers 0.000 description 3
- 239000004945 silicone rubber Substances 0.000 description 3
- 210000000707 wrist Anatomy 0.000 description 3
- 230000008901 benefit Effects 0.000 description 2
- 238000004364 calculation method Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- WABPQHHGFIMREM-UHFFFAOYSA-N lead(0) Chemical compound [Pb] WABPQHHGFIMREM-UHFFFAOYSA-N 0.000 description 2
- 229910021421 monocrystalline silicon Inorganic materials 0.000 description 2
- 230000004044 response Effects 0.000 description 2
- 230000001953 sensory effect Effects 0.000 description 2
- 241000282412 Homo Species 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 230000006835 compression Effects 0.000 description 1
- 238000007906 compression Methods 0.000 description 1
- 238000012937 correction Methods 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000013013 elastic material Substances 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 239000010408 film Substances 0.000 description 1
- 210000004247 hand Anatomy 0.000 description 1
- 238000003780 insertion Methods 0.000 description 1
- 230000037431 insertion Effects 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 238000010884 ion-beam technique Methods 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 230000035807 sensation Effects 0.000 description 1
- 230000002123 temporal effect Effects 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- 238000004078 waterproofing Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/84—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by variation of applied mechanical force, e.g. of pressure
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Ceramic Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Force Measurement Appropriate To Specific Purposes (AREA)
- Pressure Sensors (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59016771A JPS60160672A (ja) | 1984-01-31 | 1984-01-31 | 圧覚センサアレイ |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59016771A JPS60160672A (ja) | 1984-01-31 | 1984-01-31 | 圧覚センサアレイ |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS60160672A JPS60160672A (ja) | 1985-08-22 |
| JPH0560269B2 true JPH0560269B2 (fr) | 1993-09-01 |
Family
ID=11925474
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP59016771A Granted JPS60160672A (ja) | 1984-01-31 | 1984-01-31 | 圧覚センサアレイ |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS60160672A (fr) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7334489B2 (en) * | 2005-08-10 | 2008-02-26 | Custom Sensors & Technologies, Inc. | Dual rate force transducer |
| JP5156311B2 (ja) * | 2007-09-19 | 2013-03-06 | 本田技研工業株式会社 | 搬送システム及び接触センサ |
| JP2013257267A (ja) * | 2012-06-14 | 2013-12-26 | Seiko Epson Corp | 力検出モジュール、力検出装置及びロボット |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS598782A (ja) * | 1982-07-08 | 1984-01-18 | Fuji Photo Film Co Ltd | 放射線増感スクリ−ン |
-
1984
- 1984-01-31 JP JP59016771A patent/JPS60160672A/ja active Granted
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS598782A (ja) * | 1982-07-08 | 1984-01-18 | Fuji Photo Film Co Ltd | 放射線増感スクリ−ン |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS60160672A (ja) | 1985-08-22 |
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