JPH0560256B2 - - Google Patents
Info
- Publication number
- JPH0560256B2 JPH0560256B2 JP60168956A JP16895685A JPH0560256B2 JP H0560256 B2 JPH0560256 B2 JP H0560256B2 JP 60168956 A JP60168956 A JP 60168956A JP 16895685 A JP16895685 A JP 16895685A JP H0560256 B2 JPH0560256 B2 JP H0560256B2
- Authority
- JP
- Japan
- Prior art keywords
- electrode
- sample
- container
- gas
- dry etching
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Landscapes
- Drying Of Semiconductors (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16895685A JPS6230329A (ja) | 1985-07-31 | 1985-07-31 | ドライエツチング装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16895685A JPS6230329A (ja) | 1985-07-31 | 1985-07-31 | ドライエツチング装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6230329A JPS6230329A (ja) | 1987-02-09 |
| JPH0560256B2 true JPH0560256B2 (OSRAM) | 1993-09-01 |
Family
ID=15877669
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP16895685A Granted JPS6230329A (ja) | 1985-07-31 | 1985-07-31 | ドライエツチング装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6230329A (OSRAM) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH07111835A (ja) * | 1991-12-10 | 1995-05-02 | Toho Leo Kk | 樹木の支持施工方法 |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01179421A (ja) * | 1988-01-06 | 1989-07-17 | Tokuda Seisakusho Ltd | 放電電極 |
| JP2804037B2 (ja) * | 1988-02-05 | 1998-09-24 | 株式会社東芝 | ドライエッチング方法 |
| JPH02121330A (ja) * | 1988-10-31 | 1990-05-09 | Hitachi Ltd | プラズマ処理方法及び装置 |
| JPH02268429A (ja) * | 1989-04-11 | 1990-11-02 | Tokyo Electron Ltd | プラズマエッチング装置 |
| JPH03167825A (ja) * | 1989-11-28 | 1991-07-19 | Matsushita Electric Ind Co Ltd | エッチング装置およびエッチング方法 |
| US5798016A (en) * | 1994-03-08 | 1998-08-25 | International Business Machines Corporation | Apparatus for hot wall reactive ion etching using a dielectric or metallic liner with temperature control to achieve process stability |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6056431B2 (ja) * | 1980-10-09 | 1985-12-10 | 三菱電機株式会社 | プラズマエツチング装置 |
| JPS58153332A (ja) * | 1982-03-08 | 1983-09-12 | Mitsubishi Electric Corp | ドライエツチング装置 |
-
1985
- 1985-07-31 JP JP16895685A patent/JPS6230329A/ja active Granted
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH07111835A (ja) * | 1991-12-10 | 1995-05-02 | Toho Leo Kk | 樹木の支持施工方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6230329A (ja) | 1987-02-09 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| EXPY | Cancellation because of completion of term |